IEEE Transactions on Plasma Science最新文献

筛选
英文 中文
Editorial Editor-in-Chief Transition 编辑主编过渡
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-25 DOI: 10.1109/TPS.2024.3412532
Edl Schamiloglu
{"title":"Editorial Editor-in-Chief Transition","authors":"Edl Schamiloglu","doi":"10.1109/TPS.2024.3412532","DOIUrl":"https://doi.org/10.1109/TPS.2024.3412532","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 7","pages":"2652-2652"},"PeriodicalIF":1.3,"publicationDate":"2024-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10736389","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142524133","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation in Forced Shifts of Current on the Dynamic Armature and Rail Interface 动态电枢和钢轨界面上电流强制移位的研究
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-25 DOI: 10.1109/TPS.2024.3481051
Jinghan Xu;Shengguo Xia;Anbang Gu;Lixue Chen;Chengxian Li;Hongdan Yang
{"title":"Investigation in Forced Shifts of Current on the Dynamic Armature and Rail Interface","authors":"Jinghan Xu;Shengguo Xia;Anbang Gu;Lixue Chen;Chengxian Li;Hongdan Yang","doi":"10.1109/TPS.2024.3481051","DOIUrl":"https://doi.org/10.1109/TPS.2024.3481051","url":null,"abstract":"The armature and rail (A/R) interface in railgun is considered a dynamic electrical contact involving contact pressure and area variations, and the extreme working conditions lead to distinct electromagnetic properties from the bulk and perfect contact. This article investigates the mechanical and electromagnetic properties of the dynamic A/R interface based on imperfect contact boundary conditions. The contact area expands as the driving current increases, which increases the current distributed area and enhances uniformity. The current redistribution patterns are identified as forced shifts of current, with currents on the previous contact area boundaries decreasing and those on the existing boundaries increasing sharply. The analysis results indicate that the electric scalar potential difference and contact conductivity dominate the current variations on previous and existing boundaries, respectively. In other words, the conduction current and the contact state are the primary factors causing forced shifts of current rather than the induction current. Furthermore, the influences of dynamic contact conditions on the electric scalar potential difference are studied, and the results indicate that contact area variation has a more significant impact on the electric scalar potential difference. As the contact area changes, the conduction current paths shift with contact area boundaries, which causes variations in electric scalar potential differences, consequently, leading to the phenomenon of forced current shifts.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4727-4734"},"PeriodicalIF":1.3,"publicationDate":"2024-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142797918","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Transient Analysis of Absorption Characteristics of Argon Plasma Column Array Under High-Power Microwave Irradiation 大功率微波辐照下氩等离子体柱阵列的瞬态吸收特性分析
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-25 DOI: 10.1109/TPS.2024.3479281
Zhengming Tang;Yusen Yang;Lin Wang
{"title":"Transient Analysis of Absorption Characteristics of Argon Plasma Column Array Under High-Power Microwave Irradiation","authors":"Zhengming Tang;Yusen Yang;Lin Wang","doi":"10.1109/TPS.2024.3479281","DOIUrl":"https://doi.org/10.1109/TPS.2024.3479281","url":null,"abstract":"This article mainly focuses on the absorption properties of microwave plasma. Based on the plasma fluid method, plasma column array structures are proposed to study the transmission of high-power microwave (HPM) pulses. The damping effect of the plasma column array on HPM with different plasma column gap widths, different plasma column radius lengths and a double-layer plasma column array in combination with an absorbing material structure is investigated. The physical process and mechanism of plasma shielding effect on high-power microwaves are determined. The results suggest that large gaps between the plasma columns weaken the absorption and reflection of electromagnetic (EM) waves by the plasma column array. Increasing the plasma column radius can improve the absorption and reflection of EM waves and realize the limiting function. In addition, the double-layer plasma column array structure combined with absorbing material can prevent the loss of EM waves and optimally achieve the EM wave absorption effect. This study can provide more effective guidelines for microwave protection applications.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4562-4569"},"PeriodicalIF":1.3,"publicationDate":"2024-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142798020","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blank Page 空白页
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-25 DOI: 10.1109/TPS.2024.3471091
