N. D’Souza, M. Salehi-Fashami, Supriyo Bandyopadhyay, J. Atulasimha
{"title":"Experimental demonstration of strain-clocked Boolean nanomagnetic logic and information propagation","authors":"N. D’Souza, M. Salehi-Fashami, Supriyo Bandyopadhyay, J. Atulasimha","doi":"10.1109/DRC.2014.6872355","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872355","url":null,"abstract":"Nanomagnetic logic has emerged as a promising alternative to transistor based logic because it offers both non-volatility and energy-efficiency. Recent experiments by Bhowmik et al. [1] demonstrate energy-efficient magnetization switching in nanomagnets using the Spin Hall effect. Another switching paradigm claiming unprecedented energy-efficiency involves magnetization switching of the nanomagnets via “straintronics” [2], whereby the magnetization of a multiferroic magnet is switched with a tiny voltage generating strain in a magnetostrictive-piezoelectric composite (Fig. 1a). This scheme, proposed by our group, was previously shown to reduce the energy dissipated per bit flip to a few hundred kT at room temperature [2-4]. In this work, we show for the first time experimental results implementing some of these schemes, using elliptical magnetostrictive nanomagnets of nominal lateral dimensions ~200 nm and thickness ~12 nm that possess shape anisotropy and are grown on a (001) PMN-PT substrate (Fig. 1b). A voltage is applied along the length of the PMN-PT substrate to generate mechanical strain, via d33 coupling, along the nanomagnet's easy axis of magnetization. The resulting strain-induced magnetization switching is investigated for single-domain nanomagnets and for clocking of dipole-coupled magnet arrays to implement Boolean logic using the schemes illustrated in Fig. 2. The strain clocking schemes used in our experiments are studied with Magnetic Force Microscopy (MFM) that is used to image the single domain magnetization switching and demonstrate strain clocked nanomagnetic logic for the first time [5]. These experimental results will be highlighted in this talk. Preliminary results are included here that show ferromagnetic (Fig. 3b) and anti-ferromagnetic ordering (Fig. 3c) in such nanomagnets.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117055014","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Rolandi, Erik E. Josberger, Yingxin Deng, Wei Sun, Rylan Kautz
{"title":"Two-terminal proton conducting devices with synaptic behavior and memory","authors":"M. Rolandi, Erik E. Josberger, Yingxin Deng, Wei Sun, Rylan Kautz","doi":"10.1109/DRC.2014.6872389","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872389","url":null,"abstract":"With the recent physical demonstration of memristive-based devices low-power two terminal devices with memory and learning functions have advanced electronics and neuromorphic computing. To this end, typically slow moving ions are coupled with fast moving electrons. Ionic motion affords memory, with electronic current as the output signal. Here, we introduce fully ionic two-terminal devices in which protons provide both memory and output signal. These devices exhibit synaptic-like reversible short-term depression, memory, and can be turned “ON” and “OFF” with as little as 30 fJ of energy per bit if appropriately miniaturized.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"331 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116234031","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
L. Ji, Yao‐Feng Chang, B. Fowler, Ying‐Chen Chen, T. Tsai, Kuan‐Chang Chang, Min-Chen Chen, T. Chang, S. Sze, E. Yu, Jack C. Lee
{"title":"Resistive switching of SiOX with one diode-one resistor nanopillar architecture fabricated via nanosphere lithography","authors":"L. Ji, Yao‐Feng Chang, B. Fowler, Ying‐Chen Chen, T. Tsai, Kuan‐Chang Chang, Min-Chen Chen, T. Chang, S. Sze, E. Yu, Jack C. Lee","doi":"10.1109/DRC.2014.6872388","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872388","url":null,"abstract":"Resistive random access memories (ReRAM) has attracted tremendous attention as a promising candidate for non-volatile memory. ReRAM can be classified into two categories: unipolar and bipolar memory. The advantage of unipolar memory is that it can be integrated into simple 1D-1R architecture with low static power consumption and constrained sneak-path issue. This is because unipolar memory does not require opposite voltage polarities for on/off switching [1]. SiOx has long been used as gate dielectrics for MOSFET and recently proved to be an active unipolar ReRAM material [2, 3]. Here we report SiOx-based 1D-1R high density nanopillar ReRAM via nanosphere lithography.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115870039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
L. E. Rodak, A. Sampath, Y. Chen, Q. Zhou, J. Campbell, H. Shen, M. Wraback
