Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium最新文献

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Theory And Implementation Of LSSD Scan Ring & STUMPS Channel Test And Diagnosis LSSD扫描环& STUMPS通道检测与诊断的理论与实现
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1992-09-28 DOI: 10.1109/IEMT.1992.639890
G. A. Sarrica
{"title":"Theory And Implementation Of LSSD Scan Ring & STUMPS Channel Test And Diagnosis","authors":"G. A. Sarrica","doi":"10.1109/IEMT.1992.639890","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639890","url":null,"abstract":"Today's advanced computer technology renders the use of physically probe-able test pins impractical. Built In Self-Test uses scan rings which provide observability to on-chip latches. This paper discusses the latch-level theory of the scan M y defects that must be tested for and diagnosed, and the implementation of the diagnostic algorithms used. SUMMARY: Modem test methodology eliminates the use of physically probe-able points in the testing of TCM's. This allows for faster testing of the parts and reduces tester complexity. However, this situation creates many challenges in the fields of logic testing, and failure diagnostics if a test reveals a defect. Significant progress has been made using the Built In Self-Test (BIST) concept to accomplish probeless 'TCM test. This concept requires the use of Level Sensitive Scan Design (LSSD) where latches have two methods of propagating data, a scan path and a logic path. The Shift Register Latches (SRLs) are connected in scan chains which provide observability to the results of logic functions performed by the TCM. Before the logic of a chip can be tested, the integrity of its scan path must be verified. This verification is accomplished by applying three scan ring based tests: LSSD Flush, LSSD Scan, and Self-Test Scan. If a scan path proves defective, then diagnostics must be performed to make an effective repair call. This paper deals with the latch level theory of LSSD, the types of defects that can occur in a scan ring, and the tests and software tools that are used to make effective repair calls on faiting parts. Part","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133773225","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Molding Of Plastic Components Using Micro-EDM Tools 使用微细电火花加工工具的塑料部件成型
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1992-09-28 DOI: 10.1109/IEMT.1992.639879
H. Li, S. Senturia
{"title":"Molding Of Plastic Components Using Micro-EDM Tools","authors":"H. Li, S. Senturia","doi":"10.1109/IEMT.1992.639879","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639879","url":null,"abstract":"We report the use of micro electrodischarge machining (micro-EDM) to fabricate molding tools with which plastic pairts are molded having dimensions on the order of tens of microns. While problems are encountered with the surface roughness of the microEDM parts, and occasionally in achieving successful mold-release, this approach to micro fabrication offers the potential of achieving a greater flexibility for fabricating three-dimensional shapes than either silicon micromachining, or the combination of high-aspectratio lithography, electroplating, and injection molding referred to as the LIGA process. Examples of micromolded plastic parts using micro-EDM fabricated molding tools are presented.","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"262 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115492195","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Silicon VLSI Technology Trends 硅VLSI技术趋势
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1992-09-28 DOI: 10.1109/IEMT.1992.639915
T. Ning
{"title":"Silicon VLSI Technology Trends","authors":"T. Ning","doi":"10.1109/IEMT.1992.639915","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639915","url":null,"abstract":"The integration level of silicon VLSI has been increasing approximately 4X every three years for memory chips and approximately 2X every two years for logic chips. CMOS technology, with its unique negligible-standby-power characteristics, is ideally suited for continuing these trends in integration. The integration levels, as well as the practical circuit speeds, of bipolar are severely constrained by the large standby power of bipolar circuits. CMOS is scalable to about 0.1 Spm for room temperature applications, and to smaller than O.lpm for low-temperature applications. Furthermore, CMOS on ultra-thin SO1 could be 2X as fast as bulk CMOS. In addition to emphasis on low power dissipation, there will be emphasis on 3D structures, stacked multi-layer ICs, and planarized multi-level fine-pitch and variable-width interconnect technology.","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116428377","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Knowledge Based Decision Support For Surface Mount Infrared Reflow Soldering 基于知识的表面贴装红外回流焊决策支持
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1992-09-28 DOI: 10.1109/IEMT.1992.639910
Chien-Hsing Wu, K. Srihari, A. McLenaghan
{"title":"Knowledge Based Decision Support For Surface Mount Infrared Reflow Soldering","authors":"Chien-Hsing Wu, K. Srihari, A. McLenaghan","doi":"10.1109/IEMT.1992.639910","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639910","url":null,"abstract":"Determination of the thermal profile for the InfraRed (IR) reflow soldering operation is a critical process in the surface mounted manufacture of Printed Circuit Boards (PCBs). An appropriate IR reflow profile is critical to ensuring good solder joints and high product yield levels. Determining an IR reflow profile requires the consideration of several factors. The heuristic knowledge required, the qualitative nature of the information used, and the vast quantity of information to be processed for IR reflow profile generation have made this an appropriate application for knowledge based expert systems. This paper describes the design, and development of a knowledge based system that assists in determining an IR reflow profile for single sided surface mount PCBs. The concepts used in this research relate to electronics packaging, surface mount PCB assembly, reflow soldering, and expert systems. The objectives of this research are identified, and the research methodology is described. The inputs and outputs to the system are delineated.","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"98 2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121385056","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Towards A QML Approach In Electronic Packaging 面向电子封装的QML方法
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1992-09-28 DOI: 10.1109/IEMT.1992.639856
A. Dasgupta, S. Verma, R. K. Agarwal
