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Journal of Photopolymer Science and Technology最新文献

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Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure KrF、EB和EUV曝光光刻胶灵敏度的比较
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.49
Yosuke Ohta, A. Sekiguchi, Shinji Yamakawa, T. Harada, Takeo Watanabe, Hiroki Yamamoto
{"title":"Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure","authors":"Yosuke Ohta, A. Sekiguchi, Shinji Yamakawa, T. Harada, Takeo Watanabe, Hiroki Yamamoto","doi":"10.2494/photopolymer.35.49","DOIUrl":"https://doi.org/10.2494/photopolymer.35.49","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"21 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76579671","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication 用于晶圆级微流控器件制造的低残余应力光敏胶粘剂材料的研制
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.313
Takashi Doi, Isao Nishimura, M. Kaneko, T. Shimokawa
{"title":"Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication","authors":"Takashi Doi, Isao Nishimura, M. Kaneko, T. Shimokawa","doi":"10.2494/photopolymer.35.313","DOIUrl":"https://doi.org/10.2494/photopolymer.35.313","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"9 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84237988","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing EUV金属氧化物抗蚀剂开发技术，用于提高灵敏度，粗糙度和大批量生产的图案崩溃裕度
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.87
C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley
{"title":"EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing","authors":"C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley","doi":"10.2494/photopolymer.35.87","DOIUrl":"https://doi.org/10.2494/photopolymer.35.87","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"25 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78107535","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer 重分配层用低温固化低Dk & Df聚酰亚胺
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.261
Masaya Jukei, Hitoshi Araki, Hisashi Ogasawara, Akira Shimada, T. Fujiwara, Masao Tomikawa
{"title":"Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer","authors":"Masaya Jukei, Hitoshi Araki, Hisashi Ogasawara, Akira Shimada, T. Fujiwara, Masao Tomikawa","doi":"10.2494/photopolymer.35.261","DOIUrl":"https://doi.org/10.2494/photopolymer.35.261","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75570134","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Biomimetic Diamond-like Carbon Coating on a Lumen of Small-diameter Long-sized Tube Modified Surface Uniformly with Carboxyl Group using Oxygen Plasma 用氧等离子体均匀修饰小直径长管管腔表面的仿生类金刚石涂层
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.289
Yuichi Imai, Hiroyuki Fukue, T. Nakatani, S. Kunitsugu, K. Kanda, Tsuneo Suzuki, S. Watari, Y. Fujii, D. Ousaka, Susumu Oozawa, Tomio Uchi
{"title":"Biomimetic Diamond-like Carbon Coating on a Lumen of Small-diameter Long-sized Tube Modified Surface Uniformly with Carboxyl Group using Oxygen Plasma","authors":"Yuichi Imai, Hiroyuki Fukue, T. Nakatani, S. Kunitsugu, K. Kanda, Tsuneo Suzuki, S. Watari, Y. Fujii, D. Ousaka, Susumu Oozawa, Tomio Uchi","doi":"10.2494/photopolymer.35.289","DOIUrl":"https://doi.org/10.2494/photopolymer.35.289","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85874843","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate 微波激发水蒸气等离子体对离子注入光刻胶的高速灰化研究
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-01-01 DOI: 10.2494/photopolymer.35.365
Takeshi Aizawa, Tasuku Sakurai, Khant Nyar Paing, Yusuke Kayamori, Y. Nakano, Yasunori Tanaka, T. Ishijima
{"title":"High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate","authors":"Takeshi Aizawa, Tasuku Sakurai, Khant Nyar Paing, Yusuke Kayamori, Y. Nakano, Yasunori Tanaka, T. Ishijima","doi":"10.2494/photopolymer.35.365","DOIUrl":"https://doi.org/10.2494/photopolymer.35.365","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"03 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80087345","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors 拱形和s型萘双噻二唑基受体的合成、性质和光伏特性
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.285
Seihou Jinnai, Y. Ie
{"title":"Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors","authors":"Seihou Jinnai, Y. Ie","doi":"10.2494/photopolymer.34.285","DOIUrl":"https://doi.org/10.2494/photopolymer.34.285","url":null,"abstract":"Fine-tuning physical properties by structural modification is important for developing organic semiconducting materials. In this work, we designed and synthesized new electron-accepting compounds containing or naphtho[1,2- c :5,6- c' ]bis[1,2,5]thiadiazole (NTz) groups as electron-accepting units; these units are structural isomers. The vNTz-based compounds have an arch-shaped molecular backbone with C 2v symmetry, whereas the NTz-based compound forms an S-shaped molecular backbone with C 2h symmetry. Property measurements showed unique behavior originating from the vNTz core. An organic solar cell comprising the vNTz-based compound and poly(3-hexylthiopehene) showed a power conversion efficiency of 2.06%. This result demonstrates the potential of vNTz as an electron-accepting unit in organic semiconducting materials.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"11 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89286889","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Photoluminescence Properties of Copolyimides Containing Naphthalene Core and Analysis of Excitation Energy Transfer between the Dianhydride Moieties 含萘核共聚亚胺的光致发光性质及二氢基间激发能转移分析
