Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst

IF 0.4 4区化学 Q4 POLYMER SCIENCE

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI:10.2494/photopolymer.34.499

Koki Akita, Shota Sogo, Ryusei Sogame, Masashi Yamamoto, S. Nagaoka, H. Umemoto, H. Horibe

引用次数: 0

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钨热丝催化剂活化H2/O2混合物去除不同浓度光活性化合物Novolac光刻胶

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Journal of Photopolymer Science and Technology 化学-高分子科学

CiteScore

1.50

自引率

25.00%

发文量

审稿时长

4-8 weeks

期刊介绍： Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.