Thin Solid Films最新文献_第3页

Corrosion inhibition of copper and carbon steel by a neonicotinoid in HCl solution 新烟碱在盐酸溶液中对铜和碳钢的缓蚀作用

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-24 DOI: 10.1016/j.tsf.2025.140689

Luyan Wang , Zhongkang Zhou , Xiaochun Chen , Wei Liu , Yangqian Ye , Jianjia Shen , Qiangqiang Liao

{"title":"Corrosion inhibition of copper and carbon steel by a neonicotinoid in HCl solution","authors":"Luyan Wang , Zhongkang Zhou , Xiaochun Chen , Wei Liu , Yangqian Ye , Jianjia Shen , Qiangqiang Liao","doi":"10.1016/j.tsf.2025.140689","DOIUrl":"10.1016/j.tsf.2025.140689","url":null,"abstract":"<div><div>The corrosion inhibition effects of a compound containing chlorothiazole and imidazole structures, 1-[(2‑chloro-5-thiazolyl)-methyl]-4,5-dihydro-N-nitro-1H-imidazol-2-amine (IMT), were investigated on copper and 45# carbon steel in 1.0 M HCl solution. The corrosion inhibition behavior was explored by various technical means such as weight loss analysis, electrochemical impedance spectroscopy (EIS), X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), quantum chemical analysis (QCA), and molecular dynamics simulation (MDS). The results show that the corrosion inhibition efficiencies at a concentration of 2 mM IMT reach 98.71 % and 98.85 % for copper and carbon steel, respectively. IMT acts as a mixed corrosion inhibitor, effectively slowing down cathodic and anodic reactions. The adsorption of IMT follows the Langmuir isotherm, with a mix of chemisorption and physisorption. Theoretical calculations display a frontier molecular orbital energy gap (Δ<em>E</em>) of 4.178 eV and a dipole moment (<em>μ</em>) of 4.562 D, highlighting the strong electron donor-acceptor capability of IMT. Molecular dynamics results further confirm the effective electronic interactions of IMT on the copper (iron) surface. Compared with conventional inhibitors, IMT demonstrates excellent inhibition performance due to its unique structure including chlorothiazolyl and imidazolyl ring. These structures enhance the interaction of IMT with the target metals and improve its corrosion inhibition efficiency.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"822 ","pages":"Article 140689"},"PeriodicalIF":2.0,"publicationDate":"2025-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143904035","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Interfacial roughness study of N2 reactive sputtered Ti/Ni neutron supermirrors by neutron reflection technique 用中子反射技术研究N2反应溅射Ti/Ni中子超镜的界面粗糙度

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-24 DOI: 10.1016/j.tsf.2025.140690

Yue Zhang , Xinxi Li , Qian Qiu , Zhong Zhang , Bo Dai , Yong Ren

{"title":"Interfacial roughness study of N2 reactive sputtered Ti/Ni neutron supermirrors by neutron reflection technique","authors":"Yue Zhang , Xinxi Li , Qian Qiu , Zhong Zhang , Bo Dai , Yong Ren","doi":"10.1016/j.tsf.2025.140690","DOIUrl":"10.1016/j.tsf.2025.140690","url":null,"abstract":"<div><div>Neutron supermirror is an important neutron optics component which uses the total reflection principle to transport neutron beams. The formation of interface intermetallics and interface roughness with total multilayer thickness limit the neutron reflectivity performance of Ti/Ni multilayers. The interface roughness of multilayer film was optimized by adjusting the ratio of N<sub>2</sub> when sputtering the Ni layers, which ultimately guided the preparation of Ti/Ni neutron supermirrors with improved reflectivity. Direct current reactive magnetron sputtered samples were prepared with different N<sub>2</sub> ratios. And the surface morphology was studied by atomic force microscope (AFM), which revealed that 10 % N<sub>2</sub> inhibited the roughness growth of film by refining grains. The results of interfacial structure observed by neutron reflectivity were consistent with the AFM, that the average interfacial roughness of the film was minimized at 10 % N<sub>2</sub> ratio. The magnetization strength measured by vibrating sample magnetometer was affected by the number of bilayers and the N<sub>2</sub> ratio of the magnetic material. Finally, the Ni layers were sputtered with 10 % ratio of N<sub>2</sub>, which resulted in a 2.7 % reflectivity enhancement compared to m = 2 Ti/Ni supermirror with pure Ar in the q range of 0.03–0.04 Å<sup>-1</sup>.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"821 ","pages":"Article 140690"},"PeriodicalIF":2.0,"publicationDate":"2025-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143882606","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Deposition of copper/polymer composite thin film using atmospheric pressure plasma 常压等离子体沉积铜/聚合物复合薄膜

