IEEE Transactions on Plasma Science最新文献

{"title":"Investigation of the Effect of High Frequency and Ambient Gas on Ignition and Damping of Barrier Discharge","authors":"Mustafa Saglam;Fevzi Hansu","doi":"10.1109/TPS.2025.3533421","DOIUrl":"https://doi.org/10.1109/TPS.2025.3533421","url":null,"abstract":"Determining the ignition and damping voltage values of dielectric barrier discharge (DBD) at various frequencies and in different gas ambients is important regarding lighting techniques and various industrial applications. DBDs can be operated with sinusoidal or square-wave currents between line frequency and microwave frequencies or with special pulsed waveforms. For large-scale industrial applications, power supplies operating between 500 Hz and 500 kHz are preferred. In this study, an experimental application was carried out to determine the current and voltage parameters in the damping and ignition of DBD at various frequencies and in different gas ambients. Within the scope of the study, the supply voltage was gradually applied at certain frequencies to the cylindrical plane electrode system placed in a specially designed closed and vacuumable reactor, these experiments were also repeated in various gas environments, and the voltage-current (V–I) measurements of the system were made. According to the results, it was observed that the frequency and gas type had a significant effect on the discharge damping and ignition voltages and that increasing the frequency significantly facilitated the ignition of the DBD. Similarly, the conductivity of the ambient gas significantly reduced the ignition voltage level of the DBD.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 2","pages":"311-316"},"PeriodicalIF":1.3,"publicationDate":"2025-02-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143512863","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Accelerated Plasma Spraying of Cu/Alumina Ceramics Based on Electromagnetic Pulse Welding: Simulation and Experiments","authors":"Chengxiang Li;Shiyu Weng;Chennan Xu;Dan Chen;Yan Zhou","doi":"10.1109/TPS.2025.3531962","DOIUrl":"https://doi.org/10.1109/TPS.2025.3531962","url":null,"abstract":"Cu is widely used to fabricate highly efficient conductive coatings in the power electronics industry due to its exceptional electrical and ductility. To achieve higher spraying speed and better Cu coating quality, this article deeply studied the method of accelerated plasma spraying (APS) based on electromagnetic pulse welding (EMPW). A multiphysical field simulation model was constructed to study the plasma and Cu powder motion processes. The electromagnetic parameters, temperature, and Cu powder velocity were obtained. The relationship between electrode parameters and the Lorentz force was obtained by combining the plasma equation of motion with numerical analysis. The velocity of the Cu powder motion was obtained through the capture of the spraying process. The findings revealed that the electrode spacing exerted an influence on the plasma motion. The simultaneous impact of the compression shock wave and the Lorentz force propelled the Cu powder, which remained in the solid state, toward the ceramic. The Cu powder speed reached 1024 m/s and the maximum Cu coating thickness of <inline-formula> <tex-math>$140~mu $ </tex-math></inline-formula>m was obtained when the discharge voltage was 5 kV. This study elucidated the mechanism of APS based on EMPW, thereby providing a theoretical foundation for APS in mechanism analysis and future applications.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 2","pages":"301-310"},"PeriodicalIF":1.3,"publicationDate":"2025-02-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143512865","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Fabrication of Gold Nanoparticle-Masked ITO Nanopillars Using Argon Plasma Etching: Utilization and Application in the Thin c-Si Flexible Solar Cell","authors":"Arijit Bardhan Roy","doi":"10.1109/TPS.2025.3533101","DOIUrl":"https://doi.org/10.1109/TPS.2025.3533101","url":null,"abstract":"Fabrication procedure and utilization of gold nanoparticles (NPs)-masked indium tin oxide (ITO) nanopillars using argon plasma etching was reported in this article. As we know that due to lack of substrate thickness, some fractions of photons are not absorbed by thin crystalline