IEEE Transactions on Plasma Science最新文献

{"title":"A Novel Design of Pulsed Magnet for Repetitive Magnetic Field","authors":"Yihang Huang;Huidong Shang;Shaobo Liu;Aoming Ge;Shuang Wang;Liang Li;Yiliang Lv;Tao Peng","doi":"10.1109/TPS.2026.3682291","DOIUrl":"https://doi.org/10.1109/TPS.2026.3682291","url":null,"abstract":"Repetitive pulsed magnetic fields play a critical role in neutron diffraction, room-temperature magnetic refrigeration, and pulsed terahertz gyrotron. In this article, a novel design combining flux concentrator (FC) and coil with cooling channels is proposed. This technique mitigates the thermal load generated in the coil by transferring part of it to the FC, thus enhancing both the magnetic field strength and the repetition rate. Comprehensive simulations of the electromagnetic, thermal, and mechanical behaviors were conducted, showing that the maximum temperature is 430 K and the maximum stress is 57.7 MPa. A 10-T pulsed magnetic field at a repetition rate of 5 Hz was successfully generated.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"5390-5394"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176159","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Investigation Into Critical Pulsewidth and Wormhole Effect on Solid--Vacuum Interfaces","authors":"Liang Zhao;Xibo Zhang","doi":"10.1109/TPS.2026.3709253","DOIUrl":"https://doi.org/10.1109/TPS.2026.3709253","url":null,"abstract":"The concept of critical pulsewidth (<inline-formula> <tex-math>$tau _{c}$ </tex-math></inline-formula>) refers to the pulse duration at which the surface flashover threshold (<inline-formula> <tex-math>$E_{!f}$ </tex-math></inline-formula>) equals the bulk breakdown threshold (<inline-formula> <tex-math>$E_{BD}$ </tex-math></inline-formula>) in composite insulation systems, such as solid–liquid, solid–gas, or solid–vacuum interfaces. When the applied pulsewidth (<inline-formula> <tex-math>$tau $ </tex-math></inline-formula>) is shorter than <inline-formula> <tex-math>$tau _{c}$ </tex-math></inline-formula>, <inline-formula> <tex-math>$E_{!f}$ </tex-math></inline-formula> exceeds <inline-formula> <tex-math>$E_{BD}$ </tex-math></inline-formula>, leading to bulk breakdown instead of surface flashover. This phenomenon results in a wormhole-like breakdown trace, termed the wormhole effect. In this article, the critical pulsewidth for solid–vacuum interfaces is investigated, and the conditions under which the wormhole effect occurs are calculated. It is concluded that the wormhole effect is likely to occur when: 1) the insulator thickness is too small; 2) the pulsewidth is too short; 3) the insulator configuration is too complex; or 4) the number of applied pulses is sufficiently large. These conditions are used to explain the observed wormhole breakdowns in vacuum insulators of the PITHON accelerator and the TPG700 generator.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"4826-4832"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176166","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Performance Analysis and Implementation Feasibility of an Active Hybrid Absorber for RCS Reduction Using Inhomogeneous Anisotropic Plasma and Graphene","authors":"Anis Soltani","doi":"10.1109/TPS.2026.3726817","DOIUrl":"https://doi.org/10.1109/TPS.2026.3726817","url":null,"abstract":"The design of active and tunable radar absorbing materials (RAMs) for dynamic and frequency-agile radar cross section (RCS) reduction is a critical challenge in modern stealth technology. This study proposes and numerically investigates a hybrid resonant absorber consisting of a metallic cylindrical core coated with a magnetized, inhomogeneous, and collisional plasma sheath, integrated with a tunable monolayer graphene. Unlike previous studies, we utilize a radially parabolic plasma density profile and an external static magnetic field of 0.5 T to create a gradient-index (GRIN) impedance matching environment. Full-wave simulations using the finite element method (FEM) reveal that the absorption response is dynamically reconfigurable via the graphene’s chemical potential (<inline-formula> <tex-math>$mu _{c}$ </tex-math></inline-formula>). Optimization results show an ultradeep monostatic RCS reduction of −49.94 dBsm/m at 8.65 GHz (for <inline-formula> <tex-math>$mu _{c}= 0.3$ </tex-math></inline-formula> eV). A comparative analysis demonstrates that the anisotropic plasma spacer significantly enhances performance, providing an 8.4-dB improvement over the conventional graphene-on-metal (air-spacer) configuration. Furthermore, angular stability simulations confirm that the absorber maintains its high-efficiency performance with negligible fluctuations (less than 1 dBsm/m) for incidence angles from 0° to 100°, ensuring omnidirectional stealth capability. Finally, this article addresses practical implementation aspects, including ion-gel gating for graphene biasing and the structural integration of the plasma sheath, positioning this hybrid design as a robust solution for active electromagnetic protection of cylindrical platforms.