ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures最新文献_第3页

An investigation into the nonquasistatic effects in MOS devices with on-wafer S-parameter techniques 基于片上s参数技术的MOS器件非准静态效应研究

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292899

R. Singh, A. Juge, R. Joly, G. Mortin

引用次数: 14

A moveable shielding box adaptable to commercial automatic wafer probers 一种可移动屏蔽盒，适用于商用自动晶圆探测器

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292917

M. Lozano, C. Cané, J. Santander, I. Gràcia, E. Lora-Tamayo

引用次数: 0

Modeling of real defect outlines for defect size distribution and yield prediction 真实缺陷轮廓的建模，用于缺陷尺寸分布和良率预测

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292890

C. Hess, A. Strole

引用次数: 3

The use of low-level pre-tunneling currents to characterize thin oxide wearout and breakdown 使用低水平的预隧穿电流来表征薄氧化物的磨损和击穿

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292922

D. Dumin, J. Maddux, R. Subramoniam, R. S. Scott, D. Wong

引用次数: 2

A flexible test structure evaluation system for reliability data analysis 一种用于可靠性数据分析的柔性试验结构评估系统

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292921

M. Mori, Y. Kuriyama, N. Shiono

引用次数: 1

A direct, reliable, measurement-based technique for the extraction of an on-chip HBT dummy structure equivalent circuit 一种直接，可靠，基于测量的技术，用于提取片上HBT假结构等效电路

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292898

K. Lu, P. Perry, T. Brazil

引用次数: 4

The use of test masks in the analysis of device yields 在器件产量分析中使用测试掩模

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292920

S. J. Rhodes, G.C. Day

引用次数: 0

Junction evaluation by time dependent degradation due to high constant voltage stressing (DRAMs) 高恒压应力引起的时间依赖退化的结评价(dram)

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292883

J. Mitsuhashi, J. Komori, T. Eimori, H. Koyama

引用次数: 1

A test pattern for three-dimensional latch-up analysis 三维闭锁分析的测试模式

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292886

I. De Munari, R. Menozzi, M. Davoli, F. Fantini

引用次数: 0

Test structure for the in-plane locations of project features with nanometer-level accuracy traceable to a coordinate measurement system 工程特征面内位置的测试结构，具有纳米级精度，可追溯至坐标测量系统

ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures Pub Date : 1993-03-22 DOI: 10.1109/ICMTS.1993.292910

M. Cresswell, R. Allen, L. W. Linholm, C. Ellenwood, W. B. Penzes, E. Teague

{"title":"Test structure for the in-plane locations of project features with nanometer-level accuracy traceable to a coordinate measurement system","authors":"M. Cresswell, R. Allen, L. W. Linholm, C. Ellenwood, W. B. Penzes, E. Teague","doi":"10.1109/ICMTS.1993.292910","DOIUrl":"https://doi.org/10.1109/ICMTS.1993.292910","url":null,"abstract":"A new test structure is reported. It is designed to measure the positions of the images of an array of features projected from a mask into a resist film on substrate with accuracy better than 10 nm. The resist film on the substrate covers a nominally matching array of partially formed versions of the test structure prepatterned in a conducting film. Instances of the finished structure are formed on the substrate by further selective removal of conducting material from the partially formed test structures where they are overlaid by images of the fiducial marks on the mask. At each array point, the feature of the completed test structure that is defined by the overlay of the image of the fiducial marks on the mask is called the pointer. The part of the partially formed test structure that is unaffected by the overlay of the images of the fiducial marks on the mask serves as a ruler. Electrical testing accurately provides the precise location of the pointer relative to the ruler within each test structure. The locations of the rulers prepatterned on the substrate are determined with a coordinate measurement system (CMS) called the NIST (National Institute of Standards and Technology) Molecular Measuring Machine (M-Cubed).<<ETX>>","PeriodicalId":123048,"journal":{"name":"ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131889184","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 6