Microelectronics Reliability最新文献

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HTRB effects on threshold instability of 4H-SiC PowerMOSFET with carrots defects HTRB对具有胡萝卜缺陷的4H-SiC功率mosfet阈值不稳定性的影响
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-13 DOI: 10.1016/j.microrel.2025.115781
L. Anoldo , G. Tosto , Z. Dahrouch , S. Bevilacqua , E. Schroer , S. Patanè , A. Russo
{"title":"HTRB effects on threshold instability of 4H-SiC PowerMOSFET with carrots defects","authors":"L. Anoldo ,&nbsp;G. Tosto ,&nbsp;Z. Dahrouch ,&nbsp;S. Bevilacqua ,&nbsp;E. Schroer ,&nbsp;S. Patanè ,&nbsp;A. Russo","doi":"10.1016/j.microrel.2025.115781","DOIUrl":"10.1016/j.microrel.2025.115781","url":null,"abstract":"<div><div>This article presents a reliability study on conventional 650 V SiC MOSFETs subject to carrot-like defects under High Temperature Reverse Bias (HTRB) stress. The instabilities of some parameters are monitored, and the drift analysis of the most critical one is presented. The study aims to isolate the impact of carrot defects by comparing devices with these defects to those without and the analysis of the electrical characteristics on samples subjected to HTRB shows an evident difference between devices with and without defects.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115781"},"PeriodicalIF":1.6,"publicationDate":"2025-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143935871","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A review in thermal management for advanced chip packaging from chip to heat sink 先进芯片封装从芯片到散热器的热管理综述
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-12 DOI: 10.1016/j.microrel.2025.115782
Minsoo Kim , Jaehyun Kim , Woosung Park , Joon Sang Kang
{"title":"A review in thermal management for advanced chip packaging from chip to heat sink","authors":"Minsoo Kim ,&nbsp;Jaehyun Kim ,&nbsp;Woosung Park ,&nbsp;Joon Sang Kang","doi":"10.1016/j.microrel.2025.115782","DOIUrl":"10.1016/j.microrel.2025.115782","url":null,"abstract":"<div><div>As the architectural complexity of semiconductor devices increases, energy-efficient thermal management in semiconductor packages has become a significant challenge. The effectiveness of thermal management dictates the performance and reliability of semiconductor packaging, making it a crucial factor in the design of high-performance and high-density systems. This review provides a detailed overview of recent advances in thermal management solutions for semiconductor packages, with a particular focus on heat conduction from the chip to the heat sink. The review first introduces advanced thermal characterization techniques, which are essential for evaluating the passive thermal performance of chip packages. It then explores the use of high thermal conductivity materials in various components, such as thermal interface materials (TIMs), heat spreaders, and package substrates, all of which are critical for improving heat dissipation. Additionally, the review examines design aspects aimed at enhancing heat removal rates, including interface engineering between dissimilar components and the incorporation of thermal vias within a package. The aforementioned approaches can be combined to optimize overall thermal performance in semiconductor packages, requiring careful material selection and appropriate thermal engineering design.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115782"},"PeriodicalIF":1.6,"publicationDate":"2025-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143935967","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhancing AC degradation modeling by considering the degradation profile in SiON pMOSFETs 通过考虑pmosfet的退化特性来增强交流退化建模
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-09 DOI: 10.1016/j.microrel.2025.115771
Yeohyeok Yun
{"title":"Enhancing AC degradation modeling by considering the degradation profile in SiON pMOSFETs","authors":"Yeohyeok Yun","doi":"10.1016/j.microrel.2025.115771","DOIUrl":"10.1016/j.microrel.2025.115771","url":null,"abstract":"<div><div>This paper presents a method to enhance the prediction accuracy of SiON <em>p</em>MOSFET degradation under AC stress. The degradation occurring in the preceding stage (pre-ON or OFF-state) is analyzed by extract the <em>V</em><sub><em>th</em></sub> degradation profile, which influences the subsequent stage (post-OFF or ON-state). As a result, the negative charge generated by stress in the pre-OFF-state increased the gate oxide field in the post-ON-state, accelerating the degradation of the post-ON-state. This phenomenon became more localized at the drain edge. The positive charge generated by pre-ON-state non-uniformly altered the electric field between the gate and channel, accelerating degradation due to post-OFF-state, especially at the source and drain region. Furthermore, integrating post-ON and OFF-state degradation models for each channel region during the effective period of AC stress improved the accuracy of <em>V</em><sub><em>th</em></sub> degradation modeling for SiON <em>p</em>MOSFETs under various duty ratios of AC stress.