EUV金属氧化物抗蚀剂开发技术,用于提高灵敏度,粗糙度和大批量生产的图案崩溃裕度

IF 0.4 4区 化学 Q4 POLYMER SCIENCE
C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley
{"title":"EUV金属氧化物抗蚀剂开发技术,用于提高灵敏度,粗糙度和大批量生产的图案崩溃裕度","authors":"C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley","doi":"10.2494/photopolymer.35.87","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"25 1","pages":""},"PeriodicalIF":0.4000,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing\",\"authors\":\"C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley\",\"doi\":\"10.2494/photopolymer.35.87\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":16810,\"journal\":{\"name\":\"Journal of Photopolymer Science and Technology\",\"volume\":\"25 1\",\"pages\":\"\"},\"PeriodicalIF\":0.4000,\"publicationDate\":\"2022-12-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Photopolymer Science and Technology\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://doi.org/10.2494/photopolymer.35.87\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"POLYMER SCIENCE\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Photopolymer Science and Technology","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.2494/photopolymer.35.87","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"POLYMER SCIENCE","Score":null,"Total":0}
引用次数: 8

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EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
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来源期刊
CiteScore
1.50
自引率
25.00%
发文量
0
审稿时长
4-8 weeks
期刊介绍: Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.
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