silicon solar cells. This issue may be answered by reported ITO nanopillar geometry embedded on top of the device provided by multiple bounces and super scattering of light. Further, this type of nanostructuring happened only on top of the anti-reflection coating (ARC), so it will be incapable to add on any surface recombination of generated carriers. In this work, the author applied this nanopillar geometry on top of the thin silicon heterojunction solar cell (p-type crystalline thin substrate with n-type amorphous layer) using Au-masked Argon plasma etching and some noticeable enhancement of short circuit current (approximately 50%) and output efficiency (more than 30%) was achieved compared to flat ITO coated cells. These values established the utilization of ITO nanopillars as an anti-reflective coating on thin c-Si solar cells through this reported study and these results also validated by electric field and integrated reflection-based profiles received from finite element method (FEM)-based simulation studies. Finally, at the end of this study, author prolifically realized thin c-Si-based solar cell with <inline-formula> <tex-math>$20~pm ~5~mu $ </tex-math></inline-formula> m substrate thickness and an effective light management design offered by ITO nanopillars.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 2","pages":"206-212"},"PeriodicalIF":1.3,"publicationDate":"2025-02-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143512961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Sensitivity Studies of Power Deposition Computed on Tokamak First Wall","authors":"Wayne Arter","doi":"10.1109/TPS.2024.3485530","DOIUrl":"https://doi.org/10.1109/TPS.2024.3485530","url":null,"abstract":"Profiles of power deposition on the first wall of the Joint European Torus (JET) tokamak experiment are fit by tracing an analytic representation for the distribution of power from midplane along lines of magnetic field. The technique is used to help design plasma-facing components (PFCs) in reactor-scale magnetic confinement devices; hence, understanding how to employ it both efficiently and accurately is important. Focusing on JET divertor geometry, the work examines the sensitivity of the integrated power and maximum power per PFC tile to the representation of the magnetic field and to the discretization of the tile’s own geometry and that of other PFCs. For design, it is helpful to reduce computation costs per realization to a few seconds of elapsed time, and the work concludes with recommendations and guidelines for minimizing cost while retaining adequate accuracy.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 3","pages":"463-475"},"PeriodicalIF":1.3,"publicationDate":"2025-02-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10870444","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143645168","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Delay and Jitter Characteristics of Fast-Triggered Cold Cathode Switches and Their Discharge Circuits","authors":"Zhaoxiang Wang;Guisheng Jiang;Yijun Zheng;Hongliang Ma;Yu Liu;Ziren Zhu;Yinhui Yang;Zefan Huang;Lin Chen;Rongqing Tan","doi":"10.1109/TPS.2024.3522338","DOIUrl":"https://doi.org/10.1109/TPS.2024.3522338","url":null,"abstract":"Based on gas discharge theory incorporating enhanced distorted electric fields, refines the delay calculation formula for three-electrode spark-gap switches, thereby improving the accuracy of theoretical predictions. Additionally, the relationships between the delay and jitter of the spark-gap switch and variations in trigger voltage, operating voltage, gas pressure, and main electrode spacing were comprehensively examined. From the perspective of microscopic particles, the physical mechanisms by which these factors influence breakdown delay and discharge jitter were elucidated. By comparing the magnitude of each factor’s impact, the most critical factors affecting the breakdown delay and jitter of the spark-gap switch under conditions using a TEA CO2 laser as a load were identified, and discharge jitter was further reduced. Experimental results indicate that the rise rates of operating voltage and trigger voltage are the key parameters affecting the delay and jitter of the spark-gap switch, while the influence of other factors is relatively minor. Furthermore, the corrected delay calculation formula aligns well with the experimental results. This research not only provides a reference for delay prediction but also offers a low-jitter solution for laser oscillator-amplifier systems based on synchronized pulse discharge.