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Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers 高χ嵌段共聚物DSA的多功能面漆策略
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.11
X. Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, P. Bézard, M. Sérégé, C. Petit-Etienne, G. Gay, G. Cunge, Benjamin Cabannes-Boué, C. Nicolet, C. Navarro, I. Cayrefourcq, Marcus Müller, G. Hadziioannou, I. Iliopoulos, G. Fleury, M. Zelsmann
{"title":"Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers","authors":"X. Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, P. Bézard, M. Sérégé, C. Petit-Etienne, G. Gay, G. Cunge, Benjamin Cabannes-Boué, C. Nicolet, C. Navarro, I. Cayrefourcq, Marcus Müller, G. Hadziioannou, I. Iliopoulos, G. Fleury, M. Zelsmann","doi":"10.2494/photopolymer.34.11","DOIUrl":"https://doi.org/10.2494/photopolymer.34.11","url":null,"abstract":"A concept of patternable top-coats dedicated to directed self-assembly of high- χ block copolymers is detailed, where the design enables a crosslinking reaction triggered by thermal or photo-activation. Nanostructured BCP areas with controlled domains orientation are selected through a straightforward top-coat lithography step with unique integration pathways. Additionally, the crosslinked nature of the material enables the suppression of the BCP dewetting, while exhibiting exceptional capabilities for the construction of 3D stacks.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81238603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Novel Effective Photoinitiators for the Production of Dental Fillings 新型有效的牙补材料光引发剂
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.259
Monika Topa, J. Ortyl
{"title":"Novel Effective Photoinitiators for the Production of Dental Fillings","authors":"Monika Topa, J. Ortyl","doi":"10.2494/photopolymer.34.259","DOIUrl":"https://doi.org/10.2494/photopolymer.34.259","url":null,"abstract":"Photopolymerization is an environmentally-friendly, non-destructive, safe and solvent-free method. Moreover it guarantees low energy consumption. Therefore the photopolymerization is used in many scientific disciplines, including dentistry for production photocurable dental materials. In this work, the new photoinitiating systems based on camphoroquinone (CQ) and iodonium salts with tosyl anion for initiation of photopolymerization of the acrylates monomers bisphenol A - glycidyl methacrylate (BisGMA) and triethyleneglycol dimethacrylate (TEGDMA) was studied. As a reference, camphorquinone (CQ) and ethyl 4-(dimethylamino)benzoate (EDB) photoinitiating system was used.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"78 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89833777","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Polymerizable Olefins Groups in Antimony EUV Photoresists 锑极紫外光刻胶中的可聚合烯烃基团
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.117
M. Murphy, N. Upadhyay, Munsaf Ali, James V. Passarelli, Jodi Grzeskowiak, Maximillian Weires, R. Brainard
{"title":"Polymerizable Olefins Groups in Antimony EUV Photoresists","authors":"M. Murphy, N. Upadhyay, Munsaf Ali, James V. Passarelli, Jodi Grzeskowiak, Maximillian Weires, R. Brainard","doi":"10.2494/photopolymer.34.117","DOIUrl":"https://doi.org/10.2494/photopolymer.34.117","url":null,"abstract":"Many antimony-carboxylate complexes containing polymerizable olefins are highly sensitive EUV photoresists. Herein we report two approaches by which we explored the reactivity of polymerizable olefin antimony carboxylate photoresists to improve lithographic performance. First, we explored the effect of replacing three phenyl groups with methyl groups in an effort to increase the relative concentration of olefins vs. size of the molecule. Second, we explored the effect of increasing the number of polymerizable olefins from two to five. This approach examines the use of tris(4-vinylphenyl)antimony-dicarboxylate complexes as photoresists and the developer chemistry capable of patterning highly crosslinked substrates.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"47 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89641671","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask 使用精密内置透镜掩模的三维精细光刻计算光刻技术
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.123
Tomoaki Osumi, A. Misaka, Kousuke Sato, M. Yasuda, M. Sasago, Y. Hirai
