Thin Solid Films最新文献

{"title":"N,S co-doping of VO2 films with enhancing luminous transmittance and investigation of phase transition","authors":"Lele Fan ,&nbsp;Chen Chen ,&nbsp;Lei Zhu ,&nbsp;Qinfang Zhang","doi":"10.1016/j.tsf.2025.140639","DOIUrl":"10.1016/j.tsf.2025.140639","url":null,"abstract":"<div><div>Vanadium dioxide (VO₂), known for its phase transition properties, is a promising candidate for thermochromic applications. However, its high phase transition temperature and low visible light transmittance restrict its applicability. To overcome these challenges, we propose a co-doping strategy in this study. Using a simple annealing technique, we synthesize N,S co-doped VO₂ films that exhibit phase transition at ambient temperature. Optical evaluations reveal a substantial improvement, with a 24.3 % increase in luminous transmittance for the co-doped films compared to undoped VO₂ films. Furthermore, we conducted first-principles calculations to investigate the effects of S and N dopants on the electronic structure of VO₂, offering valuable insights into how these dopants influence the phase transition process. These results offer an alternative approach to enhance the optical properties of VO₂ and contribute to a deeper understanding of its phase transition mechanisms.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140639"},"PeriodicalIF":2.0,"publicationDate":"2025-03-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549150","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Microstructure and oxidation behavior of Alx(CrFeCoCuNi)100–x composition spread thin film","authors":"Xiaoyi Liu,&nbsp;Pei Yuwen,&nbsp;Ruixin Pan,&nbsp;Chungen Zhou","doi":"10.1016/j.tsf.2025.140645","DOIUrl":"10.1016/j.tsf.2025.140645","url":null,"abstract":"<div><div>Al_x(CrFeCoCuNi)_100–x thin film was fabricated by the magnetron co-sputtering. The microstructures of the high entropy alloy (HEA) film before and after the high temperature oxidation at 950 °C for 1.5 h were investigated. A combinatorial library of the film with the concentration of Al ranging from 10 to 40 at % is achieved. The structure of the film transforms from face-centered cubic (FCC) to body-centered cubic (BCC) with the increasing Al content. Three distinct regions of oxides are identified across the oxidized film from the low to high Al content regions. The critical Al concentration for the establishment of a passivating Al₂O₃ scale is determined.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140645"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549151","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Mechanistic insights into the formation of phase pure V2O5 2D nanostructures: Advanced fourier transform-raman spectroscopy analysis","authors":"Shrivathsa V S ,&nbsp;Shounak De ,&nbsp;Shubhava Shetty ,&nbsp;Deekshitha K ,&nbsp;Yuvaraj A R ,&nbsp;Jayarama A ,&nbsp;Shriganesh Prabhu ,&nbsp;Richard Pinto","doi":"10.1016/j.tsf.2025.140642","DOIUrl":"10.1016/j.tsf.2025.140642","url":null,"abstract":"<div><div>Vanadium Pentoxide (V₂O₅) thin films and 2-Dimensional nanostructures have gained significant attention for their unique properties and diverse applications in gas sensing, energy storage, catalysis, and electrochromic devices. Despite their potential, a comprehensive understanding of their growth dynamics remains limited. This study offers a detailed exploration of the synthesis and properties of phase-pure V₂O₅ thin films and their nanostructures using a combination of solution combustion synthesis and spray pyrolysis deposition. The Aqueous Combustion Mixtures (ACM) were prepared using ammonium metavanadate and urea as precursor solutions, which were used to deposit V₂O₅ using the spray pyrolysis technique at temperatures ranging from 200°C to 550°C. Advanced characterization techniques, including Field Emission Scanning Electron Microscopy, X-Ray Diffraction, and Fourier Transform Raman Spectroscopy, were employed to analyze the films. The results revealed that films synthesized at 400°C exhibited exceptional crystallinity, microstructural integrity, and phase purity. At higher temperatures, a meta-stable β-V₂O₅ phase was also observed. This research bridges a critical gap in the existing literature by enhancing the understanding of the growth mechanisms of V₂O₅ thin films and their nanostructures, thereby facilitating the optimized formation of high-quality V₂O₅ nanostructures for advanced technological applications.