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115771"},"PeriodicalIF":1.6,"publicationDate":"2025-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143922456","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Corrosion failure analysis of printed circuit boards exposed to H2S resulting from the decomposition of sargassum algae 马尾藻分解产生的H2S对印刷电路板的腐蚀失效分析
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-08 DOI: 10.1016/j.microrel.2025.115784
Benoit Lescop , Olivia Amintas , Carole Boullanger , Stéphane Rioual
{"title":"Corrosion failure analysis of printed circuit boards exposed to H2S resulting from the decomposition of sargassum algae","authors":"Benoit Lescop ,&nbsp;Olivia Amintas ,&nbsp;Carole Boullanger ,&nbsp;Stéphane Rioual","doi":"10.1016/j.microrel.2025.115784","DOIUrl":"10.1016/j.microrel.2025.115784","url":null,"abstract":"<div><div>This work analyzed the corrosion failure of a printed circuit board (PCB) exposed to atmosphere of the island of Martinique (located in the Caribbean Sea). This island suffered from the stranding of <em>sargassum</em> algae, which decompose and release toxic gases such as hydrogen sulfide (H<sub>2</sub>S). The morphology and properties of the corrosion products were determined using visual inspection, Scanning Electron Microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDS). Sulfur species were observed in corrosion products, demonstrating the impact of <em>sargassum</em> stranding on air corrosivity. RFID silver corrosion sensors were installed to study the corrosion rate in Martinique. X-ray diffraction (XRD) analysis of the sensors confirmed the impact of hydrogen sulfide on corrosion.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115784"},"PeriodicalIF":1.6,"publicationDate":"2025-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143916541","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An analytical model for calculating transient temperatures of 3-D integrated system considering heat capacity variations 考虑热容变化的三维集成系统瞬态温度分析模型
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-07 DOI: 10.1016/j.microrel.2025.115777
Xin Jin, Junqin Zhang, Luhao Zhai, Wenting Chen, Guangbao Shan, Yintang Yang
{"title":"An analytical model for calculating transient temperatures of 3-D integrated system considering heat capacity variations","authors":"Xin Jin,&nbsp;Junqin Zhang,&nbsp;Luhao Zhai,&nbsp;Wenting Chen,&nbsp;Guangbao Shan,&nbsp;Yintang Yang","doi":"10.1016/j.microrel.2025.115777","DOIUrl":"10.1016/j.microrel.2025.115777","url":null,"abstract":"<div><div>Constant pressure heat capacity is an important property that affects thermal diffusivity when calculating the transient temperature of three-dimensional (3-D) integrated systems, but current analytical models usually do not consider the effect of heat capacity. Acknowledging the temperature-dependent nature of heat capacity for materials within the AlN-substrate-based 3-D integrated system, a novel anisotropic transient thermal analytical model that takes into account the heat capacity's temperature-dependent variation is proposed. Initially, the AlN substrate, integrated with a through ceramic via (TCV) array, is modeled as a homogenized structure utilizing the equivalent thermal conductivity (ETC) model. Subsequently, an anisotropic transient thermal analytical model based on Fourier series was established, and the heat capacity values of various materials in the analytical model were updated in real time. The analytical model was compared with the finite element method (FEM), showing a relative error of about 0.73 % in the transient peak temperature predictions, which indicates a high level of agreement with the FEM results. Furthermore, the time required to extract the transient peak temperature within a 10-s simulation using our analytical model was only 0.43 s, which is 885 times faster than the FEM. This demonstrates that the proposed model excels in computational precision and velocity, offering a reliable and efficient strategy for predicting the thermal management needs of 3-D integrated systems.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115777"},"PeriodicalIF":1.6,"publicationDate":"2025-05-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143916542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
New methodology for optimal preconditioning of GaN HEMT devices GaN HEMT器件最佳预处理的新方法
