Microstructure and Properties of Protective Ion-Plasma Coating on UFG Ti Alloy

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
Ya. N. Savina, S. V. Ovchinnikov, R. R. Valiev, K. S. Selivanov
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Abstract

The paper presents results of comprehensive studies on a fine structure of TiVN ion-plasma protective coating deposited on a Ti–6Al–4V substrate with an ultrafine-grained (UFG) structure. This coating considerably improves the performance properties of critical products operating under high loads in aggressive environments. In the article special attention is paid to features of formation of coating layers and their phase composition with account of effect caused the substrate ultrafine-grained structure. It is established that TiVN functional coating has a layered structure with thin layers of dark and light colors, which can be formed at different ratios of Ti and V concentrations due to planetary rotation of substrates. The structure of a TiVN functional layer is columnar and has an average diameter of about 17 nm. Based on microdiffraction patterns of a TiVN layer, it is found that the reflexes correspond to an fcc structure, which does not have a dominant textural component of growth. This might be conditioned by high level of ion activation of growth and multicomponent nature of the coating being terms for creation and retention of high density of defects. This fine structure of ion-plasma coating on a substrate with UFG structure provides the achievement of high adhesion and erosion resistance.

Abstract Image

UFG钛合金防护离子等离子体涂层的组织与性能
本文介绍了在具有超细晶(UFG)结构的Ti-6Al-4V衬底上沉积的ticn离子等离子体保护涂层的精细结构的综合研究结果。这种涂层大大提高了在恶劣环境下高负荷运行的关键产品的性能。本文重点介绍了涂层的形成特点及其相组成,并考虑了镀层超细晶组织的影响。建立了ticn功能涂层具有层状结构,在Ti和V浓度的不同比例下,由于基底的行星旋转,可以形成较薄的暗、浅色层。该功能层的结构为柱状,平均直径约为17 nm。基于TiVN层的微衍射图,发现其反射对应于一种fcc结构,该结构不具有主要的生长织构成分。这可能是由于高水平的离子激活生长和涂层的多组分性质,这是产生和保留高密度缺陷的条件。这种精细结构的离子等离子体涂层在具有UFG结构的基底上实现了高附着力和抗侵蚀性。
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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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