IEEE Transactions on Nanotechnology最新文献

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Recent Challenges in the Fabrication of Vertical Silicon Nanowire Transistors 垂直硅纳米线晶体管制造的最新挑战
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-06-23 DOI: 10.1109/TNANO.2025.3582023
Cigdem Cakirlar;Jonas Müller;Christoph Beyer;Konstantinos Moustakas;Bruno Neckel Wesling;Giulio Galderisi;Sylvain Pelloquin;Cristell Maneux;Thomas Mikolajick;Guilhem Larrieu;Jens Trommer
{"title":"Recent Challenges in the Fabrication of Vertical Silicon Nanowire Transistors","authors":"Cigdem Cakirlar;Jonas Müller;Christoph Beyer;Konstantinos Moustakas;Bruno Neckel Wesling;Giulio Galderisi;Sylvain Pelloquin;Cristell Maneux;Thomas Mikolajick;Guilhem Larrieu;Jens Trommer","doi":"10.1109/TNANO.2025.3582023","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3582023","url":null,"abstract":"Vertical silicon nanowire transistors are among the most promising device concepts for future low-power electronics due to their gate-all-around nature as well as their 3D stacking potential. In this work we review the current status of transistor fabrication on vertical silicon nanostructures and identify the most important challenges for successful process integration. Channel patterning, source/drain contact formation, gate-deposition and spacer engineering are identified as key steps independent on the actual process integration sequence. We conclude the paper with two emerging device examples and discuss the influence of the processing challenges on the transistor design.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"356-362"},"PeriodicalIF":2.1,"publicationDate":"2025-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144634629","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analytical Modeling and Simulation Investigation of Nanowire Tunnel FET for Potential and Drain Current Evaluation 纳米线隧道场效应管的分析建模与仿真研究
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-06-20 DOI: 10.1109/TNANO.2025.3581782
Parveen Kumar;Balwinder Raj;Girish Wadhwa
{"title":"Analytical Modeling and Simulation Investigation of Nanowire Tunnel FET for Potential and Drain Current Evaluation","authors":"Parveen Kumar;Balwinder Raj;Girish Wadhwa","doi":"10.1109/TNANO.2025.3581782","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3581782","url":null,"abstract":"An analytical model of nanowire-tunnel field effect transistor (NWTFET) has been developed in this article with a gate-all-around structure and band-to-band tunneling (BTBT) mechanism. The proposed model is effective for operation in all regions such as source, drain, channel and measures accurate potential, transfer characteristics and is immune to short channel effect. The drain current and surface potential have been evaluated with the variation in metal work function, doping concentration, oxide thickness and channel material at different bias conditions (V<sub>DS</sub> and V<sub>GS</sub>). The validation of observed results has been performed through TCAD simulations. The surface potential model is designed by separating the substrate of silicon into three dissimilar areas (I, II, III) and determining the 2-D Poisson’s equation (PE) in other areas. To utilize Poisson’s Equation appropriately at various boundary conditions, a descriptive parabolic approximation strategy is used.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"323-329"},"PeriodicalIF":2.1,"publicationDate":"2025-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144597741","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of Size-Dependent Electrical Transport in Single Nanowire La$_{1-x}$A$_{x}$MnO$_{3}$ ($x$ = 0.3 & 0.5 for A = Ca and $x$ = 0.5 for A = Sr) Using Nanolithography-Based Device Fabrication 利用纳米光刻技术研究单纳米线La$_{1-x}$A$_{x}$MnO$_{3}$ (A = Ca = $x$ = 0.3 & 0.5, A = Sr = $x$ = 0.5)中尺寸相关的电输运
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-06-18 DOI: 10.1109/TNANO.2025.3580798
Subarna Datta;Barnali Ghosh;Soumyadipta Pal
