{"title":"Development of wafer level solderball placement process for RDL-first FOWLP","authors":"S. Lim, N. Jaafar, S. Chong, S. Lim, T. Chai","doi":"10.1109/EPTC50525.2020.9315079","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315079","url":null,"abstract":"The Fan-out wafer-level packaging technology is an integrated circuit technology as well as an enhancement of standard wafer-level packaging (WLP) solutions. This technology is an attractive packaging approach for mobile applications and heterogeneous integration. It allows better electrical performance, low form factor and at relatively low cost as compared to wafer to wafer stacking or 3D stacked bonding. Furthermore, as the industry moving towards higher density and higher-bandwidth chip to chip interconnections, the application of Package on Package technology offers a solution for applications processors and mobile applications with better thermal and electrical performance. One of the significant advantages of package-on-package FOWLP is the ability of stacking 2 different packages to achieve multi-functionality. However, the overall package has to maintain a low profile for thin portable applications. The work in this paper focus on the development and process of wafer level solderball placement on a molded wafer using RDL-first FOWLP process. The Fanout molded wafer is 0.47mm thick and the package size is after singulation. The work in this paper focus on the development and process of wafer level solderball placement on a molded wafer using RDL-first FOWLP process. The Fanout molded wafer is 0.47mm thick and the package size is $15 times 15 mathbf{mm}^{2}$ after singulation. Detailed process parameters on flux printing process parameters such as the printing speed and printing gap coupled with ball placement speed, ball dispense gap and ball head moving direction needs to be evaluated to achieve robust wafer level solderball placement process with good flux printing and good ball placement process yield.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"467 1","pages":"435-439"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86717146","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Billie Xianghong Bi, H. Fan, Jun Yang, Haibin Chen
{"title":"Study on Cu Wire Wedge Crack and Fatigue Life Prediction during Thermal Cycling Test (TCT)","authors":"Billie Xianghong Bi, H. Fan, Jun Yang, Haibin Chen","doi":"10.1109/EPTC50525.2020.9315045","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315045","url":null,"abstract":"It is widely believed that wedge crack is resulted from thermal stress occurring at wire bonding area due to coefficient of thermal expansion (CTE) mismatches among epoxy molding compound (EMC), Cu wire, and Leadframe, and wedge bond heel area has the highest risk due to higher stress concentration. To fully understand the wedge crack failure mechanism and the way to improve its fatigue life, in this study, the wedge bond performance under TCT was evaluated in a small outline transistor package with different wire bonding settings, different types of EMC with different CTEs and modulus. The results showed that the TCT performance of Cu wire wedge bond depended on the wire bonding setting, CTE of EMC, adhesion between EMC and Leadframe, wire diameter, etc. Through suitable material selection, package design, process optimization, Cu wire wedge crack during TCT can be avoided to achieve the increasingly higher reliability requirement. Furthermore, numerical modeling was developed to predict Cu wire wedge bond fatigue life with those different factors during TCT. For given packages, modelling can provide a comparison on accumulative plastic strain ($Deltavarepsilon_{mathrm{p}}$) at Cu wedge bond to identify the effect of factors on Cu wedge fatigue crack. Fatigue parameters can be derived by simulation results and experimental data. Regarding to these fatigue parameters, TCT fatigue life can be predicted for a given package.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"44 1","pages":"168-171"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86132412","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Material Removal Rate Prediction using the Classification-Regression Approach","authors":"Kart-Leong Lim, R. Dutta","doi":"10.1109/EPTC50525.2020.9315140","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315140","url":null,"abstract":"Chemical Mechanical Polishing (CMP) is one of the most critical process step in the fabrication of advanced packages, such as Fanout Wafer Level Packaging (FOWLP). CMP process requires tight and dynamic control of process parameters to achieve palnarization, high quality and reliability of organic or in-organic redistribution layer (RDL) surface morphology. Typically, physics based or data driven approaches are implied to predict material removal rate (MRR) and run time control. The former models a closed-form expression between domain knowledge and MRR. Often, the domain knowledge are based on kinetics and contact interaction between the wafer, and the polishing tool. While the latter use time series based training data and machine learning to predict MRR. In this paper, we demonstrate to incorporate wear knowledge as classification and show its effectiveness in predicting MRR. Our experiments shows better overall accuracy being achieved through the proposed classification and regression framework.