A. Halouani, Z. Khatir, R. Lallemand, A. Ibrahim, D. Ingrosso
{"title":"低∆Tj荷载序列相互作用对igbt粘结铝线可靠性的影响","authors":"A. Halouani, Z. Khatir, R. Lallemand, A. Ibrahim, D. Ingrosso","doi":"10.1016/j.microrel.2025.115793","DOIUrl":null,"url":null,"abstract":"<div><div>This paper focuses on the effects of load sequence on the reliability of insulated gate bipolar transistors (IGBTs). Precisely, the effect of junction temperature swing (<span><math><mo>∆</mo><msub><mi>T</mi><mi>j</mi></msub></math></span>) is investigated in low ranges. A series of power cycling tests have been done; first, two tests with a single <span><math><mo>∆</mo><msub><mi>T</mi><mi>j</mi></msub><mspace></mspace></math></span> conditions are performed in order to serve as test reference. Then, combined power cycling tests with two-level of <span><math><mo>∆</mo><msub><mi>T</mi><mi>j</mi></msub></math></span> are conducted sequentially. The crack propagation for both combined tests specimens is analysed. Results show that a sequencing in <span><math><mo>∆</mo><msub><mi>T</mi><mi>j</mi></msub><mspace></mspace></math></span> of the high-low stress level leads to crack retardation and then a crack acceleration after a number of cycles. In addition, the crack propagation of the low-high stress level follows the same evolution of the high stress crack propagation. These results were correlated to the microstructure parameters using Electron Backscatter Diffraction (EBSD) technique with a focus on the effect of residual stress. Local misorientation, grain size and grain boundaries evolution at the sites of crack propagation confirmed the phenomenon observed for the crack propagation for both combined tests.</div></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"171 ","pages":"Article 115793"},"PeriodicalIF":1.9000,"publicationDate":"2025-05-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of load sequence interaction for low ∆Tj's on the reliability of bonded aluminum wires in IGBTs\",\"authors\":\"A. Halouani, Z. Khatir, R. Lallemand, A. Ibrahim, D. Ingrosso\",\"doi\":\"10.1016/j.microrel.2025.115793\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This paper focuses on the effects of load sequence on the reliability of insulated gate bipolar transistors (IGBTs). Precisely, the effect of junction temperature swing (<span><math><mo>∆</mo><msub><mi>T</mi><mi>j</mi></msub></math></span>) is investigated in low ranges. A series of power cycling tests have been done; first, two tests with a single <span><math><mo>∆</mo><msub><mi>T</mi><mi>j</mi></msub><mspace></mspace></math></span> conditions are performed in order to serve as test reference. Then, combined power cycling tests with two-level of <span><math><mo>∆</mo><msub><mi>T</mi><mi>j</mi></msub></math></span> are conducted sequentially. The crack propagation for both combined tests specimens is analysed. Results show that a sequencing in <span><math><mo>∆</mo><msub><mi>T</mi><mi>j</mi></msub><mspace></mspace></math></span> of the high-low stress level leads to crack retardation and then a crack acceleration after a number of cycles. In addition, the crack propagation of the low-high stress level follows the same evolution of the high stress crack propagation. These results were correlated to the microstructure parameters using Electron Backscatter Diffraction (EBSD) technique with a focus on the effect of residual stress. Local misorientation, grain size and grain boundaries evolution at the sites of crack propagation confirmed the phenomenon observed for the crack propagation for both combined tests.</div></div>\",\"PeriodicalId\":51131,\"journal\":{\"name\":\"Microelectronics Reliability\",\"volume\":\"171 \",\"pages\":\"Article 115793\"},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2025-05-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Microelectronics Reliability\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0026271425002069\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microelectronics Reliability","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0026271425002069","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Effect of load sequence interaction for low ∆Tj's on the reliability of bonded aluminum wires in IGBTs
This paper focuses on the effects of load sequence on the reliability of insulated gate bipolar transistors (IGBTs). Precisely, the effect of junction temperature swing () is investigated in low ranges. A series of power cycling tests have been done; first, two tests with a single conditions are performed in order to serve as test reference. Then, combined power cycling tests with two-level of are conducted sequentially. The crack propagation for both combined tests specimens is analysed. Results show that a sequencing in of the high-low stress level leads to crack retardation and then a crack acceleration after a number of cycles. In addition, the crack propagation of the low-high stress level follows the same evolution of the high stress crack propagation. These results were correlated to the microstructure parameters using Electron Backscatter Diffraction (EBSD) technique with a focus on the effect of residual stress. Local misorientation, grain size and grain boundaries evolution at the sites of crack propagation confirmed the phenomenon observed for the crack propagation for both combined tests.
期刊介绍:
Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged.
Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.