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Radiation-induced short-range order in ceramics. 陶瓷中辐射诱发的短程有序。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfaf053
Manabu Ishimaru
{"title":"Radiation-induced short-range order in ceramics.","authors":"Manabu Ishimaru","doi":"10.1093/jmicro/dfaf053","DOIUrl":"10.1093/jmicro/dfaf053","url":null,"abstract":"<p><p>The development of radiation-tolerant materials is of technological importance for establishing safe operating systems in the nuclear industry, from power generation to the immobilization of high-level radioactive waste. Harsh radiation environments generate interstitials and vacancies in materials, and their accumulation leads to structural changes, including order-to-disorder phase transformations and amorphization. These structural changes are induced locally on an atomic scale; therefore, transmission electron microscopy is a useful technique for analyzing radiation effects in materials. In addition, the strong interaction between matter and electrons enables the detection of weak signals associated with phase transformations, such as diffuse scattering and halo rings. This article provides an overview of radiation-induced amorphous structures in materials consisting of light elements, such as boron carbide and silicon oxycarbide, as well as the short-range ordered structure that appears during an order-to-disorder phase transformation in fluorite structural derivatives.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"217-228"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC13280761/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145656517","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
COSY INFINITY and its use for singlepass and multipass systems. COSY INFINITY及其在单通和多通系统中的应用。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfag016
Martin Berz, Kyoko Makino
{"title":"COSY INFINITY and its use for singlepass and multipass systems.","authors":"Martin Berz, Kyoko Makino","doi":"10.1093/jmicro/dfag016","DOIUrl":"10.1093/jmicro/dfag016","url":null,"abstract":"<p><p>We discuss the computational treatment of both singlepass systems like those used in microscopy and spectroscopy where careful consideration and control of aberrations is important, as well as multipass systems where other priorities arise. This is largely due to the fact that many of the aberrations cancel out when traversing a system repeatedly, which is greatly helped by the adjustment of the linear transfer matrix to be non-resonant. However, some other effects have a tendency to build up over time either linearly or exponentially, and a specific form of analysis is necessary to understand and control this behavior. This is achieved using normal form methods which allow a clear separation of multipass effects that are transient and those that are persistent, as well as the use of symplectic integration. The Differential Algebraic (DA) methods employed in COSY INFINITY allow for the computation of aberrations of arbitrary order and also the relevant normal forms. The tools allow the automatic computation of fully Maxwellian 3D fields if only midplane or on-axis field information is available, which for example allows recovering all nonlinear effects arising from increasing or decreasing fields in the fringes of particle optical elements. They also allow the computation of such fields from surface or volume field measurements, leading to a fully Maxwellian representation even in the presence of noise in the data. Utilizing metrics on symplectic spaces, it is possible to construct minimally invasive symplectification schemes for study of multipass systems based on transfer maps.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"i15-i23"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147494698","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of a wire corrector for low accelerating voltage scanning electron microscopy. 低加速电压扫描电镜用导线校正器的研制。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfaf054
Tomonori Nakano, Yu Yamazawa
{"title":"Development of a wire corrector for low accelerating voltage scanning electron microscopy.","authors":"Tomonori Nakano, Yu Yamazawa","doi":"10.1093/jmicro/dfaf054","DOIUrl":"10.1093/jmicro/dfaf054","url":null,"abstract":"<p><p>Aberration correctors are essential for achieving high-resolution imaging in advanced electron microscopy. However, their complexity and cost have limited their integration into conventional scanning electron microscopes (SEMs), particularly in low-voltage applications. In this study, we present a wire aberration corrector that utilizes symmetrically arranged current lines to generate multipole fields. The corrector was implemented in a cold field emission SEM equipped with a bright-field scanning transmission electron microscopy (STEM) detector and operated at 30 kV. Experimental results demonstrate successful generation of quadrupole to dodecapole fields, effective correction of spherical aberration and improved imaging of carbon multilayers. These findings demonstrate that wire correctors offer a compact and cost-effective means to enhance imaging performance in standard SEM systems, and the underlying principle could be adapted for other electron microscopy platforms such as TEM or STEM.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"i52-i59"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145783839","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Rigorous computation of high-order aberrations and their errors. 高阶像差及其误差的严格计算。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfag019