{"title":"Investigation of Size-Dependent Electrical Transport in Single Nanowire La$_{1-x}$A$_{x}$MnO$_{3}$ ($x$ = 0.3 & 0.5 for A = Ca and $x$ = 0.5 for A = Sr) Using Nanolithography-Based Device Fabrication","authors":"Subarna Datta;Barnali Ghosh;Soumyadipta Pal","doi":"10.1109/TNANO.2025.3580798","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3580798","url":null,"abstract":"This work investigates the integration of single nanowire La<inline-formula><tex-math>$_{1-x}$</tex-math></inline-formula>A<inline-formula><tex-math>$_{x}$</tex-math></inline-formula>MnO<inline-formula><tex-math>$_{3}$</tex-math></inline-formula> (<inline-formula><tex-math>$x$</tex-math></inline-formula> = 0.3 & 0.5 for A = Ca; <inline-formula><tex-math>$x$</tex-math></inline-formula> = 0.5 for A = Sr) nano-devices via advanced nanolithography techniques for transport measurements. The comparative study of resistivity in bulk and nanowire forms highlights a significant size-dependent enhancement in transport behavior. Notably, the resistivity data for La<inline-formula><tex-math>$_{1-x}$</tex-math></inline-formula>A<inline-formula><tex-math>$_{x}$</tex-math></inline-formula>MnO<inline-formula><tex-math>$_{3}$</tex-math></inline-formula> (<inline-formula><tex-math>$x$</tex-math></inline-formula> = 0.3 & 0.5 for A = Ca; <inline-formula><tex-math>$x$</tex-math></inline-formula> = 0.5 for A = Sr) nanowires could not be fully explained by conventional models like Mott Variable Range Hopping (VRH) model, Efros-Shklovskii (ES) localization model, adiabatic small polaron hopping (ASPH) model etc. A hybrid model incorporating fluctuation-induced tunneling and disorder-induced localization more accurately captures the resistivity variation across temperature ranges. This refined approach successfully models transport behavior, particularly in the insulating regime, validating its applicability over previous models. The study establishes a robust methodology combining precise lithographic fabrication and improved theoretical modeling, paving the way for accurate transport characterization in complex oxide nanowires.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"593-601"},"PeriodicalIF":2.1,"publicationDate":"2025-06-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145886594","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Efficient Photodetection via High Aspect Ratio Core-Shell Nanowire Array 高纵横比核壳纳米线阵列的高效光电探测
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-06-10 DOI: 10.1109/TNANO.2025.3577930
Vishal Kaushik;Swati Rajput;Ashavani Kumar;Mukesh Kumar
{"title":"Efficient Photodetection via High Aspect Ratio Core-Shell Nanowire Array","authors":"Vishal Kaushik;Swati Rajput;Ashavani Kumar;Mukesh Kumar","doi":"10.1109/TNANO.2025.3577930","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3577930","url":null,"abstract":"Here we propose a Cu<sub>2</sub>O-ZnO-based high-aspect ratio core-shell nanowire (with radial p-n junction) for efficient photodetection via a cost-effective fabrication route. The proposed platform exploits enhanced active depletion area offered by radial p-n junction in high aspect ratio nanowires, along with this excellent transport properties of the device. This results in superior light-matter interaction and better charge collection efficiency. The proposed device demonstrates significant improvement in responsivity via a simple fabrication approach and offers a compact and cost-effective alternative to complex, highly sensitive photodetectors. It can find applications in remote sensing, medical diagnostics barcode readers, and wireless environmental monitoring. Moreover, the enhanced light-matter interaction via the proposed approach can be useful in various other applications such as Solar Cells, Light Emitting Diodes, and Optical Modulation.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"318-322"},"PeriodicalIF":2.1,"publicationDate":"2025-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144606428","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blue Narrowband Photomultiplication Type Organic Photodetector Using ZnPc as Photon Field Modulation Layer 利用ZnPc作为光子场调制层的蓝色窄带光电倍增型有机光电探测器
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-06-06 DOI: 10.1109/TNANO.2025.3577501
Sampati Rao Sridhar;Medha Joshi;Brijesh Kumar
{"title":"Blue Narrowband Photomultiplication Type Organic Photodetector Using ZnPc as Photon Field Modulation Layer","authors":"Sampati Rao Sridhar;Medha Joshi;Brijesh Kumar","doi":"10.1109/TNANO.2025.3577501","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3577501","url":null,"abstract":"In this work, a blue narrowband photomultiplication (PM) type organic photodetector (OPD) is fabricated with ZnPc as photon field modulation layer. The photomultiplication in OPD is attributed to electron trap assisted hole injection mechanism. In PM OPD, ZnPc altered the distribution of photogenerated charge carriers within the P3HT:PCBM active layer and results in narrowband detection. This study is the first to demonstrate a narrowband PM OPD with a peak response at 480 nm, using a P3HT:PCBM active layer. The detector demonstrated a rejection ratio (EQE<sub>480 nm</sub>/EQE<sub>570 nm</sub>) of 590, and a full width half maximum (FWHM) of 67 nm with 1000 nm thick ZnPc as photon field modulation layer. As the ZnPc layer thickness is increased from 200 nm to 1500 nm, the FWHM of the detector narrowed from 175 nm to 67 nm. The demonstrated narrowband photodetector with response peak in blue region has diverse applications in communication and imaging fields.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"312-317"},"PeriodicalIF":2.1,"publicationDate":"2025-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144367000","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ni-SiO2 Cell-Assisted Thermally Stable Broadband Metamaterial Emitter Ni-SiO2电池辅助热稳定宽带超材料发射极
