IEEE Transactions on Plasma Science最新文献_第8页

Real-Time Ethernet Interface for NSTX-U’s Thomson Scattering Diagnostic (2023) 用于 NSTX-U 汤姆逊散射诊断仪的实时以太网接口 (2023)

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-23 DOI: 10.1109/TPS.2024.3421897

S. Trieu;F. Hoffmann;M. de Haas;G. Tchilinguirian;B. P. LeBlanc

引用次数: 0

Optimized Design for Armature Lightweighting and Contact Pressure Distribution Uniformization Based on BP Neural Network and Genetic Algorithm 基于 BP 神经网络和遗传算法的电枢轻量化和接触压力分布均匀化优化设计

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-22 DOI: 10.1109/TPS.2024.3406200

Jinguo Wu;Sihan Li;Bin Yang;Yujie Zhang

{"title":"Optimized Design for Armature Lightweighting and Contact Pressure Distribution Uniformization Based on BP Neural Network and Genetic Algorithm","authors":"Jinguo Wu;Sihan Li;Bin Yang;Yujie Zhang","doi":"10.1109/TPS.2024.3406200","DOIUrl":"10.1109/TPS.2024.3406200","url":null,"abstract":"The variation in armature structural parameters has a profound impact on electromagnetic railgun performance. In order to enhance the electrical contact performance of armature and rail interfaces and achieve armature lightweighting, a novel approach is proposed that combines backpropagation (BP) neural networks with genetic algorithms for optimizing armature structures. Employing Latin hypercube experiments, structural dimension samples were extracted for both flat armatures and convex-arc armatures, and a training dataset was generated through finite element simulations. Mapping models were constructed based on BP neural networks to relate the contact pressure distribution coefficient, maximum stress, mass, and total contact force individually to the armature structural parameters. Incorporating a comprehensive evaluation index denoted as “W” as the fitness function for the genetic algorithm, global optimization of armature size was carried out. The optimized results were subsequently validated through finite element comparative analysis. The outcomes revealed that, following optimization of flat armatures, a 10.4% reduction in mass and a 55.7% decrease in the contact pressure distribution coefficient were achieved. For convex-arc armatures, a 25% reduction in mass and a 46.5% decrease in the contact pressure distribution coefficient were observed. Simultaneously achieving armature lightweighting and improving the uniformity of contact pressure distribution on armature and rail interfaces, this methodology offers a novel perspective and serves as a valuable reference for addressing the optimization of armature structures under complex operating conditions.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 6","pages":"2359-2367"},"PeriodicalIF":1.3,"publicationDate":"2024-08-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142175288","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Design and Characteristics of a High-Power Pulse Transformer Based on a Closed Cage Core Structure 基于封闭笼型铁芯结构的大功率脉冲变压器的设计与特性

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-19 DOI: 10.1109/TPS.2024.3441320

Bingyang Feng;Yingjie Fu;Luokang Dong;Shenyi Qin;Mengbing He

引用次数: 0

Forward Space Charge Wave Amplifiers Using Lossy Backward Circuit Waves 使用有损后向电路波的前向空间电荷波放大器

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-19 DOI: 10.1109/TPS.2024.3440928

