Microelectronics Reliability最新文献

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Long-term (8000 h) reliability and failures of high-power LEDs for outdoor lighting stressed at high ambient temperatures
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-12 DOI: 10.1016/j.microrel.2025.115634
A. Caria , R. Fraccaroli , G. Pierobon , T. Castellaro , A. Huang , J. Magnien , J. Rosc , Gy Lipák , G. Hantos , J. Hegedüs , C. De Santi , M. Buffolo , N. Trivellin , E. Zanoni , A. Poppe , G. Meneghesso , M. Meneghini
{"title":"Long-term (8000 h) reliability and failures of high-power LEDs for outdoor lighting stressed at high ambient temperatures","authors":"A. Caria ,&nbsp;R. Fraccaroli ,&nbsp;G. Pierobon ,&nbsp;T. Castellaro ,&nbsp;A. Huang ,&nbsp;J. Magnien ,&nbsp;J. Rosc ,&nbsp;Gy Lipák ,&nbsp;G. Hantos ,&nbsp;J. Hegedüs ,&nbsp;C. De Santi ,&nbsp;M. Buffolo ,&nbsp;N. Trivellin ,&nbsp;E. Zanoni ,&nbsp;A. Poppe ,&nbsp;G. Meneghesso ,&nbsp;M. Meneghini","doi":"10.1016/j.microrel.2025.115634","DOIUrl":"10.1016/j.microrel.2025.115634","url":null,"abstract":"<div><div>Modern solid-state lighting systems allowed to enhance the energy efficiency of light sources, improve quality and reduce the related costs; however, the reliability of high-power light-emitting diodes (LEDs) is a critical aspect, especially in systems where high powers/small footprints are required.</div><div>In this paper, the long-term reliability of high-power light emitting diodes (LEDs) for outdoor lighting is analyzed. LEDs were stressed for 8000 h near their absolute maximum current, at different ambient temperatures (45 °C, 65 °C, 85 °C and 105 °C). The devices were mounted on metal-core printed circuit boards (PCBs), 8 LEDs per PCB. LEDs were characterized individually by means of I-V characterizations and power spectral density measurements. LEDs stressed at the lowest temperatures, which junction temperature was within absolute maximum rating, showed almost no degradation, whereas LEDs stressed at 85 °C and 105 °C, with junction temperature exceeding absolute maximum, showed an initial gradual degradation, followed by a catastrophic degradation, due to silicone cracking and darkening. X-ray imaging and shear tests highlighted a solder degradation. Remarkably, negligible thermal resistance variation was measured, but junction temperature increased during the stress. This increase was attributed to gradual silicone degradation, that increased silicone lens light absorption in a positive feedback loop, leading to the cracking/darkening of the lens.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115634"},"PeriodicalIF":1.6,"publicationDate":"2025-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143611530","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
About the influence of temperature operation and packaging stress on the threshold for catastrophic optical damage in laser diodes
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-12 DOI: 10.1016/j.microrel.2025.115695
Jorge Souto, José Luis Pura, Julian Anaya, Juan Jimenez
{"title":"About the influence of temperature operation and packaging stress on the threshold for catastrophic optical damage in laser diodes","authors":"Jorge Souto,&nbsp;José Luis Pura,&nbsp;Julian Anaya,&nbsp;Juan Jimenez","doi":"10.1016/j.microrel.2025.115695","DOIUrl":"10.1016/j.microrel.2025.115695","url":null,"abstract":"<div><div>Catastrophic optical damage (COD) is a degradation mode of laser diodes. COD is associated with a localized overheating of the active region of the laser. The COD power threshold decreases with laser aging and is influenced by operational conditions, such as cavity temperature, and technological factors, including packaging-induced stress. We analyze here the influence of both factors, the temperature of the cavity and the packaging stress, on the local heat sources responsible for COD. Using finite element methods, we extend a thermomechanical COD model to include these variables. The model is applied to a generic AlGaAs/GaAs (808 nm) laser device, but it can be extended to any laser device by taking account of the specific operational characteristics and the material parameters. The results obtained evidence a reduction in the COD power threshold due to junction temperature increase and packaging stress.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115695"},"PeriodicalIF":1.6,"publicationDate":"2025-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143611532","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Active gate driver for current overshoot suppression of SiC+Si hybrid switches with dynamic gate current regulation
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-12 DOI: 10.1016/j.microrel.2025.115689
Ping Liu , Yongjie Liu , Qi Cao , Biao Xiao , Mingbin Tang , Chunming Tu , Bin Yu