{"title":"Towards A QML Approach In Electronic Packaging","authors":"A. Dasgupta, S. Verma, R. K. Agarwal","doi":"10.1109/IEMT.1992.639856","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639856","url":null,"abstract":"~This paper discusses validation, process verif in an integrated QML The distinctions between verification functions approach is presented analysis, simulation and product validation is to hierarchize the manufacturing variables life-cycle cost. Case applications of the mair. 1","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127476008","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High Density Multilayer Substrate For Si On Si High Speed Module 用于Si On Si高速模组的高密度多层基板
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1992-09-28 DOI: 10.1109/IEMT.1992.639919
M. Kimura, T. Shimoto, K. Matsui, K. Utsumi, T. Kusaka, T. Koike
{"title":"High Density Multilayer Substrate For Si On Si High Speed Module","authors":"M. Kimura, T. Shimoto, K. Matsui, K. Utsumi, T. Kusaka, T. Koike","doi":"10.1109/IEMT.1992.639919","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639919","url":null,"abstract":"In order to have high speed hardware, there are two approaches. One is to use high speed LSIs. The other is to reduce the mcdia dclay between LSIs. This paper describes the performance by a high density multilayer substrate, based on Si wafer for high speed module. The high density Si multilayer substrate consists of ground layer(Si wafer), power distribution layer(Al), two signal layers(Au), bonding pad(Ni/Au) and four dielectric layers. The signal layer has 20 pm/55 pm line and space. The dielectric layers are made of organic resin having low dielectric constant(e=3.0). Si substrate size is 43mn x 43mm. With high density Si multilayer substrate, thc authors have evaluated various mechanical and electrical characteristics. The adhesion between conduction llayer and organic insulator is excellent. The electric Characteristics (characteristic impedance, crosstalk noise and propagation delay time) are practical too. After mounting LSIs, which are TAB chips, on Si substrate, a high speed RISC chip module packaged 174 pin ceramic PGA has been fabricated. LSI packaging density is 34 % for high efficiency.","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126553634","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Thermomechanical Characterization Of Flip Chip Solder Bumps For Multichip Module Applications 用于多芯片模块应用的倒装芯片焊料凸点的热力学特性
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1992-09-28 DOI: 10.1109/IEMT.1992.639907
J. Lau
{"title":"Thermomechanical Characterization Of Flip Chip Solder Bumps For Multichip Module Applications","authors":"J. Lau","doi":"10.1109/IEMT.1992.639907","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639907","url":null,"abstract":"In this paper, the responses of a self-stretching flip chip solder joint under thermal fatigue crack propagation have been study. Emphasis is placed on the determination of the J-integral and stress intensity factor around the crack tips of the solder joint by the finite element method. A 5th order polynomial has been used to best fit the J-integral and stress intensity factor as a function of the crack length in the solder joint. Thermal fatigue life of the solder joint was then estimated based on the calculated stress intensity factor, Paris' law, and fatigue crack growth rate data on solders. Furthermore, a correlation between the analytical and experimental results has also been made.","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"10872 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127395237","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Principle And Method Of Dynamic Parameters Measurement For Semiconductor Rectification Devices 半导体整流器件动态参数测量原理与方法
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1900-01-01 DOI: 10.1109/IEMT.1992.639874
Zhao Fu, Ge Shuxin, Ling Zemin, W. Jinghua
{"title":"Principle And Method Of Dynamic Parameters Measurement For Semiconductor Rectification Devices","authors":"Zhao Fu, Ge Shuxin, Ling Zemin, W. Jinghua","doi":"10.1109/IEMT.1992.639874","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639874","url":null,"abstract":"Shijiazhuang Res. Inst.of Automation No. 12, East Changan St. Shijiazhuang Hebei, P.R. China Post code: 050031 Phone: 0311-551415 In this paper, we propose the principle and the method of the on-line quality analysisand approval, including the concept of dynamic I[R and the dynamic diode equation, present a number of on-line quality phenomena and their change: regularities revealed first based on this princip1,e and method. It proves its correctness and effectiveness, and at the same time states it necessary to revise and supplement the existed IEC standard concerned.","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114623185","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Failure Analysis Of Power Modules; A Look At The Packaging And Reliability Of Large IGBTs 电源模块的故障分析大型igbt的封装和可靠性
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1900-01-01 DOI: 10.1109/IEMT.1992.639922
H. de lambilly, H. Keser
{"title":"Failure Analysis Of Power Modules; A Look At The Packaging And Reliability Of Large IGBTs","authors":"H. de lambilly, H. Keser","doi":"10.1109/IEMT.1992.639922","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639922","url":null,"abstract":"","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115321083","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Design Tradeoffs When Using SMT, COB, And/or TAB packaging Technology 使用SMT、COB和/或TAB封装技术时的设计权衡
Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium Pub Date : 1900-01-01 DOI: 10.1109/IEMT.1992.639917
Elliott H. Newcombe
{"title":"Design Tradeoffs When Using SMT, COB, And/or TAB packaging Technology","authors":"Elliott H. Newcombe","doi":"10.1109/IEMT.1992.639917","DOIUrl":"https://doi.org/10.1109/IEMT.1992.639917","url":null,"abstract":"With increasing market pressure to provide electronic products with more functionality while, at the same time, reducing the overall product form factor, future product designs will require the highest density packaging technologies available. Currently,, there are several suitable technologies available such as fine-pitch SMT, Chip-on-Board (COB), and Tape Automated Bonding (TAB), but making the decision on which to use is not always easy. There are many variables to consider that are related to the requirements of the endproduct, including product form factor, reliability, service and maintenance, unit cast, and testing, to name a few. The purpose of this paper is to review some of the advanced packaging technologies available and understand the design tradeoffs associated with each.","PeriodicalId":403090,"journal":{"name":"Thirteenth IEEE/CHMT International Electronics Manufacturing Technology Symposium","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132613897","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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