Journal of Photopolymer Science and Technology最新文献_第9页

The Measurement of the Refractive Index n and k Value of the EUV Resist by EUV Reflectivity Measurement Method 用EUV反射率测量法测量EUV电阻折射率n和k值

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.105

Yosuke Ohta, A. Sekiguchi, T. Harada, Takeo Watanabe

引用次数: 3

Electrical and Optical Model of Reverse Mode Liquid Crystal Cells with Low Driving Voltage 低驱动电压反模液晶电池的电学和光学模型

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.315

R. Yamaguchi, K. Inoue

引用次数: 0

Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility 显影剂中甘油对novolak型正音抗溶解度的影响

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.495

Shunpei Kajita, Yukiko Miyaji, H. Horibe

引用次数: 0

Designed, Flexible Electrochromic Display Device with Fe(II)-Based Metallo-Supramolecular Polymer Using Mechanically Etched ITO Film 采用机械蚀刻ITO薄膜的Fe(II)基金属超分子聚合物设计柔性电致变色显示器件

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.175

M. Higuchi, Y. Fujii

{"title":"Designed, Flexible Electrochromic Display Device with Fe(II)-Based Metallo-Supramolecular Polymer Using Mechanically Etched ITO Film","authors":"M. Higuchi, Y. Fujii","doi":"10.2494/photopolymer.34.175","DOIUrl":"https://doi.org/10.2494/photopolymer.34.175","url":null,"abstract":"J. Raman Spectrosc. , 27 (1996) 351. 38. A. J. Bovill, A. A. McConnel, J. A. Nimmo, and W. E. Smith, J. Phys. Chem. , 90 (1986) 569. 39. A. Asano, M. Omichi, S. Tsukuda, K. Takano, M. Sugimoto, A. Saeki, and S. Seki, J. Phys. Chem. C , 116 (2012) 17274. Electrochromic (EC) displays are expected as energy-saving smart windows or digital signages because of the memory property. We succeeded in developing a designed and flexible electrochromic (EC) display device with Fe(II)-based metallo-supramolecular polymer (polyFe) using a mechanically etched ITO film. Mechanical etching an ITO film was performed with a cutting machine having a blade of which length was adjusted so as not to cut off the film. The fabricated EC device was composed of the etched ITO film, a polyFe layer, an electrolyte layer, a nickel hexacyanoferrate layer as the counter material, and another ITO film. The EC device showed unique changes of the display upon applying a voltage of 1.5 V between the two ITO electrodes. It was revealed that the EC changes were controlled by the etching pattern such as a closed circle or the formation of a narrow ITO path.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"124 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86799063","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Effect of 2-propanol Immersing on Organohalide Perovskite Layer in Perovskite Solar Cells Fabricated by Two-step Method 二步法制备钙钛矿太阳能电池中2-丙醇浸泡对有机卤化物钙钛矿层的影响

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.279

Daiki Okawa, Yoshiyuki Seike, T. Mori

引用次数: 1

Synthesis and Characterization of High Refractive Index Polythiocyanurates 高折射率多硫氰脲酸盐的合成与表征

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.251

Songyan Shi, Yoshihisa Onodera, Tadashi Tsukamono, Y. Shibasaki, Y. Oishi

{"title":"Synthesis and Characterization of High Refractive Index Polythiocyanurates","authors":"Songyan Shi, Yoshihisa Onodera, Tadashi Tsukamono, Y. Shibasaki, Y. Oishi","doi":"10.2494/photopolymer.34.251","DOIUrl":"https://doi.org/10.2494/photopolymer.34.251","url":null,"abstract":"The polythiocyanurates with high molecular weights were successfully prepared by the phase-transfer catalyzed polycondensation of triazinedithiol with activated dibromides. These polymers were soluble in tetrahydrofuran (THF) and N -methyl-2-pyrrolidone (NMP), and readily afforded colorless and transparent cast films. The films of polythiocyanurates exhibited good thermal stabilities such as thermal decomposition temperatures of 320 ˚C in air. A relatively high glass transition temperatures of the polymers were in the range of 112-143 ˚C. The optical transmittance of the films was as high as 80% at 400 nm. The films exhibited high refractive index of 1.73 at d line, which is attributed to the triazine rings and sulfur atoms, and Abbe's number of around 18. Furthermore, the f ilms showed the low birefringence of 0.0007-0.0022 at d-line. The obtained polymers are promising candidates for thermoplastic optical lens application. Copolymers of polysilane and allyl methacrylate were prepared using the polysilane as a photoradical initiator. The polysilane block and allyl group were retained even after photopolymerization. The σ -conjugation of polysilane block in the copolymer allowed it to exhibit light absorption in the ultraviolet region. Subsequently, an ene-thiol reaction between the copolymer and mercapto-containing molecule was carried out by photocuring a thin film of the mixture. The photoreaction formed –CH–CH 2 –S– bonding between the organic component and a silica component that was formed by photolysis of the polysilane block in the copolymer. Therefore, the polysilane-allyl methacrylate copolymer successfully provided a silicon-rich organic–inorganic hybrid material.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"11 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78591448","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement 用接触角测量法分析化学放大阻光刻膜中光酸产生源的亲和力

