2016 IEEE Symposium on VLSI Technology最新文献

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A Monte Carlo simulation method to predict large-density NAND product memory window from small-array test element group (TEG) verified on a 3D NAND Flash test chip 基于小阵列测试元件组(TEG)预测大密度NAND产品存储窗口的蒙特卡罗模拟方法在3D NAND闪存测试芯片上得到验证
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573386
C. Hsieh, H. Lue, T. Hsu, P. Du, K. Chiang, Chih-Yuan Lu
{"title":"A Monte Carlo simulation method to predict large-density NAND product memory window from small-array test element group (TEG) verified on a 3D NAND Flash test chip","authors":"C. Hsieh, H. Lue, T. Hsu, P. Du, K. Chiang, Chih-Yuan Lu","doi":"10.1109/VLSIT.2016.7573386","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573386","url":null,"abstract":"We developed a Monte Carlo simulation method to accurately predict the large-density NAND flash product memory window based on several device parameters collected in the small-array test element group (TEG). The required parameters include the ISPP slope, intrinsic Vt distribution sigma, program noise, random telegraph noise (RTN), and various interference ratios. All these parameters can be collected from the wafer acceptance test (WAT) of a small-array TEG. The simulation methodology is to randomly generate a Vt distribution ensemble that resembles the product memory cell. Programming simulation of each memory cell considers the programming distribution and various fluctuation factors during ISPP programming and verification. Experimental data of a fabricated 3D NAND test chip are compared with the simulation results, and show excellent consistency. This novel methodology not only provides memory product window from device parameters of TEG, but also emulates various MLC programming algorithms to optimize the product-level memory window.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133010773","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
Germanium-Tin heterojunction phototransistor: Towards high-efficiency low-power photodetection in short-wave infrared range 锗锡异质结光电晶体管:迈向短波红外高效低功耗光电探测
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573449
Wei Wang, Yuan Dong, S. Lee, W. Loke, X. Gong, S. Yoon, G. Liang, Y. Yeo
{"title":"Germanium-Tin heterojunction phototransistor: Towards high-efficiency low-power photodetection in short-wave infrared range","authors":"Wei Wang, Yuan Dong, S. Lee, W. Loke, X. Gong, S. Yoon, G. Liang, Y. Yeo","doi":"10.1109/VLSIT.2016.7573449","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573449","url":null,"abstract":"We report the world's first demonstration of Germanium-Tin (Ge1-xSnx) heterojunction phototransistor (HPT) for high-efficient low-power light detection in short-wave infrared (SWIR) range. Large optical response enhancement of ~10 times over the conventional p-i-n Ge1-xSnx photodiode (PD) was achieved, with photodetection beyond 2003 nm. High responsivities of ~2.6 A/W at 1510 nm and ~0.19 A/W at 1877 nm were achieved at a low operating bias of 1.0 V.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126661109","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
200–280GHz CMOS RF front-end of transmitter for rotational spectroscopy 旋转光谱发射机200-280GHz CMOS射频前端
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573400
N. Sharma, Q. Zhong, Z. Chen, W. Choi, J. P. McMillan, C. Neese, R. Schueler, I. Medvedev, F. D. De Lucia, K. O
{"title":"200–280GHz CMOS RF front-end of transmitter for rotational spectroscopy","authors":"N. Sharma, Q. Zhong, Z. Chen, W. Choi, J. P. McMillan, C. Neese, R. Schueler, I. Medvedev, F. D. De Lucia, K. O","doi":"10.1109/VLSIT.2016.7573400","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573400","url":null,"abstract":"A 200-280 GHz RF front-end of transmitter is demonstrated in 65-nm CMOS. Saturated EIRP is greater than -5dBm over a frequency range of 60GHz. When the input power is -20dBm, EIRP is greater than -10dBm for most of the frequency range, and achieves 3-dB and 6-dB bandwidths of 24% and 33%. The front-end was integrated with a fractional-N synthesizer to form a transmitter operating at 208-255GHz with EIRP of -18 to -11dBm. The transmitter and a CMOS receiver are used for rotational spectroscopy and to detect ethanol in human breath.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121469608","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 30
Enabling high-performance heterogeneous TFET/CMOS logic with novel circuits using TFET unidirectionality and low-VDD operation 利用TFET单向性和低vdd操作的新颖电路实现高性能异构TFET/CMOS逻辑
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573442
D. Morris, Kaushik Vaidyanathan, U. Avci, Huichu Liu, T. Karnik, I. Young