Patrick Forbes;Halil Topözlü;Nader Behdad;John H. Booske

{"title":"Forward Space Charge Wave Amplifiers Using Lossy Backward Circuit Waves","authors":"Patrick Forbes;Halil Topözlü;Nader Behdad;John H. Booske","doi":"10.1109/TPS.2024.3440928","DOIUrl":"10.1109/TPS.2024.3440928","url":null,"abstract":"Previous studies of the metamaterial-enhanced resistive wall amplifier (MERWA) predicted gain and bandwidth properties attractive for high-power microwave (HPM) applications. The MERWA theory used a transverse admittance matching (AM) technique at the boundary between the beam and a lossy negative-permittivity metamaterial (MTM) slab to predict that forward slow space charge wave growth should occur if the wall presents a resistive-inductive admittance to the beam. We show that the growth and bandwidth of the MERWA can be equivalently predicted via wave-coupling theory. The main interaction occurs between two coupled waves (CWs) that correspond to the beam slow space charge wave and a lossy backward propagating circuit wave in the limit of weak coupling. We present a two-wave-coupling model to build intuition and discuss two modes of operation, oscillation and amplification, in terms of a damped feedback system. We compare the two-wave-coupling solutions against four-wave model solutions. We further demonstrate and discuss equivalency between the AM model and the wave-coupling model for an infinite parallel plate geometry. Finally, we validate the AM method predictions using particle-in-cell (PIC) simulations.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 7","pages":"2734-2748"},"PeriodicalIF":1.3,"publicationDate":"2024-08-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142175284","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Filterscope Techniques for Parasitic Signal Screening 用于筛选寄生信号的滤波器技术

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-19 DOI: 10.1109/TPS.2024.3437662

K. Butler;J. B. O. Caughman;C. A. Johnson;D. C. Easley;K. M. Davda;C. C. Klepper;E. A. Unterberg;D. C. Donovan

{"title":"Filterscope Techniques for Parasitic Signal Screening","authors":"K. Butler;J. B. O. Caughman;C. A. Johnson;D. C. Easley;K. M. Davda;C. C. Klepper;E. A. Unterberg;D. C. Donovan","doi":"10.1109/TPS.2024.3437662","DOIUrl":"10.1109/TPS.2024.3437662","url":null,"abstract":"The filterscope diagnostic uses bandpass filters and photomultiplier tubes (PMTs) to detect specific spectral emission lines. A filterscope was used to measure the W I 400.88 nm line emission as a function of ion energy on the Radio Frequency Plasma Interaction Experiment (RF PIE) for the purpose of assessing W erosion on plasma-facing components (PFCs). Different filter techniques are being explored and compared in order to effectively screen out nearby impurity lines, like the Ar II 401.39 nm line. The effectiveness of these techniques is determined by comparing the measurements to a high-resolution 1.0 m Czerny-Turner spectrometer with 0.012 nm spectral resolution. The ability to filter out nearby impurity emissions is useful when imaging PFCs in fusion devices including divertor and antenna guard limiters. Initial results with a helium plasma show little difference between the two techniques at higher bias voltages. In a helium plasma at lower dc bias voltages, a two-filter technique with filters at two separate wavelengths was shown to be more effective at screening out background signals. Data collected with an argon plasma however show the technique with overlapping filters on the line of interest is a closer match to spectrometer data at lower dc bias voltages.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 6","pages":"2343-2348"},"PeriodicalIF":1.3,"publicationDate":"2024-08-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142175285","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Effect of Low-Pressure Glow Discharge Cold Plasma on the Quality Characteristics of Button Mushroom (Agaricus bisporus) 低压辉光放电冷等离子体对双孢蘑菇品质特征的影响

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-16 DOI: 10.1109/TPS.2024.3439851

