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Investigating High Opacity and Increased Activation Energy in the Multi-Trigger Resist 多触发抗蚀剂中高不透明度和增加活化能的研究
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.75
C. Popescu, G. O'Callaghan, A. McClelland, J. Roth, T. Lada, T. Kudo, R. Dammel, M. Moinpour, Y. Cao, A.P.G. Robinson
{"title":"Investigating High Opacity and Increased Activation Energy in the Multi-Trigger Resist","authors":"C. Popescu, G. O'Callaghan, A. McClelland, J. Roth, T. Lada, T. Kudo, R. Dammel, M. Moinpour, Y. Cao, A.P.G. Robinson","doi":"10.2494/photopolymer.34.75","DOIUrl":"https://doi.org/10.2494/photopolymer.34.75","url":null,"abstract":"by NMP; yet current resist formulations purposely add tertiary amines to prevent dark losses. Recent research has demonstrated that amides can accelerate deprotonation of radical cations [14] that form along the polymer backbone upon exposure to EUV. This feature helps to prevent recombination with other radicals and increases acid generation, thereby enhancing sensitivity [15]. Our goal in these studies was to design peptoids that incorporate chemical moieties adapted to functions such as adhesion to the underlying substrate, etch resistance, and solubility switching. As the peptoids examined are 10-mers, the structure of the side chains is also carefully chosen to avoid crystallization and tune the glass transition temperature. Protecting groups serving as solubility switches were selected with the goal of groups that possessed a high radical cation acidity, a property previously shown to correlate closely with the sensitivity of EUV resists. While these initial results show the potential of peptoids as photoresist materials, the ongoing research is still at an initial stage.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"80 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86154672","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigations of Matrix-Exposure Lithography Using Stacked Linear Arrays of Squared Optical Fibers 方形光纤堆叠线性阵列的矩阵曝光光刻技术研究
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.27
T. Horiuchi, Jun Watanabe, J. Iwasaki, Hiroshi Kobayashi
{"title":"Investigations of Matrix-Exposure Lithography Using Stacked Linear Arrays of Squared Optical Fibers","authors":"T. Horiuchi, Jun Watanabe, J. Iwasaki, Hiroshi Kobayashi","doi":"10.2494/photopolymer.34.27","DOIUrl":"https://doi.org/10.2494/photopolymer.34.27","url":null,"abstract":"Plastic optical fiber matrices with squared ends were investigated. Such fiber matrices are particularly required for printing two dimensional code marks by using them as new lithography tools combining with light emitting diodes. A large number of fibers with a diameter of 500 µm were packed in an oblong slit of a jig, and fiber ends were simultaneously transformed into square shapes by heating the jig on a hotplate. Next, three linear arrays, each composed of 10 fibers, were simply stacked and bound without coating any adhesives and/or opaque films. It was anticipated that light leaks from neighbored bright fibers degraded the printed pattern qualities. However, checker patterns were normally printed without influenced by neighbored bright fibers when the fiber ends were projected on a wafer through a 1/10 projection lens. Considering the advantages, a regularly arranged 10×10 fiber matrix was fabricated on trial for demonstrating the availability of the matrix required for developing a matrix-exposure lithography system.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"102 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80625316","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Nodule Deformation on Cleaning of PVA Roller Brushes and its Relation to Cross-contamination PVA辊刷清洗时的结瘤变形及其与交叉污染的关系
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.505
Atsuki Hosaka, Tsubasa Miyaki, Y. Mizushima, Satomi Hamada, Ryota Koshino, A. Fukunaga, T. Sanada
{"title":"Nodule Deformation on Cleaning of PVA Roller Brushes and its Relation to Cross-contamination","authors":"Atsuki Hosaka, Tsubasa Miyaki, Y. Mizushima, Satomi Hamada, Ryota Koshino, A. Fukunaga, T. Sanada","doi":"10.2494/photopolymer.34.505","DOIUrl":"https://doi.org/10.2494/photopolymer.34.505","url":null,"abstract":"This study investigates nodule deformation and contact area during PVA roller-type brush scrubbing to clarify their relationship with cross-contamination. Two high-speed video cameras with collimating LED light sources and an evanescent field on a prism enabled us to observe brush nodule deformation and contact area. Deformation analysis showed that the volume of a roller-type brush changes gradually at the beginning of compression, deforms more when vertically pushed at maximum compression, and then recovers rapidly at the end of compression. The brush contact area changes according to the brush and wafer rotation speed. The contact area can be categorized into three: the front, rear side face in the brush traveling direction, and vertically pushed bottom face on the surface. We analyzed the three types of brush contacts on a 100 mm type wafer and observed that the vertical compression type significantly affected the cross-contamination region.