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 2","pages":"276-283"},"PeriodicalIF":1.3,"publicationDate":"2025-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143512765","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Neutron Yield Optimization From a Palm Top Plasma Focus Device Using Lee Code","authors":"M. I. Nayeem;S. Biswas;M. K. Islam;M. Akel;S. Lee;M. A. Malek","doi":"10.1109/TPS.2025.3525982","DOIUrl":"https://doi.org/10.1109/TPS.2025.3525982","url":null,"abstract":"A palm top plasma focus (PF) device (100 J, 5 kV, 59 kA, ~1.5 kg) with tapered anode was demonstrated in a study earlier by (Rout et al., 2013). To simulate that device, we use the Lee code (RADPFV5.16). The computed current trace is fit to Rout’s measured current trace at 2.25 Torr deuterium (<inline-formula> <tex-math>${D} _{2}$ </tex-math></inline-formula>) gas. The best-fit values of the model parameters are found as <inline-formula> <tex-math>${f}_{m} = 0.11, f_{c} = 0.73, f_{text {mr}} = 0.245, f_{text {cr}} = 0.78$ </tex-math></inline-formula>. Having fixed these parameters, the computed neutron yields (<inline-formula> <tex-math>${Y} _{n}$ </tex-math></inline-formula>) <inline-formula> <tex-math>$6.12times 10^{4}, 1.72times 10^{4}$ </tex-math></inline-formula>, and <inline-formula> <tex-math>$0.24times 10^{4}$ </tex-math></inline-formula> neutrons/shot are found to be comparable with the measured values (<inline-formula> <tex-math>$5.2~pm ~0.8$ </tex-math></inline-formula>) <inline-formula> <tex-math>$times 10^{4}$ </tex-math></inline-formula>, (<inline-formula> <tex-math>$2~pm ~0.5$ </tex-math></inline-formula>) <inline-formula> <tex-math>$times 10^{4}$ </tex-math></inline-formula>, and (<inline-formula> <tex-math>$0.2~pm ~0.1$ </tex-math></inline-formula>) <inline-formula> <tex-math>$times 10^{4}$ </tex-math></inline-formula> at (2.25 Torr, 5 kV), (1.875 Torr, 4 kV), and (1.5 Torr, 3 kV), respectively. The remarkable agreement shows the reliability of the code. Numerical studies are extended with anode length and taper size optimization, corresponding to the pressure range (2–3.5) Torr of <inline-formula> <tex-math>${D} _{2}$ </tex-math></inline-formula>. The optimum <inline-formula> <tex-math>${Y} _{n}$ </tex-math></inline-formula> (<inline-formula> <tex-math>$1.56times 10^{5}$ </tex-math></inline-formula>) is found at 2.55 Torr which is three times greater than the highest measured value [(<inline-formula> <tex-math>$5.2~pm ~0.8$ </tex-math></inline-formula>) <inline-formula> <tex-math>$times 10^{4}$ </tex-math></inline-formula>] at 2.25 Torr, 5 kV. At this optimized configuration, using deuterium-tritium (1:1) as the operating gas, the neutron yield is computed to increase to <inline-formula> <tex-math>$10^{7}$ </tex-math></inline-formula>, about 100 times greater than the computed yield with <inline-formula> <tex-math>${D} _{2}$ </tex-math></inline-formula>. In addition, we found that reducing the stray inductance <inline-formula> <tex-math>${L} _{0}$ </tex-math></inline-formula> of the device from its present value of 30 to 16 nH, the D-D neutron yield is increased from computed value of <inline-formula> <tex-math>$1.56times 10^{5}$ </tex-math></inline-formula> to <inline-formula> <tex-math>$2.58times 10^{5}$ </tex-math></inline-formula>.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 2","pages":"293-300"},"PeriodicalIF":1.3,"publicationDate":"2025-01-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143512866","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Blank Page","authors":"","doi":"10.1109/TPS.2025.3530041","DOIUrl":"https://doi.org/10.1109/TPS.2025.3530041","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 12","pages":"C4-C4"},"PeriodicalIF":1.3,"publicationDate":"2025-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10856692","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143106536","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Nanosecond Microwave Pulse Amplification Based on a High-Power Gyrotron Traveling Wave Tube","authors":"Ruoyang Pan;Zhiyuan Zhang;Guo Liu;Weijie Wang;Yingjian