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IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-02-16 DOI: 10.1109/TPS.2026.3659694

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Fabrication and Characterization of a 10 × 10 cm Cold Atmospheric Pressure Plasma Array. 10 × 10 cm低温大气压等离子体阵列的制备与表征。

IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-02-01 Epub Date: 2025-12-30 DOI: 10.1109/tps.2025.3646554

Ranajoy Bhattacharya, Sumona Islam, Daniel Miller, Dylan Brown, Nuha Akhtar, Marcus Pearlman, Robert Hay, Kenneth A Cornell, Jim Browning

{"title":"Fabrication and Characterization of a 10 × 10 cm Cold Atmospheric Pressure Plasma Array.","authors":"Ranajoy Bhattacharya, Sumona Islam, Daniel Miller, Dylan Brown, Nuha Akhtar, Marcus Pearlman, Robert Hay, Kenneth A Cornell, Jim Browning","doi":"10.1109/tps.2025.3646554","DOIUrl":"10.1109/tps.2025.3646554","url":null,"abstract":"We report the development of a large area cold atmospheric plasma (CAP) array. The device consists of a parallel stack of 43 linear-discharge plasma elements that create a 10 cm × 10 cm treatment area. The CAP device is fabricated using low temperature co-fired ceramic (LTCC) layers to create 10 cm long linear discharge channels (1.1 mm discharge gap) with embedded opposing silver metal electrodes. A 21 kHz AC voltage of 1.55 kVrms applied to the electrodes generates an Ar plasma between the plates, with the gas flow directing the reactive species toward the intended biological sample (bacteria biofilms, etc.) to affect the antimicrobial treatment. Internal ballast resistors (20 kΩ) were used on each side of the two electrode elements to improve discharge uniformity and to prevent large filamentary discharges. Typical element discharge currents were 3.5-4 mA with the total array current tested at 178 mA (rms) to provide optimal device uniformity at a 1.55 kV (rms), and an argon flow rate of 130 lpm. Further, the gas flow system was optimized to obtain a uniform plasma. Treatment of Ps. fluorescence bacterial biofilms on stainless steel coupons demonstrated a 91% decrease in colony forming units after 150 s of treatment with a 1.5 cm gap.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 2","pages":"496-502"},"PeriodicalIF":1.5,"publicationDate":"2026-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12923079/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147269368","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

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Special Issue on Selected Papers from APSPT-14 May 2027 APSPT-14论文精选特刊2027年5月

IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-01-13 DOI: 10.1109/TPS.2026.3651943

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IEEE Transactions on Plasma Science Special Issue on Discharges and Electrical Insulation in Vacuum IEEE等离子体科学汇刊：真空中的放电和电绝缘

IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-01-13 DOI: 10.1109/TPS.2026.3651947

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Special Issue on the 40th PSSI National Symposium on Plasma Science and Technology (PLASMA 2025) 第40届PSSI全国等离子体科学与技术学术研讨会（Plasma 2025）特刊

IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-01-13 DOI: 10.1109/TPS.2026.3651945

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IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-01-13 DOI: 10.1109/TPS.2025.3649333

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High-Voltage Sources and Reactors for Nonthermal Plasma Applications: A Review of Designs, Fabrications, and Their Performances 用于非热等离子体的高压源和反应器：设计、制造和性能综述

IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-01-12 DOI: 10.1109/TPS.2025.3650163

Sushma Balanagu;Srikanth Allamsetty;Ambrish Devanshu

{"title":"High-Voltage Sources and Reactors for Nonthermal Plasma Applications: A Review of Designs, Fabrications, and Their Performances","authors":"Sushma Balanagu;Srikanth Allamsetty;Ambrish Devanshu","doi":"10.1109/TPS.2025.3650163","DOIUrl":"https://doi.org/10.1109/TPS.2025.3650163","url":null,"abstract":"Discharge plasma-based treatments for different applications, such as sterilization, surface decontamination, food processing, water, and air pollution control, have many advantages over conventional technologies. Nonthermal plasma (NTP) consists of energetic electrons, which in turn generates free radicals through interactions and triggers important chemical reactions. As a result, NTP is being preferred in a variety of domains but there are several technical challenges for its successful implementation. Researchers from different backgrounds: physics, chemistry, electrical, and chemical engineering, are working to understand various aspects of NTP treatments with different domain-specific objectives. It is required to form multidisciplinary research groups and study various procedures to increase the potency of these treatments. This article is intended to stand as a complete guide for budding researchers working on NTP applications, simultaneously attracting new researchers to this area, by providing total information regarding various high-voltage (HV) sources, discharge techniques, and reactor configurations available in the literature for different NTP treatments, along with their details: designs, fabrications, and performances.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 2","pages":"801-818"},"PeriodicalIF":1.5,"publicationDate":"2026-01-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146199208","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

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An Improved Calculation Method for Dynamic Characteristics of Electromagnetic Repulsion Mechanism Based on Series Armature Equivalence 基于串联电枢等效的电磁斥力机构动态特性改进计算方法

IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-01-12 DOI: 10.1109/TPS.2025.3647270

Wenying Yang;Fansong Meng;Daoyi Wu

{"title":"An Improved Calculation Method for Dynamic Characteristics of Electromagnetic Repulsion Mechanism Based on Series Armature Equivalence","authors":"Wenying Yang;Fansong Meng;Daoyi Wu","doi":"10.1109/TPS.2025.3647270","DOIUrl":"https://doi.org/10.1109/TPS.2025.3647270","url":null,"abstract":"The bypass switch is an important component for protecting the modular multilevel converter submodule in the flexible DC transmission system. Due to the low impedance of the flexible DC system, the fault current rises rapidly, imposing strict requirements on the closing speed of the bypass switch. As a linear actuator, the electromagnetic repulsion mechanism (ERM) can be a solution for the mechanical part of the bypass switch. At present, the ERM is primarily designed and optimized by the finite element method (FEM) and the equivalent circuit method (ECM). However, the FEM suffers from limitations such as low computational efficiency, large resource consumption, and model modification, while the inductance and inductance gradient required by the ECM are difficult to obtain. Moreover, the ECM divides the armature into multiple regions, resulting in highly ill-conditioned inductance matrix and inductance gradient matrix, which increases the risk of numerical errors. In this regard, a series armature equivalent method (SAEM) is proposed in this article to calculate the dynamic characteristics of ERM. First, the principle of SAEM is introduced, and the formulas of the electrical parameters are given. The calculation accuracy of the electrical parameters is verified by the FEM. Then, the dynamic characteristics of the ERM calculated by the ECM, the SAEM, and the FEM, are compared with the experimental results. The results indicate that SAEM has similar accuracy to the ECM, and it has more advantages in numerical stability. In addition, the SAEM has more advantages in calculation efficiency than the ECM and the FEM.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 2","pages":"774-783"},"PeriodicalIF":1.5,"publicationDate":"2026-01-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146199234","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

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Advances in Laminar Plasma Torch Technology and Applications: A Review 层流等离子体炬技术及其应用进展

IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2026-01-12 DOI: 10.1109/TPS.2025.3643347

Xiuquan Cao;Lijun Yan;Fa Zhang;Ling Luo;Guangzhong Hu;Yufeng Tang

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Optimization of a Hybrid Graphene–Copper Terahertz Gas Sensor Using Machine Learning 利用机器学习优化石墨烯-铜混合太赫兹气体传感器

IF 1.5 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-12-30 DOI: 10.1109/TPS.2025.3644784

Hamza Ben Krid;Hamza Wertani;Aymen Hlali;Hassen Zairi

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