IEEE Transactions on Plasma Science最新文献

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IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-14 DOI: 10.1109/TPS.2025.3584300
{"title":"Member ad suite","authors":"","doi":"10.1109/TPS.2025.3584300","DOIUrl":"https://doi.org/10.1109/TPS.2025.3584300","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 7","pages":"1838-1838"},"PeriodicalIF":1.3,"publicationDate":"2025-07-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11079400","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144623922","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Special Issue on Plenary, Invited, Workshop on Pulsed Power for Fusion from PPPS-2025 来自PPPS-2025的聚变脉冲功率研讨会全体会议特刊
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-14 DOI: 10.1109/TPS.2025.3583453
{"title":"Special Issue on Plenary, Invited, Workshop on Pulsed Power for Fusion from PPPS-2025","authors":"","doi":"10.1109/TPS.2025.3583453","DOIUrl":"https://doi.org/10.1109/TPS.2025.3583453","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 7","pages":"1837-1837"},"PeriodicalIF":1.3,"publicationDate":"2025-07-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11079401","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144623881","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Proposal for a Uniform Magnetic Focusing System to Improve the Sheet Beam Transmission 一种均匀磁聚焦系统提高片束透射率的方案
IF 1.5 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-11 DOI: 10.1109/TPS.2025.3585526
Wenbo Wang;Cunjun Ruan;Pengpeng Wang;Yaqi Zhao;Tianyi Xu
{"title":"A Proposal for a Uniform Magnetic Focusing System to Improve the Sheet Beam Transmission","authors":"Wenbo Wang;Cunjun Ruan;Pengpeng Wang;Yaqi Zhao;Tianyi Xu","doi":"10.1109/TPS.2025.3585526","DOIUrl":"https://doi.org/10.1109/TPS.2025.3585526","url":null,"abstract":"Sheet electron beam (SEB) has been widely concerned in high-power vacuum electronic devices (VEDs). By enlarging its transverse size, the current of SEB can be further increased under the premise of relatively low current density, thus greatly enhancing the output power. However, the instability of SEB transmission under the focusing of uniform magnetic focusing system (UMFS) limits the further development of SEB-VEDs. In order to solve this problem, a novel and simple method to improve the transmission performance of SEB has been proposed in this article. Based on the conventional UMFS, this method adds two another magnetic blocks with transverse magnetization, and then, the transverse magnetic (TM) field will be generated and will be fully utilized in optimizing the transmission of SEB. Comparative analysis of simulation results shows that under the same strength of the axial magnetic field, using the UMFS with additional TM field (TM-UMFS) to focus the SEB can further increase the electron passing rate by at least 30% compared to the conventional UMFS. The simple structure of TM-UMFS proposed in this article shows the high possibility in the fabricating process and is expected to obtain further development in the high-power SEB-VED industry.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 8","pages":"1866-1873"},"PeriodicalIF":1.5,"publicationDate":"2025-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144831754","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An All-Metal Terahertz Metamaterial Absorber Using Concentric Octagonal Rings for Refractive Index Sensing 利用同心八角形环进行折射率传感的全金属太赫兹超材料吸收体
IF 1.5 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-11 DOI: 10.1109/TPS.2025.3582610
Shruti;Bhargav Appasani;Sasmita Pahadsingh
{"title":"An All-Metal Terahertz Metamaterial Absorber Using Concentric Octagonal Rings for Refractive Index Sensing","authors":"Shruti;Bhargav Appasani;Sasmita Pahadsingh","doi":"10.1109/TPS.2025.3582610","DOIUrl":"https://doi.org/10.1109/TPS.2025.3582610","url":null,"abstract":"This article introduces an all-metal THz metamaterial absorber (MA) featuring triple concentric octagonal rings optimized to detect the refractive index of brain tissues. Constructed entirely from stainless steel, the absorber achieves dual-band absorption rates of 99.45% and 96.72% at 3.7149 and 3.8695 THz, respectively. Simulations reveal that the device exhibits sensitivities of 2.45 and 2.70 THz per refractive index unit (RIU) as the refractive index shifts from 1.30 to 1.40. The corresponding quality factors (<italic>Q</i>-factor) are 571 and 1488, while the figures of merit (FoM) are 376 and 1038. These exceptionally high <italic>Q</i>-factors and FoM values highlight the absorber’s potential for high-precision sensing applications. Moreover, a parametric analysis was performed to optimize the geometric dimensions of the structure. Physical mechanisms, including impedance matching, current distribution, and sensitivity, were also explained in detail. This stainless steel-based absorber simplifies fabrication and significantly reduces costs compared to conventional metal-dielectric-metal designs. This work finds its application in biomedical sensing, which requires highly sensitive sensors.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 8","pages":"2109-2115"},"PeriodicalIF":1.5,"publicationDate":"2025-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144831766","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Testing of Novel Semiconductor Opening Switches Using Magnetic Switching 采用磁开关的新型半导体开路开关的测试