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"3385 1","pages":"172-175"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86622692","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Wafer Level Fine-Pitch Hybrid Bonding: Challenges and Remedies","authors":"V. Chidambaram, Yew Wing Leong, Qin Ren","doi":"10.1109/EPTC50525.2020.9315002","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315002","url":null,"abstract":"Fine-pith hybrid bonding has been demonstrated using 3μm Cu pad size and 6μm pitch. TEOS SiO2 is used as a dielectric material. Oxide films were characterized in terms of porosities. A good correlation has been established between the % of porosity in the oxide film and the bonding energy. Chemical-mechanical polishing (CMP) process control challenges in order to achieve a narrow Cu dishing range has also been discussed. It has been recommended that the post-bond annealing temperature needs to be appropriately adjusted in order to achieve good diffusion bonding at the Cu-Cu interface and at the same time mitigate generation of peeling stresses. Disparity in misalignment is observed within the same bonded wafer. To resolve this, a novel solution of designing mating Cu pads of different dimensions is being proposed. Through this design approach, misalignment could be successfully offset and better Cu pad connectivity could be achieved.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"22 1","pages":"459-463"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83503640","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"High performances 3D heterogeneous integrated devices based on 3D silicon capacitive interposer","authors":"M. Jatlaoui, C. Muller","doi":"10.1109/EPTC50525.2020.9315000","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315000","url":null,"abstract":"One of the key issues in today's 3D integration topic is to correctly design and assemble silicon-related technologies (ICs, IPDs, Si-interposers and so on) with non-silicon-related technologies (ceramic components, plastic molded chips, crystal oscillators as examples), in a structure that takes advantage of the silicon base, like thin-pitch TSVs, RDL or WLCSP. Such structure would help moving from the COB era, to a real 3D heterogeneous platform era. Two successful examples, with high integration level and optimized performances, will be detailed in this paper.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"33 1","pages":"266-267"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79543448","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Frequency Domain Methodology for Evaluating Signal Integrity Performance of Logic to Logic and HBM Interconnect Models for Chiplet Packaging","authors":"Li Kangrong, M. D. Rotaru","doi":"10.1109/EPTC50525.2020.9315036","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315036","url":null,"abstract":"A novel methodology to evaluate the signal integrity (SI) performance of logic to logic and high bandwidth memory (HBM) interconnect model for chiplet packaging is proposed. Compared with the traditional S parameters and eye diagram analyses, the proposed methodology reflects the actual SI performance under the capacitive termination condition, takes much shorter simulation time and provides more insightful SI evaluation, which is suitable for logic to logic and HBM interconnect design and optimization. The S parameters analysis are not sufficient for the cases like logic to logic and HBM interconnect models, which are unterminated (capacitive loading). The eye diagram analysis cannot provide an insightful guideline for optimization of interconnect model. Besides, eye diagram simulations to find the optimum interconnect model are very time consuming, as a frequency domain to time domain via an inverse fast Fourier transformation (FFT) is required. Compared with the eye diagram analysis, the proposed methodology only analyses the SI performance in frequency domain rather than in time domain, so the simulation time is reduced. The proposed methodology can overcome the drawbacks of the S parameters and eye diagram analyses and provide an in-depth and fast evaluation on the SI performance of logic to logic and HBM interconnect models frequently encountered in advanced system in package using chiplets.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"100 1","pages":"147-151"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84267022","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
P. Mackowiak, M. Schiffer, Martin Scheider-Ramelow, K. Lang
{"title":"Dry Etched Through SiC Via (TSiCV) Process Analysis Using DOE Modeling","authors":"P. Mackowiak, M. Schiffer, Martin Scheider-Ramelow, K. Lang","doi":"10.1109/EPTC50525.2020.9315121","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315121","url":null,"abstract":"This paper describes the research on modelling the etching parameters of SiC using RIE. The experiments were performed using a design of experiments (DOE) with a total 78 experiments and D-efficiency of over 85.4 finding the most significant process parameters impacting the etch result. All experiments were carried out for three different via diameters. The evaluation of the via etching was performed using confocal microscopy and by cross sections of the SiC vias. Afterwards the model was verified with etching experiments show very good match with the prediction model. The deviation between the model and the verification was below 6%.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"57 1","pages":"10-13"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83571571","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Min-Sung Kim, H. Jung, Sunghyun Park, Tae-Hyung Kim, E. Ahn, Young-Hwan
