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Journal of Photopolymer Science and Technology最新文献

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Impact of Water Treatment Reactor using TiO2-coated Micropillar Made by UV-NIL UV-NIL包覆二氧化钛微柱对水处理反应器的影响
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.127
Kazuki Daigo, Ryota Akama, N. Unno, S. Satake, J. Taniguchi
{"title":"Impact of Water Treatment Reactor using TiO2-coated Micropillar Made by UV-NIL","authors":"Kazuki Daigo, Ryota Akama, N. Unno, S. Satake, J. Taniguchi","doi":"10.2494/photopolymer.34.127","DOIUrl":"https://doi.org/10.2494/photopolymer.34.127","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"34 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74002259","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Protrusion Formation of Polymer Surface by Atomic Hydrogen Annealing 原子氢退火技术在聚合物表面形成突起的研究
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.561
A. Heya, K. Sumitomo
{"title":"Protrusion Formation of Polymer Surface by Atomic Hydrogen Annealing","authors":"A. Heya, K. Sumitomo","doi":"10.2494/photopolymer.34.561","DOIUrl":"https://doi.org/10.2494/photopolymer.34.561","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"24 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85414734","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Development of Bile Direct Stent Having Antifouling Properties by Atmospheric Pressure Low-Temperature Plasma 常压低温等离子体抗脏胆汁直接支架的研制
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.401
A. Sekiguchi, Masashi Yamamoto, T. Kumagai, Youichirou Mori, H. Minami, M. Aikawa, H. Horibe
{"title":"Development of Bile Direct Stent Having Antifouling Properties by Atmospheric Pressure Low-Temperature Plasma","authors":"A. Sekiguchi, Masashi Yamamoto, T. Kumagai, Youichirou Mori, H. Minami, M. Aikawa, H. Horibe","doi":"10.2494/photopolymer.34.401","DOIUrl":"https://doi.org/10.2494/photopolymer.34.401","url":null,"abstract":"Biomimetics (or biomimicry) is a field of technologies based on imitating various functions and properties of organisms. examined structure structures the scale nanoholes, the thin water is costly and unsuitable for mass production. To overcome these issues, we sought to develop elemental technologies for providing antifouling properties to biliary stents, which are made of polyethylenes (PEs), by forming nanostructures directly on the inner surface, using atmospheric pressure low-temperature plasma. We formed nanostructures on the inner walls of PE tubes of varying diameters under varying plasma conditions. We then examined the resulting structures and effects of the antifouling properties thus imparted.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"32 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84989692","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Microstructure Formation on Poly (Methyl Methacrylate) Film Using Atmospheric Pressure Low-Temperature Plasma 常压低温等离子体制备聚甲基丙烯酸甲酯薄膜的微结构
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.385
Masashi Yamamoto, Youichirou Mori, T. Kumagai, A. Sekiguchi, H. Minami, H. Horibe
{"title":"Microstructure Formation on Poly (Methyl Methacrylate) Film Using Atmospheric Pressure Low-Temperature Plasma","authors":"Masashi Yamamoto, Youichirou Mori, T. Kumagai, A. Sekiguchi, H. Minami, H. Horibe","doi":"10.2494/photopolymer.34.385","DOIUrl":"https://doi.org/10.2494/photopolymer.34.385","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"12 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87803884","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Micropatterning Performance and Physical Characteristics of Water-soluble High Molecular Weight Polysaccharide Photoresist Materials 水溶性高分子量多糖光刻胶材料的微图纹性能和物理特性
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.181
Toru Amano, Makoto Kobayasi, S. Takei
{"title":"Micropatterning Performance and Physical Characteristics of Water-soluble High Molecular Weight Polysaccharide Photoresist Materials","authors":"Toru Amano, Makoto Kobayasi, S. Takei","doi":"10.2494/photopolymer.34.181","DOIUrl":"https://doi.org/10.2494/photopolymer.34.181","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"8 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75076270","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Properties of Imidazolinium-containing Multiblock Amphiphile in Lipid Bilayer Membranes 脂质双层膜中含咪唑多嵌段两亲化合物的性质
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.161
M. Mori, K. Kinbara
