Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility

Abstract

Photoresist is used for circuit fabrication in semiconductor devices. The material generally used for manufacturing semiconductor devices is the novolak-type positive-tone resist; however, it is necessary to minimize its line width while improving the resolution. To improve the resolution of novolak-type positive-tone resist, in this study, developers containing water-soluble organic solvents or surface-activating agents have been designed for controlling the resist solubility. The addition of glycerol, as a water-soluble organic solvent in the developer, inhibits the dissolution of the novolak resist, particularly in the unexposed area. The developer containing glycerol improves the novolak resist resolution, thereby developing a fine pattern.