2016 International Conference on Electronics Packaging (ICEP)最新文献

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Thermal compression bonding for power IC attachment using pure Zn 纯锌用于功率IC附件的热压缩键合
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486858
Chih-Hao Fan, Ting-Jui Wu, Jenn-Ming Song
{"title":"Thermal compression bonding for power IC attachment using pure Zn","authors":"Chih-Hao Fan, Ting-Jui Wu, Jenn-Ming Song","doi":"10.1109/ICEP.2016.7486858","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486858","url":null,"abstract":"This study developed a low temperature solid-state direct bonding process for dissimilar metals. Experimental results show that Cu/Zn can be bonded successfully at 200°C under the loading of 10MPa for 30 minutes. The joints thus formed exhibited a shear strength up to 20MPa. If the thermal compression was performed at 300°C, the shear strength of bonded Cu/Zn and Cu/Ni/Zn joints exceeded 50MPa, especially for Cu/Zn joint, the strength even reached 70MPa. With respect to high temperature mechanical properties, due to the softening of Zn, the shear strength of all the joints decreased with a higher testing temperature. During aging at 250°C, the shear strength of Cu/Zn degraded drastically up to 500hr and after that the joint strength remained almost constant. The strength of Cu/Ni/Zn joints decreased gradually and maintained 30MPa for 500hr. The shear strength of both of the joints tended to be identical subjected to aging for 800hr. The deterioration of the joint strength during aging can be ascribed to the competitive growth between CuZn5 and Cu5Zn8 resulting in collapse and oxidation of CuZn5. The electroplated Ni and Ni5Zn21 thus formed can retard the excessive growth of Cu5Zn8 to some extent.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131002786","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Non-destructive testing method for chip warpage -Applications of synchrotron radiation X-ray 芯片翘曲的无损检测方法。同步辐射x射线的应用
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486772
H. Hsu, Chang-meng Wang, Hsin-yi Lee, A. Wu
{"title":"Non-destructive testing method for chip warpage -Applications of synchrotron radiation X-ray","authors":"H. Hsu, Chang-meng Wang, Hsin-yi Lee, A. Wu","doi":"10.1109/ICEP.2016.7486772","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486772","url":null,"abstract":"Warpage has become a very critical reliability problem for the advanced electronic packaging technique. One or more chips are stacked on the substrates for a device. The device thus contains materials that have different physical properties. The most prominent problem would be the differences in the thermal expansion coefficient for these materials. During fabrication, thermal energy was applied to the chips; the expansion of these materials would induce thermal stress and warpage on the chips that would be harmful to the long-term reliability. When a current is applied to the device, the Joule heating may further enhance the warpage of the chips. Si-on-Si interposer samples are introduced to minimize the issue. It is important to develop a quick and non-destructive method to in-situ analyze the warpage level at different conditions. Synchrotron radiation X-ray is used for measuring the strain and the warpage of the Si dies.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"52 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132383125","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The advantage of Slow Cure NCP in filp chip package 慢固化NCP在芯片封装中的优势
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486904
Yoshihide Fukuhara, M. Hoshiyama, Toshikazu Hocchi, Y. Kamata, Hirotatsu Ikarashi, Ruka Iwaya
{"title":"The advantage of Slow Cure NCP in filp chip package","authors":"Yoshihide Fukuhara, M. Hoshiyama, Toshikazu Hocchi, Y. Kamata, Hirotatsu Ikarashi, Ruka Iwaya","doi":"10.1109/ICEP.2016.7486904","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486904","url":null,"abstract":"Smaller flip chip packages have been developing and narrow gap and small pitch are required. The capillary type underfill still mainly applies for the flip chip mass-production process. The Non-Conductive Past (NCP), which is applied before chip attachment, has been introduced for fine pitch applications. These pre-applied type underfill have some advantages, such as no free space for dispensing and no flux cleaning process. However, the NCP has issue for connectivity and void control. We develop the new NCP, which is named Slow Cure NCP (SCNCP), to improve the connectivity and void control. SCNCP has slow cure ability to be void free after a pressure oven cure. It leads to an easier void controlling. In addition, slow cure property makes solder wettability higher and achieves better joint shape.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128417462","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Using FEA to determine test speed for high speed shear test on BGA based on field conditions 基于现场条件,采用有限元法确定了BGA高速剪切试验的试验速度
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486844
C. Selvanayagam