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-06-03 DOI: 10.1109/TNANO.2025.3576246
Muhammad Saqlain;Muhammad Abuzar Baqir;Pankaj Kumar Choudhury
{"title":"Ni-SiO2 Cell-Assisted Thermally Stable Broadband Metamaterial Emitter","authors":"Muhammad Saqlain;Muhammad Abuzar Baqir;Pankaj Kumar Choudhury","doi":"10.1109/TNANO.2025.3576246","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3576246","url":null,"abstract":"A thermally stable ultra-broadband metasurface-based emitter comprising square-shaped Ni resonators on Si substrate was investigated. The planar multilayer metamaterial emitter exhibits high emissivity of 94% over a span of 400–8450 nm wavelength. With the optimized structural parameters, the results show the thermal emission efficiency of 93.55% and photothermal conversion efficiency of 90.5% at 900K, which determine strong solar energy absorption of the emitter cavity. However, variations in structural parameters and the angle of incidence leave a minor impact on thermal emissivity. The findings show the developed structure to be of potential in efficient solar energy utilization.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"307-311"},"PeriodicalIF":2.1,"publicationDate":"2025-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144299063","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An Intelligent 3D-AFM Scanning Process Based on Online Probe Rotation and Adaptive Speed Strategy 基于在线探针旋转和自适应速度策略的3D-AFM智能扫描过程
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-04-30 DOI: 10.1109/TNANO.2025.3565847
Huang-Chih Chen;Sheng-An Lee;Ting-An Chou;Li-Chen Fu
{"title":"An Intelligent 3D-AFM Scanning Process Based on Online Probe Rotation and Adaptive Speed Strategy","authors":"Huang-Chih Chen;Sheng-An Lee;Ting-An Chou;Li-Chen Fu","doi":"10.1109/TNANO.2025.3565847","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3565847","url":null,"abstract":"Atomic Force Microscope (AFM) has remained one of the most prominent morphology tools for examining the microscopic world. However, the 3D-AFM has several disadvantages. First, the physical AFM tip occupies space and may sometimes obstruct the scanning process, creating distorted results, especially for vertical sidewalls. Additionally, the traditional AFM scanning scheme results in sparser data density along steep surfaces. In this work, to alleviate distortion, the AFM probe is allowed to rotate. Moreover, the scanning speed along the fast axis in a scan line has to be adaptive according to terrain variation. Therefore, we aim to develop and implement an intelligent AFM scanning process assisted by the proposed probe rotation decision (PRD) and adaptive speed decision (ASD) modules, enabling the AFM probe to achieve online rotation and variable scan speed. Moreover, methods for online coarse compensation and offline fine compensation are also presented to accurately eliminate tip shifts caused by probe rotation. Finally, some comparison results will be provided to demonstrate the effectiveness of the proposed intelligent scanning process.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"264-276"},"PeriodicalIF":2.1,"publicationDate":"2025-04-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144100085","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
FDSOI-Based Reconfigurable FETs: A Ferroelectric Approach 基于fdsoi的可重构场效应管:铁电方法
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-04-30 DOI: 10.1109/TNANO.2025.3565720
Donghyeok Lee;Suprem R. Das;Jiseok Kwon;Jiwon Chang
