{"title":"Analyzing the synchronism of stacking-fault formation in side-by-side SiC nanowire pairs using the Levenshtein distance: stochastic versus deterministic processes.","authors":"Fuka Moriuchi, Hideo Kohno","doi":"10.1093/jmicro/dfac073","DOIUrl":"10.1093/jmicro/dfac073","url":null,"abstract":"<p><p>Pairs of silicon carbide nanowires were grown side by side synchronously from the same metal catalyst nanoparticles. The stacking sequences of each pair were read by high-resolution transmission electron microscopy, and the similarity of each stacking sequence was measured using the Levenshtein distance. No synchronism was detected in the pairs of stacking sequences, and the results indicated that the formation of stacking faults in silicon carbide nanowires was not deterministic, but purely stochastic.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"395-398"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10444312","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Measurement and correction of TEM image distortion using arbitrary samples.","authors":"Hirokazu Tamaki, Koh Saitoh","doi":"10.1093/jmicro/dfad015","DOIUrl":"10.1093/jmicro/dfad015","url":null,"abstract":"<p><p>We have developed a method to quantitatively measure image distortion, one of the five Seidel aberrations, in transmission electron microscopes without using a standard sample with a known structure. Displacements of small local segments in an image due to image distortion of the intermediate and projection lens system are first measured by comparing images taken before and after a given shift at the first image plane of the objective lens. Then, the sum of the second partial derivatives, or the Laplacian, of the displacement field is measured, and the radial and azimuthal distortion parameters are determined from the measured results. We confirmed using numerically distorted images that the proposed method can measure the image distortion within a relative error ratio of 0.04 for a wide range of distortion amount from 0.1% to 5.0%. The distortion measurement and correction were confirmed to work correctly by using the experimental images, and the iterative measurement and correction procedure could reduce the distortion to a level where the average image displacement was < 0.05 pixels.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"425-432"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10710879","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Development of temporal series 4D-STEM and application to relaxation time measurement.","authors":"Katsuaki Nakazawa, Kazutaka Mitsuishi","doi":"10.1093/jmicro/dfad006","DOIUrl":"10.1093/jmicro/dfad006","url":null,"abstract":"<p><p>Diffraction patterns contain useful information about the materials. Recent developments in four-dimensional scanning transmission electron microscopy and the acquisition of the spatial distribution of diffraction patterns have produced significant results. The acquisition of a temporal series of diffractions is achieved for a stationary beam. However, the acquisition of spatiotemporal distribution of diffraction patterns has only been established under limited conditions. In this study, we developed a simple method that enables the recording of the spatiotemporal distribution of diffraction patterns and applied it to the relaxation time measurement that is robust to sample drift.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"446-449"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9074254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Correction to: High-resolution and analytical electron microscopy in a liquid flow cell via gas purging.","authors":"","doi":"10.1093/jmicro/dfad033","DOIUrl":"10.1093/jmicro/dfad033","url":null,"abstract":"","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"460"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9648257","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Super-resolution method for SEM images based on pixelwise weighted loss function.","authors":"Akira Ito, Atsushi Miyamoto, Naoaki Kondo, Minoru Harada","doi":"10.1093/jmicro/dfad009","DOIUrl":"10.1093/jmicro/dfad009","url":null,"abstract":"<p><p>Scanning electron microscopy (SEM) has realized high-throughput defect monitoring of semiconductor devices. As miniaturization and complexification of semiconductor circuit patterns increase in recent years, so has the number of defects. There is thus a great need to further increase the throughput of SEM defect monitoring. Toward this end, we propose a deep learning-based super-resolution method that reproduces high-resolution (HR) images from corresponding low-resolution images. Image quality factors such as pattern contrast and sharpness are important in SEM HR images in order to evaluate the quality of printed circuit patterns. Our proposed method meets various image quality requirements by changing the loss calculation method pixelwise based on the pattern in the image. It realizes super-resolved images that compare favorably with actual HR images and can improve SEM throughput by 100% or more.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"408-417"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10700639","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Edge effect of wide spectrum denoising in super-resolution microscopy.","authors":"Tao Cheng, Yingshan Wang","doi":"10.1093/jmicro/dfad012","DOIUrl":"10.1093/jmicro/dfad012","url":null,"abstract":"<p><p>During the stochastic optical reconstruction microscope (STORM) raw image acquisition in super-resolution microscopy, noise is inevitable. Noise not only reduces the temporal and spatial resolution of the super-resolution image but also leads to the failure of super-resolution image reconstruction. Wide spectrum denoising (WSD) can effectively remove various random noises (such as Poisson noise and Gaussian noise) from the STORM raw image to improve the super-resolution image reconstruction. We found that there is an obvious edge effect in WSD, and its influence on STORM raw image denoising and super-resolution image reconstruction is studied. We then proposed the method of restraining edge effect. The simulation and real experiment results show that edge trimming can effectively suppress the edge effect, thus leading to better super-resolution image reconstruction.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"418-424"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10650616","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Momoyo Enyama, Ryuji Nishi, Hiroyuki Ito, Jun Yamasaki
