高有序含硅氟嵌段共聚物的合成

IF 0.4 4区化学 Q4 POLYMER SCIENCE

Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI:10.2494/photopolymer.34.329

Jianuo Zhou, Xuemiao Li, H. Deng

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引用次数: 0

摘要

采用活聚合法合成了系列含硅特别是多面体低聚硅氧烷(POSS)-含氟嵌段共聚物(bcp)、聚苯乙烯多面体低聚硅氧烷-嵌段聚肝氟甲基丙烯酸丁酯(PStPOSS- b - phfbma)。PStPOSS- b - phfbma BCP的flory-huggins参数(χ，在150ºC时)为0.060。在160℃退火10 h后，通过小角x射线散射(SAXS)观察到高度有序的六方畴，其间距为13.2 nm，在扫描电镜(SEM)下显示出粗糙的线条图案。热重分析(TGA)中，烧结700℃后仍有sio1.5残留(13.7 wt%)。

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Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers

Series of Si-containing, especially polyhedral oligomeric silsesquioxane (POSS)-containing fluorinated block copolymers (BCPs), poly(styryl polyhedral oligomeric silsesquioxane)- block -poly(hepatafluorobutyl methacrylate) (PStPOSS- b -PHFBMA) were synthesized via living polymerizations. The flory-huggins parameter ( χ , at 150 ºC) of PStPOSS- b -PHFBMA BCP was 0.060. Highly ordered hexagonal domain with 13.2 nm d spacing was observed by small-angle X-ray scattering (SAXS) after 10 h 160 ºC annealing, exhibiting rough line patterns in scanning electron microscope (SEM). SiO 1.5 residue (13.7 wt%) still remained after 700 ºC sintering in thermal gravimetric analysis (TGA).

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来源期刊

Journal of Photopolymer Science and Technology 化学-高分子科学

CiteScore

1.50

自引率

25.00%

发文量

审稿时长

4-8 weeks

期刊介绍： Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.