IF 1.5 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-11 DOI: 10.1109/TPS.2025.3586185
B. Esser;J. C. Stephens;J. C. Dickens;A. A. Neuber;J. J. Mankowski;C. A. Chapin;Q. Shao;D. O. Smith;L. F. Voss;J. A. Schrock;B. Hoff;S. Heidger
{"title":"Testing of Novel Semiconductor Opening Switches Using Magnetic Switching","authors":"B. Esser;J. C. Stephens;J. C. Dickens;A. A. Neuber;J. J. Mankowski;C. A. Chapin;Q. Shao;D. O. Smith;L. F. Voss;J. A. Schrock;B. Hoff;S. Heidger","doi":"10.1109/TPS.2025.3586185","DOIUrl":"https://doi.org/10.1109/TPS.2025.3586185","url":null,"abstract":"The performance of semiconductor opening switch (SOS) diodes with different doping profiles is assessed with the primary aim of enhancing or substituting hard-to-find devices. SOS devices are capable of providing long lifetime, gigawatt level pulses in generators with risetimes on the nanosecond scale with pulse widths on the order of 20 ns. An experimental testbed is described which allows for rapid testing of diodes with control of the forward pumping time which is a crucial parameter of SOS diodes. A saturable pulse transformer provides both the initial voltage multiplication and reverse current pulse required to drive SOS diodes. Voltage multiplication ratios of 16:1 were achieved with a modest charging voltage of 800 V and simple circuitry. With current densities of up to 1.4 kA <inline-formula> <tex-math>$cdot $ </tex-math></inline-formula> <inline-formula> <tex-math>$text{cm}^{text {-2}}$ </tex-math></inline-formula>, the testbed produces 10 kV output pulses into a <inline-formula> <tex-math>$56~Omega $ </tex-math></inline-formula> load with a pulsewidth of 16 ns and delivered power of up to 1.9 MW. These novel devices are compared to legacy SOS diodes originating from Russia, with one of the profiles yielding increased performance. These profiles are studied in hopes of creating manufacturing demand to augment the availability of these useful devices.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 8","pages":"1976-1981"},"PeriodicalIF":1.5,"publicationDate":"2025-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144831959","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Single-Stage Constant Power Capacitor Charging Architecture for Flicker Mitigation for High-Power Pulsed Loads 一种用于抑制大功率脉冲负载闪烁的单级恒功率电容器充电结构
IF 1.5 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-11 DOI: 10.1109/TPS.2025.3585969
Max Collins
{"title":"A Single-Stage Constant Power Capacitor Charging Architecture for Flicker Mitigation for High-Power Pulsed Loads","authors":"Max Collins","doi":"10.1109/TPS.2025.3585969","DOIUrl":"https://doi.org/10.1109/TPS.2025.3585969","url":null,"abstract":"Capacitor chargers for pulsed power loads are typically realized as two-stage systems consisting of a front-end rectifier and a dclink filter followed by a dc/dc converter. Whereas such systems generally operate in constant current charging mode, it has recently been demonstrated that constant power charging may be achieved and can effectively eliminate line-side flicker. In this article, these ideas are extended to a single-stage capacitor charger architecture in which the modulation index of a three-phase voltage source converter is controlled to both actively shape the line current waveforms, eliminating reactive power and current harmonics, as well as to provide constant power capacitor charging, thereby eliminating flicker. A detailed description of the control scheme is presented, and a method for controller design is proposed. Finally, the performance of the proposed method is assessed in a case study based on European Spallation Source klystron modulator requirements (pulse amplitude 115 kV/100 A, pulselength 3.5 ms, pulse repetition rate 14 Hz). The designed capacitor charger is validated through circuit simulation and compared to the existing capacitor charger solution.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 8","pages":"1989-1996"},"PeriodicalIF":1.5,"publicationDate":"2025-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144831763","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Generation of a High Current Density and High Compression Ratio Beam for THz TWT 太赫兹行波管高电流密度和高压缩比光束的产生
