U. L. Mishigdorzhiyn, B. E. Markhadayev, A. P. Semenov, N. S. Ulakhanov, A. S. Milonov, K. A. Demin
{"title":"Development of a Kinetic Model of the Growth of Boroaluminized Diffusion Layers by Finding the Activation Energy from a Given Experimental Dependence","authors":"U. L. Mishigdorzhiyn, B. E. Markhadayev, A. P. Semenov, N. S. Ulakhanov, A. S. Milonov, K. A. Demin","doi":"10.1134/S1027451024702124","DOIUrl":"10.1134/S1027451024702124","url":null,"abstract":"<p>The thermal-chemical treatment of metals, such as boriding and boroaluminizing, significantly improve the performance properties of machine parts and tools by forming protective diffusion layers on the surface of products. The thickness of the resulting layers is one of the determining factors affecting the properties. To control layer growth, it is important to know the kinetic parameters that govern it during high-temperature holding. The problem of determining the activation energy of boron is considered in order to identify the growth kinetics and predict the thickness of the boroaluminized layer on steel 45. On the basis of experimental data, a model for calculating the activation energy and thickness of a diffusion layer, which characterize the kinetics of the boroaluminizing of the diffusion layer, is proposed. The activation energy of the formation of a boroaluminized layer in pastes on the surface of steel 45 is calculated according to the parabolic dependence of layer growth as a function of temperature and time.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S239 - S244"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638100","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Absorption and Scattering of Neutrons during Sub-Barrier Reflection from a Surface","authors":"Yu. V. Nikitenko","doi":"10.1134/S1027451024702264","DOIUrl":"10.1134/S1027451024702264","url":null,"abstract":"<p>When studying the interaction of neutrons with a force field, the important parameters are the neutron flux and the time the neutron stays in the measuring setup. To increase them, a neutron accumulator generated by a pulsed or continuously acting source can be used. Both parameters in a storage ring with material walls are determined by the probabilities of neutron capture by atomic nuclei and diffuse neutron scattering on the surface roughness of the walls. The task of definition of probabilities of neutron capture and scattering processes in the mirror reflection channel is considered. An imaginary potential of neutron interaction with the medium is introduced, which is responsible for the diffuse scattering of neutrons. Requirements for the wall roughness of the neutron storage ring are formulated.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S343 - S348"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638157","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. M. Strel’chuk, V. V. Kozlovski, G. A. Oganesyan
{"title":"Effect of Low-Dose Irradiation and Subsequent Isochronous Annealing on the Current-Voltage Characteristics of Silicon Carbide-Based Surface-Barrier Diodes","authors":"A. M. Strel’chuk, V. V. Kozlovski, G. A. Oganesyan","doi":"10.1134/S1027451024702239","DOIUrl":"10.1134/S1027451024702239","url":null,"abstract":"<p>A study was conducted on the effect of low-dose (~10<sup>16</sup> cm<sup>–2</sup>) irradiation with electrons with an energy of 0.9 MeV and subsequent isochronous annealing at temperatures up to 550°C on the current-voltage characteristics of commercial rectifier diodes based on 4H-SiC with a doping level of (3–7) × 10<sup>15</sup> cm<sup>–3</sup>. The previously established effect of increasing series resistance <i>R</i><sub>s</sub> of diodes under irradiation, the numerical value of the threshold dose of irradiation, and the effect of the spread of the value of <i>R</i><sub>s</sub> of identical diodes at the same dose of radiation have been confirmed. For the first time, isochronous annealing (without passing current during annealing) was performed at temperatures up to 550°C, significantly exceeding the maximum operating temperatures of the diodes. It has been shown that starting from temperatures ≥200°C the annealing of defects is observed, which is expressed in a decrease in the value of <i>R</i><sub>s</sub> at room temperature down to pre-irradiation values. Annealing also leads to a decrease in the reverse breakdown current.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S321 - S327"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638233","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
D. G. Reunov, A. D. Akhsakhalyan, E. I. Glushkov, I. G. Zabrodin, I. V. Malyshev, M. S. Mikhailenko, E. V. Petrakov, A. K. Chernyshev, N. I. Chkhalo
{"title":"Stand for Certification of X-ray Optical Elements and Systems for Synchrotron Applications","authors":"D. G. Reunov, A. D. Akhsakhalyan, E. I. Glushkov, I. G. Zabrodin, I. V. Malyshev, M. S. Mikhailenko, E. V. Petrakov, A. K. Chernyshev, N. I. Chkhalo","doi":"10.1134/S1027451024701842","DOIUrl":"10.1134/S1027451024701842","url":null,"abstract":"<p>The article describes an X-ray optical certification setup based on a microfocus X-ray tube, a Kirkpatrick-Baez (KB) collimating system, and a Gpixel2020BSI matrix semiconductor detector. To minimize X-ray beam scattering and intensity loss due to absorption in air, vacuum-tight tubes with compton windows are installed between the microfocus X-ray tube and the KB system, and between the KB system and the detector. Pumping is performed by an oil-free fore-vacuum pump. The setup