Multi-valley high-field transport in 2-dimensional MoS2 transistors

A. Serov, V. Dorgan, C. English, E. Pop
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引用次数: 4

Abstract

In this study we investigate for the first time both low-and high-field transport in few-layer MoS2 transistors using a two-valley band structure [Fig. 1], by combining simulations and experimental data [5]. We find that taking into account both the K and Q conduction band valley (with the Q valley along K to Γ being ΔE ≈ 0.13 eV higher) is necessary in order to understand all transport regimes. This finding clarifies the results of several theoretical band structure studies [6-8], which until now showed disagreement about this inter-valley separation. We demonstrate that a two-valley band structure and device self-heating should be taken into account to understand a wide range of transport in MoS2 transistors. Our results also help clarify the band structure of MoS2 as relevant for a variety of applications. This work was supported in part by NSF and STARnet/SONIC.
二维MoS2晶体管的多谷高场输运
在本研究中,我们首次通过结合模拟和实验数据[5],研究了使用双谷带结构的少层二硫化钼晶体管中的低场和高场输运[图1]。我们发现,为了理解所有输运机制,同时考虑K和Q导带谷(沿K至Γ的Q谷ΔE≈0.13 eV)是必要的。这一发现澄清了一些理论带结构研究的结果[6-8],这些研究迄今为止对这种谷间分离存在分歧。我们证明,为了理解MoS2晶体管的大范围输运,应该考虑双谷带结构和器件自加热。我们的研究结果还有助于阐明MoS2的能带结构与各种应用的关系。这项工作得到了NSF和STARnet/SONIC的部分支持。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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