{"title":"Built-in Stress effects of IC package substrate's layers on its warpage at room temperature","authors":"Min-Sung Kim, H. Jung, Sunghyun Park, Tae-Hyung Kim, E. Ahn, Young-Hwan","doi":"10.1109/EPTC50525.2020.9315057","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315057","url":null,"abstract":"This paper presents that built-in stress of copper, FRP and solder-resist (SR) layers is critical to predict an IC package substrate's warpage at room temperature. The built-in stresses are 78MPa on copper, 16MPa on FR4 and 9MPa on SR through simple bilayer's curvature and strain-curvature analytic model. Specifically, the built-in stress of copper layers has distinct value depending on circuit process; that is, average built-in stress of 78, 136 and 53MPa are loaded on the copper layer of tenting, MSAP, and PSAP respectively. Besides, in curing process, uncured FRP has a material-dependent built-in stress, namely 22 and 15MPa on each type D and E of FRP. Moreover, SR also has built-in stress, 6 and 23MPa on each type A and B of SR. It is shown that simulation results considered built-in stress are in good agreement with measured warpage of simple bilayer substrate. To conclude, it is verified that built-in stress of copper, FRP, and SR affects warpage of IC package substrate at room temperature.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"3 1","pages":"73-76"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79038927","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Sajay Bhuvanendran Nair Gourikutty, Kok Keng Chua, J. Alton, Jong Ming Chinq, Ratan Bhimrao Umralkar, V. Chidambaram, S. Bhattacharya
{"title":"Non-destructive fault isolation in through-silicon interposer based system in package","authors":"Sajay Bhuvanendran Nair Gourikutty, Kok Keng Chua, J. Alton, Jong Ming Chinq, Ratan Bhimrao Umralkar, V. Chidambaram, S. Bhattacharya","doi":"10.1109/EPTC50525.2020.9315038","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315038","url":null,"abstract":"The importance of IC packaging technologies within semiconductor manufacturing has increased dramatically over the last decade. Advanced packaging, including 2.5D ICs, is becoming more widely used due to its integrated functionality. However, due to the complexity of the advanced package architectures, it also poses challenges in localizing the defect, which is required for the successful investigation of faults. In this paper, an approach to accurately localize the failures in 2.5-D integrated system-in-package is presented. Two different case studies are discussed to demonstrate fault isolation, the first one with a short defect at the die, and the second one having an open defect at the substrate. The proposed method to locate faults rapidly with an accuracy of less than $10mumathrm{m}$ will provide an effective solution for investigating yield-loss in advanced packages.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"83 1","pages":"281-285"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80346491","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Bobby Johns L. Villacarlos, Marty Lorgino D. Pulutan
{"title":"Thermomechanical Stress and Strain Distribution and Thermal Resistivity Correlation to Bondline Thickness of Ag Sinter","authors":"Bobby Johns L. Villacarlos, Marty Lorgino D. Pulutan","doi":"10.1109/EPTC50525.2020.9315142","DOIUrl":"https://doi.org/10.1109/EPTC50525.2020.9315142","url":null,"abstract":"Stress and strain energy distribution and thermal resistivity of diebonded Si dies were measured and correlated with varying bondline thickness of hybrid Ag sinter to define and optimize workable bondline thickness window. Thermomechanical simulations were done using carrier device with known PPF-plated Cu flange, Si die, epoxy mold compound and Ag sinter material properties. Principal stress, total strain energy density and interfacial stress distribution were obtained to check susceptibility to die crack, cohesive and adhesive failure respectively using Finite Element Analysis. On the other hand, thermal resistivity (Rth) per die section (Final Peak, Final Carrier, Driver Peak, and Driver Carrier) were measured across varying dry bondline thickness of 20, 40 and $60mu mathrm{m}$. Results reveal that maximum principal stress, strain energy and interfacial stress experienced on the die, die-attach, and die backside - die-attach interface are inversely proportional to the bondline thickness of Ag sinter which means lower bondline thickness are more susceptible to reliability failures. Moreover, thermal resistivity on all die sections dramatically increases with increasing bondline thickness and should be controlled within 20 to $60mu mathrm{m}$ thickness range.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"10 1","pages":"307-311"},"PeriodicalIF":0.0,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82856451","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}