Kyoko Makino, Martin Berz
{"title":"Rigorous computation of high-order aberrations and their errors.","authors":"Kyoko Makino, Martin Berz","doi":"10.1093/jmicro/dfag019","DOIUrl":"10.1093/jmicro/dfag019","url":null,"abstract":"<p><p>High-order transfer maps offer many advantages in the study of both singlepass systems, where they represent optical aberrations, and multipass systems, where they allow the direct computation of relevant properties like high-order dispersions, chromaticities, and amplitude- and parameter-dependent tune shifts. However, one remaining question is always how accurate a map of a given expansion order really is-while in many cases, the sizes of high-order contributions decrease as a function of order, this does not always have to be the case. To address these topics, we present methods to determine mathematically rigorous bounds on all missing orders beyond the one explicitly considered. The computational effort to determine these bounds is small compared to the cost of the underlying high-order transfer map computation. Furthermore, the method allows for rigorous step size control in the Differential Algebra-based integration of high-order transfer maps.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"i24-i30"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147619102","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Tribute to Peter William Hawkes. 向彼得·威廉·霍克斯致敬。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfaf052
Sameen Ahmed Khan, Ramaswamy Jagannathan
{"title":"Tribute to Peter William Hawkes.","authors":"Sameen Ahmed Khan, Ramaswamy Jagannathan","doi":"10.1093/jmicro/dfaf052","DOIUrl":"10.1093/jmicro/dfaf052","url":null,"abstract":"<p><p>Peter William Hawkes, an internationally renowned specialist in electron optics, passed away on 20 October 2024. He was 87 years old. He was quite involved in many microscopy communities and was also the co-founder and former President of the European Society of Microscopy. Hawkes will be remembered as an exceptional educator, scientist, and communicator who made significant and ground-breaking advances in the fields of electron optics, aberrations and digital imaging.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"i60-i62"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146144999","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Eric Munro-pioneer of electron optics software. Eric munro -电子光学软件的先驱。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfaf051
John Rouse
{"title":"Eric Munro-pioneer of electron optics software.","authors":"John Rouse","doi":"10.1093/jmicro/dfaf051","DOIUrl":"10.1093/jmicro/dfaf051","url":null,"abstract":"","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"i63-i66"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146145019","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Computing initial energy distributions for field emission sources. 场发射源初始能量分布的计算。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfag003
John Rouse, Catherine Rouse, Haoning Liu
{"title":"Computing initial energy distributions for field emission sources.","authors":"John Rouse, Catherine Rouse, Haoning Liu","doi":"10.1093/jmicro/dfag003","DOIUrl":"10.1093/jmicro/dfag003","url":null,"abstract":"<p><p>In Monte Carlo simulations of electron sources, random initial conditions of the particles' velocity components at the cathode need to be generated: these velocities are governed by the initial energy and angular distribution of the source. To generate the distributions numerically, the probability densities must be integrated so that the distribution can be inverted. Unlike for thermionic sources, where these integrals can be performed using simple trigonometric functions, for field emission or thermal field emission sources it is not so straightforward to integrate the probability distributions analytically. In this paper, we will show how we have derived analytic formulæ for the integrals of the energy probability distributions for cold and thermal field emission sources. These formulæ involve the Gaussian hypergeometric function, which can be evaluated numerically using established computational techniques. Hence, the random energy, and therefore velocity components, can be generated efficiently for the many thousands of particles typically needed for a Monte Carlo analysis of field emission sources. We have implemented these integrals in a computer program and give results of the energy distribution for field emission sources generated by these techniques.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"i4-i14"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146222462","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Carrier-mediated reduction mechanism in WO3 nanowires under electron-beam irradiation. 电子束辐照下WO3纳米线中载流子介导的还原机制。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfaf058
Sho Nekita, Itsuki Misono, Kazuhiro Yasuda, Yusuke Shimada, Jyh-Tyng Chou, Tetsuya Okuyama, Satoshi Hata