{"title":"Blank Page","authors":"","doi":"10.1109/TPS.2024.3471091","DOIUrl":"https://doi.org/10.1109/TPS.2024.3471091","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 7","pages":"C4-C4"},"PeriodicalIF":1.3,"publicationDate":"2024-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10736373","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142518233","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blank Page 空白页
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-25 DOI: 10.1109/TPS.2024.3477871
{"title":"Blank Page","authors":"","doi":"10.1109/TPS.2024.3477871","DOIUrl":"https://doi.org/10.1109/TPS.2024.3477871","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 7","pages":"C4-C4"},"PeriodicalIF":1.3,"publicationDate":"2024-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10736374","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142517911","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Guest Editorial Special Issue on Plenary, Invited, and Selected Papers From the Third International Conference on Advances in Plasma Science and Technology (ICAPST-23) 第三届等离子体科学与技术进展国际会议 (ICAPST-23) 全会论文、特邀论文和精选论文特刊客座编辑
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-25 DOI: 10.1109/TPS.2024.3465129
K. Navaneetha Pandiyaraj;Rajendra R. Deshmukh;Anthony B. Murphy;Rino Morent;Truell Hyde;Shu Lai;Francesco Taccogna;Steven J. Gitomer
{"title":"Guest Editorial Special Issue on Plenary, Invited, and Selected Papers From the Third International Conference on Advances in Plasma Science and Technology (ICAPST-23)","authors":"K. Navaneetha Pandiyaraj;Rajendra R. Deshmukh;Anthony B. Murphy;Rino Morent;Truell Hyde;Shu Lai;Francesco Taccogna;Steven J. Gitomer","doi":"10.1109/TPS.2024.3465129","DOIUrl":"https://doi.org/10.1109/TPS.2024.3465129","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 7","pages":"2390-2391"},"PeriodicalIF":1.3,"publicationDate":"2024-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10736383","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142573616","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Review on Megavolt Pulsed Switches and Their Time Delay Jitters 兆伏脉冲开关及其时延抖动研究进展
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-24 DOI: 10.1109/TPS.2024.3477737
Tianchi Wang;Yingchao Du;Wei Chen
{"title":"A Review on Megavolt Pulsed Switches and Their Time Delay Jitters","authors":"Tianchi Wang;Yingchao Du;Wei Chen","doi":"10.1109/TPS.2024.3477737","DOIUrl":"https://doi.org/10.1109/TPS.2024.3477737","url":null,"abstract":"In large pulsed power drivers for the research of high-energy-density physics (HEDP) and high power electromagnetic (HPEM), megavolt pulsed gas switches are crucial and indispensable components that transfer energy and compress the pulse. Their working conditions and characteristics are remarkably different. Their time delay jitter under pulsed voltage is a key indicator that influences the pulsed power driver’s output waveform quality and stability. This article summarized the megavolt pulsed switches and their time delay jitters. First, the composition of the large pulsed power driver’s time delay and jitter and the influence of the megavolt switch are analyzed. Then, the configurations and working parameters such as the time delay jitter of three types of existent megavolt switches (self-breakdown, self-triggered, and externally triggered switches) are introduced. After summarizing the research progress of the time delay jitter characteristics of megavolt switches, the experimental, theoretical, and simulative approaches are discussed. The breakdown probability distribution model provides a tool for analyzing the megavolt switches’ time delay and jitter. Based on the framework of the probability distribution model and relevant experimental phenomena, the general methods to reduce the jitter in single-stage and multistage switches are extracted.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4655-4670"},"PeriodicalIF":1.3,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142797939","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Compact Wide Range High-Voltage/Current Impulse Generator for Simulating Various Indirect Effects of Lightning 用于模拟各种雷电间接效应的紧凑型宽范围高电压/电流脉冲发生器
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-24 DOI: 10.1109/TPS.2024.3479210
Woo-Cheol Jeong;Su-Mi Park;Hong-Je Ryoo
{"title":"Compact Wide Range High-Voltage/Current Impulse Generator for Simulating Various Indirect Effects of Lightning","authors":"Woo-Cheol Jeong;Su-Mi Park;Hong-Je Ryoo","doi":"10.1109/TPS.2024.3479210","DOIUrl":"https://doi.org/10.1109/TPS.2024.3479210","url":null,"abstract":"In this study, a high-voltage, high-current impulse generator to evaluate the indirect effects of lightning was developed. The impulse generator was designed to meet 14 distinct conditions necessary for simulating various lightning-induced scenarios. To accommodate these diverse requirements, pulse forming networks (PFNs) incorporating passive elements and high-repetition-rate semiconductor switches for high voltage and current was designed. The major challenge addressed in this research was the design of a high-voltage capacitor charger (HVCC) that can efficiently