Study on the Influence of Pressure on Ion Extraction Characteristics

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Ao Xu;Xiang Wan;Pingping Gan;Yuanjie Shi
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引用次数: 0

Abstract

Many ion sources need to work in the order of $10^{-3}$ –1-Pa pressure, so the influence of these pressures on ion extraction characteristics has been attracted attention. In this article, based on 2-D space and 3-D velocity (2D3V) particle-in-cell-coupled Monte Carlo collision (PIC-MCC) method, a simplified simulation model of argon ion extraction process under an extraction voltage of −10 kV is established. The influence of argon pressure on the density and velocity of electrons and ions is obtained. Then, the reason why the extracted ion current decreases obviously when the argon pressure increases to 1 Pa is explained. That is, the probability of elastic collision and charge exchange between argon ions and argon atoms increases obviously, which leads to the deceleration and divergence of argon ion beam. This provides support for further understanding of ion extraction characteristics and influencing factors.
压力对离子萃取特性影响的研究
许多离子源需要在$10^{-3}$ -1-Pa的压力下工作,因此这些压力对离子提取特性的影响引起了人们的关注。本文基于二维空间和三维速度(2D3V)粒子-胞内耦合蒙特卡罗碰撞(PIC-MCC)方法,建立了提取电压为−10 kV时氩离子提取过程的简化仿真模型。得到了氩气压力对电子和离子的密度和速度的影响。然后,解释了当氩气压力增加到1 Pa时,离子提取电流明显减小的原因。即氩离子与氩原子之间发生弹性碰撞和电荷交换的概率明显增大,导致氩离子束的减速和发散。这为进一步了解离子萃取特性及影响因素提供了支持。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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