{"title":"Active gate driver for current overshoot suppression of SiC+Si hybrid switches with dynamic gate current regulation","authors":"Ping Liu ,&nbsp;Yongjie Liu ,&nbsp;Qi Cao ,&nbsp;Biao Xiao ,&nbsp;Mingbin Tang ,&nbsp;Chunming Tu ,&nbsp;Bin Yu","doi":"10.1016/j.microrel.2025.115689","DOIUrl":"10.1016/j.microrel.2025.115689","url":null,"abstract":"<div><div>Hybrid Switch (HyS) is consisted of a high-current Si-insulated gate bipolar transistor (IGBT) and a low-current Silicon Carbide (SiC)-MOSFET connected in parallel, which has been widely studied due to their high efficiency and low cost. In general, to realize the zero-voltage conduction of IGBTs, the switching timing of the Hys is usually chosen to turn on the SiC earlier or at the same instant. However, HyS will have current overcurrent stress problem in practical applications, resulting in the maximum current rating being limited. In this paper, an active drive circuit is proposed to suppress the SiC MOSFET current overshoot by extracting part of the driving current during the SiC current rise phase, so as to ensure the operational reliability of the hybrid switches. A double-pulse test platform was built to verify the proposed driver circuit under different load current conditions. The experimental results show that compared with the conventional gate driver (CGD) circuit, the Si/SiC hybrid switches with the active gate driver(AGD) circuit proposed in this paper suppresses the current overshoot of the SiC by 38.3 %, 28.4 %, and 22 % in the heavy-load, medium-load, and light-load conditions, respectively, when the drain resistance is selected to be 3 Ω. The peak current of the SiC is within the limit of the safe operating area, while the increased switching loss is within the acceptable range.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115689"},"PeriodicalIF":1.6,"publicationDate":"2025-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143611528","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Device edge termination effects on TDDB in galvanic isolators based on polymeric dielectrics
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-12 DOI: 10.1016/j.microrel.2025.115670
Matteo Greatti , Jurij L. Mazzola , Lorenzo Cantù , Marco Salina , Fabrizio Speroni , Michele Lauria , Francesco Guzzi , Donata Asnaghi , Dario Paci , Vincenzo Marano , Alessandro Spinelli , Christian Monzio Compagnoni , Gerardo Malavena
{"title":"Device edge termination effects on TDDB in galvanic isolators based on polymeric dielectrics","authors":"Matteo Greatti ,&nbsp;Jurij L. Mazzola ,&nbsp;Lorenzo Cantù ,&nbsp;Marco Salina ,&nbsp;Fabrizio Speroni ,&nbsp;Michele Lauria ,&nbsp;Francesco Guzzi ,&nbsp;Donata Asnaghi ,&nbsp;Dario Paci ,&nbsp;Vincenzo Marano ,&nbsp;Alessandro Spinelli ,&nbsp;Christian Monzio Compagnoni ,&nbsp;Gerardo Malavena","doi":"10.1016/j.microrel.2025.115670","DOIUrl":"10.1016/j.microrel.2025.115670","url":null,"abstract":"<div><div>We present an investigation on the impact of device edge termination on Time-Dependent Dielectric Breakdown (TDDB) in galvanic isolators based on polymeric dielectrics. By means of experimental and numerical analyses, we highlight that electrode thickness and device passivation are important design elements to limit the impact of electric field intensification at device on TDDB and prolong device lifetime. Results point out key aspects to consider to push the performance and the reliability of modern galvanic isolators to their ultimate limits.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115670"},"PeriodicalIF":1.6,"publicationDate":"2025-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143611527","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Gate lifetime investigation at low temperature for p-GaN HEMT
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-11 DOI: 10.1016/j.microrel.2025.115658
M. Alam , V. Rustichelli , M. Zerarka , C. Banc , J. Pieprzyk , O. Perrotin , R. Ceccarelli , D. Trémouilles , M. Matmat , F. Coccetti
{"title":"Gate lifetime investigation at low temperature for p-GaN HEMT","authors":"M. Alam ,&nbsp;V. Rustichelli ,&nbsp;M. Zerarka ,&nbsp;C. Banc ,&nbsp;J. Pieprzyk ,&nbsp;O. Perrotin ,&nbsp;R. Ceccarelli ,&nbsp;D. Trémouilles ,&nbsp;M. Matmat ,&nbsp;F. Coccetti","doi":"10.1016/j.microrel.2025.115658","DOIUrl":"10.1016/j.microrel.2025.115658","url":null,"abstract":"<div><div>This paper investigates the time-dependent gate degradation of Schottky-type p-GaN gate transistors by the application of constant electrical stress until the breakdown of the device, indicated by a sudden increase in the gate leakage current. Tests are performed at voltage levels outside the datasheet limits to accelerate the occurrence of failure. To understand the impact of temperature on the failure mechanism, tests encompass temperature ranges from −55 °C to 80 °C, within datasheet recommendations. Results demonstrate that the lower the temperature, the shorter the lifetime, indicating a negative activation energy. Results also present a non-constant activation energy within the range of tested temperatures, demonstrating a complex temperature dependence of the failure mechanism that might not be unique over this temperature range. A very low lifetime of only one day was estimated at −55 °C at the nominal datasheet voltage. The validity of the projection was experimentally confirmed. This underlines the importance of further investigating the gate behavior at low temperatures, as it could be critical for certain applications. Additionally, this challenges the standard gate reliability tests typically performed at the maximum temperature rating of the device, which do not appear to represent the worst-case condition for the gate lifetime.