Investigation of electrostatic body control in accumulated body MOSFETs

M. Akbulut, F. Dirisaglik, A. Cywar, A. Faraclas, D. Pence, J. Patel, S. Steen, R. Nunes, H. Silva, A. Gokirmak
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Abstract

The authors previously reported wide-range threshold voltage (VT) control and improvement in subthreshold slope (SS) and drain induced barrier lowering (DIBL) in narrow bulk Si Accumulated Body MOSFETs [1-3]. The side-gate structure surrounding the MOSFET body is used for accumulating the body through an independent contact to provide these effects (Fig. 1). In this work, we present a study on the electrostatic body control attained by the side-gates, using experimental and simulated devices.
积体mosfet静电体控制的研究
作者先前报道了窄体硅积体mosfet的宽范围阈值电压(VT)控制和亚阈值斜率(SS)和漏极诱导势垒降低(DIBL)的改善[1-3]。围绕MOSFET体的侧栅结构用于通过独立接触积累体以提供这些效果(图1)。在这项工作中,我们使用实验和模拟设备研究了侧栅实现的静电体控制。
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