{"title":"Using FEA to determine test speed for high speed shear test on BGA based on field conditions","authors":"C. Selvanayagam","doi":"10.1109/ICEP.2016.7486844","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486844","url":null,"abstract":"Miniaturization and increased functionality has been the trend in the mobile electronic device industry. Inevitably, the drive for increased density of miniaturized components has led to the miniaturization of the BGA joints. Smaller joints, in general, have shorter lives as the crack propagation path is shorter. The high speed shear test is gaining popularity as a component-level test to ensure good outgoing solder joints. One advantage of this test over the static shear test is that higher test speeds induce brittle failure in the intermetallic layer (IMC) of the joint, similar to that in drop impact. As a result, this test can detect variations in substrate finishing quality and joint reflow conditions that could lead to premature drop impact failures. However, selection of test speed is critical. The general consensus is to test at the speed where IMC failures are induced. With recent advances in pad finishing and solder alloys resulting in thinner and more uniform IMC layers, testing at a speed where IMC failures occur could result in over-testing the device, well beyond the strain rates experienced in the field. This, in turn, would lead to the over-design of solder joints. Clearly, a method to determine equivalent shear test speed is required, where strain rates during shear test are matched to that in field conditions. This work presents a methodology to determine the equivalent shear test speed for high speed shear test based on shock and vibration requirements. FEA is used to match the maximum strain rates during the most severe impact or vibration application of the device to that during high speed shear test. Usage of the methodology is demonstrated on a board with a BGA component under three different drop conditions. Results show that for the three drop conditions, the equivalent shear speed is lower than 200mm/s. Given that the maximum capability of the tester is 4m/s, shear speed for high speed shear test needs to be selected carefully.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122807681","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Stress evaluation of flip chip bonding die by thermal compression bonding using Raman spectroscopy 热压缩键合倒装片键合模的拉曼光谱应力评估
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486870
Mototaka Ito, T. Uchida, R. Sugie
{"title":"Stress evaluation of flip chip bonding die by thermal compression bonding using Raman spectroscopy","authors":"Mototaka Ito, T. Uchida, R. Sugie","doi":"10.1109/ICEP.2016.7486870","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486870","url":null,"abstract":"We evaluated the residual stress of the Si die which bonding to organic substrate by the flip chip technology, using Raman spectroscopy. Non-conductive paste (NCP) and non-conductive film (NCF) are used for the high-density flip chip joint as pre applied underfill. Then, it was understand that a physical characteristic of NCF influenced the residual stress of the Si die. In the NCF part of the die corner part, correlation was accepted by the coefficient of thermal expansion (CTE) and residual stress of NCF. On the other hand, in the NCF + solder resist (SR) part, NCF relieved stress by the shrinkage of the SR. It was explained that resin of NCF is a low coefficient of elasticity. In addition, it was shown that residual stress was low in the circumference of Cu pillar by the pinning effect.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"197 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129328579","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Novel copper surface preparation processes for copper alloy lead frame lamination pretreatment in embedded packaging device 嵌入式封装装置中铜合金引线框架层压预处理的新型铜表面制备工艺
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486883
Wei-chung Chen, C. Lee, Lu-Fu Lin, Yen-Fu Liu, H. Cheng, T.-J Hsu, Kun-Ting Tsai, Ming-Hung Chen, Tang-Yuan Chen, P. Yang, S. Uegaki, C. Hung
{"title":"Novel copper surface preparation processes for copper alloy lead frame lamination pretreatment in embedded packaging device","authors":"Wei-chung Chen, C. Lee, Lu-Fu Lin, Yen-Fu Liu, H. Cheng, T.-J Hsu, Kun-Ting Tsai, Ming-Hung Chen, Tang-Yuan Chen, P. Yang, S. Uegaki, C. Hung","doi":"10.1109/ICEP.2016.7486883","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486883","url":null,"abstract":"In this paper, the interface adhesion and reliability between copper lead frame(C-19210) and resin prepreg material of different copper lead frame lamination pretreatment processes (CZ and brown oxide) was studied. Surface morphology, roughness, peel strength and moisture sensitivity level, MSL3, reliability tests were performed in order to investigate the performance between these pretreatment procedures. CZ (HCl/formic acid system) process for copper etching is commonly used for lamination pretreatment, but it is not suitable to create uniformity coarse surface on copper alloy material. Compare to CZ, brown oxide gives better uniformity morphology, higher Ra/s-ratio and stronger peel strength. Reliability test including precondition + MSL3 (failure rate: BO CZ=14:100) and solder dipping (260, 270, 288 °C × 10 times) were performed to evaluate the bond strength.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"50 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115977004","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Warpage characterization analysis for Embedded package technology 嵌入式封装技术翘曲特性分析
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486881
Tang-Yuan Chen, M. Shih, Ming-Hung Chen, Wei-chung Chen, S. Uegaki, C. Kao, Ping-Feng Yang, C. Hung
