Full 3-D Monte Carlo Simulation of Coupled Electron-Phonon Transport: Self-Heating in a Nanoscale FinFET

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Mohammad Zunaidur Rashid;Shaikh Shahid Ahmed
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引用次数: 0

Abstract

To study coupled electro-thermal transport processes in nanoscale electronic devices, continuum models are no longer sufficient. In this work, we present an effort to couple a three-dimensional (3-D) Monte Carlo Phonon Transport (MCPT) kernel with a 3-D Monte Carlo Electron Transport (MCET) simulator. The phonon-phonon scattering is modeled in relaxation time approximation (RTA) using Holland's formalism. Diffusive boundary collisions for phonons is modeled using the Beckmann-Kirchhoff (B-K) surface roughness scattering formalism considering the effects of phonon wavelength, incident angles and degree of surface roughness. In the electron-phonon coupled platform, acoustic and intervalley g and f type electron-phonon scattering mechanisms are considered and the resulting local temperature modification has been used to bridge the electron and phonon transport paths. The simulator has been validated by modeling the self-heating effect in a nanoscale FinFET device. Here, phonon transport at the oxide-silicon interface has been treated using the Diffuse Mismatch (DM) model, whereas, the phonons in the oxide have been described using the Debye model and temperature and frequency dependent relaxation time. For a FinFET with a gate length of 18 nm, channel width of 4 nm, and a fin height of 8 nm, simulation results show an ON current degradation of as high as ∼7% due to self-heating. The temperature rise in the channel region is found to be ∼30 K.
电子-鹭鸶耦合传输的全三维蒙特卡罗模拟:纳米级 FinFET 中的自加热
要研究纳米级电子器件中的电热耦合传输过程,连续模型已不再足够。在这项工作中,我们努力将三维(3-D)蒙特卡洛声子传输(MCPT)核与三维蒙特卡洛电子传输(MCET)模拟器结合起来。声子-声子散射采用霍兰形式主义的弛豫时间近似(RTA)建模。声子的扩散边界碰撞采用贝克曼-基尔霍夫(B-K)表面粗糙度散射形式主义建模,考虑了声子波长、入射角和表面粗糙度的影响。在电子-声子耦合平台中,考虑了声学和间隙 g 和 f 型电子-声子散射机制,并利用由此产生的局部温度修正来连接电子和声子传输路径。通过对纳米级 FinFET 器件中的自热效应建模,该模拟器得到了验证。在这里,氧化物-硅界面上的声子传输采用扩散错配(DM)模型进行处理,而氧化物中的声子则采用德拜模型以及与温度和频率相关的弛豫时间进行描述。对于栅极长度为 18 nm、沟道宽度为 4 nm、鳍片高度为 8 nm 的 FinFET,模拟结果显示,由于自发热,导通电流衰减高达 ∼ 7%。沟道区域的温升为 30 K。
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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