Cao;Yu Wang;Yelei Yao;Wei Jiang;Zewei Wu;Youlei Pu;Jianxun Wang;Yong Luo","doi":"10.1109/TPS.2025.3530471","DOIUrl":"https://doi.org/10.1109/TPS.2025.3530471","url":null,"abstract":"This article presents the amplification of nanosecond pulses using a Ku-band TE11 gyrotron traveling wave tube (gyro-TWT). The output performance is analyzed through simulation and experiment at 15.0–17.0 GHz with different pulse widths. Simulated results show that the maximum saturation power for a single-frequency pulse can reach 292.7 kW with a pulsewidth of 2.0 ns. As the input pulsewidth further shortens, the output power of the gyro-TWT decreases. The shortest pulsewidth to achieve a hundred-kilowatt level output power is 1.1 ns. In the hot test, the maximum power is 201.4 kW at 15.5 GHz with a single-frequency pulsewidth of 4.7 ns. For an up-chirped pulse from 15.0–16.0 GHz, the output power of ~100 kW with a minimum output pulsewidth is 3.8 ns.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 2","pages":"239-244"},"PeriodicalIF":1.3,"publicationDate":"2025-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143512835","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Temporal and Spatiotemporal Evolution Distribution Characteristics of Friction and Wear of Electromagnetic Launcher","authors":"Feng Liu;Yuntian Han;Xiang Gao;Tonggang Lu;Huihui Zhang","doi":"10.1109/TPS.2025.3530532","DOIUrl":"https://doi.org/10.1109/TPS.2025.3530532","url":null,"abstract":"During the launching of electromagnetic railguns, the friction and wear of the armature and rails under the extreme force-electromagnetic–temperature coupling cannot be avoided, which has become a serious obstacle restricting the service life and launching accuracy of electromagnetic railguns. To explore the time and space distribution characteristics of rail friction and wear, an electromagnetic launcher model considering the interference fit of the armature-rail is established, and the wear calculation considering the effect of material temperature is carried out on the basis of the electromagnetic field analysis. The calculation of friction heat considers the contact pressure generated by the combined action of the interference fit and the Lorentz force. The results show that the wear volume of the steel-copper armature rail is significantly lower than that of the copper-aluminum armature rail, and there is no significant difference in the spatial distribution. After the pulse current is transformed into a trapezoidal current waveform, the wear volume of the armature rail can not only be reduced but also the acceleration efficiency of the armature can be significantly improved.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 2","pages":"334-342"},"PeriodicalIF":1.3,"publicationDate":"2025-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143512969","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Study on the Influence of Pressure on Ion Extraction Characteristics","authors":"Ao Xu;Xiang Wan;Pingping Gan;Yuanjie Shi","doi":"10.1109/TPS.2025.3530562","DOIUrl":"https://doi.org/10.1109/TPS.2025.3530562","url":null,"abstract":"Many ion sources need to work in the order of <inline-formula> <tex-math>$10^{-3}$ </tex-math></inline-formula>–1-Pa pressure, so the influence of these pressures on ion extraction characteristics has been attracted attention. In this article, based on 2-D space and 3-D velocity (2D3V) particle-in-cell-coupled Monte Carlo collision (PIC-MCC) method, a simplified simulation model of argon ion extraction process under an extraction voltage of −10 kV is established. The influence of argon pressure on the density and velocity of electrons and ions is obtained. Then, the reason why the extracted ion current decreases obviously when the argon pressure increases to 1 Pa is explained. That is, the probability of elastic collision and charge exchange between argon ions and argon atoms increases obviously, which leads to the deceleration and divergence of argon ion beam. This provides support for further understanding of ion extraction characteristics and influencing factors.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 2","pages":"252-258"},"PeriodicalIF":1.3,"publicationDate":"2025-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143512836","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}