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-06 DOI: 10.1016/j.microrel.2025.115776
Maroun Alam , Valeria Rustichelli , Christophe Banc , Jean-François Pieprzyk , Olivier Perrotin , Romain Ceccarelli , David Trémouilles , Mohamed Matmat , Fabio Coccetti
{"title":"New methodology for optimal preconditioning of GaN HEMT devices","authors":"Maroun Alam ,&nbsp;Valeria Rustichelli ,&nbsp;Christophe Banc ,&nbsp;Jean-François Pieprzyk ,&nbsp;Olivier Perrotin ,&nbsp;Romain Ceccarelli ,&nbsp;David Trémouilles ,&nbsp;Mohamed Matmat ,&nbsp;Fabio Coccetti","doi":"10.1016/j.microrel.2025.115776","DOIUrl":"10.1016/j.microrel.2025.115776","url":null,"abstract":"<div><div>High Electron Mobility Transistors (HEMTs) based on p-type Gallium Nitride (p-GaN) gate have emerged as promising candidates for next-generation high frequency and high-power applications. However, these devices present a threshold-voltage (V<sub>th</sub>) fluctuation impacting their performance and reliability over time. While V<sub>th</sub> fluctuations have been commonly associated with device aging, recent research has uncovered evidence suggesting that certain variations are unrelated to aging effects but rather stem from potentially recoverable trapping phenomena.</div><div>This study has demonstrated that the biases applied to the gate and drain contribute to the observed variations in V<sub>th</sub>. To mitigate these fluctuations, a systematic methodology is proposed for establishing an optimal preconditioning protocol capable of stabilizing the V<sub>th</sub> and ensuring consistent device measurements over different biasing conditions. The optimal electrical preconditioning protocol involves applying a defined voltage to the gate and or to the drain right before V<sub>th</sub> measurement, ensuring an acceptable stability of V<sub>th</sub> measurements. Furthermore, our findings illustrate that the preconditioning protocol is dependent on the technology of the reference.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115776"},"PeriodicalIF":1.6,"publicationDate":"2025-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143907800","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
DC and RF aging test of AlGaN/GaN HEMT technology on SiC substrate SiC衬底上AlGaN/GaN HEMT技术的直流和射频老化试验
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-03 DOI: 10.1016/j.microrel.2025.115772
Thomas Pallaro , Tristan Dubois , Magali De Matos , Christophe Chang , Nathalie Labat , Benoit Lambert , Nathalie Malbert
{"title":"DC and RF aging test of AlGaN/GaN HEMT technology on SiC substrate","authors":"Thomas Pallaro ,&nbsp;Tristan Dubois ,&nbsp;Magali De Matos ,&nbsp;Christophe Chang ,&nbsp;Nathalie Labat ,&nbsp;Benoit Lambert ,&nbsp;Nathalie Malbert","doi":"10.1016/j.microrel.2025.115772","DOIUrl":"10.1016/j.microrel.2025.115772","url":null,"abstract":"<div><div>This article focuses on the comprehensive evaluation of performance and robustness in microwave AlGaN/GaN HEMTs. The study investigates whether the degradation mechanisms observed during DC aging test align with those observed during RF aging test. A time-domain load-pull setup (1.8 GHz – 18 GHz) is utilized to measure key parameters during RF stresses and characterize the devices, highlighting key differences in degradation mechanisms between RF and DC aging tests. These findings shed light on the behavior of HEMTs when subjected to a RF signal, emphasizing the necessity of comprehensive analysis for ensuring device reliability in practical scenarios.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115772"},"PeriodicalIF":1.6,"publicationDate":"2025-05-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143900148","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study of trapping mechanisms affecting AlGaN/GaN HEMTs adopting AlGaN back-barriers with different aluminum concentrations 不同铝浓度的AlGaN背势垒对AlGaN/GaN hemt捕集机理的影响研究
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-03 DOI: 10.1016/j.microrel.2025.115758
Andrea Carlotto, Fabiana Rampazzo, Marco Saro, Francesco De Pieri, Manuel Fregolent, Carlo De Santi, Gaudenzio Meneghesso, Matteo Meneghini, Enrico Zanoni