supply the required energy under each specified condition with a single unit. Because it should rapidly and repeatedly charge capacitors that vary in size by up to 40 000 times. Therefore, unlike typical HVCC designs that are optimized based on a specific voltage or current, this study selected two output currents as part of the HVCC design process, taking into account capacitor size, charging speed, and precision, along with various output voltage conditions. The HVCC was designed based on an analysis of an inductor-capacitor–capacitor (LCC) resonant converter utilizing a trapezoidal resonant current. It was designed to maintain a consistent target output current across a wide range of output voltages and capacitor conditions, while minimizing the stress on switches. Additionally, an appropriate structural design was incorporated to handle high voltages. The HVCC has been experimentally verified to precisely charge a wide range of load capacitors (from 1 to 38 500 nF) with high voltage (up to 11 kV) at a rapid repetition rate (up to 11 kHz). Additionally, through integrated experiments with the PFN, it has been experimentally verified that the system can precisely output impulses at all targeted conditions, including high-voltage impulses of 3300 V at a rapid repetition rate of 11 kHz and high-current impulses of 5100 A.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4639-4647"},"PeriodicalIF":1.3,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142797947","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Impact of the Generalized (r, q) Distributed Electrons on the Formation of Solitary Wave Structure in Magnetized Negative Ion Plasma 广义(r,q)分布电子对磁化负离子等离子体中孤波结构形成的影响
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-24 DOI: 10.1109/TPS.2024.3472696
N. Akhtar;S. Hussain
{"title":"The Impact of the Generalized (r, q) Distributed Electrons on the Formation of Solitary Wave Structure in Magnetized Negative Ion Plasma","authors":"N. Akhtar;S. Hussain","doi":"10.1109/TPS.2024.3472696","DOIUrl":"https://doi.org/10.1109/TPS.2024.3472696","url":null,"abstract":"Ion-acoustic solitary waves in the negative ion plasmas in the presence of generalized (r, q) distributed electrons are studied. Equations of states for positive and negative ions are included in magnetized plasma. Reductive perturbation method (RPM) are applied to derive the Zakharov-Kuznetsov (ZK) equation. The impact of variation of spectral indices on propagation characteristic of ion acoustic solitary waves in negative ion plasma is discussed. The effect of negative ion temperature in the presence of generalized distribution of electrons is also presented. Our findings predict that equation of state of negative ions affects amplitude and width of the nonlinear solitary structure significantly. Our findings are applicable to laboratory as well as space plasmas where negative ion plasmas exist with magnetic field, and a flat-top feature for low-energy electrons and a high-energy tail in the distribution function of the electrons have been observed.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 8","pages":"3094-3102"},"PeriodicalIF":1.3,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142600342","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Requirements for the Fast Interlock System of Wendelstein 7-X 对Wendelstein 7-X快速联锁系统的要求
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-10-24 DOI: 10.1109/TPS.2024.3391509
Sven Degenkolbe;Hans-Stephan Bosch;Olaf Grulke;Jörg Schacht;Erik Scharff;Reinhard Vilbrandt;Axel Winter
{"title":"The Requirements for the Fast Interlock System of Wendelstein 7-X","authors":"Sven Degenkolbe;Hans-Stephan Bosch;Olaf Grulke;Jörg Schacht;Erik Scharff;Reinhard Vilbrandt;Axel Winter","doi":"10.1109/TPS.2024.3391509","DOIUrl":"https://doi.org/10.1109/TPS.2024.3391509","url":null,"abstract":"The purpose of the Wendelstein 7-X central safety system (css) is to minimize the risk of injury to personnel and damage to equipment. The design of the css follows the IEC 61511 standard for functional safety in the industry. Due to the nature of the hardware used, the reliability of the system is high and the response time is moderate (in the order of seconds). To protect the components inside the plasma vessel during plasma operation, the response time must be much faster (on the order of 100 ms). As part of the safety control system, the fast interlock system (FIS) has been installed but with different hardware to that used for the css. The purpose of this article is to present the design process, starting with a risk assessment for the components inside the plasma vessel due to thermal loads, which determines the requirements for the FIS. The basic design criteria for the FIS to ensure the principles of functional safety are described.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"3622-3627"},"PeriodicalIF":1.3,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10734844","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142810526","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信