IF 1.5 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-11 DOI: 10.1109/TPS.2025.3585886
Hao Li;Junjian Wu;Yang Dong;Jingyu Guo;Zhiyu Chen;Yixin Peng;Jingrui Duan;Yinyu Zhang;Yuan Zheng;Yubin Gong
{"title":"Generation of a High Current Density and High Compression Ratio Beam for THz TWT","authors":"Hao Li;Junjian Wu;Yang Dong;Jingyu Guo;Zhiyu Chen;Yixin Peng;Jingrui Duan;Yinyu Zhang;Yuan Zheng;Yubin Gong","doi":"10.1109/TPS.2025.3585886","DOIUrl":"https://doi.org/10.1109/TPS.2025.3585886","url":null,"abstract":"In the terahertz (THz) band, electron beam quality significantly influences beam-focused transmission and beam-wave interaction, and the compressive electric field distribution determines it. This article introduces a stepped-conical (SC) electron gun optimized to improve beam laminarity. Compared with the traditional single-stage (SS) gun, the SC gun reduces velocity dispersion by 36.9%, resulting in a 55.3% reduction in population velocity standard deviation (<inline-formula> <tex-math>$sigma $ </tex-math></inline-formula>). Under a 0.67-T uniform magnetic (UM) field focusing, both beams achieve transmissions over 99% within a 40-<inline-formula> <tex-math>$mu $ </tex-math></inline-formula>m-radius, 80-mm-length beam tunnel. Verified through CST particle-in-cell (PIC) simulations, the hot transmission of the SC gun-based beam could maintain an over 99% transmission ratio, while the SS gun decreased to 95.6%. Under the 1-mW input signal, the SS gun-based beam amplifies the signal by 40 dB in the slow wave structure (SWS) circuit, yielding an output power of 400 mW. In contrast, the SC gun-based beam achieves a gain of 48 dB and an output power of 900 mW, representing a 112.8% improvement. The high-quality electron beam generated by the SC electron gun not only enhances the transmission efficiency of ultrafine electron beams but also significantly improves the gain and power output of the THz traveling-wave tubes (TWTs).","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 8","pages":"1874-1879"},"PeriodicalIF":1.5,"publicationDate":"2025-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144831929","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Engineering Design of Plasma Current Measurement in EXL-50U Spherical Torus: Integrating Rogowski Coil and Water-Cooled Optical Fiber Sensors EXL-50U球形环面等离子体电流测量的工程设计:集成Rogowski线圈和水冷光纤传感器
IF 1.5 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-10 DOI: 10.1109/TPS.2025.3576816
Jia Li;Dong Guo;Renyi Tao;Zhixin Wang;Chao Wu
{"title":"Engineering Design of Plasma Current Measurement in EXL-50U Spherical Torus: Integrating Rogowski Coil and Water-Cooled Optical Fiber Sensors","authors":"Jia Li;Dong Guo;Renyi Tao;Zhixin Wang;Chao Wu","doi":"10.1109/TPS.2025.3576816","DOIUrl":"https://doi.org/10.1109/TPS.2025.3576816","url":null,"abstract":"Accurate plasma current measurement is essential for the control and analysis of plasma behavior in tokamak experiments. In the EXL-50U spherical torus, a synergistic measurement system combining Rogowski coils, strategically positioned 180° apart, with optical fiber current sensors has been implemented. To meet the rigorous demands of high-temperature of plasma experiments, a dedicated water-cooling system was engineered to protect and efficiently cool the optical fibers within the vacuum vessel. Calibration procedures employing a FLUKE current source were done after the installation and the two kinds of sensors show good consistency in measuring the plasma current. The research overcame significant design and installation obstacles, such as reducing eddy current interference from toroidal structures and preventing damage to the optical fibers during installation, by employing innovative engineering strategies. These advancements contribute significantly to the field of fusion energy, enhancing the accuracy and reliability of plasma diagnostics.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 8","pages":"1946-1951"},"PeriodicalIF":1.5,"publicationDate":"2025-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144831658","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A E-Band Broadband 100-W Continuous-Wave Traveling-Wave Tube With Novel Slow Wave Circuit 一种新型慢波电路的e波段宽带100w行波管
IF 1.5 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-10 DOI: 10.1109/TPS.2025.3584954
Fei Li;Liu Xiao;Jiandong Zhao;Zicheng Wang;Hongxia Yi;Zhiliang Chen;Xinwen Shang;Yanwei Li;Weixing Li;Can Li