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115658"},"PeriodicalIF":1.6,"publicationDate":"2025-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143592879","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Interface-related VTH shift of SiC MOSFETs during constant current stress extracted from charge pumping measurements
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-11 DOI: 10.1016/j.microrel.2025.115698
A. Marcuzzi , M. Avramenko , C. De Santi , P. Moens , G. Meneghesso , E. Zanoni , M. Meneghini
{"title":"Interface-related VTH shift of SiC MOSFETs during constant current stress extracted from charge pumping measurements","authors":"A. Marcuzzi ,&nbsp;M. Avramenko ,&nbsp;C. De Santi ,&nbsp;P. Moens ,&nbsp;G. Meneghesso ,&nbsp;E. Zanoni ,&nbsp;M. Meneghini","doi":"10.1016/j.microrel.2025.115698","DOIUrl":"10.1016/j.microrel.2025.115698","url":null,"abstract":"<div><div>This work focuses on the extraction of Threshold Voltage Shift due to interface trapping from Charge Pumping (CP) measured curves. The proposed mathematical approach analyzes the peak of the charge pumping curve, proportional to the average interface defects density, for estimating the threshold voltage shift due to interface trapping separately from the shift induced by oxide trapping. The high-frequency nature of CP measurements is therefore exploited for the detection of fast states. The analyzed devices are 4H-SiC n-channel MOSFETs and a custom, on-wafer, in-situ measurement setup is used. Under constant current gate stress, positive and negative charge trapping processes are identified; the role of a) charge trapping in the oxide and b) interface states generation is analyzed and described.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115698"},"PeriodicalIF":1.6,"publicationDate":"2025-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143592878","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
On the influence of the porosity and homogeneity of sintered die-attach layers on the power cycling performance
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-10 DOI: 10.1016/j.microrel.2025.115691
L. Mikutta, F. Otto, J. Schadewald
{"title":"On the influence of the porosity and homogeneity of sintered die-attach layers on the power cycling performance","authors":"L. Mikutta,&nbsp;F. Otto,&nbsp;J. Schadewald","doi":"10.1016/j.microrel.2025.115691","DOIUrl":"10.1016/j.microrel.2025.115691","url":null,"abstract":"<div><div>Silver sintering is the state-of-the-art technology for highly reliable chip - substrate interconnects. The power cycling reliability, however, strongly depends on the thermal and mechanical properties of the sintered bond line, both of which are governed by the magnitude and the homogeneity of the porosity in the sintered layer. This dependency is investigated and discussed in this paper. Power cycling tests were performed on sintered samples having different porosities and/or porosity distributions after which the samples were subjected to failure analysis. It is concluded that - within the tested ranges - the sinter layer porosity and its distribution is not limiting the power cycling capability.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115691"},"PeriodicalIF":1.6,"publicationDate":"2025-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143578648","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
On the validity of rainflow counting-based lifetime assessment for power electronics assembly
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-10 DOI: 10.1016/j.microrel.2025.115651
D. Zhao, S. Letz, J. Leib, B. Eckardt