{"title":"Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask","authors":"Tomoaki Osumi, A. Misaka, Kousuke Sato, M. Yasuda, M. Sasago, Y. Hirai","doi":"10.2494/photopolymer.34.123","DOIUrl":"https://doi.org/10.2494/photopolymer.34.123","url":null,"abstract":"Built-in lens mask lithography realizes 3D imaging by a single exposure using a conventional proximity exposure system. 3D structures are divided into seed elements with different depth of focus, and the complex amplitude of the mask is designed by combining the wavefronts that image these elements. However, due to the interference of the seeds, the three-dimensional image may be missing. For this reason, it has been necessary to set the seed pattern based on empirical knowledge. In this paper, we have developed a system to automatically design the seed pattern. The system calculates the light intensity-distribution in space and places seeds with opposite phases to cancel where excessive image remains. On the other hand, additional seeds are placed in space where light intensity is not sufficient. This procedure is repeated step by step until the required image is obtained. Computational lithography will show that this results in the required 3D image.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"36 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86124310","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Purification Method for Achieving Low Trace Metals in Ultra-High Purity Chemicals 在超高纯度化学品中获得低痕量金属的纯化方法
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.205
Mitsuaki Kobayashi, Yukihisa Okada, T. Shirai, O. Sawajiri, R. Gieger, M. Entezarian
{"title":"Purification Method for Achieving Low Trace Metals in Ultra-High Purity Chemicals","authors":"Mitsuaki Kobayashi, Yukihisa Okada, T. Shirai, O. Sawajiri, R. Gieger, M. Entezarian","doi":"10.2494/photopolymer.34.205","DOIUrl":"https://doi.org/10.2494/photopolymer.34.205","url":null,"abstract":"and T. Sasaki. J. Photopolym. Sci. Technol., 25 . (2012) 389. 7. M. Ree, C-W. Chu, and M. J. Goldberg J. Appl. Phys., 75 (1994) 1410. The high purity requirements of materials used in semiconductor manufacturing are being pushed to unprecedented levels as demand for reliability in computer processors over increasingly longer lifetimes continues to rise. The production of these high purity chemicals requires new purification methods and technologies where the metal concentrations of low parts per billion (ppb) were effectively reduced to low parts per trillion (ppt). The new approach discussed in this paper would present a method for dividing the fluid through micro-channels that form tortuous pathways. These micro-channels allow for further dividing and converging of the fluid thereby presenting the metal species to the purifying surfaces throughout the porous matrix. The ion exchange capability was a function of the concentration and the presence of the species in the solution. Two ion exchange chemistries of strong acid and chelating were made into these structures and their purification performances were assessed and compared in terms of removal efficiencies. Furthermore, these two chemistries were evaluated in series to demonstrate the overall synergistic purification capabilities.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"24 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82212891","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Research on a New Lithography Method Utilizing Laser Speckles for Printing Random Patterns 激光散斑印刷随机图案新方法的研究
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.35
Hiroshi Kobayashi, Tomoki Iwaoka, Kazuki Oi, T. Horiuchi
{"title":"Research on a New Lithography Method Utilizing Laser Speckles for Printing Random Patterns","authors":"Hiroshi Kobayashi, Tomoki Iwaoka, Kazuki Oi, T. Horiuchi","doi":"10.2494/photopolymer.34.35","DOIUrl":"https://doi.org/10.2494/photopolymer.34.35","url":null,"abstract":"A new simple and low-cost optical lithography method utilizing speckles was developed for printing random patterns on surfaces of three-dimensinal objects with various shapes, and patterning characteristics were investigated by assembling a handmade exposure system. In the system, a laser beam was irradiated on a transparent diffuser plate, and generated speckles were projected onto a wafer coated with a resist. As a result, resist patterns with random shapes were successfully formed after the development. The size and number of patterns were controllable by adjusting the exposure time. Pattern sizes were between several tens microns and a few hundred microns. It was demonstrated also that the pattern sizes were controlled by changing the wafer position from the diffuser plate. However, the sizes and numbers of patterns were varied together when the exposure time or the distance between the diffuser and the wafer was changed.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"20 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82561383","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication of Colloidal Crystal Gel Film Using Poly(N-vinylcaprolactam) 聚n -乙烯基己内酰胺制备胶体晶体凝胶膜
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.543
Takaki Kaneda, Yutaro Seki, Naoto Iwata, S. Furumi
