脉冲激光沉积Cr2O3薄膜的显微组织和硬度

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2025-07-19 DOI:10.1016/j.tsf.2025.140749

Xiang Li , Tingting Yao , Yixiao Jiang , Ang Tao , Xuexi Yan , Zhiqing Yang , Hengqiang Ye , Chunlin Chen

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引用次数: 0

摘要

用x射线衍射、原子力显微镜、透射电镜和纳米压痕技术对脉冲激光沉积在SrTiO3（111）、Al2O3（0001）和Al2O3（112）基体上的Cr2O3薄膜的微观结构和硬度进行了表征。显微结构表征表明，Cr2O3薄膜表现为定向生长，但存在不同的缺陷。（0001） Cr2O3/SrTiO3薄膜具有高密度的纳米孪晶，而这两种类型的Cr2O3/Al2O3薄膜都含有大量的层错。纳米压痕试验表明，（0001）Cr2O3/SrTiO3薄膜的硬度为38.5 GPa，高于（0001）Cr2O3/Al2O3薄膜的硬度（36.2 GPa），表明纳米孪晶比层错对硬度的提高更大。（112¯0）Cr2O3/Al2O3薄膜的硬度最低，为31.7 GPa，表明薄膜的生长取向对硬度也有很大影响。研究结果表明，Cr2O3薄膜的硬度可以通过薄膜中存在的缺陷及其生长方向来调控，从而为高性能Cr2O3薄膜的发展提供了科学依据和技术支持。

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Microstructure and hardness of Cr2O3 films grown by pulsed laser deposition

The microstructure and hardness of Cr₂O₃ films deposited on SrTiO₃ (111), Al₂O₃ (0001) and Al₂O₃ (11

\overline{2}

0) substrates by pulsed laser deposition have been characterized by X-ray diffraction, atomic force microscopy, transmission electron microscopy, and nanoindentation techniques. Microstructural characterizations revealed that the Cr₂O₃ films exhibited orientated growth but with different defects. The (0001) Cr₂O₃/SrTiO₃ film has a high density of nanotwins, whereas both types of Cr₂O₃/Al₂O₃ films contain numerous stacking faults. The nanoindentation tests showed that the (0001) Cr₂O₃/SrTiO₃ film had a hardness of 38.5 GPa, which is higher that of the (0001) Cr₂O₃/Al₂O₃ film (36.2 GPa), This indicates that the nanotwins enhance hardness more than the stacking faults. The (11

\bar{2}

0) Cr₂O₃/Al₂O₃ film exhibited the lowest hardness of 31.7 GPa, indicating that the growth orientation of the films also greatly influences hardness. The findings indicate that the hardness of Cr₂O₃ films can be regulated by the defects present in the films and their growth orientation, thereby providing scientific foundation and technical assistance for the advancement of high-performance Cr₂O₃ films.

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.