低∆Tj荷载序列相互作用对igbt粘结铝线可靠性的影响

IF 1.9 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
A. Halouani, Z. Khatir, R. Lallemand, A. Ibrahim, D. Ingrosso
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引用次数: 0

摘要

本文主要研究负载顺序对绝缘栅双极晶体管(igbt)可靠性的影响。准确地说,结温摆动(∆Tj)在低范围内的影响进行了研究。进行了一系列的功率循环试验;首先,以单个∆Tj条件进行两次试验,作为试验参考。然后依次进行两级∆Tj的联合功率循环试验。分析了两种组合试样的裂纹扩展规律。结果表明:高-低应力水平的∆Tj顺序导致裂纹延迟,多次循环后裂纹加速;低-高应力水平裂纹扩展遵循与高应力水平裂纹扩展相同的演化规律。利用电子后向散射衍射(EBSD)技术将这些结果与微观结构参数进行了关联,重点研究了残余应力的影响。裂纹扩展部位的局部取向错误、晶粒尺寸和晶界演变证实了两种联合试验中观察到的裂纹扩展现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of load sequence interaction for low ∆Tj's on the reliability of bonded aluminum wires in IGBTs
This paper focuses on the effects of load sequence on the reliability of insulated gate bipolar transistors (IGBTs). Precisely, the effect of junction temperature swing (Tj) is investigated in low ranges. A series of power cycling tests have been done; first, two tests with a single Tj conditions are performed in order to serve as test reference. Then, combined power cycling tests with two-level of Tj are conducted sequentially. The crack propagation for both combined tests specimens is analysed. Results show that a sequencing in Tj of the high-low stress level leads to crack retardation and then a crack acceleration after a number of cycles. In addition, the crack propagation of the low-high stress level follows the same evolution of the high stress crack propagation. These results were correlated to the microstructure parameters using Electron Backscatter Diffraction (EBSD) technique with a focus on the effect of residual stress. Local misorientation, grain size and grain boundaries evolution at the sites of crack propagation confirmed the phenomenon observed for the crack propagation for both combined tests.
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来源期刊
Microelectronics Reliability
Microelectronics Reliability 工程技术-工程:电子与电气
CiteScore
3.30
自引率
12.50%
发文量
342
审稿时长
68 days
期刊介绍: Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged. Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.
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