{"title":"Enhancing the deep ultraviolet response of 4H-silicon carbide-based photodiodes between 210 nm and 255 nm","authors":"L. E. Rodak, A. Sampath, Y. Chen, Q. Zhou, J. Campbell, H. Shen, M. Wraback","doi":"10.1109/DRC.2014.6872314","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872314","url":null,"abstract":"This work demonstrates two novel 4H-SiC-based photodiode structures that enhance the response from ~200 nm to 260 nm by increasing the absorption of DUV photons within the high-electric-field depletion region and more efficiently collecting photo-generated carriers through drift as opposed to diffusion, despite the presence of surface recombination. In particular, the two devices discussed in this work have replaced the heavily doped, top-illuminated, n+-layer of conventional p-n--n+ diodes by a semi-transparent metal contact to create a p-n--metal based device and by an n-type, wider bandgap AlGaN layer to create a heterojunction 4H-SiC/AlGaN p-n--n+ based device.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125940155","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Akbulut, F. Dirisaglik, A. Cywar, A. Faraclas, D. Pence, J. Patel, S. Steen, R. Nunes, H. Silva, A. Gokirmak
{"title":"Investigation of electrostatic body control in accumulated body MOSFETs","authors":"M. Akbulut, F. Dirisaglik, A. Cywar, A. Faraclas, D. Pence, J. Patel, S. Steen, R. Nunes, H. Silva, A. Gokirmak","doi":"10.1109/DRC.2014.6872385","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872385","url":null,"abstract":"The authors previously reported wide-range threshold voltage (VT) control and improvement in subthreshold slope (SS) and drain induced barrier lowering (DIBL) in narrow bulk Si Accumulated Body MOSFETs [1-3]. The side-gate structure surrounding the MOSFET body is used for accumulating the body through an independent contact to provide these effects (Fig. 1). In this work, we present a study on the electrostatic body control attained by the side-gates, using experimental and simulated devices.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"50 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128129630","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Sibani Bisoyi, R. Rodel, U. Zschieschang, K. Takimiya, H. Klauk, S. P. Tiwari
{"title":"Charge-carrier injection, extraction and trapping dynamics in organic thin-film transistors based on different organic semiconductors evaluated by displacement current measurements","authors":"Sibani Bisoyi, R. Rodel, U. Zschieschang, K. Takimiya, H. Klauk, S. P. Tiwari","doi":"10.1109/DRC.2014.6872303","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872303","url":null,"abstract":"Organic thin-film transistors (TFTs) have potential as pixel drivers in flexible active-matrix organic light-emitting diode displays [1]. Hence it is essential to analyze the charge-carrier injection and extraction dynamics of organic TFTs to gain a better understanding of the trapping and detrapping at the TFT interfaces. From the current-voltage characteristics of the TFTs, many important parameters can be extracted, such as carrier mobility, threshold voltage, on/off ratio, subthreshold slope and transconductance. But to quantitatively evaluate the trapping and detrapping dynamics, displacement current measurements on two-terminal long-channel capacitors (LCCs) are far more useful [2, 3]. The cross-section and the layout of an LCC are schematically shown in Fig. 1. Unlike a TFT, an LCC has only one contact, so that carriers are injected into and extracted from the semiconductor through the same contact. To increase the signal-to-noise ratio, a very large channel length (up to 6 cm) is employed. While Liang et al. have performed displacement current measurements on pentacene-based LCCs [2,3], we report here on displacement current measurements on LCCs based on four different organic semiconductors: pentacene, dinaptho[2,3-b:2',3'-f]thieno[3,2-b]thiophene (DNTT), 2,9-didecyl-DNTT (C10-DNTT) and diphenyl-DNTT (DPh-DNTT). In TFTs, these semiconductors show hole mobilities ranging from 1 to 7 cm2/Vs. The goal of the displacement current measurements reported here is to study how the choice of the semiconductor affects the trapping and detrapping dynamics in organic TFTs.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130654776","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Calculation of electron impact ionization co-efficient in β-Ga2O3","authors":"Krishnendu Ghosh, U. Singisetti","doi":"10.1109/DRC.2014.6872302","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872302","url":null,"abstract":"Monoclinic β-Ga2O3 field effect transistors (FETs) have been recently explored for power electronics application [1, 2] due to its large bandgap, and the availability of native substrates. Quantitative impact ionization coefficient (α) values are required to accurately predict the achievable breakdown voltages in these devices. Here, we first report the theoretical calculation of the electron impact ionization co-efficient in β-Ga2O3 by numerically evaluating the electron distribution function at high electric fields using Baraff's method [3]. We have included acoustic deformation potential (ADP) scattering, impurity scattering (IS), polar optical phonon (POP) scattering, and impact ionization (II) scattering in our calculations. Non-polar optical phonons are found to have negligible effects. Cheynoweth exponential fit of the impact ionization coefficient is extracted that can be used in device simulators to optimize the device design for high breakdown voltages.