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"5002-5008"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176242","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Electrostatic Analysis of Compact Modular High-Voltage Insulation Structures for High-Power RF Devices","authors":"D. Senthil Kumar;M. S. Shivabhagya;Sisir Kumar Nayak;Subrata Kumar Datta","doi":"10.1109/TPS.2026.3727925","DOIUrl":"https://doi.org/10.1109/TPS.2026.3727925","url":null,"abstract":"High-voltage insulation structures are critical in interfacing high-power radio frequency (RF) devices with pulsed power sources (PPSs). These structures are intended to carry hundreds of kilovolts and tens of kiloamperes of pulsed power. They commonly suffer from breakdown during the operations due to the high electric stress encountered. In this study, we present an electrostatic analysis of a high-voltage structure in three different dielectric regions—transformer oil, solid insulator (nylon), and vacuum. Two types of structures, namely, nylon-based structure (structure-1) and alumina-based structure (structure-2), are analyzed. The geometries are modeled, simulated, and analyzed using ANSYS Maxwell 3-D in DC conditions. The objective of the study is to investigate the electric field distribution and identify the peak electric field value in each region of the structures. The structures which are studied in this article are generally used in integrating the high-power RF device with a pulsed power system. The peak electric field value and its location are critical in assessing breakdown risk. Fixed voltages of 400 and 600 kV are applied between the electrodes separated by dielectric material. Appropriate dielectric properties are selected for the regions to closely represent the practical conditions. Peak electric field value and its location are thoroughly checked with different mesh counts to minimize the numerical errors. The simulated results of the high-voltage structures are validated through experiments, and the structure successfully withstood the high-voltage pulse without dielectric breakdown. The simulation study is extended to a compact and modular alumina-based structure (structure-2) that serves as an ultrahigh vacuum (UHV) envelope as well as high-power devices.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"5101-5110"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176262","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Investigation of Charging Mechanisms in PEO With SPIS Simulation Tool","authors":"J. Forest;B. Tezenas du Montcel;B. Jeanty-Ruard;A. Trouche;A. Hilgers;D. Cooke","doi":"10.1109/TPS.2026.3681598","DOIUrl":"https://doi.org/10.1109/TPS.2026.3681598","url":null,"abstract":"Strong negative surface charging events, down to several kilovolt negative, have been observed on past missions in polar Earth orbit (PEO), like Swedish/German spacecraft FREJA or U.S. DMSP missions. Through a set of surface charging simulations performed with the Spacecraft Plasma Interaction Software (SPIS) software, this work attempts to explore parameters, related to space plasma conditions and spacecraft characteristics, and especially, the secondary electron yield of coating materials that may favor such events. Results are compared with previous works on this topic. Also, possible consequences on future commercial satellites in PEO, like constellations, are briefly discussed.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"5360-5367"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11495312","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149175971","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Simulation on Voltage-Sharing Configuration for 550 kV Double-Break Vacuum Circuit Breakers in Hot Standby State Considering Multiple Lightning Strikes","authors":"Jie Zhang;Yong Wang;Junxiang Liu;Lu Zhu;Jun Xiong;Yongxia Han","doi":"10.1109/TPS.2026.3718156","DOIUrl":"https://doi.org/10.1109/TPS.2026.3718156","url":null,"abstract":"Multibreak vacuum circuit breakers (VCBs) are advancing toward transmission voltage classes, but rising voltage classes cause nonuniform voltage distribution; as a result, the VCB is more prone to damage under multiple lightning intruding overvoltage. Therefore, it is of great significance to carry out research on the voltage-sharing