{"title":"Functional verification of networked embedded systems","authors":"N. Bombieri, F. Fummi, G. Pravadelli","doi":"10.1109/ISQED.2005.59","DOIUrl":"https://doi.org/10.1109/ISQED.2005.59","url":null,"abstract":"We propose an automatic mechanism to extract the environment of a networked embedded system (NEV), and a functional verification methodology, which mixes automatic test pattern generation and model checking, exploiting the network environment constraints.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"141 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123746435","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"P/G pad placement optimization: problem formulation for best IR drop","authors":"A. Dubey","doi":"10.1109/ISQED.2005.89","DOIUrl":"https://doi.org/10.1109/ISQED.2005.89","url":null,"abstract":"IR drop minimization has become very difficult for non-flip chip packaged designs due to technology shrink and increasing design frequencies. Different constituents of IR drop on a wire-bond chip (where pads are placed at the die-periphery) are \"package-ball to bond-pad drop\", \"bond-pad to internal global power ring drop\" and \"internal local power ring drop\". Optimization equations are developed to minimize IR drop from the lead-finger-frame to the standard cell power rails on the die by placing the P/G pads optimally for a given power network. Further, optimization equations are developed to minimize trace wire length on package for P/G pads drawing highest current. The cost functions in the optimization equations target minimum IR drop for those regions of the chip that are switching at maximum speed. By use of our cost function for optimizing P/G pad placement, results on the representative chip with about 15 million gates and several hard macros show an improvement of 10% to 15% in worst IR drop value for different floorplans (one floorplan with uniform power density, and the other floorplan with maximum power density much higher than the average power density of the design).","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131005086","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Xiaojun Li, Bing Huang, J. Qin, X. Zhang, M. Talmor, Z. Gur, J. Bernstein
{"title":"Deep submicron CMOS integrated circuit reliability simulation with SPICE","authors":"Xiaojun Li, Bing Huang, J. Qin, X. Zhang, M. Talmor, Z. Gur, J. Bernstein","doi":"10.1109/ISQED.2005.37","DOIUrl":"https://doi.org/10.1109/ISQED.2005.37","url":null,"abstract":"The purpose of the paper is to introduce a new failure rate-based methodology for reliability simulation of deep submicron CMOS integrated circuits. Firstly, two of the state-of-the-art MOSFET degradation models are reviewed. They have been developed into reliability simulation tools and commercialized in industry for many years, however, their inherent limitations of characterizing circuit lifetime, including tedious processes for extracting device degradation parameters and model fitting parameters, impeded their wide applications in the product's front-end design process. Secondly, a set of accelerated lifetime models for the most important intrinsic silicon degradation mechanisms are proposed. These lifetime models correlate a device's electrical operating parameters to its mean time to failure (MTTF) in simple forms. Finally, a new failure rate-based SPICE reliability simulation methodology is developed, in which MTTF and failure in time (FIT) are the primary reliability parameters to be characterized. The power of this new reliability simulation method, due to its simplicity, makes it an important design-for-reliability tool for electronic product developers.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125907814","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Gyure, Alireza Kasnavi, S. Lo, P. Tehrani, William Shu, M. Shahram, Joddy W. Wang, Jindrich Zejda
{"title":"Noise library characterization for large capacity static noise analysis tools","authors":"A. Gyure, Alireza Kasnavi, S. Lo, P. Tehrani, William Shu, M. Shahram, Joddy W. Wang, Jindrich Zejda","doi":"10.1109/ISQED.2005.85","DOIUrl":"https://doi.org/10.1109/ISQED.2005.85","url":null,"abstract":"Noise glitches can cause timing degradation in switching nodes or incorrect transitions in steady-state or \"quiet\" nodes. These incorrect transitions can propagate through the circuit, and can create functional errors or failures. This paper presents both a method and a practical implementation technique for accurately and efficiently characterizing and modeling the propagation of noise glitches through a cell within an integrated circuit. A characterization methodology is developed to generate noise immunity criteria (NIC) and noise propagation tables (NPT) for a given cell library. The resulting look-up tables are appended to any standard gate-level library to be utilized by static timing and noise analysis (STNA) tools.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"274 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123421639","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Design of high performance sense amplifier using independent gate control in sub-50nm double-gate MOSFET","authors":"S. Mukhopadhyay, H. Mahmoodi, K. Roy","doi":"10.1109/ISQED.2005.44","DOIUrl":"https://doi.org/10.1109/ISQED.2005.44","url":null,"abstract":"The double-gate (DG) transistor has emerged as the most promising device for nanoscale circuit design. Independent control of front and back gate in DG devices can be effectively used to improve performance and reduce power in sub-50 nm circuits. In this paper, we propose a high-performance sense-amplifier design using independent gate control in symmetric and asymmetric DG devices. The proposed design reduces the sensing delay of the sense amplifier by 30-35% and dynamic power by 10% (at 6 GHz) from the connected gate design.