基于三维硅电容中间体的高性能三维异构集成器件

M. Jatlaoui, C. Muller
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引用次数: 3

摘要

当今3D集成主题的关键问题之一是正确设计和组装硅相关技术(ic, ipd, Si-interposers等)与非硅相关技术(陶瓷组件,塑料模制芯片,晶体振荡器等),在利用硅基的结构中,如薄间距tsv, RDL或WLCSP。这样的结构将有助于从COB时代过渡到真正的3D异构平台时代。本文将详细介绍两个集成度高、性能优化的成功实例。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High performances 3D heterogeneous integrated devices based on 3D silicon capacitive interposer
One of the key issues in today's 3D integration topic is to correctly design and assemble silicon-related technologies (ICs, IPDs, Si-interposers and so on) with non-silicon-related technologies (ceramic components, plastic molded chips, crystal oscillators as examples), in a structure that takes advantage of the silicon base, like thin-pitch TSVs, RDL or WLCSP. Such structure would help moving from the COB era, to a real 3D heterogeneous platform era. Two successful examples, with high integration level and optimized performances, will be detailed in this paper.
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