configuration of a multibreak VCB. This article built the 3-D finite element models of a 550 kV double-break VCB with varied structures to analyze the voltage distribution characteristics under lightning impulse voltage, finding that the T-type structure has a more uniform voltage distribution without a voltage-sharing configuration. Second, distributed capacitance parameters were calculated to establish the equivalent circuit model of the T-type VCB. Finally, the voltage distribution characteristics of the T-type VCB under lightning impulse voltage with different voltage-sharing configurations were systematically analyzed. Simulation results indicated that the improved four-capacitor voltage-sharing configuration can not only improve the uniformity of the voltage distribution at the break with small capacitance values, but also enhance the uniformity of the voltage distribution in the vacuum interrupter. The optimal values of the voltage-sharing capacitor of the vacuum interrupter at the high-voltage terminal and at the low-voltage terminal are designed as 850 and 750 pF, respectively. The nonuniform coefficient of voltage distribution between the double-break can decrease below 1.02, as well as in the vacuum interrupters. Moreover, the maximum electric field intensity of the vacuum interrupters is reduced by approximately 47.4% compared to when without a voltage-sharing configuration; the voltage margin that the porcelain shell can withstand reaches over 1.3.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"4864-4872"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176044","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Analysis of Wheat Seeds Exposed With Cold Atmospheric Plasma for Agricultural Applications","authors":"Priti Pal;Mahendra Singh;Akhilesh Mishra;Minakshi Singh;Hansa Sehgal;Mukul Joshi;Shivendra Maurya;Ram Prakash Lamba;Udit Narayan Pal","doi":"10.1109/TPS.2026.3734238","DOIUrl":"https://doi.org/10.1109/TPS.2026.3734238","url":null,"abstract":"In this work, a volume dielectric barrier discharge (DBD)-based cold atmospheric plasma (CAP) source is designed and developed. CAP is a promising, residue-free technology for seed surface modification and priming, providing a sustainable alternative to chemical treatments. Here, a systematic investigation is carried out to examine the interaction between CAP and wheat (<italic>Triticum aestivum</i>) seeds to evaluate its effect on germination behavior and surface physicochemical properties. Wheat seeds are exposed to CAP for varied exposure durations of 0, 1, 5, and 15 min. The plasma exposure is followed by various physicochemical modifications in the seed analysis using field emission scanning electron microscopy (FESEM), X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), and contact angle measurements. The germination percentage of the seeds is also examined. The results clearly revealed enhanced hydrophilicity (contact angle < 40°), surface activation, and modification of chemical functional groups, which facilitate improved water uptake. Germination studies indicated a positive correlation between CAP exposure times and seed vigor. Overall, when the seeds are exposed to CAP for a treatment time of 5 min have good results with a germination percentage of 63%. While the seeds that are exposed for 15 min have adverse effects on germination. This indicates the importance of treatment-time optimization for this specific plasma configuration and seed type.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"5432-5439"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176063","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Development and Electrical Characterization of Compact High-Voltage Film-Foil Cylindrical Pulse Capacitor","authors":"Ravindra Kumar Sharma;Pratik S. Soni;Vijay Mohale","doi":"10.1109/TPS.2026.3687480","DOIUrl":"https://doi.org/10.1109/TPS.2026.3687480","url":null,"abstract":"High voltage (HV) is a necessary voltage rating of a pulse capacitor to deliver fast rising kA pulse currents for various pulsed power applications. A 2 <inline-formula> <tex-math>$mu $ </tex-math></inline-formula>F, 5 kV, 28 nH pulse capacitor is designed and fabricated in solid cylindrical shape. The challenges involved are compact size, low self-inductance, and higher insulation resistance (IR) value. Initial design of 2 <inline-formula> <tex-math>$mu $ </tex-math></inline-formula>F capacitor is with 2 kV/mm creep age distance, electric field stress: 227 V/<inline-formula> <tex-math>$mu $ </tex-math></inline-formula>m and epoxy casting with no extra impregnating oil and a lower IR value of 220 M<inline-formula> <tex-math>$Omega $ </tex-math></inline-formula> is