{"title":"On the validity of rainflow counting-based lifetime assessment for power electronics assembly","authors":"D. Zhao,&nbsp;S. Letz,&nbsp;J. Leib,&nbsp;B. Eckardt","doi":"10.1016/j.microrel.2025.115651","DOIUrl":"10.1016/j.microrel.2025.115651","url":null,"abstract":"<div><div>The lifetime assessment of power electronics based on mission profiles is increasingly applied to obtain realistic lifetime predictions while considering application-close operational scenarios. Generally, mission profile-based lifetime is calculated by individual temperature cycles disassembled from the mission profiles using specific counting methods. Among the different methods, rainflow counting (RC) method is the most common algorithmic procedure for determining damage-relevant events in power electronics. However, the conventional RC method does not consider the mechanical sequential effect and transient effect on damage caused by time-dependent material properties, especially at high temperatures during power module operation. In this paper, we investigate the validity of using the RC method for mission profile-based lifetime assessment of power modules. Through finite element (FE) modeling, we explicitly calculate both effects driven by the mission profile. For the selected mission profiles, we find that the lifetime of bond wire calculated by the FE approach shows a difference of 9 %, which cannot be sensed by the conventional RC approach. Furthermore, through a comparison between different approaches, it appears that the lifetime calculated by the RC approach is higher than the lifetime assessed by the FE approach by around 20 %. Simultaneously at the solder, the deviation between both approaches reaches around 95 %.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115651"},"PeriodicalIF":1.6,"publicationDate":"2025-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143578646","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A geometry-scalable electrothermal compact circuit model of SiC merged-PiN-Schottky diodes accounting for the snapback mechanism: Application to current surge events
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-10 DOI: 10.1016/j.microrel.2025.115668
A. Borghese, V. Terracciano, M. Boccarossa, A. Irace, V. d'Alessandro
{"title":"A geometry-scalable electrothermal compact circuit model of SiC merged-PiN-Schottky diodes accounting for the snapback mechanism: Application to current surge events","authors":"A. Borghese,&nbsp;V. Terracciano,&nbsp;M. Boccarossa,&nbsp;A. Irace,&nbsp;V. d'Alessandro","doi":"10.1016/j.microrel.2025.115668","DOIUrl":"10.1016/j.microrel.2025.115668","url":null,"abstract":"<div><div>In this paper, we introduce a compact model tailored for silicon carbide Merged PiN Schottky (MPS) diodes in the form of a SPICE-compatible subcircuit. The model is designed to (i) describe the undesired snapback mechanism, which is likely to occur in unoptimized diodes with narrow width of the PiN portion and/or excessively thick drift layer, (ii) capture the dependence of geometry-related parameters upon the width of the cell and the individual widths of the PiN and Schottky portions, (iii) account for the impact of temperature on the related parameters; in addition, the thermal equivalent of the Ohm's law is exploited to allow for static and dynamic electrothermal simulations within SPICE-like tools. The proposed subcircuit is adopted to analyze imbalances occurring in paralleled snapback-affected MPS diodes subjected to current surge events.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115668"},"PeriodicalIF":1.6,"publicationDate":"2025-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143578647","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Threshold voltage hysteresis investigation of SiC MOSFETs with different structures under various measurement conditions
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-03-09 DOI: 10.1016/j.microrel.2025.115657
Dong Xie , Patrick Heimler , Roman Boldyrjew-Mast , Mohamed Alaluss , Sven Thiele , Josef Lutz , Thomas Basler
{"title":"Threshold voltage hysteresis investigation of SiC MOSFETs with different structures under various measurement conditions","authors":"Dong Xie ,&nbsp;Patrick Heimler ,&nbsp;Roman Boldyrjew-Mast ,&nbsp;Mohamed Alaluss ,&nbsp;Sven Thiele ,&nbsp;Josef Lutz ,&nbsp;Thomas Basler","doi":"10.1016/j.microrel.2025.115657","DOIUrl":"10.1016/j.microrel.2025.115657","url":null,"abstract":"<div><div>The evaluation of the bias temperature instability (BTI) or gate-switching instability (GSI) of the threshold voltage (<em>V</em><sub>th</sub>) is important for analyzing the stability of <em>R</em><sub>DS,on</sub> and virtual temperature calculation by the <em>V</em><sub>SD</sub>-T technique in the power cycling test (PCT). But before this, the <em>V</em><sub>th</sub> hysteresis should be first analyzed to choose the suitable <em>V</em><sub>th</sub> measurement parameters and eliminate the hysteresis effect on the BTI/GSI read-out. This paper investigates the <em>V</em><sub>th</sub> hysteresis of SiC MOSFETs under various measurement conditions. The differences in <em>V</em><sub>th</sub> hysteresis between different technologies are significant. Relevant measured and analytical results can provide the practical guidance for the BTI/GSI evaluation and the PCT for different types of SiC MOSFETs.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"168 ","pages":"Article 115657"},"PeriodicalIF":1.6,"publicationDate":"2025-03-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143578643","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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