{"title":"Enabling high-performance heterogeneous TFET/CMOS logic with novel circuits using TFET unidirectionality and low-VDD operation","authors":"D. Morris, Kaushik Vaidyanathan, U. Avci, Huichu Liu, T. Karnik, I. Young","doi":"10.1109/VLSIT.2016.7573442","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573442","url":null,"abstract":"Tunneling FETs (TFETs) offer better low-VDD performance than CMOS but lack performance above 0.5V VDD due to low drive current and VDD-dependent parasitic leakages. At low-VDD, TFET's higher energy efficiency enables 2X parallel performance for power constrained systems. For applications less amenable to parallelization, newly proposed circuits improve energy/op, performance and area by not only using TFET's steep sub-threshold swing, but also utilizing its asymmetric IDS-VDS characteristic. Design synthesis with sub-5nm node TFETs, MOSFETs and interconnects is used to assess trade-offs in industry logic blocks. In addition to a 44% energy reduction over CMOS circuits, novel TFET circuits improve dynamic energy by 32% and performance by 13% at logic cell level (4% and 10% respectively at synthesized logic block). Even with these benefits, single-threaded CPUs require CMOS logic's high performance. In this case, heterogeneous TFET/CMOS logic with low-overhead level-shifters improves performance 50% while reducing energy 42% for non-critical performance logic.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"119 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114054302","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
High performance In0.53Ga0.47As FinFETs fabricated on 300 mm Si substrate 在300 mm Si衬底上制备的高性能In0.53Ga0.47As finfet
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573361
M. Huang, S. W. Chang, M. Chen, Y. Oniki, H. C. Chen, W. Lee, C. H. Lin, M. A. Khaderbad, K. Y. Lee, Z. Chen, P. Tsai, L. T. Lin, M. Tsai, C. Hung, T. C. Huang, Y. Lin, Y. Yeo, S. Jang, H. Hwang, H. Wang, Carlos H. Díaz
{"title":"High performance In0.53Ga0.47As FinFETs fabricated on 300 mm Si substrate","authors":"M. Huang, S. W. Chang, M. Chen, Y. Oniki, H. C. Chen, W. Lee, C. H. Lin, M. A. Khaderbad, K. Y. Lee, Z. Chen, P. Tsai, L. T. Lin, M. Tsai, C. Hung, T. C. Huang, Y. Lin, Y. Yeo, S. Jang, H. Hwang, H. Wang, Carlos H. Díaz","doi":"10.1109/VLSIT.2016.7573361","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573361","url":null,"abstract":"In<sub>0.53</sub>Ga<sub>0.47</sub>As FinFETs are fabricated on 300 mm Si substrate. High device performance with good uniformity across the wafer are demonstrated (SS=78 mV/dec., I<sub>on</sub>/I<sub>off</sub>~10<sup>5</sup>, DIBL=48 mV/V, g<sub>m</sub>=1510 μS/μm, and I<sub>on</sub>=301 μA/μm at V<sub>ds</sub>=0.5V with L<sub>g</sub>=120 nm device). The extrinsic field effect mobility of 1731 cm<sup>2</sup>/V-s with EOT~0.9nm is extracted by split-CV. Devices fabricated on 300mm Si have shown similar performances in SS and I<sub>on</sub> when benchmarked with device fabricated on lattice-matched InP substrate. In addition, an I<sub>on</sub> of 44.1 μA per fin is observed on the fin-height of 70 nm and the fin-width of 25nm, which is among the highest values reported for In<sub>0.53</sub>Ga<sub>0.47</sub>As FinFETs to the best of our knowledge.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123064407","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 20
Comprehensive evaluation of early retention (fast charge loss within a few seconds) characteristics in tube-type 3-D NAND flash memory 管型3-D NAND闪存早期保留(几秒内快速电荷损失)特性的综合评价
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573385
Bongsik Choi, S. H. Jang, J. Yoon, Juhee Lee, M. Jeon, Yongwoo Lee, Jungmin Han, Jieun Lee, D. M. Kim, D. Kim, Chan Lim, Sungkye Park, Sung-Jin Choi
{"title":"Comprehensive evaluation of early retention (fast charge loss within a few seconds) characteristics in tube-type 3-D NAND flash memory","authors":"Bongsik Choi, S. H. Jang, J. Yoon, Juhee Lee, M. Jeon, Yongwoo Lee, Jungmin Han, Jieun Lee, D. M. Kim, D. Kim, Chan Lim, Sungkye Park, Sung-Jin Choi","doi":"10.1109/VLSIT.2016.7573385","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573385","url":null,"abstract":"A fast charge loss within a few seconds, which is referred to as early retention, was observed in tube-type 2y word-line stacked 3-D NAND flash memory for the first time, and the origin of the early retention was comprehensively evaluated. Using a fast-response pulse I-V system, the early retention characteristics from microseconds to seconds were thoroughly investigated, and the correlations with various program and erase levels were examined using solid and checkerboard patterns. Our findings indicate that the early retention mainly originates from the lateral charge loss through the shared charge trap layers and suggest that the program and erase levels should be balanced and optimized to reduce the early retention.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131210907","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 54
Smart power technologies enabling power SOC and SIP 智能电源技术,支持电源SOC和SIP
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573394
S. Pendharkar