{"title":"Carrier-mediated reduction mechanism in WO3 nanowires under electron-beam irradiation.","authors":"Sho Nekita, Itsuki Misono, Kazuhiro Yasuda, Yusuke Shimada, Jyh-Tyng Chou, Tetsuya Okuyama, Satoshi Hata","doi":"10.1093/jmicro/dfaf058","DOIUrl":"10.1093/jmicro/dfaf058","url":null,"abstract":"<p><p>Electron-beam irradiation often induces unintended structural and chemical changes in materials. Here, we show that damage and reduction in tungsten trioxide (WO3) nanowires are primarily driven by a carrier-mediated ionization process. In situ electron microscopy and electron energy-loss spectroscopy reveal structural degradation accompanied by the reduction of W6+ to W5+, while carrier dynamics simulations identify persistent, high-density electron-hole populations. Quantitative analyses and control experiments indicate that knock-on displacement and heating contribute minimally. This study establishes a microscopy-based quantitative framework for understanding electron-beam-induced damage and redox processes, highlighting the potential of electron microscopy for mechanistic insights and nanoscale chemical patterning in oxides.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"294-300"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC13280754/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145897161","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Image simulation in projection-type electron microscopy for understanding experimental images under non-optimal conditions. 投影型电子显微镜中的图像模拟，用于理解非最佳条件下的实验图像。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfag013
Takeshi Morimoto, Momoyo Enyama, Akira Ikegami
{"title":"Image simulation in projection-type electron microscopy for understanding experimental images under non-optimal conditions.","authors":"Takeshi Morimoto, Momoyo Enyama, Akira Ikegami","doi":"10.1093/jmicro/dfag013","DOIUrl":"10.1093/jmicro/dfag013","url":null,"abstract":"<p><p>Microscope images are acquired under a wide range of optical conditions-regardless of whether optical alignment is complete-when using projection-type electron microscopes such as transmission, low-energy, photoemission and mirror electron microscopes. Although paraxial rays and aberration coefficients are often calculated to describe electron optical conditions, image simulations are rarely conducted. Therefore, interpreting images under non-optimal experimental setups, such as misaligned apertures or off-center electron beams, can be challenging for users and electron-optics designers. To address this issue, we developed a fast and simple image-simulation method that is based on paraxial rays and aberration coefficients. As a demonstration, we simulated three types of image effects: field-of-view loss due to displacement of an angular limitation aperture along the optical axis, shadow-contrast formation caused by the angular limitation aperture and change in images due to lens wobbling. The simulated images well reproduce those commonly observed in daily experiments. The proposed method provides a more intuitive and quantitative understanding of image formation under non-optimal conditions and can serve as a useful tool for both experimentalists and designers in the field of electron optics.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"i42-i51"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147357607","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analytic chromaticity formulas for the Muon g-2 Experiment at Fermilab†. 费米实验室μ子g-2实验的解析色度公式。
IF 1.9
Microscopy (Oxford, England) Pub Date : 2026-06-01 DOI: 10.1093/jmicro/dfag010
Eremey Valetov, Kyoko Makino, Martin Berz
{"title":"Analytic chromaticity formulas for the Muon g-2 Experiment at Fermilab†.","authors":"Eremey Valetov, Kyoko Makino, Martin Berz","doi":"10.1093/jmicro/dfag010","DOIUrl":"10.1093/jmicro/dfag010","url":null,"abstract":"<p><p>The Muon g-2 Experiment (E989) at Fermilab measured the muon anomalous magnetic moment aμ with unprecedented precision of 127  ppb using a storage ring. The experiment pushed the limits in terms of accuracy and systematic errors. Achieving the 78-ppb total systematic uncertainty required precise beam dynamics modeling and corrections for effects on the measured muon precession frequency. We derived the first analytic aberration formulas up to the second order for the muon g-2 storage ring's combined-function electrostatic quadrupoles (superimposed magnetic dipole and electric quadrupole fields) using an order-by-order perturbation method. From these, we obtained the exact chromaticity formulas for three ring models of different granularity and validated them against numerical calculations using COSY INFINITY, achieving analytic-numerical agreement to O(10-10). This work resolved discrepancies between previous approximate derivations and provided essential beam dynamics results for Runs 4-6 analyses. We also calculated nonlinear chromaticities up to ninth order. The experiment completed its final Run 6 in July 2023, collecting 21 times more data than the previous muon g-2 experiment at Brookhaven National Laboratory, with the final result announced in June 2025.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"i31-i41"},"PeriodicalIF":1.9,"publicationDate":"2026-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147476602","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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