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131808518","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The piezoelectric transformer field effect transistor","authors":"S. Agarwal, E. Yablonovitch","doi":"10.1109/DRC.2014.6872282","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872282","url":null,"abstract":"In order to reduce the power consumption of modern electronics, the operating voltage needs to be significantly reduced. Unfortunately, conventional transistors fundamentally require around half a volt to switch. On the other hand, electrical wires only need millivolts to overcome noise and communicate information. This voltage mismatch results in a significant amount of power being wasted by charging the wires to a high voltage. To overcome this mismatch, either a new low voltage switch[1-5] or a voltage transformer is needed. In this paper we propose a new CMOS compatible piezoelectric voltage transformer that can be placed on the gate of each transistor to reduce the voltage needed for switching. This allows for a low voltage to be used to charge the wires while increasing the voltage at the transistor where it's needed. This results in the Piezoelectric Transformer Field Effect Transistor, or PT-FET.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133179871","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Multi-valley high-field transport in 2-dimensional MoS2 transistors","authors":"A. Serov, V. Dorgan, C. English, E. Pop","doi":"10.1109/DRC.2014.6872358","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872358","url":null,"abstract":"In this study we investigate for the first time both low-and high-field transport in few-layer MoS2 transistors using a two-valley band structure [Fig. 1], by combining simulations and experimental data [5]. We find that taking into account both the K and Q conduction band valley (with the Q valley along K to Γ being ΔE ≈ 0.13 eV higher) is necessary in order to understand all transport regimes. This finding clarifies the results of several theoretical band structure studies [6-8], which until now showed disagreement about this inter-valley separation. We demonstrate that a two-valley band structure and device self-heating should be taken into account to understand a wide range of transport in MoS2 transistors. Our results also help clarify the band structure of MoS2 as relevant for a variety of applications. This work was supported in part by NSF and STARnet/SONIC.","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"94 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133341384","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"SPICE models for metallic all-spin-logic devices and interconnects","authors":"A. Naeemi","doi":"10.1109/DRC.2014.6872409","DOIUrl":"https://doi.org/10.1109/DRC.2014.6872409","url":null,"abstract":"As Si CMOS technology approaches its scaling limits, there is a global search for novel devices based on state variables other than electronic charge. Among the potential alternative state variables, electron spin has received special attention thanks to its advantages in terms of robustness, non-volatility, and enhanced functionality. Recently, Purdue researchers proposed an all-spin logic (ASL) device that is a derivative of the nonlocal spin-valve structure and accomplishes the five essential characteristics for logic devices: concatenability, nonlinearity, feedback elimination, gain, and a complete set of Boolean operations [1], [2]. Various materials such as metals (copper and aluminum), semiconductors (silicon and gallium arsenide), and even novel carbon-based material such as graphene may be used to implement the channel in an ASL device. Metals are particularly attractive because of their high conductivity, which helps to reduce the “conductivity mismatch” problem [3] prevalent in spin devices with both semiconducting and graphene channels. In this talk, compact models are presented for the spin transport parameters in Cu and Al wires that capture the impact of size effects including surface scattering and grain boundary scattering at nanoscale dimensions [4]. The proposed models have been calibrated with experimental data from mesoscopic lateral spin valves. To model an ASL interconnect, one needs to account for the magnet dynamic, electronic and spintronic transport through magnet to non-magnet interfaces, electric currents, and spin diffusion. A comprehensive set of SPICE models that captures all these effects are described [5]. Finally, the models are used to predict the delay and energy dissipation of ASL devices and interconnects as functions of channel length and cross-sectional dimensions","PeriodicalId":293780,"journal":{"name":"72nd Device Research Conference","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133416602","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}