{"title":"Smart power technologies enabling power SOC and SIP","authors":"S. Pendharkar","doi":"10.1109/VLSIT.2016.7573394","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573394","url":null,"abstract":"Today's smart power technologies and advanced packaging techniques have helped enable complex power systems on chip (SOCs) as well as multi-chip power modules and systems in package (SIPs). Innovations in power management SOCs and SIPs have been key in pushing the efficiency and form factor targets for portable electronics as well as for enhancing the overall system robustness and reliability for harsher industrial and automotive applications. Increasingly mature SiC and GaN power technology along with heterogeneous integration is helping achieve enormous power density enhancement even for higher voltage applications.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133423146","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Analog/RF wonderland: Circuit and technology co-optimization in advanced FinFET technology 模拟/射频仙境:先进FinFET技术中的电路和技术协同优化
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573399
F. Hsueh, Y. Peng, Chung-Hui Chen, T. Yeh, H. Hsieh, Chin-Ho Chang, Szu-Lin Liu, Mei-Chen Chuang, Mark Chen
{"title":"Analog/RF wonderland: Circuit and technology co-optimization in advanced FinFET technology","authors":"F. Hsueh, Y. Peng, Chung-Hui Chen, T. Yeh, H. Hsieh, Chin-Ho Chang, Szu-Lin Liu, Mei-Chen Chuang, Mark Chen","doi":"10.1109/VLSIT.2016.7573399","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573399","url":null,"abstract":"Stacked-gate is one of the most popular solutions used in mismatch-sensitive circuits in FinFET technology. A Bandgap circuit using stacked-gate formed by 150 short-channel devices to achieve high accuracy is demonstrated. Adding uniform surrounding patterns to the target MOS array, the device mismatch caused by DGE (density gradient effect) can be cancelled. In low-power RF LNA and VCO, dc power reductions are achieved. The near-threshold-voltage (NTV) design technique is adopted for further 50% RF power reduction.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132297254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Novel RRAM-enabled 1T1R synapse capable of low-power STDP via burst-mode communication and real-time unsupervised machine learning 通过突发模式通信和实时无监督机器学习实现低功耗STDP的新型rram启用1T1R突触
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573432
S. Ambrogio, S. Balatti, V. Milo, R. Carboni, Z. Wang, A. Calderoni, N. Ramaswamy, D. Ielmini
{"title":"Novel RRAM-enabled 1T1R synapse capable of low-power STDP via burst-mode communication and real-time unsupervised machine learning","authors":"S. Ambrogio, S. Balatti, V. Milo, R. Carboni, Z. Wang, A. Calderoni, N. Ramaswamy, D. Ielmini","doi":"10.1109/VLSIT.2016.7573432","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573432","url":null,"abstract":"We present a new electronic synapse for neuromorphic computing consisting of a 1T1R structure based on HfO2 RRAM technology, and capable of STDP and pattern learning. Power consumption is reduced by adopting short POST spike and burst-mode integration. MNIST classification shows promising learning and classification efficiency. These results support RRAM as an enabling technology for low-power neuromorphic hardware.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133803334","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 32
Advanced a-VMCO resistive switching memory through inner interface engineering with wide (>102) on/off window, tunable μA-range switching current and excellent variability 先进的a-VMCO阻性开关存储器通过内部接口工程,具有宽(>102)开/关窗口,μ a范围开关电流可调和优异的可变性
2016 IEEE Symposium on VLSI Technology Pub Date : 2016-06-14 DOI: 10.1109/VLSIT.2016.7573387
B. Govoreanu, L. D. Piazza, J. Ma, Thierry Conard, A. Vanleenhove, A. Belmonte, D. Radisic, M. Popovici, A. Velea, A. Redolfi, O. Richard, S. Clima, C. Adelmann, Hugo Bender, Malgorzata Jurczak
{"title":"Advanced a-VMCO resistive switching memory through inner interface engineering with wide (>102) on/off window, tunable μA-range switching current and excellent variability","authors":"B. Govoreanu, L. D. Piazza, J. Ma, Thierry Conard, A. Vanleenhove, A. Belmonte, D. Radisic, M. Popovici, A. Velea, A. Redolfi, O. Richard, S. Clima, C. Adelmann, Hugo Bender, Malgorzata Jurczak","doi":"10.1109/VLSIT.2016.7573387","DOIUrl":"https://doi.org/10.1109/VLSIT.2016.7573387","url":null,"abstract":"We demonstrate an advanced a-VMCO nonfilamentary resistive switching memory cell with self-rectifying, self-compliant, forming-free and analog behavior. A BEOL-compatible process yields devices with excellent device-to-device variability, down to 40nm size. Detailed analysis of the a-Si/TiO2 interface enables understanding the barrier resistance modulation, engineered for wider on/off window and current reduction, while preserving an excellent variability. Inner-interface engineered devices have an on/off window well above 102 and reset switching currents of down to ~1uA for 40nm-size cells, scaling with size, without compromising reliability. Furthermore, vertical stack scaling allows to reduce the operating voltages, while preserving or tuning device figures.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"58 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115737618","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 21
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