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-21 DOI: 10.1016/j.tsf.2025.140686

Paul Lottin , Dominique Debarnot , Jean-François Coulon

引用次数: 0

Fabrication of highly homogeneous metal films for hemispherical resonators by a 3D mask based on a sputter-coating process 基于溅射镀膜工艺的三维掩模制备半球形谐振器高均匀金属薄膜

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-20 DOI: 10.1016/j.tsf.2025.140684

Feng Zhu, Jia Liu, Chen Liao, Xuezhong Wu, Yan Shi, Xiang Xi

{"title":"Fabrication of highly homogeneous metal films for hemispherical resonators by a 3D mask based on a sputter-coating process","authors":"Feng Zhu, Jia Liu, Chen Liao, Xuezhong Wu, Yan Shi, Xiang Xi","doi":"10.1016/j.tsf.2025.140684","DOIUrl":"10.1016/j.tsf.2025.140684","url":null,"abstract":"<div><div>The metal film of fused silica resonators is critical for electrostatic driving and detection in hemispherical resonator gyroscope (HRG). The circumferential and radial inhomogeneities of the deposited metal film considerably reduce the homogeneity of the resonator damping, leading to an inhomogeneous Q-factor in the HRG. In this paper, we propose a high-uniformity coating method for fused silica HRG based on a magnetron sputtering coating process combined with a 3D mask. First, the deposition rate of the metal film on the HRG is modeled and the simulation results are presented. A 3D mask is then designed based on the simulation results to improve the homogeneity of the metal film on the inner surface of the resonator by adjusting the passage rate of the sputtered atoms. Subsequently, a hemispherical device is designed to measure the film thickness and the theoretical model is tested. The radial inhomogeneity of the resonator film deposition is reduced from 11.9 % to 3.5 %. Finally, the damping parameters of the hemispherical resonator are tested. Compared to the conventional coating process, the damping inhomogeneity of the hemispherical resonator generated by the sputtering coating process is increased by only 0.5 %, while the Q-factor loss is 18.1 % less than that of the conventional process.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"821 ","pages":"Article 140684"},"PeriodicalIF":2.0,"publicationDate":"2025-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143859349","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Silver emulsion films with isotropic mechanical properties and hydrophilic porous surface 具有各向同性力学性能和亲水多孔表面的银乳液膜

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-20 DOI: 10.1016/j.tsf.2025.140685

V.V. Bocharov , V.S. Sulyaeva , M.M. Syrokvashin , A.N. Kolodin

{"title":"Silver emulsion films with isotropic mechanical properties and hydrophilic porous surface","authors":"V.V. Bocharov , V.S. Sulyaeva , M.M. Syrokvashin , A.N. Kolodin","doi":"10.1016/j.tsf.2025.140685","DOIUrl":"10.1016/j.tsf.2025.140685","url":null,"abstract":"<div><div>Optically active films based on Ag nanoparticles stabilised by sodium bis(2-ethylhexyl)sulfosuccinate (<strong>AOT</strong>) were prepared by the dip-coating method. It was experimentally found that variation of the substrate immersion number allowed one to control the surface properties of the prepared films. The values of the surface roughness, the pore depth, the contact angle, and the adhesion work vary within a wide range from 1.1 ± 0.5 to 20.9 ± 1.7 nm, 25±6 to 37±7 nm, 37±4 to 18±5°, and 2.5 ± 0.1 to 32±1 J∙m<sup>-2</sup>, respectively. A comprehensive study using X-ray energy dispersive analysis, X-ray photoelectron spectroscopy, and UV–Vis spectroscopy showed that the prepared films exhibited a complex chemical composition. The films are formed by the silver nanoparticles encapsulated in the AOT layer. The numerical concentration and the linear size of the encapsulated nanoparticles grow with an increase of the substrate immersion number. Due to the presence of hydrophilic properties as well as a stable plasmonic effect, the obtained films can be considered as a promising material for the development of surface plasmon resonance sensor devices with liquid contact.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"821 ","pages":"Article 140685"},"PeriodicalIF":2.0,"publicationDate":"2025-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143882605","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Environment-controlled agglomeration in nanoporous Ag films with ultrathin silicon oxide 超薄氧化硅纳米多孔银膜的环境控制团聚

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-16 DOI: 10.1016/j.tsf.2025.140683

Dawoon Jung , Sehoon Hwang , Hyun-Jong Kim , Sungho Yun , Jae-Hee Han , Ho-Nyun Lee