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124629374","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"TFT-LCD application specific low power SRAM using charge-recycling technique","authors":"Keejong Kim, C. Kim, K. Roy","doi":"10.1109/ISQED.2005.121","DOIUrl":"https://doi.org/10.1109/ISQED.2005.121","url":null,"abstract":"We propose a novel low power charge-recycling SRAM (CR-SRAM) for portable TFT-LCD applications. In portable TFT-LCD applications, low power considerations are becoming more important for longer battery lifetime. To reduce the power consumption in SRAMs, the source-line, connected to the source terminals of the driver MOSFETs, is controlled, so that it is zero in the active mode and has a positive bias voltage in the stand-by mode. However, the overhead power consumed during the control of source-line voltage is considerable due to the large capacitive load on the source-line. Applying a charge-recycling technique to the source-line allows reduction of the power dissipation of the source-biased SRAM. Moreover, by exploiting the sequential access pattern of the TFT-LCD memory, the proposed CR-SRAM can efficiently reduce the power dissipation of the control circuit for charge recycling. The proposed CR-SRAM is implemented in a 0.18 /spl mu/m technology and shows 68% and 14% power reduction compared to conventional SRAM (CON-SRAM) and source-biased SRAM (SB-SRAM), respectively. We also evaluate the power consumptions under various temperatures and row driver clock frequencies. Experimental results show that the percentage of power savings due to charge recycling increases with the higher frequency and achieved a maximum of 25% at 250 MHz.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121511901","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Issues and challenges in ramp to production","authors":"Arun Shrimali, Anand Venkitachalam, Ravi Arora","doi":"10.1109/ISQED.2005.72","DOIUrl":"https://doi.org/10.1109/ISQED.2005.72","url":null,"abstract":"As the world is moving toward the deep submicron (DSM) era, understanding silicon behavior is becoming more and more challenging. Models are getting complex and yet not able to reflect the actual silicon behavior. Hence some of the silicon issues cannot be replicated in circuit simulations. The problems found on silicon require the understanding of various tools and techniques available to observe and modify the die. A good understanding of these techniques and debug methodology is required to meet time to market goals. The devices used for mobile applications have stringent power requirements. The devices thus have power conservation modes during which the current drawn is extremely low of the order of tens of microamperes. This paper discusses the challenges and techniques used to identify the issues found in shutdown mode (a power conservation mode), which had to be addressed in order to ramp the device to production.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"14 1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116920927","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Analysis and design of LVTSCR-based EOS/ESD protection circuits for burn-in environment","authors":"O. Semenov, H. Sarbishaei, M. Sachdev","doi":"10.1109/ISQED.2005.17","DOIUrl":"https://doi.org/10.1109/ISQED.2005.17","url":null,"abstract":"As technology feature size is reduced, ESD becomes one of the dominant failure modes due to the lower gate oxide breakdown voltage. Also, the holding voltage of LVTSCR devices is reduced with operating temperature increase. As a result, during stress testing (burn-in), the risk of latch-up in LVTSCR is extremely high. In this paper, a new latch-up free LVTSCR-based protection circuit is proposed. It can be reliably used in sub-0.18 /spl mu/m CMOS technologies and burn-in environment. The proposed ESD circuit has higher holding voltage by 1.5/spl times/ than the conventional LVTSCR structure at burn-in temperature. Under 3 kV HBM ESD stress, the developed LVTSCR-based protection circuit has the voltage peak less than the conventional LVTSCR structure and GG-MOSFET by 2/spl times/ and 1.25/spl times/, respectively.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"293 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132182234","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Devgan, R. Puri, Sachin Sapatnaker, T. Karnik, R. Joshi
{"title":"Design of sub-90 nm circuits and design methodologies","authors":"A. Devgan, R. Puri, Sachin Sapatnaker, T. Karnik, R. Joshi","doi":"10.1109/ISQED.2005.45","DOIUrl":"https://doi.org/10.1109/ISQED.2005.45","url":null,"abstract":"Summary form only given. The tutorial discusses the design challenges of scaled CMOS circuits in sub-90 nm technologies and the design methodologies required in order to produce robust designs with the desired power-performance trade-off. We focus on four major components: design challenges of sub-90 nm CMOS circuits with particular emphasis on the implications of each individual device scaling element on circuit design; design methodologies for implementing robust circuits with desired power performance characteristics; managing leakage power; circuit design in the presence of uncertainty.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"196 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133116102","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Dynamic test compaction for bridging faults","authors":"I. Pomeranz, S. Reddy","doi":"10.1109/ISQED.2005.48","DOIUrl":"https://doi.org/10.1109/ISQED.2005.48","url":null,"abstract":"We describe a dynamic test compaction procedure for four-way bridging faults. Under this fault model, a pair of lines g/sub i/, g/sub j/ is associated with four bridging faults corresponding to two possible combinations of opposite values on g/sub i/ and g/sub j/, and two options for the line whose value is faulty in the presence of the fault (either g/sub i/ or g/sub j/). Compaction is achieved by simultaneously considering faults that have a line g/sub i/ with a value /spl alpha//sub i/ in common, such that the value /spl alpha//sub i/ on g/sub i/ is affected by the presence of the fault. Faults with a common line g/sub i/ and value /spl alpha//sub i/ differ only in the second line g/sub j/ of each pair of bridged lines, and the second lines only need to be assigned the value /spl alpha/~/sub i/ in order to detect all the faults. This strong relationship between the faults allows us to derive tests that detect large numbers of these faults, resulting in compact test sets.","PeriodicalId":333840,"journal":{"name":"Sixth international symposium on quality electronic design (isqed'05)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2005-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122956186","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}