Polarization evolution in ferroelectric thin films at different electrode interfaces without strain

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Sirui Zhang, Puqi Hao, Borui Wang, Shuaibing Gao, Fei Yan, Min Liao
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Abstract

Ferroelectric materials show significant potential for application in ferroelectric random access memory, sensors, and transducers. With the demand for electronic devices scaling down in size, ferroelectrics are being increasingly produced as nanoscale films. However, in ultrathin films, polarization tends to decrease significantly due to depolarization fields caused by incomplete charge screening at the interfaces, which poses challenges for their integration into electronic devices. To address this, we investigated the effects of different electrode and film interfaces, including Nb:SrTiO3/PbTiO3 (Nb:STO/PTO), SrRuO3/PbTiO3 (SRO/PTO), La0.7Sr0.3MnO3/PbTiO3 (LSMO/PTO), and LaCoO3/PbTiO3 (LCO/PTO). Using aberration-corrected scanning transmission electron microscopy, we analysed these interfaces and found that the PTO films grown on the LSMO and LCO electrode exhibited a sharp increase in polarization, while the PTO film grown on SRO exhibited a marked decrease. Consequently, LSMO/PTO was proven to have the highest polarization, followed by Nb:STO/PTO, with SRO/PTO having the lowest. This behaviour was further confirmed through piezoresponse force microscopy. These findings indicate that ferroelectric polarization at epitaxial interfaces can be fine-tuned through atomic-level control of the interface structure, yielding possibilities for designing nanoscale ferroelectric devices with interfacial properties.
铁电薄膜在不同电极界面下的极化演化
铁电材料在铁电随机存储器、传感器和换能器中显示出巨大的应用潜力。随着对电子器件尺寸的需求不断缩小,铁电体越来越多地被制成纳米级薄膜。然而,在超薄膜中,由于在界面处不完全的电荷筛选引起的去极化场,极化倾向于显著降低,这对其集成到电子器件中提出了挑战。为了解决这个问题,我们研究了不同电极和薄膜界面的影响,包括Nb:SrTiO3/PbTiO3 (Nb:STO/PTO), SrRuO3/PbTiO3 (SRO/PTO), La0.7Sr0.3MnO3/PbTiO3 (LSMO/PTO)和LaCoO3/PbTiO3 (LCO/PTO)。利用像差校正扫描透射电镜对这些界面进行了分析,发现在LSMO和LCO电极上生长的PTO膜的极化率急剧增加,而在SRO上生长的PTO膜的极化率明显下降。结果表明,LSMO/PTO的极化率最高,Nb:STO/PTO次之,SRO/PTO极化率最低。通过压响应力显微镜进一步证实了这种行为。这些发现表明,外延界面上的铁电极化可以通过对界面结构的原子级控制来微调,从而为设计具有界面特性的纳米级铁电器件提供了可能。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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