{"title":"Environment-controlled agglomeration in nanoporous Ag films with ultrathin silicon oxide","authors":"Dawoon Jung , Sehoon Hwang , Hyun-Jong Kim , Sungho Yun , Jae-Hee Han , Ho-Nyun Lee","doi":"10.1016/j.tsf.2025.140683","DOIUrl":"10.1016/j.tsf.2025.140683","url":null,"abstract":"<div><div>Silver (Ag) nanostructures have been employed extensively in various applications, including plasmonic devices, metamaterials, and optical devices. This is attributed to their low cost, high catalytic activity, low loss in the visible and near-infrared regions. However, the thin films and nanoparticles of Ag are susceptible to agglomeration and recrystallization, which reduces surface energy and internal stress. This study examines the phenomenon of agglomeration in nanoporous Ag films under a range of atmospheric conditions over an extended period. The Ag films were prepared by gas flow sputtering (GFS) and subsequently subjected to aging under different environments and humidity levels, including air, vacuum, dry air, and nitrogen (N<sub>2</sub>). To suppress Ag agglomeration and analyze the samples under each aging condition, a 2 nm-thick silicon oxide capping layer was applied. The surface morphology, particle area, crystallite size, and chemical bonding states were analyzed. The findings indicated that humidity facilitated the agglomeration of Ag particles, whereas silicon oxide effectively impeded the growth of Ag particles by hindering surface diffusion. Furthermore, surface-enhanced Raman scattering (SERS) analysis indicated that the application of a silicon oxide coating effectively controls the aggregation of the nanoparticle size and enhances the stability of Ag-based SERS substrates.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"821 ","pages":"Article 140683"},"PeriodicalIF":2.0,"publicationDate":"2025-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143854787","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Van der Pauw device for mobility measurement in organic semiconductors 用于有机半导体迁移率测量的范德堡装置

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-15 DOI: 10.1016/j.tsf.2025.140682

Gabriel Volkweis Leite, Henri Boudinov

{"title":"Van der Pauw device for mobility measurement in organic semiconductors","authors":"Gabriel Volkweis Leite, Henri Boudinov","doi":"10.1016/j.tsf.2025.140682","DOIUrl":"10.1016/j.tsf.2025.140682","url":null,"abstract":"<div><div>In this work, a Van der Pauw device was developed using photolithography to measure the carrier mobility of organic semiconductors. This device performs four-point measurements, minimizing the influence of contact resistance between the organic semiconductor and the metal contacts. Nickel contacts and SiO<sub>2</sub> gate dielectric were used. The device was fabricated on a Si wafer, which also serves as the device's gate. A thin layer of SiO₂ was created on the Si wafer before depositing the organic semiconductor, acting as the gate dielectric. The semiconductor used was Poly(3-hexylthiophene-2,5-diyl), which was deposited by spin coating. Theoretical modeling was performed using Van der Pauw theory along with a compact DC model for organic transistors. First-order approximations showed that by varying the gate voltage, the sheet conductance exhibited a linear dependence on the difference between the gate voltage and the average voltage of the measurement electrodes. Measurements were performed using a parameter analyzer, applying different gate voltages and current injections, with corresponding voltage values being measured. From the measured data, the values of sheet conductance and mobility were extracted. The mobility values obtained ranged from 0.1 to 0.5 cm²/(V.s), which are consistent with those reported in the literature using other methods. However, the results suggest that mobility values obtained by other methods may be underestimated due to the influence of contact resistance.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"820 ","pages":"Article 140682"},"PeriodicalIF":2.0,"publicationDate":"2025-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143843016","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Environmentally friendly synthesis and characterization of CuInS₂ thin films via electrostatic spray deposition of nanocolloids 静电喷雾沉积纳米胶体的CuInS 2薄膜的环保合成与表征

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-14 DOI: 10.1016/j.tsf.2025.140681

