钨热丝催化剂活化H2/O2混合物去除不同浓度光活性化合物Novolac光刻胶

IF 0.4 4区 化学 Q4 POLYMER SCIENCE
Koki Akita, Shota Sogo, Ryusei Sogame, Masashi Yamamoto, S. Nagaoka, H. Umemoto, H. Horibe
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Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst
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来源期刊
CiteScore
1.50
自引率
25.00%
发文量
0
审稿时长
4-8 weeks
期刊介绍: Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.
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