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140642"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549153","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"The encaging of cobalt interconnect lines with an ordered amino-based self-assembled monolayer for electromigration mitigation using an all-wet electroless process","authors":"Jau-Shiung Fang ,&nbsp;Wei Lee ,&nbsp;Yi-Lung Cheng ,&nbsp;Chih-I Lin ,&nbsp;Giin-Shan Chen","doi":"10.1016/j.tsf.2025.140644","DOIUrl":"10.1016/j.tsf.2025.140644","url":null,"abstract":"<div><div>A self-assembled monolayer (SAM) encaging Cu interconnects as a barrier layer has been well developed to enhance thermal stability and electromigration (EM) reliability for interconnect metallization. However, the SAM-encapsulated and associated electromigration behaviors of interconnects of Co, an interconnecting material for sub-10-nm technology nodes, have yet to be evaluated. In this study, an all-wet electroless trench-filling process is presented to fabricate interconnect lines of SAM-encapsulated Co for the evaluation of their EM characteristics, using unsealed Co lines as a control. Empirical data obtained from accelerated bias-stressing tests, including EM failure lifetimes, current-density scaling factors, and activation energies, consistently show that electromigration reliability of the Co lines is markedly enhanced by the SAM encapsulation. The mechanical properties measured by nanoscratch testing reveal that the enhancement of adhesion between Co and SiO₂ through the SAM encapsulation strongly contributes to the superior EM mitigation by preventing interfacial diffusion. The adhesion strength and Joule-heating data of the Co and Co(SAM) lines are provided for the discussion of the difference in their electromigration performance and failure mechanism. Correlations between mechanical properties and EM characteristics of the electrolessly-plated Co as an interconnect material are also given.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140644"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549152","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Enhanced self-cleaning efficiency of photovoltaic solar panels using Ti|TiOx|TiO2 nanofilms from pulsed direct current magnetron sputtering plasma","authors":"Maurício Marlon Mazur ,&nbsp;Emerson Luís Alberti ,&nbsp;Kleber Franke Portella ,&nbsp;Mariana D'Orey Gaivão Portella Bragança ,&nbsp;Viviane Teleginski Mazur ,&nbsp;Sidnei Antônio Pianaro","doi":"10.1016/j.tsf.2025.140641","DOIUrl":"10.1016/j.tsf.2025.140641","url":null,"abstract":"<div><div>Self-cleaning Ti|TiO_x|TiO₂ nanofilms thermally annealed at 400 °C were generated on soda-lime glass for application on photovoltaic solar panel glass surfaces using the pulsed direc current magnetron sputtering plasma. Parameters such as deposition time, atmosphere, target type and distance from substrate were optimized. The properties depended on the deposition time (10 to 300 s), with average growth rates of (0.46 ± 0.05) nm/s. Sheet resistivity decreased from 10⁷ Ω.□^-1 for the 10 s, to 25 Ω.□ ^-1 for the 300 s, due to a metallic interface between stoichiometric and non-stoichiometric oxides. The nanofilms were hydrophilic, with contact angles&lt; 45°. For depositions up to 120 s, the nanofilms did not interfere with direct light transmittance and produced a self-cleaning effect, resulting in an average transmittance of (92 ± 1)% after 1 year of field exposure on the floating solar photovoltaic island FPV-SC, Paraná, Brazil, compared to (79 ± 7)% for the reference sample.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140641"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143563585","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Simulation of the stress distribution in diamond coatings applied by chemical vapor deposition on martensitic stainless steel X46Cr13 with a deterministic surface microstructure","authors":"Richard Börner ,&nbsp;Thomas Helmreich ,&nbsp;Maximilian Göltz ,&nbsp;Nithin Kumar Bandaru ,&nbsp;Philipp Steinert ,&nbsp;Ingo Schaarschmidt ,&nbsp;Stefan Rosiwal ,&nbsp;Andreas Schubert","doi":"10.1016/j.tsf.2025.140646","DOIUrl":"10.1016/j.tsf.2025.140646","url":null,"abstract":"<div><div>Diamond coatings are widely used in tribology for their exceptional mechanical, thermal, and chemical properties. Combining these advantages with the versatility of steel, the most common technical metal, presents challenges such as graphite formation, carbon diffusion, and residual stresses from thermal expansion mismatches during high-temperature coating processes.