{"title":"Properties of Imidazolinium-containing Multiblock Amphiphile in Lipid Bilayer Membranes","authors":"M. Mori, K. Kinbara","doi":"10.2494/photopolymer.34.161","DOIUrl":"https://doi.org/10.2494/photopolymer.34.161","url":null,"abstract":"A multiblock amphiphile CBA bearing a cationic imidazolinium moiety at its center formed different types of assembly in THF and CHCl 3 , which show characteristic emission bands around 300 and 465 nm upon excitation at 295 and 320 nm, respectively. These assemblies were able to be transferred into lipid bilayer membranes, keeping the similar spectral profiles with those in solutions. These results indicate a new potential of self-assembling processes for the control of supramolecular architecture hierarchically formed in lipid bilayer membranes.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"68 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77971990","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility 显影剂中甘油对novolak型正音抗溶解度的影响
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.495
Shunpei Kajita, Yukiko Miyaji, H. Horibe
{"title":"Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility","authors":"Shunpei Kajita, Yukiko Miyaji, H. Horibe","doi":"10.2494/photopolymer.34.495","DOIUrl":"https://doi.org/10.2494/photopolymer.34.495","url":null,"abstract":"Photoresist is used for circuit fabrication in semiconductor devices. The material generally used for manufacturing semiconductor devices is the novolak-type positive-tone resist; however, it is necessary to minimize its line width while improving the resolution. To improve the resolution of novolak-type positive-tone resist, in this study, developers containing water-soluble organic solvents or surface-activating agents have been designed for controlling the resist solubility. The addition of glycerol, as a water-soluble organic solvent in the developer, inhibits the dissolution of the novolak resist, particularly in the unexposed area. The developer containing glycerol improves the novolak resist resolution, thereby developing a fine pattern.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"2022 28","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72536531","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Evaluation of Color Stability of Experimental Dental Composite Resins Prepared from Bis-EFMA, A Novel Monomer System 新型单体体系Bis-EFMA制备实验性牙科复合树脂的颜色稳定性评价
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.297
Ömer Hatipoğlu, E. A. Turumtay, A. Saygın, F. Hatipoğlu
{"title":"Evaluation of Color Stability of Experimental Dental Composite Resins Prepared from Bis-EFMA, A Novel Monomer System","authors":"Ömer Hatipoğlu, E. A. Turumtay, A. Saygın, F. Hatipoğlu","doi":"10.2494/photopolymer.34.297","DOIUrl":"https://doi.org/10.2494/photopolymer.34.297","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"12 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82908250","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Suspensions of Polymer Hydrogel Microparticles with Highly Sensitive Detectability of Glucose 具有葡萄糖高灵敏度检测的高分子水凝胶微颗粒悬浮液
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.555
Tatsuya Kawa, Y. Shibata, Naoto Iwata, S. Furumi
{"title":"Suspensions of Polymer Hydrogel Microparticles with Highly Sensitive Detectability of Glucose","authors":"Tatsuya Kawa, Y. Shibata, Naoto Iwata, S. Furumi","doi":"10.2494/photopolymer.34.555","DOIUrl":"https://doi.org/10.2494/photopolymer.34.555","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"66 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90409189","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Flexible and Semi-Transparent Antenna for ISM Band Fabricated by Direct Laser Writing 直接激光刻写制备ISM波段柔性半透明天线
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.149
A. F. M. Moshiur Rahman, Akira Watanabe
{"title":"Flexible and Semi-Transparent Antenna for ISM Band Fabricated by Direct Laser Writing","authors":"A. F. M. Moshiur Rahman, Akira Watanabe","doi":"10.2494/photopolymer.34.149","DOIUrl":"https://doi.org/10.2494/photopolymer.34.149","url":null,"abstract":"In this paper, a flexible and semi-transparent antenna is proposed having impedance bandwidth of 110 MHz (from 2.45 GHz to 2.56 GHz) of ISM band which covers the most popular (2.4 GHz) for Wi-Fi application all over the world. A simple dipole shape rectangular ring antenna with two extended edge on the opposite sides was prepared by laser direct writing on an Au sputtered PET film. The center part of the antenna was kept empty and transparent intentionally to incorporate with either a planar capacitor for microwave wireless charging or to integrate this antenna with a solar cell in future. The compact, miniature and flexibility of the antenna are suitable for easy integration in any smart devices or clothing for wireless charging to implement self-powered sensors. The performance of the patch antenna is evaluated using return loss (S11) parameter analysis. A measured reflection coefficient and simulated current distribution along with radiation pattern demonstrate that the fabricated antenna is suitable for Wi-Fi application.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85155446","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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