Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers

Abstract

Series of Si-containing, especially polyhedral oligomeric silsesquioxane (POSS)-containing fluorinated block copolymers (BCPs), poly(styryl polyhedral oligomeric silsesquioxane)- block -poly(hepatafluorobutyl methacrylate) (PStPOSS- b -PHFBMA) were synthesized via living polymerizations. The flory-huggins parameter ( χ , at 150 ºC) of PStPOSS- b -PHFBMA BCP was 0.060. Highly ordered hexagonal domain with 13.2 nm d spacing was observed by small-angle X-ray scattering (SAXS) after 10 h 160 ºC annealing, exhibiting rough line patterns in scanning electron microscope (SEM). SiO 1.5 residue (13.7 wt%) still remained after 700 ºC sintering in thermal gravimetric analysis (TGA).