{"title":"FDSOI-Based Reconfigurable FETs: A Ferroelectric Approach","authors":"Donghyeok Lee;Suprem R. Das;Jiseok Kwon;Jiwon Chang","doi":"10.1109/TNANO.2025.3565720","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3565720","url":null,"abstract":"In this study, we propose ferroelectric-based reconfigurable field-effect transistors (FeRFETs) that utilizes the structure of a fully depleted silicon-on-insulator field-effect transistors (FDSOI FETs). In FeRFETs, the non-volatile and reconfigurable electrostatic doping facilitated by ferroelectric enables type conversion. Through the TCAD simulations calibrated with the experimental data, we confirm a reconfigurable high doping level (>1 × 1021 <inline-formula><tex-math>${text{cm}^{-3}}$</tex-math></inline-formula>), a clear type conversion and highly tunable performance in FeRFETs. It is also found that carefully tailoring coercive field <inline-formula><tex-math>$({{E}_{text{c}}})$</tex-math></inline-formula> is important to maximize the performance of FeRFETs.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"277-281"},"PeriodicalIF":2.1,"publicationDate":"2025-04-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144100086","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Stochastic Templates and Noise Dynamics in Memristor Cellular Nonlinear Networks 记忆电阻细胞非线性网络中的随机模板和噪声动力学
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-04-30 DOI: 10.1109/TNANO.2025.3565887
Dimitrios Prousalis;Vasileios Ntinas;Christoforos Theodorou;Ioannis Messaris;Ahmet Samil Demirkol;Alon Ascoli;Ronald Tetzlaff
{"title":"Stochastic Templates and Noise Dynamics in Memristor Cellular Nonlinear Networks","authors":"Dimitrios Prousalis;Vasileios Ntinas;Christoforos Theodorou;Ioannis Messaris;Ahmet Samil Demirkol;Alon Ascoli;Ronald Tetzlaff","doi":"10.1109/TNANO.2025.3565887","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3565887","url":null,"abstract":"Noise is a pervasive aspect that impacts various systems and environments, from mobile radio channels to biological systems. Within the framework of complex networks, noise poses significant challenges for functionality and performance. In this paper, we investigate the dynamics of a well-known type of locally-coupled computing networks, Memristor Cellular Nonlinear Networks (M-CNNs), in the presence of noise at their interconnection weights, introducing the concept of stochastic weights. In particular, we analyze the effect of noise originating from the synaptic memristors by incorporating both deterministic and stochastic components into synaptic weights, investigating how device-to-device variability and noise affect network performance. Based on the well-established theory of CNNs, we are extending the stability criteria to incorporate synaptic memristor non-idealities and we provide a theoretical framework to analyze their effect on system's performance. In this work, we employ the physics-based Jülich Aachen Resistive Switching Tools (JART) model to study Valence Change Memory (VCM) devices as synapses within our theoretical framework. We investigate the impact of device variability and noise, utilizing statistical properties derived from experimental data reported in the literature. We demonstrate the efficacy of noisy M-CNNs in performing the edge detection task, an example of fundamental image processing applications.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"282-292"},"PeriodicalIF":2.1,"publicationDate":"2025-04-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144125378","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Room Temperature Negative Differential Resistance in Gate-All-Around Field-Effect Transistors With 1D Active Channels
IF 2.1 4区 工程技术
IEEE Transactions on Nanotechnology Pub Date : 2025-04-29 DOI: 10.1109/TNANO.2025.3565276
Amit Verma;Reza Nekovei;Daryoush Shiri
{"title":"Room Temperature Negative Differential Resistance in Gate-All-Around Field-Effect Transistors With 1D Active Channels","authors":"Amit Verma;Reza Nekovei;Daryoush Shiri","doi":"10.1109/TNANO.2025.3565276","DOIUrl":"https://doi.org/10.1109/TNANO.2025.3565276","url":null,"abstract":"We report on the presence of a Negative Differential Resistance (NDR) in a Gate-All-Around Field Effect Transistor (GAAFET) with 1D nanowires or nanotubes as the active conducting channel. Here, the drain current is seen to decrease sharply at relatively higher gate voltages. The onset of NDR is tunable with device topology. The NDR mechanism in this work is due to the applied gate voltage, not the drain-source voltage, a feature which promises low-voltage application of this effect. The results are based on a self-consistent ensemble Monte Carlo charge-carrier transport model with an electrostatic solver that solves Gauss's law in integral form.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"260-263"},"PeriodicalIF":2.1,"publicationDate":"2025-04-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943966","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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