用接触角测量法分析化学放大阻光刻膜中光酸产生源的亲和力

IF 0.4 4区化学 Q4 POLYMER SCIENCE

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI:10.2494/photopolymer.34.111

Shinji Yamakawa, Ako Yamamoto, S. Yasui, Takeo Watanabe, T. Harada

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Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement

Photopolym. Sci. Technol., 27 (2014) 623. 6. A. Sekiguchi, Y. Kono, and Y. Sensu, J. Photopolym. Sci. Technol., 16 (2003) 209. 7. M. Yanagihara, J. Cao, M. Yamamoto, A. Arai, S. Nakayama, T. Mizuide, and T. Namioka, Applied Optics, 30 (1991) 2807. 8. M. Yoshifuji, S. Niihara, T. Harada, and T. Watanabe. Jpn. J. Appl. Phys., 58 (2019). 9. Y. Fukushima, T. Watanabe, T. Harada, and H. Kinoshita. J. Photopolym. Sci. Technol., 22 (2009) 85. 10. T. Ishiguro, J. Tanaka, T. Harada, and T. Watanabe. J. Photopolym. Sci. Technol., 32 (2019) 333. 11. B. Cardineau, R. D. Re, H. Al-Mashat, M. Marnell, M. Vockenhuber, Y. Ekinci, C. Sarma, M. Neisser, D. A. Freedman, and R. L. Brainard, Proc. SPIE, 9051 (2014). 12. A. Sekiguchi, T. Harada, and T. Watanabe, Proc. SPIE, 10143 (2017). 13. A. Sekiguchi, Y. Matsumoto, M. Isono, M. Naito, Y. Utsumi, T. Harada, and T. Watanabe, Proc. SPIE, 10583 (2018). 14. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, IEEE Trans. Electron Devices, 22 (1975) 445. 15. F. H. Dill, IEEE Trans. Electron Devices, 22 (1975) 440. Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement

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来源期刊

Journal of Photopolymer Science and Technology 化学-高分子科学

CiteScore

1.50

自引率

25.00%

发文量

审稿时长

4-8 weeks

期刊介绍： Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.