120kev和200kev下INTPIX4 SOI像素探测器的透射电镜表征。

IF 1.9
Yuichi Ishida, Takafumi Ishida, Makoto Kuwahara, Yasuo Arai, Koh Saitoh
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引用次数: 0

摘要

通过安装在传统透射电子显微镜上的集成型绝缘体上硅(SOI)像素探测器INTPIX4,评估了120和200 keV电子的成像性能。我们证明了用INTPIX4可以定量地检测单电子事件。测量了单电子事件的增益和信号。在此基础上,120 keV和200 keV电子的电荷回收率分别为96±5%和97±5%。测量了调制传递函数和探测量子效率。结果表明,INTPIX4具有较高的检测效率和灵敏度。我们还发现,对于INTPIX4,有必要使用能量小于120 keV的电子束,因为硅传感器上初级电子的多次散射会降低图像分辨率。该检测器有望应用于透射电子显微镜的低剂量观察。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterization of the INTPIX4 SOI pixel detector in transmission electron microscopy at 120 keV and 200 keV.

Imaging performance with 120 and 200 keV electrons was evaluated with an integration-type silicon-on-insulator (SOI) pixel detector called INTPIX4 installed in a conventional transmission electron microscope. We demonstrated that single-electron events can be detected with INTPIX4 quantitatively. The gain and signals of single-electron events were measured. On the basis of the results, the yields of the collected charge for 120 and 200 keV electrons were estimated to be 96±5% and 97±5%, respectively. The modulation transfer function and detective quantum efficiency were also measured. INTPIX4 was clarified to have high detection efficiency and high sensitivity. We also found that it is necessary to use electron beams with energies less than 120 keV for INTPIX4 because multiple scattering of primary electrons at the silicon sensor degrades image resolution. This detector is expected to be applicable to low-dose observations in transmission electron microscopy.

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