2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers最新文献

Statistical demonstration of silicide-like uniform and ultra-low specific contact resistivity using a metal/high-k/Si stack in a sidewall contact test structure 在侧壁接触测试结构中使用金属/高k/Si堆叠实现了类硅化物均匀和超低比接触电阻率的统计演示

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894423

K. Majumdar, R. Clark, T. Ngai, K. Tapily, S. Consiglio, E. Bersch, K. Matthews, E. Stinzianni, Y. Trickett, G. Nakamura, C. Wajda, G. Leusink, H. Chong, V. Kaushik, J. Woicik, C. Hobbs, P. Kirsch

引用次数: 8

Laser thermal anneal of polysilicon channel to boost 3D memory performance 多晶硅通道的激光热退火以提高3D存储器性能

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894346

J. Lisoni, A. Arreghini, G. Congedo, M. Toledano-Luque, I. Toqué-Trésonne, K. Huet, E. Capogreco, L. Liu, C. Tan, R. Degraeve, G. Van den bosch, J. van Houdt

引用次数: 18

Comprehensive statistical investigation of STT-MRAM thermal stability STT-MRAM热稳定性的综合统计研究

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894367

K. Hofmann, K. Knobloch, Christian Peters, R. Allinger

引用次数: 7

Thermally robust CMOS-aware Ge MOSFETs with high mobility at high-carrier densities on a single orientation Ge substrate 热稳健的cmos感知Ge mosfet，在单取向Ge衬底上具有高载流子密度的高迁移率

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894394

C. H. Lee, C. Lu, T. Nishimura, K. Nagashio, A. Toriumi

引用次数: 14

Physics based PBTI model for accelerated estimation of 10 year lifetime 基于物理的PBTI模型加速估算10年寿命

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894388

S. Zafar, A. Kerber, R. Muralidhar

引用次数: 7

First demonstration of strained SiGe nanowires TFETs with ION beyond 700µA/µm 离子超过700µA/µm的应变SiGe纳米线tfet的首次演示

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894369

A. Villalon, C. Le Royer, P. Nguyen, S. Barraud, F. Glowacki, A. Revelant, L. Selmi, S. Cristoloveanu, L. Tosti, C. Vizioz, J. Hartmann, N. Bernier, B. Previtali, C. Tabone, F. Allain, S. Martinie, O. Rozeau, M. Vinet

引用次数: 47

15nm-WFIN high-performance low-defectivity strained-germanium pFinFETs with low temperature STI-last process 15nm-WFIN高性能低缺陷应变锗pfinfet低温STI-last工艺

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894391

J. Mitard, L. Witters, R. Loo, S. H. Lee, J. W. Sun, J. Franco, L. Ragnarsson, A. Brand, X. Lu, N. Yoshida, G. Eneman, D. Brunco, M. Vorderwestner, P. Storck, A. Milenin, A. Hikavyy, N. Waldron, P. Favia, D. Vanhaeren, A. Vanderheyden, R. Olivier, H. Mertens, H. Arimura, S. Sonja, C. Vrancken, H. Bender, P. Eyben, K. Barla, S. Lee, N. Horiguchi, N. Collaert, A. Thean

引用次数: 36

High performance InGaAs-on-insulator MOSFETs on Si by novel direct wafer bonding technology applicable to large wafer size Si 采用新型直接晶圆键合技术，实现了适用于大晶圆尺寸硅的高性能绝缘体上ingaas mosfet

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894352

S. H. Kim, Y. Ikku, M. Yokoyama, R. Nakane, J. Li, Y. Kao, M. Takenaka, S. Takagi

引用次数: 18

Role of the Ta scavenger electrode in the excellent switching control and reliability of a scalable low-current operated TiNTa2O5Ta RRAM device Ta清除电极在可扩展的低电流操作TiNTa2O5Ta RRAM器件的出色开关控制和可靠性中的作用

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894401

L. Goux, A. Fantini, A. Redolfi, C. Y. Chen, F. Shi, R. Degraeve, Y. Chen, Thomas Witters, Guido Groeseneken, Malgorzata Jurczak

引用次数: 44

Cost and power/performance optimized 20nm SoC technology for advanced mobile devices 成本和功耗/性能优化的20nm SoC技术，适用于先进的移动设备

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers Pub Date : 2014-06-09 DOI: 10.1109/VLSIT.2014.6894414

G. Nallapati, J. Zhu, J. Wang, J. Sheu, K. Cheng, C. Gan, D. Yang, M. Cai, J. Cheng, L. Ge, Y. Chen, R. Bucki, B. Bowers, F. Vang, X. Chen, O. Kwon, S. Yoon, C. C. Wu, P. Chidambaram, M. Cao, J. Fischer, E. Terzioglu, Y. Mii, G. Yeap

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引用次数: 5