{"title":"Fabrication of Colloidal Crystal Gel Film Using Poly(N-vinylcaprolactam)","authors":"Takaki Kaneda, Yutaro Seki, Naoto Iwata, S. Furumi","doi":"10.2494/photopolymer.34.543","DOIUrl":"https://doi.org/10.2494/photopolymer.34.543","url":null,"abstract":"In this report, we successfully fabricated the colloidal crystal (CC) gel films of silica microparticles combined with a temperature-responsive biocompatible hydrogel of poly(Nvinylcaprolactam) (VCL). When the CC VCL film was prepared by filling VCL precursor into the void space between silica particles of CC film, followed by the thermal polymerization, the Bragg reflection peak was red-shifted from 475 nm to 535 nm due to the change of refractive index contrast. Subsequently, immersion of the CC VCL film into an excess of water led to the formation of CC VCL gel film, wherein the VCL matrix swelled in water to form the hydrogel state. As elevating the temperature from 25 °C, this CC VCL gel film showed the reflection color changes from red to green, arising from the decrease of lattice constant induced by the shrinkage of VCL hydrogel. Moreover, the reflection color changes of CC VCL gel film were found to be fully reversible. In this way, we believe that such CC VCL gel films can be potentially applied to novel temperature sensors with biocompatibility.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82632609","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Experimental Evaluation and Modeling of Adsorption Phenomena of Nanoliposomes on Poly(dimethylsiloxane) Surfaces 纳米脂质体在聚二甲基硅氧烷表面吸附现象的实验评价与建模
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.1
Sylvan Sunny Koyagura, Virendra Majarikar, H. Takehara, T. Ichiki
{"title":"Experimental Evaluation and Modeling of Adsorption Phenomena of Nanoliposomes on Poly(dimethylsiloxane) Surfaces","authors":"Sylvan Sunny Koyagura, Virendra Majarikar, H. Takehara, T. Ichiki","doi":"10.2494/photopolymer.34.1","DOIUrl":"https://doi.org/10.2494/photopolymer.34.1","url":null,"abstract":"Nanoparticles, such as exosomes or liposomes, have been widely studied using poly(dimethylsiloxane) (PDMS) microchannels. The interaction between nanoparticles and solid surfaces is an important subject for basic and applied research on nanoparticles, but there have been few reports on the use of microchannels for this purpose. Micro-scale systems serve as a useful platform for adsorption analysis because of their large surface-tovolume ratio. In this study, we attempted to develop a platform to study the adsorption phenomena of nanoparticles on solid surfaces using a microchannel, in which a model that analyzes dynamic (i.e., non-equilibrium) adsorption was used. This model allowed quantitative analysis of nanoliposome adsorption onto the surface of a PDMS microchannel.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"43 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82817419","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Oriented Nanowire Arrays with Phthalocyanine – C60 Multi-Heterojunctions 酞菁- C60多异质结定向纳米线阵列
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.167
Masaki Nobuoka, Koshi Kamiya, S. Sakaguchi, A. Idesaki, T. Yamaki, T. Sakurai, S. Seki
{"title":"Oriented Nanowire Arrays with Phthalocyanine – C60 Multi-Heterojunctions","authors":"Masaki Nobuoka, Koshi Kamiya, S. Sakaguchi, A. Idesaki, T. Yamaki, T. Sakurai, S. Seki","doi":"10.2494/photopolymer.34.167","DOIUrl":"https://doi.org/10.2494/photopolymer.34.167","url":null,"abstract":"1 Department of Moecular Engineering, Graduate School of Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan. 2 Department of Advanced Functional Materials Research, National Institutes for Quantum and Radiological Science and Technology (QST), Takasaki, Gunma 370-1292, Japan 3 Faculty of Molecular Chemistry and Engineering, Kyoto Institute of Technology, Sakyo-ku, Kyoto 606-8585, Japan. E-mail: seki@moleng.kyoto-u.ac.jp","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"206 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80414338","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improvement of Resist Characteristics by Synthesis of a Novel Dissolution Inhibitor for Chemically Amplified Three-Component Novolac Resist 合成一种新型化学放大三组分Novolac抗蚀剂溶解抑制剂改善抗蚀性能
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.491
Shinya Akechi, H. Horibe
{"title":"Improvement of Resist Characteristics by Synthesis of a Novel Dissolution Inhibitor for Chemically Amplified Three-Component Novolac Resist","authors":"Shinya Akechi, H. Horibe","doi":"10.2494/photopolymer.34.491","DOIUrl":"https://doi.org/10.2494/photopolymer.34.491","url":null,"abstract":"A photosensitive polymer called photoresist is used to create fine circuit patterns on the surface of semiconductors. The aim of this study was to improve the resist function by incorporating a chemical amplification mechanism into the base polymer, novolac resin. The resist is composed of three components: base polymer, dissolution inhibitor (DI), and photoacid generator. The ability to inhibit the dissolution of resist polymer in the unexposed area was improved by increasing the molecular size of DI. The high acidity of deprotected DI with carboxyl groups improved the ability to promote dissolution of resist polymer in the exposed area. The resists containing DIs with large molecular size and high acidity showed improved resolution.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"6 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80479748","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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