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Journal of Photopolymer Science and Technology最新文献

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Process and Sensitivity Optimisation of the Multi-Trigger Resist 多触发电阻制程及灵敏度优化
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.75
C. Popescu, G. O'Callaghan, C. Storey, A. McClelland, J. Roth, E. Jackson, A.P.G. Robinson
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引用次数: 0
Effect of Alternative Developer Solutions on EUVL Patterning 不同显影剂溶液对EUVL图案的影响
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.67
J. Santillan, Kyoko Shimizu, R. Otogawa, T. Itani
{"title":"Effect of Alternative Developer Solutions on EUVL Patterning","authors":"J. Santillan, Kyoko Shimizu, R. Otogawa, T. Itani","doi":"10.2494/photopolymer.35.67","DOIUrl":"https://doi.org/10.2494/photopolymer.35.67","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"29 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74285420","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Nanoimprint with CO2 Ambient 纳米压印与二氧化碳环境
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.105
Toshiki Ito, Yuto Ito, I. Kawata, Ken-ichi Ueyama, Kouhei Nagane, Weijun Liu, T. Stachowiak, Wei Zhang, Teresa Estrada
{"title":"Nanoimprint with CO2 Ambient","authors":"Toshiki Ito, Yuto Ito, I. Kawata, Ken-ichi Ueyama, Kouhei Nagane, Weijun Liu, T. Stachowiak, Wei Zhang, Teresa Estrada","doi":"10.2494/photopolymer.35.105","DOIUrl":"https://doi.org/10.2494/photopolymer.35.105","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"12 6","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72592899","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of Counteranions on the Performance of Tin-based EUV Photoresists 反阴离子对锡基EUV光刻胶性能的影响
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.95
Q. Evrard, N. Sadegh, Y. Ekinci, M. Vockenhuber, N. Mahne, A. Giglia, S. Nannarone, T. Goya, T. Sugioka, A. Brouwer
{"title":"Influence of Counteranions on the Performance of Tin-based EUV Photoresists","authors":"Q. Evrard, N. Sadegh, Y. Ekinci, M. Vockenhuber, N. Mahne, A. Giglia, S. Nannarone, T. Goya, T. Sugioka, A. Brouwer","doi":"10.2494/photopolymer.35.95","DOIUrl":"https://doi.org/10.2494/photopolymer.35.95","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"75 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74483252","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Formation and Stability of Cs2SnBr6 Perovskite Nanocrystals from CsSn2Br5 Nanocubes Cs2SnBr6钙钛矿纳米晶的形成及稳定性
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.199
Maning Liu, Mohamed Abodya, Weisi Dai, T. Kawawaki, R. Sato, M. Saruyama, T. Teranishi, Y. Tachibana
{"title":"Formation and Stability of Cs2SnBr6 Perovskite Nanocrystals from CsSn2Br5 Nanocubes","authors":"Maning Liu, Mohamed Abodya, Weisi Dai, T. Kawawaki, R. Sato, M. Saruyama, T. Teranishi, Y. Tachibana","doi":"10.2494/photopolymer.35.199","DOIUrl":"https://doi.org/10.2494/photopolymer.35.199","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"23 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74647564","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Flexible in-plane Micro-Supercapacitor Prepared by Laser Annealing and Ablation of a Graphene/Polyamide Acid Composite 石墨烯/聚酰胺酸复合材料激光退火烧蚀制备柔性平面内微型超级电容器
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.143
A. Watanabe, Ashiqur Rahman, Jinguang Cai, M. Akhtaruzzaman
{"title":"Flexible in-plane Micro-Supercapacitor Prepared by Laser Annealing and Ablation of a Graphene/Polyamide Acid Composite","authors":"A. Watanabe, Ashiqur Rahman, Jinguang Cai, M. Akhtaruzzaman","doi":"10.2494/photopolymer.35.143","DOIUrl":"https://doi.org/10.2494/photopolymer.35.143","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"51 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79203892","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Designing Er3+/Ho3+-Doped Near-Infrared (NIR-II) Fluorescent Ceramic Particles for Avoiding Optical Absorption by Water 避免水光吸收的Er3+/Ho3+掺杂近红外(NIR-II)荧光陶瓷颗粒设计
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.9
M. Umezawa, H. Kurahashi, K. Nigoghossian, K. Okubo, K. Soga
{"title":"Designing Er3+/Ho3+-Doped Near-Infrared (NIR-II) Fluorescent Ceramic Particles for Avoiding Optical Absorption by Water","authors":"M. Umezawa, H. Kurahashi, K. Nigoghossian, K. Okubo, K. Soga","doi":"10.2494/photopolymer.35.9","DOIUrl":"https://doi.org/10.2494/photopolymer.35.9","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"67 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74612317","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Fabrication of a Rose-Petal-Inspired Micro/Nanostructured Surface via the Ultraviolet Nanoimprint Lithography and Roll-Press Methods 紫外光压印和滚压法制备玫瑰花瓣微纳米结构表面
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.117
K. Fujiwara, H. Sugawara, J. Taniguchi
{"title":"Fabrication of a Rose-Petal-Inspired Micro/Nanostructured Surface via the Ultraviolet Nanoimprint Lithography and Roll-Press Methods","authors":"K. Fujiwara, H. Sugawara, J. Taniguchi","doi":"10.2494/photopolymer.35.117","DOIUrl":"https://doi.org/10.2494/photopolymer.35.117","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"100 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90066401","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity CYP1A2和CYP还原酶在自组装磷脂层上的固定化及其活性评价
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.309
S. Kondo, A. Ishii, Naoki Doi, Y. Sasai, Y. Yamauchi, M. Kuzuya
{"title":"Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity","authors":"S. Kondo, A. Ishii, Naoki Doi, Y. Sasai, Y. Yamauchi, M. Kuzuya","doi":"10.2494/photopolymer.35.309","DOIUrl":"https://doi.org/10.2494/photopolymer.35.309","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"33 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90559430","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Photo-degradation of Di- and Trifunctional Oxime Ethers Bearing Polyphthalaldehyde Arms 含聚邻苯二醛臂的二官能团和三官能团肟醚的光降解研究
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.171
K. Suyama, H. Hayashi, Hideki Tachi
{"title":"Photo-degradation of Di- and Trifunctional Oxime Ethers Bearing Polyphthalaldehyde Arms","authors":"K. Suyama, H. Hayashi, Hideki Tachi","doi":"10.2494/photopolymer.35.171","DOIUrl":"https://doi.org/10.2494/photopolymer.35.171","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"34 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82743460","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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