M. M. Pragalyaashree;V. Arun Joshy;R. Freeda Blessie;D. Tiroutchelvame;Shanmuga Velayutham

{"title":"Effect of Low-Pressure Glow Discharge Cold Plasma on the Quality Characteristics of Button Mushroom (Agaricus bisporus)","authors":"M. M. Pragalyaashree;V. Arun Joshy;R. Freeda Blessie;D. Tiroutchelvame;Shanmuga Velayutham","doi":"10.1109/TPS.2024.3439851","DOIUrl":"10.1109/TPS.2024.3439851","url":null,"abstract":"The present study was carried out to examine the efficacy of low-pressure glow discharge cold plasma on the quality characteristics of button mushrooms (Agaricus bisporus). Low-pressure (0.6 mbar) glow discharge was obtained to generate a cold plasma at 200 V with an electrode gap of 11 cm in the plasma chamber. Mushroom samples were exposed to cold plasma for different durations of time (5–15 min). The physical, chemical, and microbial qualities of the treated and untreated mushroom samples were compared. The plasma treatment on mushroom did not adversely affect the critical quality parameters, i.e., phenolic content, total antioxidant activity, elemental composition, surface morphology, color, texture, pH, and weight loss. The result of insignificance was observed with pH, texture, and weight loss for the treated and untreated samples. It was inferred from the results that there was a slight loss in nutritional properties as the treatment time increased but a greater reduction in microbial population. The shorter the duration of exposure, the greater the quality retention. The mushrooms treated with cold plasma for a period of 15 min showed higher elimination of microorganism. The scanning electron microscope (SEM) results revealed that the topology and the roughness of the original smooth surfaces of the virgin substrate were dramatically changed after plasma treatment.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 7","pages":"2634-2644"},"PeriodicalIF":1.3,"publicationDate":"2024-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142175287","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Damping Effects on the Spectrum of Solitary Structures in Cylindrical and Spherical Geometry 阻尼对圆柱和球形几何中孤岛结构频谱的影响

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-14 DOI: 10.1109/TPS.2024.3438559

Laxmikanta Mandi;Uday Narayan Ghosh;Swarniv Chandra;Chinmay Das;Prasanta Chatterjee

引用次数: 0

Research on Analytical Model of Synchronous Discharge of Capacitive Pulsed Power Supply 电容式脉冲电源同步放电分析模型研究

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-14 DOI: 10.1109/TPS.2024.3437478

Wanyu Liu;Kun Liu;Wenchao Li;Shikuo Cheng;Yaohong Sun;Ping Yan

引用次数: 0

Design and Analysis of Halbach Array PM Inner Rotor Slotted Stator Compensated Pulsed Alternator 哈尔巴赫阵列永磁内转子开槽定子补偿脉冲交流发电机的设计与分析

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-13 DOI: 10.1109/TPS.2024.3438278

Zhizhou Zhang;Jinchu Zhang;Weilong Zhao;Yueliang Pan

{"title":"Design and Analysis of Halbach Array PM Inner Rotor Slotted Stator Compensated Pulsed Alternator","authors":"Zhizhou Zhang;Jinchu Zhang;Weilong Zhao;Yueliang Pan","doi":"10.1109/TPS.2024.3438278","DOIUrl":"10.1109/TPS.2024.3438278","url":null,"abstract":"Compensated pulsed alternator (CPA) as an inertial energy storage pulsed power supply integrates the functions of flywheel inertial energy storage, electromechanical energy conversion, and pulsed discharge, and has many advantages such as high energy storage density, large power density, and small size. A new type of Halbach array permanent magnet (PM) inner rotor slotted stator passively CPA (SSPCPA) is proposed in this article; then, the scheme for the integration of the motor with SSPCPA is presented; next, the design processes for both the rotor and stator sides are given to determine the main structural size parameters of SSPCPA. Following this, the impedance of the armature winding of SSPCPA is calculated, and mathematical models are established for both single-phase discharge and two-phase rectified parallel discharge under load conditions. Subsequently, using Maxwell and Simplorer software, a simulation analysis is conducted for discharge with 1 m\u0000<inline-formula> <tex-math>$Omega $ </tex-math></inline-formula>\u0000 and \u0000<inline-formula> <tex-math>$1~mu $ </tex-math></inline-formula>\u0000H loads. Finally, the simulation results demonstrate that the design of SSPCPA can achieve the predetermined pulsed discharge performance.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 6","pages":"2285-2295"},"PeriodicalIF":1.3,"publicationDate":"2024-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142175308","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Vulnerability of L-Band LNA to the Out-of-Band HPM L$ 波段低噪声放大器易受带外 HPM 影响的问题

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2024-08-13 DOI: 10.1109/TPS.2024.3439130

Mingwen Zhang;Chunguang Ma;Ruilong Song;Yong Luo

引用次数: 0