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Journal of Photopolymer Science and Technology最新文献

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Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight 主链断裂型抗蚀剂溶解动力学与分子量的关系
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.1
A. Konda, Hiroki Yamamoto, S. Yoshitake, T. Kozawa
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引用次数: 0
Synthesis, Properties, and Photovoltaic Characteristics of Fluoranthenedione-containing Nonfullerene Acceptors for Organic Solar Cells 有机太阳能电池用含氟蒽二酮非富勒烯受体的合成、性质及光伏特性
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.187
Shreyam Chatterjee, Y. Ie
{"title":"Synthesis, Properties, and Photovoltaic Characteristics of Fluoranthenedione-containing Nonfullerene Acceptors for Organic Solar Cells","authors":"Shreyam Chatterjee, Y. Ie","doi":"10.2494/photopolymer.35.187","DOIUrl":"https://doi.org/10.2494/photopolymer.35.187","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"146 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86649830","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Adhesion Improvement Mechanism of Polytetrafluoroethylene by Heat-assisted Atmospheric Pressure Glow Plasma Treatment 热辅助常压辉光等离子体处理提高聚四氟乙烯附着力的机理
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.299
Kunihito Tanaka, Koya Sato, Kazuo Takahashi, M. Kogoma
{"title":"Adhesion Improvement Mechanism of Polytetrafluoroethylene by Heat-assisted Atmospheric Pressure Glow Plasma Treatment","authors":"Kunihito Tanaka, Koya Sato, Kazuo Takahashi, M. Kogoma","doi":"10.2494/photopolymer.35.299","DOIUrl":"https://doi.org/10.2494/photopolymer.35.299","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"44 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90731321","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Acid-responsive Emission Color Changes of Diarylaminobenzylideneanilines 二芳胺对偶酶二苯胺的酸响应性发光颜色变化
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.341
Takuma Tsukada, H. Nakano
{"title":"Acid-responsive Emission Color Changes of Diarylaminobenzylideneanilines","authors":"Takuma Tsukada, H. Nakano","doi":"10.2494/photopolymer.35.341","DOIUrl":"https://doi.org/10.2494/photopolymer.35.341","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"209 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73937145","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings 模拟蝉翅的纳米柱阵列聚合物抗菌表面
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.213
Natsuki Ogawa, Kodai Sato, K. Sunada, Hisashi Ishiguro, H. Kojima, Takeshi Ito
{"title":"Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings","authors":"Natsuki Ogawa, Kodai Sato, K. Sunada, Hisashi Ishiguro, H. Kojima, Takeshi Ito","doi":"10.2494/photopolymer.35.213","DOIUrl":"https://doi.org/10.2494/photopolymer.35.213","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"34 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73139420","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Fabrication of Glass Microchannels Using Plant Roots and Nematodes 利用植物根和线虫制备玻璃微通道
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.219
Tetsuro Koga, F. Tsumori
{"title":"Fabrication of Glass Microchannels Using Plant Roots and Nematodes","authors":"Tetsuro Koga, F. Tsumori","doi":"10.2494/photopolymer.35.219","DOIUrl":"https://doi.org/10.2494/photopolymer.35.219","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"25 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74513060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma 微波激发水蒸气等离子体光刻胶灰化过程压力依赖性研究
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.371
Khant Nyar Paing, Takeshi Aizawa, Hiroto Nishioka, Masashi Yamamoto, Tasuku Sakurai, Bat-Orgil Erdenezaya, Yusuke Kayamori, Y. Nakano, Yasunori Tanaka, T. Ishijima
{"title":"Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma","authors":"Khant Nyar Paing, Takeshi Aizawa, Hiroto Nishioka, Masashi Yamamoto, Tasuku Sakurai, Bat-Orgil Erdenezaya, Yusuke Kayamori, Y. Nakano, Yasunori Tanaka, T. Ishijima","doi":"10.2494/photopolymer.35.371","DOIUrl":"https://doi.org/10.2494/photopolymer.35.371","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"40 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78369704","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Controlled Sequence Photoresists from Polypeptoids 多肽类受控序列光刻胶
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.29
F. Kaefer, Z. MEng, R. Segalman, C. Ober
{"title":"Controlled Sequence Photoresists from Polypeptoids","authors":"F. Kaefer, Z. MEng, R. Segalman, C. Ober","doi":"10.2494/photopolymer.35.29","DOIUrl":"https://doi.org/10.2494/photopolymer.35.29","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"11 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78596126","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Determination of Radiation Dose Leading to Molecular Chain Destruction of Amino Acids 导致氨基酸分子链破坏的辐射剂量测定
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.255
Shunya Saegusa, Ryo Nakamura, N. Akamatsu, Y. Utsumi, Tomoko Ishihara, Masaki Oura, A. Yamaguchi
{"title":"Determination of Radiation Dose Leading to Molecular Chain Destruction of Amino Acids","authors":"Shunya Saegusa, Ryo Nakamura, N. Akamatsu, Y. Utsumi, Tomoko Ishihara, Masaki Oura, A. Yamaguchi","doi":"10.2494/photopolymer.35.255","DOIUrl":"https://doi.org/10.2494/photopolymer.35.255","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"49 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76816028","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials 一种双吡啶二硫交联试剂的合成及其在异种材料光粘附中的应用
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.337
M. Furutani, Ritsuto Senkyo
{"title":"Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials","authors":"M. Furutani, Ritsuto Senkyo","doi":"10.2494/photopolymer.35.337","DOIUrl":"https://doi.org/10.2494/photopolymer.35.337","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"83 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83739921","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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