</div><div>To address these, an intermediate layer is applied, and stress management techniques are employed. One method involves machining deterministic microstructures on the steel substrate using ultrasonic vibration superimposed machining. Polycrystalline diamond coatings are then applied to martensitic stainless steel X46Cr13 with a titanium nitride (TiN) intermediate layer using chemical vapor deposition as application technique for both coatings.</div><div>Finite element analysis in Abaqus simulates stress generation during cooling, incorporating material data from dilatometer measurements. Simulations explore variations in diamond coating thickness, structural heights, and distances, assessing their impact on hydrostatic stresses.</div><div>Results, validated by Raman measurements, reveal compressive residual stresses across all cases, with a maximum of -7 GPa on nearly flat surfaces and values closer to zero for rougher surfaces. This confirms that microstructured substrates significantly reduce residual stresses. The model is most accurate when the diamond coating thickness equals or is up to three times the structural height.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140646"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549038","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Effect of structural distortion on the metal-insulator transition in Ar+-implanted VO2 thin films","authors":"O.F. Kolomys,&nbsp;D.M. Maziar,&nbsp;V.V. Strelchuk,&nbsp;P.M. Lytvyn,&nbsp;V.P. Melnik,&nbsp;B.M. Romanyuk,&nbsp;O.Y. Gudymenko,&nbsp;O.V. Dubikovskyi,&nbsp;O.I. Liubchenko,&nbsp;O.A. Kulbachinskiy","doi":"10.1016/j.tsf.2025.140643","DOIUrl":"10.1016/j.tsf.2025.140643","url":null,"abstract":"<div><div>The structural, optical, morphological, and electrical properties of VO₂ films implanted with Ar⁺ ions were studied using Atomic-force microscopy (AFM), X-ray diffraction (XRD), Raman spectroscopy, and electrical resistivity measurements. AFM studies of surface morphology revealed that with an increased dose of Ar⁺ implantation, the roughness of the surface nanorelief nearly doubled, and the homogeneity of the structured grain arrangement improved. XRD studies indicated that a higher dose of Ar⁺ implantation reduces the degree of angular distortion of the VO₂ unit cell, attributable to an increase in the concentration of point defects at the film/substrate heterointerface and relaxation of lattice mismatch strains. Using temperature-dependent micro-Raman spectroscopy, the regularities of changes in the frequencies of characteristic vibrations of the long and short V-V dimers along the <em>c</em>-axis of VO₂(M1), the V-V tilting vibrations nearly perpendicular to the <em>c</em>-axis, and the V-O bond stretching vibrations in the oxygen VO₆ octahedron were determined. The strain ε_а along the V-V chain decreases, accompanied by an increase in the length of V-V bonds. The most significant changes in the lengths of L₂ and L₅ bonds were observed, as evidenced by the rise in the compression strain ε_с along the <em>c</em>_M1 axis. Raman and electrical studies of VO₂ nanocrystalline films demonstrated that the observed coexistence of two structural phases (monoclinic and tetragonal) during the metal-insulator transition (MIT) is due to size dispersion and inhomogeneity in strain distribution. A decrease in the temperature coefficient of resistance and the film resistance at room temperature at high implantation doses is explained by the formation of conductive (metallic) vanadium oxide phases. The changes in strain, crystallite size, and Ar⁺ implantation dose have been shown to lower the phase transition temperature of VO₂ to near room temperature, which is essential for their widespread application in functional devices.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140643"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549037","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Effect of deposition mode and pulse parameters on the mechanical and tribological properties of magnetron sputtered TiBx films","authors":"Alexander S. Grenadyorov,&nbsp;Sergey V. Rabotkin,&nbsp;Vladimir O. Oskirko,&nbsp;Igor M. Goncharenko,&nbsp;Vyacheslav A. Semenov,&nbsp;Konstantin V. Oskomov,&nbsp;Elizaveta O. Kraynova,&nbsp;Аndrey А. Solovyev","doi":"10.1016/j.tsf.2025.140640","DOIUrl":"10.1016/j.tsf.2025.140640","url":null,"abstract":"<div><div>The structural, mechanical and tribological properties of TiB_x films deposited by high-power impulse magnetron sputtering (HiPIMS) were characterized