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.423
Marina Doi, Koichiro Muto, Mayuko Nara, Naiqiang Liang, K. Sano, Hiroaki Mori, R. Ishige, S. Ando
{"title":"Photoluminescence Properties of Copolyimides Containing Naphthalene Core and Analysis of Excitation Energy Transfer between the Dianhydride Moieties","authors":"Marina Doi, Koichiro Muto, Mayuko Nara, Naiqiang Liang, K. Sano, Hiroaki Mori, R. Ishige, S. Ando","doi":"10.2494/photopolymer.34.423","DOIUrl":"https://doi.org/10.2494/photopolymer.34.423","url":null,"abstract":"The photoluminescence (PL) properties of semi-aromatic polyimide (PI) films and their model compounds (MCs) prepared from dianhydrides having a rigid naphthalene core were analyzed. The PMMA-dispersed MC and copolymerized PI (CoPI) films derived from 2,3,6,7-naphthalenetetracarboxylic dianhydride (NTDA) exhibited long-lived phosphorescence owing to the suppression of molecular motion by the rigidity of a naphthalene core. Additionally, the PMMA-dispersed MC and the CoPI films derived from 1,5-dibromo derivative of NTDA (DBrNT) exhibited room-temperature phosphorescence due to the enhancement of spin-orbit coupling by bromine atoms. The photophysical processes of the CoPI films prepared from NTDA/DBrNT and 4,4'-oxydiphtalic dianhydride (ODPA) in which the latter absorption band is located at a shorter wavelength than the former were analyzed. After UV irradiation, efficient excitation energy transfer occurs from the ODPA to NTDA/DBrNT moieties, and only the emission from the latter moieties was observed. These results demonstrate that the CoPI films derived from two dianhydrides absorbing different UV wavelengths can be used as spectral conversion films that convert a wide range of UV-light into longer wavelength visible","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"13 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87514520","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Analyses of Charge Accumulation of PTzBT Ternary Polymer Solar Cells Using ESR Spectroscopy PTzBT三元聚合物太阳能电池电荷积累的ESR分析
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.351
D. Xue, M. Saito, I. Osaka, K. Marumoto
{"title":"Analyses of Charge Accumulation of PTzBT Ternary Polymer Solar Cells Using ESR Spectroscopy","authors":"D. Xue, M. Saito, I. Osaka, K. Marumoto","doi":"10.2494/photopolymer.34.351","DOIUrl":"https://doi.org/10.2494/photopolymer.34.351","url":null,"abstract":"phenomenon, we hypothesize that energy transfer from 1,2-dioxetanedione to DNSE occurred momentarily in the THF and water solution because of their miscibility. Note that, in highly polar solvents, the emission of DNSE was not visualized, probably because the rate of chemiluminescent reaction is too fast to visually detect the emission caused by the miscibility of their solvents with water in comparison with the case observed using low-polarity solvents. Moreover, no emission was observed with ethyl acetate, although it is immiscible with water. This is probably because the reaction of ethyl acetate with hydrogen peroxide was faster than the oxidation of bis(2,4,6-trichlorophenyl) oxalate. As a result, DNSE was not excited because 1,2-dioxetanedione was not produced.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"13 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78503331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Glass Microchannel Formation by Mycelium 菌丝体形成玻璃微通道
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI: 10.2494/photopolymer.34.381
D. Sato, F. Tsumori
{"title":"Glass Microchannel Formation by Mycelium","authors":"D. Sato, F. Tsumori","doi":"10.2494/photopolymer.34.381","DOIUrl":"https://doi.org/10.2494/photopolymer.34.381","url":null,"abstract":"We propose a new method to fabricate complicated 3-dimensional glass microchannels. We employed mycelium for this purpose. Mycelium possesses a complicated, fine and three-dimensional network structure. We cultivated mycelium in silica compounds, and subsequently silica compounds were heated to be sintered. During this heating process, all the mycelium was burned off and remained a fine network channel structure in a transparent glass chip. We also tried to control of the growth of this mycelium. The growth could be changed by growth conditions. In this work, we used cyclic mechanical stimuli for this purpose. We set cyclic tensile strain to the sample under growing mycelium. This cyclic strain caused anisotropic growth of the mycelium in some condition.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"46 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76239773","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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