L. Ji, Yao‐Feng Chang, B. Fowler, Ying‐Chen Chen, T. Tsai, Kuan‐Chang Chang, Min-Chen Chen, T. Chang, S. Sze, E. Yu, Jack C. Lee
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引用次数: 1
Abstract
Resistive random access memories (ReRAM) has attracted tremendous attention as a promising candidate for non-volatile memory. ReRAM can be classified into two categories: unipolar and bipolar memory. The advantage of unipolar memory is that it can be integrated into simple 1D-1R architecture with low static power consumption and constrained sneak-path issue. This is because unipolar memory does not require opposite voltage polarities for on/off switching [1]. SiOx has long been used as gate dielectrics for MOSFET and recently proved to be an active unipolar ReRAM material [2, 3]. Here we report SiOx-based 1D-1R high density nanopillar ReRAM via nanosphere lithography.