to understand the effect of pulse parameters, including pulse length (7‒170 μs) and peak target current density (0.44‒1.1 A cm^‒2), on the film properties. For comparison, the films are also obtained in direct current (dcMS) and mid-frequency (mfMS) sputtering modes. The films are deposited on WC-Co substrates from a TiB₂ target at an Ar pressure of 0.2 Pa, average discharge power of 500 W, substrate bias voltage of ‒65 V and a substrate temperature of 420 °C. The phase composition, mechanical (hardness, elastic modulus), and tribological (friction coefficient and wear rate) properties of TiB_x films were measured. The adhesion of the films was assessed using the scratch and Rockwell C indentation tests. It is shown that HiPIMS is a preferred technique for depositing high quality TiB_x films with improved mechanical and tribological properties and that the pulse parameters significantly influence the properties of the deposited films. TiB_x films deposited using optimal HiPIMS parameters (pulse length of 100 μs and peak target current density of 0.44 A cm^‒2) outperform those produced using dcMS and mfMS in terms of hardness and friction coefficient. All TiB_x films exhibit low wear rates (about 2 × 10^‒6 mm³H^‒1m^‒1) and good adhesion to the WC-Co substrate, regardless of the sputtering mode.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140640"},"PeriodicalIF":2.0,"publicationDate":"2025-02-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143519146","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Synthesis and characterization of aperiodic multifunctional AlN/Al2O3 nanomultilayers","authors":"Danielle E. White ,&nbsp;Koushik Jagadish ,&nbsp;Yu-Tsun Shao ,&nbsp;Andrea M. Hodge","doi":"10.1016/j.tsf.2025.140638","DOIUrl":"10.1016/j.tsf.2025.140638","url":null,"abstract":"<div><div>Optical-mechanical multifunctionality in ceramic nanomultilayered coatings is an area of research relatively unexplored. Particularly, layer aperiodicity has been shown to improve transmittance, where the effect on mechanical deformation remains unknown. Here, AlN/Al₂O₃ nanomultilayers are synthesized via sputtering with four unique, optically optimized aperiodic layer structures with a minimum ultraviolet-visible-near-infrared transmittance of 90% and with an Al₂O₃ volume fraction ranging from 30% to 73%. Deformation was explored at different length scales, revealing the effect of local volume fraction and individual layer thicknesses within the aperiodic structure. It was determined that the deformation behavior is correlated to the local AlN or Al₂O₃ volume fraction within a given layer stack, where individual layer thickness and adjacent layer interactions were shown to affect crack propagation.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140638"},"PeriodicalIF":2.0,"publicationDate":"2025-02-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143519145","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Empowering TiO2:ZrO2 composite for energy storage through chemical beam vapor deposition","authors":"Md Kashif Shamim ,&nbsp;William Maudez ,&nbsp;Estelle Wagner ,&nbsp;Seema Sharma ,&nbsp;Radheshyam Rai ,&nbsp;Giacomo Benvenuti ,&nbsp;Rashmi Rani","doi":"10.1016/j.tsf.2025.140628","DOIUrl":"10.1016/j.tsf.2025.140628","url":null,"abstract":"<div><div>Nanocomposite TiO₂:ZrO₂ thin films were deposited using the Chemical Beam Vapour Deposition technique with a combinatorial approach, allowing for rapid scanning of multiple parameters on a single substrate. The films were carefully studied for their structural, morphological, and dielectric properties with respect to different element compositions (∼80:20, ∼70:30, and ∼60:40 (Ti:Zr) atomic %). The X-ray diffraction measurements showed the presence of TiO₂ anatase phase, ZrO₂ tetragonal phase and ZrTiO₄ orthorhombic phase, which was further confirmed by Raman analysis. Atomic Force Microscopy and Field Emission Scanning Electron Microscopy revealed homogeneous morphology for all the composite films. Notably, the ∼60:40 (Ti:Zr) atomic %) nanocomposite thin film exhibited a high dielectric constant (up to ∼73), high ionic conductivity (up to 10^–1 S/cm), and low leakage current density (down to ∼4.4 × 10^–7 A/cm² at 1.2 V), making it an attractive material for energy storage applications in the future.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140628"},"PeriodicalIF":2.0,"publicationDate":"2025-02-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143487880","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}