{"title":"Study of trapping mechanisms affecting AlGaN/GaN HEMTs adopting AlGaN back-barriers with different aluminum concentrations","authors":"Andrea Carlotto,&nbsp;Fabiana Rampazzo,&nbsp;Marco Saro,&nbsp;Francesco De Pieri,&nbsp;Manuel Fregolent,&nbsp;Carlo De Santi,&nbsp;Gaudenzio Meneghesso,&nbsp;Matteo Meneghini,&nbsp;Enrico Zanoni","doi":"10.1016/j.microrel.2025.115758","DOIUrl":"10.1016/j.microrel.2025.115758","url":null,"abstract":"<div><div>The influence of different Aluminum concentrations in the AlGaN back-barrier on short-channel and dispersion effects of 0.45 μm-gate AlGaN/GaN HEMTs has been studied. Four samples have been tested, one as reference without back-barrier but with a Fe-doped GaN buffer, and three with an AlGaN back-barrier with respectively a 0.5 %, 1 % and 1.5 % Aluminum. Back-barrier devices have lower current collapse with respect to the reference, the latter being affected by trapping at Fe-induced defects and at deep levels induced by residual C. Devices with 1.5 % Al show subthreshold characteristics comparable with those of reference, but 50 % lower current collapse. 1 % Al back-barrier devices show very low drain-source leakage in pinch-off conditions and as a consequence the lowest dispersion effects.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115758"},"PeriodicalIF":1.6,"publicationDate":"2025-05-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143900147","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Spacecraft sensor data reliability improvement based on spatio-temporal information fusion model 基于时空信息融合模型的航天器传感器数据可靠性改进
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-02 DOI: 10.1016/j.microrel.2025.115774
Yingqi Wang , Yuchen Song , Runze Yu , Shengwei Meng , Yu Peng , Datong Liu
{"title":"Spacecraft sensor data reliability improvement based on spatio-temporal information fusion model","authors":"Yingqi Wang ,&nbsp;Yuchen Song ,&nbsp;Runze Yu ,&nbsp;Shengwei Meng ,&nbsp;Yu Peng ,&nbsp;Datong Liu","doi":"10.1016/j.microrel.2025.115774","DOIUrl":"10.1016/j.microrel.2025.115774","url":null,"abstract":"<div><div>Spacecraft sensor data is crucial for evaluating the operating status and environment of spacecraft. However, due to factors such as component aging, space environment interference, and unstable satellite-to-ground communication, obtaining high-reliability sensor data is challenging. Additionally, the high dimensionality, complex correlations, strong temporal dependencies, and noise in sensor data further complicate efforts to improve data reliability. To address these challenges, this paper proposes a sensor reliability improvement method based on a multi-layer spatio-temporal information fusion model (STIFM). First, a moving average filter is applied to the raw data to reduce the impact of noise on modeling. Next, the Transformer model is used to establish data estimation models for different sensors in spatial scale and the same sensor in temporal scale. The outputs from these spatiotemporal models are then fused using particle filtering, and the uncertainty of the results is quantitatively assessed. Based on this, data anomaly detection and recovery are performed using the confidence interval of the STIFM output. Finally, the proposed method is validated using satellite flywheel on-orbit data. Experimental results show that the proposed method achieves at least 93.55 % accuracy in abnormal scenarios and significantly extends the mean time to failures (MTTF), outperforming existing methods. This indicates that the method proposed in this paper can effectively enhance the reliability of spacecraft sensor data.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115774"},"PeriodicalIF":1.6,"publicationDate":"2025-05-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143895366","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design-of-Experiments and ALT plan for reliability qualification of chip resistors based on mission profile of AIMDs 基于空空导弹任务剖面的片式电阻器可靠性鉴定实验设计与ALT方案
IF 1.6 4区 工程技术
Microelectronics Reliability Pub Date : 2025-05-02 DOI: 10.1016/j.microrel.2025.115773
F.-E. Indmeskine , L. Saintis , A. Kobi , H. Marceau
{"title":"Design-of-Experiments and ALT plan for reliability qualification of chip resistors based on mission profile of AIMDs","authors":"F.-E. Indmeskine ,&nbsp;L. Saintis ,&nbsp;A. Kobi ,&nbsp;H. Marceau","doi":"10.1016/j.microrel.2025.115773","DOIUrl":"10.1016/j.microrel.2025.115773","url":null,"abstract":"<div><div>Chip resistors are integral components of electronic devices, including Active Implantable Medical Devices. This work, as part of RECOME project, is focusing on developing a methodology for defining accelerated life test plans to qualify chip resistors as per the mission profile of AIMDs. This will be done by combining design of experiments and accelerated life tests associated with failure mechanisms. Defining test protocols, such as thermal cycling, will be a critical component of this work.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"170 ","pages":"Article 115773"},"PeriodicalIF":1.6,"publicationDate":"2025-05-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143895365","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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