{"title":"Low-aberration ExB deflector optics for scanning electron microscopy.","authors":"Momoyo Enyama, Ryuji Nishi, Hiroyuki Ito, Jun Yamasaki","doi":"10.1093/jmicro/dfad001","DOIUrl":"10.1093/jmicro/dfad001","url":null,"abstract":"<p><p>To suppress aberrations in the signal electron optics of a scanning electron microscope, we propose ExB deflector (deflector with superimposed electric and magnetic fields) optics that cancel the aberrations generated during large-angle deflection. This improves the resolution of the angle or position of the signal electrons on the sample surface, allowing them to be discriminately detected. The proposed optics consist of two ExB deflectors and a transfer system with two 4-f systems, or systems that have four times the focal length, placed between them. This configuration maintains the symmetry of the electron beam trajectory throughout the transfer system such that aberrations generated by the first ExB deflector are negated by the second. The effect of the proposed optics was confirmed using a ray-tracing simulation of the electron beam, and the aberration was reduced to at most one-tenth of that in the case with only one ExB deflector. Furthermore, as an example, we examined the implementation of the proposed ExB deflector optics to resolve the signal electron angle and found that the sample emission angle range of 80° can be resolved with an angular resolution of 1°. Therefore, the proposed ExB deflector optics can be applied to the signal electron optics of a scanning electron microscope to improve the resolution of the signal electrons.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"399-407"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10520213","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Nora Mallouk, Sisareuth Tan, Claire Scepaniack, Arnauld Garcin, Camille Pradat, Claude Lambert, Guorong Li
{"title":"A specific technique of immunolabelling of urinary small extracellular vesicle biomarkers for the diagnostic of renal cancer.","authors":"Nora Mallouk, Sisareuth Tan, Claire Scepaniack, Arnauld Garcin, Camille Pradat, Claude Lambert, Guorong Li","doi":"10.1093/jmicro/dfad007","DOIUrl":"10.1093/jmicro/dfad007","url":null,"abstract":"<p><p>Small extracellular vesicles (EVs) are characterized by the membrane expression of CD63, CD81 and CD9 tetraspanins. Their size is inferior to 200 nm. They share the same characteristics as the native cells and are found in human fluids. Specific membrane protein biomarkers expressed on small EV are useful for the diagnosis of tumoural pathologies. Clear cell renal cell carcinoma (CCRCC) is diagnosed by imaging examinations and/or tissue biopsy. Carbonic anhydrase IX (CAIX) is a powerful biomarker of CCRCC. The detection of CAIX on small EV from the urine of patients could constitute a liquid biopsy for CCRCC. We have set up a specific protocol for the preparation, the immunostaining characterization and the transmission electron microscopy observation of small EVs isolated from the urine of CCRCC patients. The background labelling was significantly reduced. We successfully detected biomarkers on urinary small EVs from CCRCC patients. This technique could be extended with antibodies directed against other EV biomarkers for the detection and the monitoring of cancer diseases.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"450-454"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10635788","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Semiautomatic contour tracking method for biological object segmentation in thin-section electron microscope images with modified zero DC component-type Gabor wavelets.","authors":"Gen Maeda, Misuzu Baba, Norio Baba","doi":"10.1093/jmicro/dfad018","DOIUrl":"10.1093/jmicro/dfad018","url":null,"abstract":"<p><p>In electron microscopic image processing, artificial intelligence (AI) is a powerful method for segmentation. Because creating training data remains time-consuming and burdensome, a simple and accurate segmentation tool, which is effective and does not rely on manual drawings, is necessary to create training data for AI and to support immediate image analysis. A Gabor wavelet-based contour tracking method has been devised as a step toward realizing such a tool. Although many papers on Gabor filter-based and Gabor filter bank-based texture segmentations have been published, previous studies did not apply the Gabor wavelet-based method to straightforwardly detect membrane-like ridges and step edges for segmentation because earlier works used a nonzero DC component-type Gabor wavelets. The DC component has a serious flaw in such detection. Although the DC component can be removed by a formula that satisfies the wavelet theory or by a log-Gabor function, this is not practical for the proposed scheme. Herein, we devised modified zero DC component-type Gabor wavelets. The proposed method can practically confine a wavelet within a small image area. This type of Gabor wavelet can appropriately track various contours of organelles appearing in thin-section transmission electron microscope images prepared by the freeze-substitution fixation method. The proposed method not only more accurately tracks ridge and step edge contours but also tracks pattern boundary contours consisting of slightly different image patterns. Simulations verified these results.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"433-445"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10793985","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Recent advances in in-resin correlative light and electron microscopy of Epon-embedded cells.","authors":"Isei Tanida, Junji Yamaguchi, Chigure Suzuki, Soichiro Kakuta, Yasuo Uchiyama","doi":"10.1093/jmicro/dfad028","DOIUrl":"10.1093/jmicro/dfad028","url":null,"abstract":"<p><p>Correlative fluorescent and electron microscopic images of the same section of epoxy (or other polymer)-embedded samples, hereafter referred to as 'in-resin CLEM', have been developed to improve the positional accuracy and Z-axis resolution limitations of conventional correlative light and electron microscopy (CLEM). High-pressure freezing and quick-freezing substitution result in in-resin CLEM of acrylic-based resin-embedded cells expressing green fluorescent protein, yellow fluorescent protein, mVenus and mCherry, which are sensitive to osmium tetroxide. The identification of osmium-resistant fluorescent proteins leads to the development of in-resin CLEM of Epon-embedded cells. Using subtraction-based fluorescence microscopy with a photoconvertible fluorescent protein, mEosEM-E, its green fluorescence can be observed in thin sections of Epon-embedded cells, and two-color in-resin CLEM using mEosEM-E and mScarlet-H can be performed. Green fluorescent proteins, CoGFP variant 0 and mWasabi, and far-red fluorescent proteins, mCherry2 and mKate2, are available for in-resin CLEM of Epon-embedded cells using the standard procedure for Epon-embedding with additional incubation. Proximity labeling is applied to in-resin CLEM to overcome the limitations of fluorescent proteins in epoxy resin. These approaches will contribute significantly to the future of CLEM analysis.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"383-387"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9875681","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}