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.111

Shinji Yamakawa, Ako Yamamoto, S. Yasui, Takeo Watanabe, T. Harada

{"title":"Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement","authors":"Shinji Yamakawa, Ako Yamamoto, S. Yasui, Takeo Watanabe, T. Harada","doi":"10.2494/photopolymer.34.111","DOIUrl":"https://doi.org/10.2494/photopolymer.34.111","url":null,"abstract":"Photopolym. Sci. Technol., 27 (2014) 623. 6. A. Sekiguchi, Y. Kono, and Y. Sensu, J. Photopolym. Sci. Technol., 16 (2003) 209. 7. M. Yanagihara, J. Cao, M. Yamamoto, A. Arai, S. Nakayama, T. Mizuide, and T. Namioka, Applied Optics, 30 (1991) 2807. 8. M. Yoshifuji, S. Niihara, T. Harada, and T. Watanabe. Jpn. J. Appl. Phys., 58 (2019). 9. Y. Fukushima, T. Watanabe, T. Harada, and H. Kinoshita. J. Photopolym. Sci. Technol., 22 (2009) 85. 10. T. Ishiguro, J. Tanaka, T. Harada, and T. Watanabe. J. Photopolym. Sci. Technol., 32 (2019) 333. 11. B. Cardineau, R. D. Re, H. Al-Mashat, M. Marnell, M. Vockenhuber, Y. Ekinci, C. Sarma, M. Neisser, D. A. Freedman, and R. L. Brainard, Proc. SPIE, 9051 (2014). 12. A. Sekiguchi, T. Harada, and T. Watanabe, Proc. SPIE, 10143 (2017). 13. A. Sekiguchi, Y. Matsumoto, M. Isono, M. Naito, Y. Utsumi, T. Harada, and T. Watanabe, Proc. SPIE, 10583 (2018). 14. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, IEEE Trans. Electron Devices, 22 (1975) 445. 15. F. H. Dill, IEEE Trans. Electron Devices, 22 (1975) 440. Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"121 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74224473","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Synthesis of Ordered Fluorinated BCPs with One Block Composed of Random Copolymer 无规共聚物单嵌段有序氟化bcp的合成

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.335

Min Cao, H. Deng

引用次数: 0

Siloxane Oligomer with Random Structure for Use in Photosensitive White Decorative Coatings 无规结构硅氧烷低聚物在光敏白色装饰涂料中的应用

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.517

Mitsuhito Suwa, Toru Okazawa, Hideyuki Kobayashi

{"title":"Siloxane Oligomer with Random Structure for Use in Photosensitive White Decorative Coatings","authors":"Mitsuhito Suwa, Toru Okazawa, Hideyuki Kobayashi","doi":"10.2494/photopolymer.34.517","DOIUrl":"https://doi.org/10.2494/photopolymer.34.517","url":null,"abstract":"A siloxane oligomer (Si-OLIGO-1) was produced by introduction of a bifunctional alkoxysilane into a silsesquioxane composed of a trifunctional alkoxysilane. The oligomer, which can form a thick film, was synthesized by a sol–gel method. This organic/inorganic hybrid material had good transparency and heat resistance. Infrared absorption spectroscopic analysis indicated that Si-OLIGO-1 had a random structure with many acidic silanol groups capable of alkaline development. A novel negative photosensitive white decorative coating that consisted of Si-OLIGO-1 as the base resin and 40 wt% TiO 2 (particle size 250 nm) as a white pigment was produced. The coating enabled facile complex decoration. A white cured film of thickness 10 µm had the brightness ( L *) and color ( a *, b *) required for the white frame of a display product. Although the coating did not transmit straight light of wavelength 300–700 nm, it gave a good patterning performance (resolution and pattern shape) on irradiation with ultraviolet light at a dose of 200–250 mJ/cm 2 . This is because it transmitted both g-line and h-line scattered light.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"152 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86228228","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Improved Hole-Transporting Properties in Conjugated Polymers Mixed with Polystyrene as an Insulating Polymer 与聚苯乙烯混合的共轭聚合物作为绝缘聚合物的空穴输运性能的改进

IF 0.8 4区化学

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.291

Yuya Horiuchi, Koshiro Midori, H. Kim, H. Ohkita

引用次数: 0