发布求助
文献互助 智能选刊 最新文献

Journal of Photopolymer Science and Technology最新文献

筛选
英文 中文
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists 金属基极紫外光抗蚀剂的化学机理
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.81
A. Brouwer
{"title":"Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists","authors":"A. Brouwer","doi":"10.2494/photopolymer.35.81","DOIUrl":"https://doi.org/10.2494/photopolymer.35.81","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"27 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74683205","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Progress in EUV Photoresists for High-Resolution Patterning 用于高分辨率图案化的极紫外光刻胶研究进展
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.101
Yusuke Otsubo, K. Sakai, K. Kasahara, Hong Xu, E. Giannelis, C. Ober
{"title":"Progress in EUV Photoresists for High-Resolution Patterning","authors":"Yusuke Otsubo, K. Sakai, K. Kasahara, Hong Xu, E. Giannelis, C. Ober","doi":"10.2494/photopolymer.35.101","DOIUrl":"https://doi.org/10.2494/photopolymer.35.101","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79950229","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Surface Functionalization of Diamond-like Carbon Film with Biocompatible Polymer Brushes 类金刚石碳膜生物相容性聚合物刷的表面功能化
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.303
Y. Sasai, D. Ousaka, Y. Fujii, Aoi Isono, Y. Yamauchi, S. Kondo, Tatsuyuki Nakatiani
{"title":"Surface Functionalization of Diamond-like Carbon Film with Biocompatible Polymer Brushes","authors":"Y. Sasai, D. Ousaka, Y. Fujii, Aoi Isono, Y. Yamauchi, S. Kondo, Tatsuyuki Nakatiani","doi":"10.2494/photopolymer.35.303","DOIUrl":"https://doi.org/10.2494/photopolymer.35.303","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82943060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process 磁控溅射法制备薄水铝石纳米阵列上生长的金纳米粒子表面增强拉曼散射衬底的评价
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.249
Takuzi Tanaka, Syunya Saegusa, Masayuki Naya, T. Fukuoka, Sho Amano, Y. Utsumi, A. Yamaguchi
{"title":"Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process","authors":"Takuzi Tanaka, Syunya Saegusa, Masayuki Naya, T. Fukuoka, Sho Amano, Y. Utsumi, A. Yamaguchi","doi":"10.2494/photopolymer.35.249","DOIUrl":"https://doi.org/10.2494/photopolymer.35.249","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"34 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89381951","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Preparation of a Polysilane-(1-Pyrene)Methyl Methacrylate Copolymer 聚硅烷-(1-芘)甲基丙烯酸甲酯共聚物的制备
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.347
Y. Matsuura, Yuuri Higashide, Y. Takagishi, Masanobu Ohkita, Tomoharu Tachikawa
{"title":"Preparation of a Polysilane-(1-Pyrene)Methyl Methacrylate Copolymer","authors":"Y. Matsuura, Yuuri Higashide, Y. Takagishi, Masanobu Ohkita, Tomoharu Tachikawa","doi":"10.2494/photopolymer.35.347","DOIUrl":"https://doi.org/10.2494/photopolymer.35.347","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"8 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82163398","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool 极紫外曝光仪合成含碘材料及其抗敏性能研究
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.41
Yutaro Iwashige, Hiroto Kudo, K. Okamoto, T. Kozawa
{"title":"Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool","authors":"Yutaro Iwashige, Hiroto Kudo, K. Okamoto, T. Kozawa","doi":"10.2494/photopolymer.35.41","DOIUrl":"https://doi.org/10.2494/photopolymer.35.41","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"2 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79006649","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement EUV光刻技术中硒元素pag的高灵敏度研究进展
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.55
Tomohito Kizu, Shinji Yamakawa, Takeo Watanabe, S. Yasui, Tomoyuki Shibagaki
{"title":"Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement","authors":"Tomohito Kizu, Shinji Yamakawa, Takeo Watanabe, S. Yasui, Tomoyuki Shibagaki","doi":"10.2494/photopolymer.35.55","DOIUrl":"https://doi.org/10.2494/photopolymer.35.55","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"155 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77078740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing 原子氢退火氧化膜表面清洗与改性
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.351
A. Heya, K. Sumitomo
{"title":"Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing","authors":"A. Heya, K. Sumitomo","doi":"10.2494/photopolymer.35.351","DOIUrl":"https://doi.org/10.2494/photopolymer.35.351","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"80 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75080498","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of UV-Light Irradiation on Charge-Accumulation States in PTzBT Polymer Solar Cells 紫外光照射对PTzBT聚合物太阳能电池电荷积累态的影响
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.193
D. Xue, Masahiko Saito, I. Osaka, K. Marumoto
{"title":"Effect of UV-Light Irradiation on Charge-Accumulation States in PTzBT Polymer Solar Cells","authors":"D. Xue, Masahiko Saito, I. Osaka, K. Marumoto","doi":"10.2494/photopolymer.35.193","DOIUrl":"https://doi.org/10.2494/photopolymer.35.193","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83037096","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Synthesis of the High Resolution i Line Novolak Resist 高分辨率i线诺瓦拉克阻片的合成
IF 0.8 4区 化学
Journal of Photopolymer Science and Technology Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.327
A. Sekiguchi, M. Hanabata, H. Minami, Y. Matsumoto, Yosuke Ohta, Fucheng Wang, Martin Z Ma, Zhiqiang Su
{"title":"The Synthesis of the High Resolution i Line Novolak Resist","authors":"A. Sekiguchi, M. Hanabata, H. Minami, Y. Matsumoto, Yosuke Ohta, Fucheng Wang, Martin Z Ma, Zhiqiang Su","doi":"10.2494/photopolymer.35.327","DOIUrl":"https://doi.org/10.2494/photopolymer.35.327","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"1141 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82605773","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
首页 上一页 下一页 尾页
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整，为了账户安全，请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们：info@booksci.cn Book学术提供免费学术资源搜索服务，方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号：481959085
Book学术官方微信