2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303)最新文献_第3页

MEMS technology: optical application, medical application and SOC application MEMS技术:光学应用、医疗应用和SOC应用

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015366

M. Esashi

引用次数: 5

Sub-1 /spl mu/m/sup 2/ high density embedded SRAM technologies for 100 nm generation SOC and beyond Sub-1 /spl mu/m/sup /高密度嵌入式SRAM技术，适用于100nm代SOC及以后

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015369

K. Tomita, K. Hashimoto, T. Inbe, T. Oashi, K. Tsukamoto, Y. Nishioka, M. Matsuura, T. Eimori, M. Inuishi, I. Miyanaga, M. Nakamura, T. Kishimoto, T. Yamada, K. Eriguchi, H. Yuasa, T. Satake, A. Kajiya, M. Ogura

引用次数: 5

60 nm gate length dual-Vt CMOS for high performance applications 60纳米栅长双vt CMOS高性能应用

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015419

M. Mehrotra, J. Wu, A. Jain, T. Laaksonen, K. Kim, W. Bather, R. Koshy, J. Chen, J. Jacobs, V. Ukraintsev, L. Olsen, J. Deloach, J. Mehigan, R. Agarwal, S. Walsh, D. Sekel, L. Tsung, M. Vaidyanathan, B. Trentman, K. Liu, S. Aur, R. Khamankar, P. Nicollian, Q. Jiang, Y. Xu, B. Campbell, P. Tiner, R. Wise, D. Scott, M. Rodder

引用次数: 8

New guideline for hydrogen treatment in advanced system LSI 先进系统大规模集成电路氢处理新指南

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015459

E. Morifuji, T. Kumamori, M. Muta, K. Suzuki, M. S. Krishnan, T. Brożek, X. Li, W. Asano, M. Nishigori, N. Yanagiya, S. Yamada, K. Miyamoto, T. Noguchi, M. Kakumu

引用次数: 7

The effects of substrate coupling on triggering uniformity and ESD failure threshold of fully silicided NMOS transistors 衬底耦合对全硅化NMOS晶体管触发均匀性和ESD失效阈值的影响

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015461

Y. Huh, V. Axerad, J.W. Chen, P. Bendix

引用次数: 8

Hot-carrier charge trapping and reliability in high-k dielectrics 高k介电介质中的热载流子电荷捕获和可靠性

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015430

A. Kumar, T. Ning, M. Fischetti, E. Gusev

引用次数: 16

Metal gate MOSFETs with HfO/sub 2/ gate dielectric 具有HfO/sub /栅极电介质的金属栅mosfet

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015373

S. Samavedam, H. Tseng, P. Tobin, J. Mogab, S. Dakshina-Murthy, L. La, J. Smith, J. Schaeffer, M. Zavala, R. Martin, B. Nguyen, L. Hebert, O. Adetutu, V. Dhandapani, T. Luo, R. García, P. Abramowitz, M. Moosa, D. Gilmer, C. Hobbs, W. Taylor, J. Grant, R. Hegde, S. Bagchi, E. Luckowski, V. Arunachalam, M. Azrak

引用次数: 10

Improved performance of ultra-thin HfO/sub 2/ CMOSFETs using poly-SiGe gate 采用多晶硅栅极提高超薄HfO/sub / cmosfet的性能

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015400

Q. Lu, H. Takeuchi, Xiaofan Meng, T. King, C. Hu, K. Onishi, Hag-ju Cho, J. Lee

引用次数: 8

Highly manufacturable sub-100 nm DRAM integrated with full functionality 高度可制造的亚100纳米DRAM集成了完整的功能

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015385

S. Choi, B. Nam, J. Ku, D. Kim, S. Lee, J.J. Lee, J. Lee, J. Ryu, S. Heo, J.K. Cho, S. Yoon, C.J. Choi, Y.J. Lee, J. Chung, B.H. Kim, M.B. Lee, G. Choi, Y.S. Kim, K. Fujihara, U. Chung, J. Moon

引用次数: 3

A 100 nm copper/low-k bulk CMOS technology with multi Vt and multi gate oxide integrated transistors for low standby power, high performance and RF/analog system on chip applications 一种100nm铜/低k块CMOS技术，具有多Vt和多栅极氧化物集成晶体管，适用于低待机功耗，高性能和芯片上RF/模拟系统应用

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) Pub Date : 2002-06-11 DOI: 10.1109/VLSIT.2002.1015370

G. Yeap, J. Chen, P. Grudowski, Y. Jeon, Y. Shiho, W. Qi, S. Jallepalli, N. Ramani, K. Hellig, L. Vishnubhotla, T. Luo, H. Tseng, Y. Du, S. Lim, P. Abramowitz, C. Reddy, S. Parihar, R. Singh, M. Wright, K. Patterson, N. Benavides, D. Bonser, T. V. Gompel, J. Conner, J.J. Lee, M. Rendon, D. Hall, A. Nghiem, R. Stout, K. Weidemann, A. Duvallet, J. Alvis, D. Dyer, D. Burnett, P. Ingersoll, K. Wimmer, S. Veeraraghavan, M. Foisy, M. Hall, J. Pellerin, D. Wristers, M. Woo, C. Lage

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引用次数: 20