that has been developed allows for studying the X-ray optical scheme of two-mirror monochromators to determine the deformation of the beam wave front at their outputs, and to calibrate the movement of high-precision mechanical tables. The setup also allows for studying the focusing properties of the Kirkpatrick-Baez system, itself, namely, measuring the size of the focus spot and calibrating the piezo-drives of the mirrors. As a result of adjusting the collimating system, we obtained a converging beam, but this did not prevent us from measuring the wave front broadening upon reflection from the substrates for a two-mirror monochromator. Two substrates made of single-crystal silicon Si(100) were studied. It was shown that upon reflection from the substrate after chemical-mechanical polishing (CMP) only, the reflected beam, due to mirror shape errors, broadened by 18 μm, while after chemical-mechanical polishing and correction of local shape errors using an ion beam, the broadening was reduced to 11 μm, which corresponds to an angular error of the mirror at a level of 3 μrad. This is 7 times less than the angular divergence of the beam at the output of the collimating system, due to the size of the radiation source.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S38 - S44"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638426","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. A. Barannikov, D. A. Zverev, I. I. Lyatun, I. B. Panormov, K. V. Rudenko, A. A. Snigirev
{"title":"Testing of X-ray Optics for Synchrotron Studies using a Laboratory Microfocus X-ray Source","authors":"A. A. Barannikov, D. A. Zverev, I. I. Lyatun, I. B. Panormov, K. V. Rudenko, A. A. Snigirev","doi":"10.1134/S1027451024701829","DOIUrl":"10.1134/S1027451024701829","url":null,"abstract":"<p>This paper considers techniques for testing X-ray optics in laboratory conditions before its direct use at synchrotron radiation sources. The example of the ‘SynchrotronLike’ complex demonstrates the capabilities of modern laboratory X-ray optical equipment for studying the optical and functional properties of refractive X-ray lenses, transfocators, and diamond monochromators. Moreover, the paper describes ways of realizing synchrotron coherent experimental techniques such as microradian X-ray diffraction and X-ray reflecto-interferometry in laboratory conditions. Applying the high-brightness Excillum MetalJet microfocus X-ray tube with a liquid anode enables experiments with several optical transformations and provides higher spatial coherence of the radiation compared to classical laboratory sources. The high coherence of the radiation allows for observing interference on thin films and test X-ray interferometers. The presented results demonstrate the capabilities of modern laboratory X-ray optical equipment in solving problems that do not require high temporal and energy resolution. It significantly saves resources spent on research based on synchrotron radiation sources when a lot of measurements and tests for optimization of X-ray optics fabrication technology are required.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S24 - S33"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638529","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Features of Magnetron Deposition by Sputtering Boron Target in Reactive Gases Medium","authors":"G. Yu. Yushkov, V. D. Gridilev, A. G. Nikolaev","doi":"10.1134/S1027451024701908","DOIUrl":"10.1134/S1027451024701908","url":null,"abstract":"<p>Boron-based coatings possess a number of useful properties and their synthesis is an important concern. These coatings can be produced by magnetron sputtering of a pure boron target in a reactive gas atmosphere such as oxygen, nitrogen, or acetylene. The use of a pure boron target in a conventional magnetron sputter system is difficult, because under normal conditions boron has high electrical resistivity of about 10 MΩ cm. However, since boron is a semiconductor material, its resistivity drops sharply with increasing temperature. A boron target, thermally insulated from the cooled magnetic system, can be gradually heated by the magnetron discharge to a temperature of 450–750°С and can sustain a stable discharge in a reactive gas or argon atmosphere. Using such a magnetron sputtering system, we have fabricated boron coatings in a reactive gas environment. Here we describe the properties of these coatings, their deposition rate, and the characteristics of the magnetron sputtering system.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S84 - S90"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638540","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
N. S. Ulakhanov, U. L. Mishigdorzhiyn, M. S. Vorobyov, A. P. Semenov, K. A. Demin, P. V. Moskvin, A. G. Tikhonov, A. E. Balanovskiy