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"41 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74006296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Synthesis of Photo-degradable Polyphthalaldehyde Macromonomer and Adhesive Property Changes of its Copolymer with Butyl Acrylate on UV-irradiation 光降解聚邻苯二醛大单体的合成及其与丙烯酸丁酯共聚物在紫外线照射下粘附性能的变化
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.219
H. Hayashi, Hideki Tachi, K. Suyama
{"title":"Synthesis of Photo-degradable Polyphthalaldehyde Macromonomer and Adhesive Property Changes of its Copolymer with Butyl Acrylate on UV-irradiation","authors":"H. Hayashi, Hideki Tachi, K. Suyama","doi":"10.2494/photopolymer.34.219","DOIUrl":"https://doi.org/10.2494/photopolymer.34.219","url":null,"abstract":"We prepared a new polyphthalaldehyde (PPA) macromonomer by introducing a polymerizable methacryloyl group at the terminal of PPA main-chain. Resulting macromonomer was copolymerized with butyl acrylate to obtain pressure-sensitive adhesives (PSAs). We also compared the behavior of the copolymers with those of polymer blends of poly(butyl acrylate) and linear PPA polymers to clarify the role of polymerization. Higher peel strengths were observed for copolymers than those of corresponding polymer blends. As an increase in irradiation time, the strength generally decreased, although once increased for the copolymer films at the early stage. These results suggest that the introduction and the depolymerization of PPA side-chains caused drastic changes in adhesive properties.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"144 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74249396","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Orientation Control of the Microphase-separated Nanostructures of Block Copolymers on Polyimide Substrates 聚酰亚胺基嵌段共聚物微相分离纳米结构的取向控制
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.439
Hayato Maeda, Y. Nabae, T. Hayakawa
{"title":"Orientation Control of the Microphase-separated Nanostructures of Block Copolymers on Polyimide Substrates","authors":"Hayato Maeda, Y. Nabae, T. Hayakawa","doi":"10.2494/photopolymer.34.439","DOIUrl":"https://doi.org/10.2494/photopolymer.34.439","url":null,"abstract":"This study aimed to form a perpendicularly orientated lamellar structure with polystyrene-block -poly(methyl methacrylate) (PS- b -PMMA) by its microphase separation on a polyimide substrate. Eight types of polyimides were prepared from different combinations of monomers and tested as the bottom layer for the microphase separation of PS- b -PMMA. The surface free energies of those polyimide substrates were evaluated by the Owens-Wendt method. Thin films of PS- b -PMMA were prepared on the polyimide substrates and the self-assembly was induced by thermal annealing, and the surface architecture was observed by atomic force microscopy. In the tested polyimide substrates, only one from 2,2-bis[4-(3,4-dicarboxyphenoxy) phenyl]propane dianhydride (tetracarboxylic dianhydride) and 1,12-bis (4-aminophenoxy) dodecane (diamine) showed a perpendicularly oriented lamellar structure. This polyimide substrate shows one of the smallest polar components in its surface free energy. Relatively large domain size and long correlation length in the PS- b -PMMA layer were obtained by optimizing the conditions for fabrication of the polyimide substrate, which were prepared by casting the polyimide onto a silicon wafer, followed by thermal annealing. These results suggest that the combination of one monomer with relatively large molecular weight, which will result in a low density of imide groups, and the other monomer with long alkyl chains, which will reduce the polarity of the resulting polyimide, contributes to providing a perpendicular orientation.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"28 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73034268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst 钨热丝催化剂活化H2/O2混合物去除不同浓度光活性化合物Novolac光刻胶
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.499
Koki Akita, Shota Sogo, Ryusei Sogame, Masashi Yamamoto, S. Nagaoka, H. Umemoto, H. Horibe