Mahsa Yadolahi , Yaser Vahidshad , Seyed Mohammad Mirkazemi , Somaye Alamalhoda

{"title":"Environmentally friendly synthesis and characterization of CuInS₂ thin films via electrostatic spray deposition of nanocolloids","authors":"Mahsa Yadolahi , Yaser Vahidshad , Seyed Mohammad Mirkazemi , Somaye Alamalhoda","doi":"10.1016/j.tsf.2025.140681","DOIUrl":"10.1016/j.tsf.2025.140681","url":null,"abstract":"<div><div>This study investigates the process parameters for electrostatic spray deposition of a stable colloid derived from copper indium sulfide composition. The research evaluates the influence of coating parameters on film deposition, structure, microstructure, and optical absorption properties. Analytical techniques including optical microscopy, scanning electron microscopy, X-ray diffraction, and ultraviolet-visible spectroscopy were employed. CuInS₂ colloid was deposited using the electrospray method with applied voltages of 24, 26, and 28 kV, flow rates of 1, 2, and 3 µL/min, and nozzle-to-substrate distances of 60, 80, and 100 mm onto fluorine-doped tin oxide glass substrates. Post-deposition, heat treatment at 500 °C was conducted to enhance crystallinity and adhesion, with sulfur powder added to ensure positive sulfur vapor pressure and prevent sulfur loss. Microstructural analysis via optical microscopy, scanning electron microscopy, and field-emission scanning electron microscopy identified best deposition conditions: 26 kV voltage, 2 µL/min flow rate, and an 80 mm nozzle-to-substrate distance, producing a uniform 1 µm-thick layer. The CuInS₂ layer exhibited strong visible light absorption, with an absorption edge at 760 nm and an energy gap of 1.5 eV.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"820 ","pages":"Article 140681"},"PeriodicalIF":2.0,"publicationDate":"2025-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143838912","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Hydrogen absorbing multilayers as switchable metamaterials 作为可切换超材料的吸氢多层材料

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-12 DOI: 10.1016/j.tsf.2025.140679

Daniel E. Azofeifa, Neville Clark, William E. Vargas, Esteban Bermúdez-Ureña

引用次数: 0

CrRu-X (X=VN, TiN, ZrN) seed layers effects on the epitaxial growth and magnetic properties of FePt-based films CrRu-X （X=VN, TiN, ZrN）种子层对fept基薄膜外延生长和磁性能的影响

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-04-07 DOI: 10.1016/j.tsf.2025.140672

Jai-Lin Tsai , Tsung-Yi Chen , Ming-Wei Hsieh , Cheng-Yu Tsai , Mau-Tin Lin , Hsin-Hau Huang

{"title":"CrRu-X (X=VN, TiN, ZrN) seed layers effects on the epitaxial growth and magnetic properties of FePt-based films","authors":"Jai-Lin Tsai , Tsung-Yi Chen , Ming-Wei Hsieh , Cheng-Yu Tsai , Mau-Tin Lin , Hsin-Hau Huang","doi":"10.1016/j.tsf.2025.140672","DOIUrl":"10.1016/j.tsf.2025.140672","url":null,"abstract":"<div><div>For heat-assisted magnetic recording media, each functional film, such as the underlayer/seed layer/heat-sink layer deposited on the amorphous soft magnetic underlayer/glass substrate, was required to grow epitaxially to promote the formation of (00L) textured FePt film. The Cr-based seed layer with (002)/[110] epitaxial orientation is essential for the growth of the MgO-based underlayer and the FePt perpendicular magnetic recording film. Here, the varied nitrides, VN, TiN, or ZrN, were further doped in the CrRu seed layer to modify the interface between the CrRu and MgTiON layer. For CrRu-<em>X</em> (<em>X</em>= TiN, ZrN) films, the Ti and Zr atoms were substituted in the CrRu lattice, which is evidenced in the lower diffraction angle (higher lattice constant) in the (002) plane, and the growth defects in the MgTiON layer can be improved due to smaller lattice misfit. In contrast, the lattice constant of CrRu-VN was close to the reference CrRu film because part of the VN was diffused up to the MgTiON layer and formed the bumpy morphology of grains, proved by the cross-sectional transition electron microscopy images and compositional analysis—the grain size and surface energy change when the VN presents around the MgTiON matric. The FePt (BN, Ag, C) film deposited on MgTiON/CrRu-VN shows the highest perpendicular magnetic anisotropy constant (K<sub>u</sub>) with the value of 2.36 × 10<sup>6</sup> J/m<sup>3</sup>, out of plane coercivity (H<sub>c</sub>= 2013 kA/m) and lowest remanence ratio (0.187) which is the ratio between in-plane remanence and out-of-plane remanence from hysteresis loops. The nitride-doped CrRu-<em>X</em> seed layer affected the magnetic and microstructural of FePt (BN, Ag, C) film via diffused VN in the MgTiON lattice or minor lattice strain during thin film growth in MgTiON/CrRu-<em>X</em> (<em>X</em>= TiN, ZrN) system.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"820 ","pages":"Article 140672"},"PeriodicalIF":2.0,"publicationDate":"2025-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143808556","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0