{"title":"Warpage characterization analysis for Embedded package technology","authors":"Tang-Yuan Chen, M. Shih, Ming-Hung Chen, Wei-chung Chen, S. Uegaki, C. Kao, Ping-Feng Yang, C. Hung","doi":"10.1109/ICEP.2016.7486881","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486881","url":null,"abstract":"The Embedded die in substrate (EDS) market has grown significantly over the past several years and it is now one of the fastest growing packaging technologies in the semiconductor industry driven by smaller form factor, better heat dissipating, low noise emission, higher levels of integration and better performance. In addition, for power management and mobile-wireless application the embedded technology had been evaluated to replace assembles fabrication not only thinner thickness but superior electrical performance. However, Embedded Die causes severe package warpage issue due to CTE mismatch happened on diffusion bond process. In this work, the three Dimensional Warpage Metrology Analyzer (3D-WMA), as a non-contact optical deformation measurement method used to measure unit package warpage behavior with different temperatures. Reducing the warpage issue of package, the parametric factors on the structure and material would be investigated. These design guides are then studied by finite element modeling to understand mechanism for warpage improvement and the dielectric material property selection is critically factoring for warpage control. The measured warpage data agrees very well with the predicted one that the maximum discrepancy is within 3%. Based on the above justification, it starts to carry out the parametric study. Initially, changed prepreg can improve the warpage 64%. Besides, Cu layer should be thick and soldermask layer should be thin. Furthermore, asymmetric structure design of Cu layer and soldermask layer is another effective for warpage reduction. Impact from structural design and material property selection is studied in this paper.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"55 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114309587","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Three-dimensional integration technology of separate SOI layers for photodetectors and signal processors of CMOS image sensors 光电探测器和CMOS图像传感器信号处理器分离SOI层的三维集成技术
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486785
M. Goto, K. Hagiwara, Y. Honda, M. Nanba, Y. Iguchi, T. Saraya, M. Kobayashi, E. Higurashi, H. Toshiyoshi, T. Hiramoto
{"title":"Three-dimensional integration technology of separate SOI layers for photodetectors and signal processors of CMOS image sensors","authors":"M. Goto, K. Hagiwara, Y. Honda, M. Nanba, Y. Iguchi, T. Saraya, M. Kobayashi, E. Higurashi, H. Toshiyoshi, T. Hiramoto","doi":"10.1109/ICEP.2016.7486785","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486785","url":null,"abstract":"We report on three-dimensional (3-D) integration technology of separate silicon-on-insulator (SOI) layers for photodetectors and signal processors of CMOS image sensors. Photodiode, A/D convertor, and counter were integrated in two SOI layers that were vertically connected by embedded Au electrodes, thereby enabling pixel-parallel operation of image sensor. Photodiode has a P+/N/P-structure to suppress the dark current. We developed the image sensor and confirmed its performance of a wide dynamic range of 96 dB and high resolution of 16 bit. The sensor is promising to next-generation ultimate imaging devices.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115619411","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A built-in electrical test circuit for detecting open leads in assembled PCB circuits 一种内置的电气测试电路,用于检测组装的PCB电路中的开路引线
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486867
Takumi Miyabe, M. Hashizume, H. Yotsuyanagi, Shyue-Kung Lu, Z. Roth
{"title":"A built-in electrical test circuit for detecting open leads in assembled PCB circuits","authors":"Takumi Miyabe, M. Hashizume, H. Yotsuyanagi, Shyue-Kung Lu, Z. Roth","doi":"10.1109/ICEP.2016.7486867","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486867","url":null,"abstract":"In this paper, a built-in electrical test circuit is proposed to detect an open defect at an interconnect between a land on a printed circuit board and an IC. The test circuit is made of an integrating circuit, nMOS switches and a switch control circuit. A time-varying signal generated by the integrating circuit is provided to a targeted interconnect as a stimulus signal in the tests. An input buffer gate in an IC is utilized as an open sensor in the tests. The open defect is detected by means of supply current of the sensor. We examine by Spice simulation whether open defects can be detected by using the test circuit. The results reveal us that an open defect can be detected at a test speed of 50 kHz for each input terminal of an IC.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116208606","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Characterization of elastic-plastic properties of intermetallic compounds 金属间化合物弹塑性性能的表征
2016 International Conference on Electronics Packaging (ICEP) Pub Date : 2016-04-20 DOI: 10.1109/ICEP.2016.7486829
Ruei-You Hong, Hsien-Chie Cheng, Hsuan-Chi Hu, Wen-Hwa Chen
{"title":"Characterization of elastic-plastic properties of intermetallic compounds","authors":"Ruei-You Hong, Hsien-Chie Cheng, Hsuan-Chi Hu, Wen-Hwa Chen","doi":"10.1109/ICEP.2016.7486829","DOIUrl":"https://doi.org/10.1109/ICEP.2016.7486829","url":null,"abstract":"A modified analysis methodology based on Dao et al.'s approach, which integrates large deformation finite element (FE) simulation of sharp nanoindentation and dimensional analysis is proposed for determining the plastic properties of two commonly observed IMCs (Cu6Sn5 and Cu3Sn) in a solder interconnect from experimental nanoindentation responses. By the modified analysis methodology incorporating with the parametric FE analysis results of nanoindentation, universal dimensionless functions are established, by which a forward and reverse analysis algorithm is constructed for predicting nanoindentation responses directly from known elastic-plastic properties, and vice versa, respectively. The effectiveness of the modified analysis methodology is verified by the experimental nanoindentation responses and limited literature data.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"111 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114447837","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
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