{"title":"Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst","authors":"Koki Akita, Shota Sogo, Ryusei Sogame, Masashi Yamamoto, S. Nagaoka, H. Umemoto, H. Horibe","doi":"10.2494/photopolymer.34.499","DOIUrl":"https://doi.org/10.2494/photopolymer.34.499","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"24 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73181321","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers 高有序含硅氟嵌段共聚物的合成
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.329
Jianuo Zhou, Xuemiao Li, H. Deng
{"title":"Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers","authors":"Jianuo Zhou, Xuemiao Li, H. Deng","doi":"10.2494/photopolymer.34.329","DOIUrl":"https://doi.org/10.2494/photopolymer.34.329","url":null,"abstract":"Series of Si-containing, especially polyhedral oligomeric silsesquioxane (POSS)-containing fluorinated block copolymers (BCPs), poly(styryl polyhedral oligomeric silsesquioxane)- block -poly(hepatafluorobutyl methacrylate) (PStPOSS- b -PHFBMA) were synthesized via living polymerizations. The flory-huggins parameter ( χ , at 150 ºC) of PStPOSS- b -PHFBMA BCP was 0.060. Highly ordered hexagonal domain with 13.2 nm d spacing was observed by small-angle X-ray scattering (SAXS) after 10 h 160 ºC annealing, exhibiting rough line patterns in scanning electron microscope (SEM). SiO 1.5 residue (13.7 wt%) still remained after 700 ºC sintering in thermal gravimetric analysis (TGA).","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"426 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86848952","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Birefringent Control of Photo-Oriented Polymeric Films by in situ Exchange of Functional Moieties 利用原位交换功能基团控制光取向聚合物薄膜的双折射
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.511
Yunosuke Norisada, M. Kondo, T. Sasaki, M. Sakamoto, H. Ono, N. Kawatsuki
{"title":"Birefringent Control of Photo-Oriented Polymeric Films by in situ Exchange of Functional Moieties","authors":"Yunosuke Norisada, M. Kondo, T. Sasaki, M. Sakamoto, H. Ono, N. Kawatsuki","doi":"10.2494/photopolymer.34.511","DOIUrl":"https://doi.org/10.2494/photopolymer.34.511","url":null,"abstract":"Thermally stimulated photoinduced molecular reorientation with high dichroism ( D >0.6) is explored in liquid crystalline (LC) copolymerthacrylate films comprising of 4-methoxy- N-benzylideneaniline (MNBA) and benzoic acid (BA) side groups. Thermal hydrolysis of MNBA side groups induces free phenyl aldehyde (PA) side groups in the oriented film. Birefringence of the oriented films is adjusted by introducing 2,7-diaminofluorene (FL) to form new imine bonds with free PA side groups. Meanwhile, in situ exchange from MNBA to FL-based imine also controls the birefringence of the oriented film. The initial birefringence of the oriented copolymer film increases up to 0.22 after introducing oriented FL moieties.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"25 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88445997","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility 新subaru同步加速器EUV光刻抗蚀剂的基本评价
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.49
Takeo Watanabe, T. Harada, Shinji Yamakawa
{"title":"Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility","authors":"Takeo Watanabe, T. Harada, Shinji Yamakawa","doi":"10.2494/photopolymer.34.49","DOIUrl":"https://doi.org/10.2494/photopolymer.34.49","url":null,"abstract":"Extreme ultraviolet lithography was started to use for the production of 7-nm node-logic-semiconductor devices in 2019. And it was adapted to use for high volume manufacturing (HVM) of 5-nm logic devices in 2020. EUVL is required to be extended to use in 1.5-nm-node-device fabrications. However, it still has many technical issues. Especially, for EUV resists, simultaneous achievement of high sensitivity and low line edge width are required. To solve the EUV resist issue, the fundamental work using synchrotron in soft X-ray region is necessary. The fundamental evaluation study of EUV resist at NewSUBARU synchrotron light facility is described in this paper.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"4 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73888209","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Impact of Water Treatment Reactor using TiO2-coated Micropillar Made by UV-NIL UV-NIL包覆二氧化钛微柱对水处理反应器的影响
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.127
Kazuki Daigo, Ryota Akama, N. Unno, S. Satake, J. Taniguchi
{"title":"Impact of Water Treatment Reactor using TiO2-coated Micropillar Made by UV-NIL","authors":"Kazuki Daigo, Ryota Akama, N. Unno, S. Satake, J. Taniguchi","doi":"10.2494/photopolymer.34.127","DOIUrl":"https://doi.org/10.2494/photopolymer.34.127","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"34 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74002259","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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