experimentally measured. This is not acceptable for the pulsed power applications. Further, three types of 2, 1.5, and 1 <inline-formula> <tex-math>$mu $ </tex-math></inline-formula>F capacitors were fabricated with 4.0 kV/mm creepage with extra oil-bath at 192, 167, and 128 V/<inline-formula> <tex-math>$mu $ </tex-math></inline-formula>m, respectively. These modified capacitors confirmed the higher IR value of 1.67, 3.17, and 5.46 G<inline-formula> <tex-math>$Omega $ </tex-math></inline-formula>, respectively. The overall geometry of all three capacitors is in a compact size of outer diameter of 60 mm with length of 155 mm. The energy density of 0.06 J/cc and self-inductance of 28 nH is experimentally measured with copper foil-based coaxial returned path over the outer surface toward the other terminal on these three capacitors. The equivalent series inductance (ESL) value is analytically estimated based on the effective diameters in cylindrical geometry. Mathematically estimated ESL is 25.47 nH, which is in close agreement with the experimental value. The difference of 2.5 nH is contributed by the external electrical connections and self-break over spark gap during the ringing discharge experimental setup. This article insides many new ideas about the electric field stress, extra oil bath, and increased creepage gap to influence the IR value, dissipation factor, and ESL step by step manner. Finally experimental test setup is discussed in detail to measure the IR and self-inductance values of a compact fast discharging pulse capacitor. Therefore, this article will add good value to the existing fabrication and measurement techniques in HV pulsed power capacitor technology.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"5418-5424"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176079","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Intensified Video Optical Emission Spectroscopy (iVOES)---New Diagnostics for Studies of Transient Vacuum Arc Phenomena","authors":"Sergey Gortschakow","doi":"10.1109/TPS.2026.3699815","DOIUrl":"https://doi.org/10.1109/TPS.2026.3699815","url":null,"abstract":"Optical emission spectroscopy (OES) provides access to local arc plasma parameters, such as species densities and temperatures. The main drawback of conventional OES is restricted temporal resolution. The typical duration of a vacuum switching arc does not exceed 10 ms. Characteristic timescales for important physical phenomena within a high-current vacuum arc are, however, less than a microsecond. In order to overcome the shortcomings of conventional imaging OES, several advanced diagnostic methods have been developed. The most recent one is intensified video OES (iVOES). Capabilities and limitations of this new method with regard to investigations of switching vacuum arcs along with an application example are presented and discussed.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"4919-4926"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176203","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Suppression Effect of Electron Beam on Partial Discharge in Vacuum","authors":"Kota Hamada;Naoki Asari;Chihiro Tateyama","doi":"10.1109/TPS.2026.3701044","DOIUrl":"https://doi.org/10.1109/TPS.2026.3701044","url":null,"abstract":"Solid insulated switchgear (SIS) is smaller than other types of switchgear because of its use of epoxy resin with high insulation performance. The molded vacuum interrupter used in the switchgear is also smaller but exhibits higher electric field intensity, which can lead to partial discharge in vacuum. This is attributable to the emission of primary and secondary electrons, and suppressing these electrons is necessary to reduce the occurrence of partial discharge. Primary electrons are emitted from high electric field points on the metal surface, and so these points must be removed to suppress partial discharge. We focused on a method for suppressing primary electron emission, namely, electron beam irradiation of the metal surface. Electron beam irradiation is considered to melt and remove the high electric field points that cause partial discharge in vacuum. In this article, we investigate the effects of electron beam processing on the metal surface with respect to partial discharge in vacuum. As a result, it was confirmed that partial discharge extinction voltage (PDEV) improved after electron beam irradiation, and the longer the irradiation time, the higher the voltage.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"54 10","pages":"4765-4768"},"PeriodicalIF":1.6,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"149176204","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}