{"title":"A E-Band Broadband 100-W Continuous-Wave Traveling-Wave Tube With Novel Slow Wave Circuit","authors":"Fei Li;Liu Xiao;Jiandong Zhao;Zicheng Wang;Hongxia Yi;Zhiliang Chen;Xinwen Shang;Yanwei Li;Weixing Li;Can Li","doi":"10.1109/TPS.2025.3584954","DOIUrl":"https://doi.org/10.1109/TPS.2025.3584954","url":null,"abstract":"A broadband E-band continuous-wave (CW) 100-W traveling-wave tube (TWT) is developed to meet the requirements of radar and electronic warfare systems. The following methods are adopted in this E-band CW TWT to expand the operation bandwidth, improve the gain flatness, and increase the output power: flat dispersion curves and high coupling impedance by adopting a new type slow wave structure of nonconcentric serpentine waveguide circuit with variable narrow edges (NSWC), improved output power in the high-frequency end by using the positive and negative phase velocity jump technology, high electron beam transmission by a dual-anode long-range electron gun, and minimized reflection within the widest possible frequency band by sapphire box windows with linear double gradient transition waveguides. The first prototype tube has been assembled and tested. Within 8-GHz operation bandwidth of 80–88 GHz, this TWT provides the saturated output power of more than 112.9 W and −1-dB compression point powers of more than 81.44 W. The saturated gain and the small signal gains are higher than 32.37 dB with fluctuations less than 2.23 and 34.92 dB with fluctuations less than 4.96 dB, respectively. Compared with other existing CW TWTs in E-band, this TWT has a wider operating bandwidth, higher linear output power, and better gain flatness.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 8","pages":"2131-2139"},"PeriodicalIF":1.5,"publicationDate":"2025-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144831774","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Parameter Dependences of Ion Energy Distribution and Ion Flux in Dual-Frequency Capacitively Coupled Argon Discharges 双频电容耦合氩放电中离子能量分布和离子通量的参数依赖性
IF 1.5 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-07-10 DOI: 10.1109/TPS.2025.3584260
Yang Zhou;Kai Zhao;Ming-Liang Zhao;Ying-Ying Zhang;Yu-Ru Zhang;Yong-Xin Liu;Fei Gao;You-Nian Wang
{"title":"Parameter Dependences of Ion Energy Distribution and Ion Flux in Dual-Frequency Capacitively Coupled Argon Discharges","authors":"Yang Zhou;Kai Zhao;Ming-Liang Zhao;Ying-Ying Zhang;Yu-Ru Zhang;Yong-Xin Liu;Fei Gao;You-Nian Wang","doi":"10.1109/TPS.2025.3584260","DOIUrl":"https://doi.org/10.1109/TPS.2025.3584260","url":null,"abstract":"Low-pressure dual-frequency capacitively coupled plasmas (DF CCPs) are routinely used in high-aspect-ratio (HAR) dielectric etching for 3-D memory fabrication, due to their capability for independent control of ion flux and ion energy. To prevent unwanted etching profiles caused by the charging effect inside the HAR trenches, a much lower excitation frequency, in the kilohertz range, is necessary to generate higher ion energy. In this work, we investigate the effects of discharge parameters on the ion energy distribution function (IEDF) and the ion flux in a DF argon discharge excited by a high-frequency (HF) source at 27.2 MHz and a low-frequency (LF) source at 0.04/0.4/1.36/2.72/5.44/6.8 MHz, utilizing a retarding field energy analyzer (RFEA). With increasing the LF voltage amplitude (<inline-formula> <tex-math>${V}_{text {L}}$ </tex-math></inline-formula>), the mean ion energy increases, while the ion flux decreases. The decrease in the ion flux versus <inline-formula> <tex-math>${V}_{text {L}}$ </tex-math></inline-formula> is attributed to a weakened HF electron heating at a higher <inline-formula> <tex-math>${V}_{text {L}}$ </tex-math></inline-formula>. The IEDF evolves from a broad peak at <inline-formula> <tex-math>${V}_{text {L}} =50$ </tex-math></inline-formula> V into a bimodal structure at <inline-formula> <tex-math>${V}_{text {L}} =100$ </tex-math></inline-formula> V. With further increasing <inline-formula> <tex-math>${V}_{text {L}}$ </tex-math></inline-formula>, the high-energy peak shifts toward higher energies, and the energy width between the high- and low-energy peaks broadens. By contrast, increasing the HF voltage amplitude (<inline-formula> <tex-math>${V}_{text {H}}$ </tex-math></inline-formula>) leads to a rise in both the mean ion energy and ion flux. By increasing the gas pressure (<italic>p</i>), both the high- and low-energy peaks in the IEDF become less evident, due to enhanced momentum transfer and/or charge exchange collision between ions and neutrals at a higher <italic>p</i>. As the LF frequency (<inline-formula> <tex-math>${f}_{text {L}}$ </tex-math></inline-formula>) increases, the IEDF transitions from a broad bimodal structure to an almost single-peak structure. Notably, with decreasing <inline-formula> <tex-math>${f}_{text {L}}$ </tex-math></inline-formula>, the ion flux decreases initially, followed by an increase, reaching a maximum at 400 kHz.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 9","pages":"2491-2497"},"PeriodicalIF":1.5,"publicationDate":"2025-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145061899","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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