{"title":"EBSD Characterization and Mechanical Properties of Boroaluminized Diffusion Layers on Surface of L6 Steel after Pulsed Electron Beam Processing","authors":"N. S. Ulakhanov, U. L. Mishigdorzhiyn, M. S. Vorobyov, A. P. Semenov, K. A. Demin, P. V. Moskvin, A. G. Tikhonov, A. E. Balanovskiy","doi":"10.1134/S1027451024701994","DOIUrl":"10.1134/S1027451024701994","url":null,"abstract":"<p>The process of modifying of boron- and aluminum diffusion layers properties on the surface of 5KhNM die steel by pulsed electron beam processing using an electron source with a plasma cathode based on a low-pressure arc discharge is considered. It was shown, using optical microscopy and electron backscatter diffraction methods, that the increase in the mechanical properties (microhardness and wear resistance) of the boroaluminized layer after electron beam processing is associated with a grain refinement and a phase redistribution, during which a concentration of the solid phase Fe<sub>2</sub>B occurs on the surface of the layer. It was found that the maximum microhardness on the surface of 5KhNM steel increases from 800 to 1400 HV and wear resistance improves by two times after electron beam processing.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S154 - S160"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638390","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. V. Sobachkin, V. Yu. Filimonov, M. V. Loginova, A. A. Sitnikov, V. I. Yakovlev, A. Z. Negodyaev, A. Yu. Myasnikov, A. A. Roznyj
{"title":"Thermal Modes of Synthesis in Mechanoactivated Powder Mixture Ti + Al","authors":"A. V. Sobachkin, V. Yu. Filimonov, M. V. Loginova, A. A. Sitnikov, V. I. Yakovlev, A. Z. Negodyaev, A. Yu. Myasnikov, A. A. Roznyj","doi":"10.1134/S1027451024701982","DOIUrl":"10.1134/S1027451024701982","url":null,"abstract":"<p>In the presented work, a study of thermal synthesis regimes in mechanically activated powder mixture of Ti + Al was carried out. The possibility of the reaction realization in a low-temperature mode (up to 700°C) in a relatively short time (about 30 min) has been established. In this case, the composition of the synthesis products is identical to the composition of the synthesis products carried out in the traditional thermal explosion mode at a maximum temperature of 1300°C. The possibility of a relatively fast reaction in a low-temperature regime is determined by solid-phase diffusion under favorable condition due to the large surface area of contact of the reagents and a low energy diffusion barrier.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S146 - S153"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
T. S. Argunova, V. G. Kohn, J.-H. Lim, V. M. Krymov, A. V. Ankudinov
{"title":"Study of the Surface Morphology and Inclusions of Heavy Metals in Basal-Faceted Sapphire Ribbons Using In-Line X-Ray Phase-Contrast Imaging","authors":"T. S. Argunova, V. G. Kohn, J.-H. Lim, V. M. Krymov, A. V. Ankudinov","doi":"10.1134/S1027451024701817","DOIUrl":"10.1134/S1027451024701817","url":null,"abstract":"<p>This study presents the results of research concerning microsteps on the surface and the inclusions of heavy metals in the volume of sapphire ribbons grown using Stepanov’s method. Basal-faceted sapphire ribbons exhibit a low density of steps, which are caused by small changes in the orientation of the growth surface or the thickness of the ribbon. Phase contrast imaging using synchrotron radiation is employed to study the defects. It is shown for the first time that the height of a step of 1 µm can be determined directly from the image. An analytical solution for the intensity distribution of the step in the case of fully coherent X-ray radiation is obtained. When the phase shift is small, there is a direct proportionality between contrast and step height, and the inverse problem is easily solved. The height obtained using the phase-contrast-imaging method is confirmed by measurements using atomic force microscopy. To analyze microinclusions, a computer simulation program is used, which allows for assessment of their sizes. We find that the experimental contrast matches the theoretical calculations only if the calculated intensity profile is convolved with a Gaussian function. The full width at half maximum of the Gaussian is independently obtained from preliminary measurements.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S16 - S23"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Ya. N. Savina, S. V. Ovchinnikov, R. R. Valiev, K. S. Selivanov
{"title":"Microstructure and Properties of Protective Ion-Plasma Coating on UFG Ti Alloy","authors":"Ya. N. Savina, S. V. Ovchinnikov, R. R. Valiev, K. S. Selivanov","doi":"10.1134/S1027451024701969","DOIUrl":"10.1134/S1027451024701969","url":null,"abstract":"<p>The paper presents results of comprehensive studies on a fine structure of TiVN ion-plasma protective coating deposited on a Ti–6Al–4V substrate with an ultrafine-grained (UFG) structure. This coating considerably improves the performance properties of critical products operating under high loads in aggressive environments. In the article special attention is paid to features of formation of coating layers and their phase composition with account of effect caused the substrate ultrafine-grained structure. It is established that TiVN functional coating has a layered structure with thin layers of dark and light colors, which can be formed at different ratios of Ti and V concentrations due to planetary rotation of substrates. The structure of a TiVN functional layer is columnar and has an average diameter of about 17 nm. Based on microdiffraction patterns of a TiVN layer, it is found that the reflexes correspond to an fcc structure, which does not have a dominant textural component of growth. This might be conditioned by high level of ion activation of growth and multicomponent nature of the coating being terms for creation and retention of high density of defects. This fine structure of ion-plasma coating on a substrate with UFG structure provides the achievement of high adhesion and erosion resistance.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S127 - S135"},"PeriodicalIF":0.5,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143638544","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}