An All-Metal Terahertz Metamaterial Absorber Using Concentric Octagonal Rings for Refractive Index Sensing

IF 1.5 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2025-07-11 DOI:10.1109/TPS.2025.3582610

Shruti;Bhargav Appasani;Sasmita Pahadsingh

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引用次数: 0

Abstract

This article introduces an all-metal THz metamaterial absorber (MA) featuring triple concentric octagonal rings optimized to detect the refractive index of brain tissues. Constructed entirely from stainless steel, the absorber achieves dual-band absorption rates of 99.45% and 96.72% at 3.7149 and 3.8695 THz, respectively. Simulations reveal that the device exhibits sensitivities of 2.45 and 2.70 THz per refractive index unit (RIU) as the refractive index shifts from 1.30 to 1.40. The corresponding quality factors (Q-factor) are 571 and 1488, while the figures of merit (FoM) are 376 and 1038. These exceptionally high Q-factors and FoM values highlight the absorber’s potential for high-precision sensing applications. Moreover, a parametric analysis was performed to optimize the geometric dimensions of the structure. Physical mechanisms, including impedance matching, current distribution, and sensitivity, were also explained in detail. This stainless steel-based absorber simplifies fabrication and significantly reduces costs compared to conventional metal-dielectric-metal designs. This work finds its application in biomedical sensing, which requires highly sensitive sensors.

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利用同心八角形环进行折射率传感的全金属太赫兹超材料吸收体

本文介绍了一种具有三同心八角形环的全金属太赫兹超材料吸收器（MA），用于检测脑组织的折射率。该吸收器完全由不锈钢制成，在3.7149 THz和3.8695 THz波段分别达到99.45%和96.72%的双频吸收率。仿真结果表明，当折射率从1.30变化到1.40时，该器件的灵敏度分别为2.45和2.70太赫兹/ RIU。相应的品质因子（q因子）分别为571和1488，而品质因子（FoM）分别为376和1038。这些异常高的q因子和FoM值突出了吸收器在高精度传感应用中的潜力。此外，还进行了参数化分析以优化结构的几何尺寸。物理机制，包括阻抗匹配，电流分布和灵敏度，也详细解释。与传统的金属介电-金属设计相比，这种不锈钢基吸收器简化了制造过程，显著降低了成本。这项工作在需要高灵敏度传感器的生物医学传感中得到了应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.