Testing of Novel Semiconductor Opening Switches Using Magnetic Switching

IF 1.5 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2025-07-11 DOI:10.1109/TPS.2025.3586185

B. Esser;J. C. Stephens;J. C. Dickens;A. A. Neuber;J. J. Mankowski;C. A. Chapin;Q. Shao;D. O. Smith;L. F. Voss;J. A. Schrock;B. Hoff;S. Heidger

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引用次数: 0

Abstract

The performance of semiconductor opening switch (SOS) diodes with different doping profiles is assessed with the primary aim of enhancing or substituting hard-to-find devices. SOS devices are capable of providing long lifetime, gigawatt level pulses in generators with risetimes on the nanosecond scale with pulse widths on the order of 20 ns. An experimental testbed is described which allows for rapid testing of diodes with control of the forward pumping time which is a crucial parameter of SOS diodes. A saturable pulse transformer provides both the initial voltage multiplication and reverse current pulse required to drive SOS diodes. Voltage multiplication ratios of 16:1 were achieved with a modest charging voltage of 800 V and simple circuitry. With current densities of up to 1.4 kA

$\cdot $

$\text{cm}^{\text {-2}}$

, the testbed produces 10 kV output pulses into a

$56~\Omega $

load with a pulsewidth of 16 ns and delivered power of up to 1.9 MW. These novel devices are compared to legacy SOS diodes originating from Russia, with one of the profiles yielding increased performance. These profiles are studied in hopes of creating manufacturing demand to augment the availability of these useful devices.

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采用磁开关的新型半导体开路开关的测试

对不同掺杂情况下的半导体开关（SOS）二极管的性能进行了评估，主要目的是增强或取代难以找到的器件。SOS装置能够在发生器中提供长寿命，千兆瓦级脉冲，上升时间在纳秒级，脉冲宽度约为20纳秒。描述了一个实验测试平台，它允许快速测试二极管与控制前向抽运时间，这是SOS二极管的一个关键参数。可饱和脉冲变压器提供驱动SOS二极管所需的初始电压倍增和反向电流脉冲。以800 V的充电电压和简单的电路实现了16:1的电压倍增比。在电流密度高达1.4 kA $\cdot $ $\text{cm}^{\text{-2}}$的情况下，该试验台向$56~ $ Omega $负载产生10 kV输出脉冲，脉冲宽度为16 ns，输出功率高达1.9 MW。这些新型器件与源自俄罗斯的传统SOS二极管进行了比较，其中一种配置文件的性能有所提高。研究这些配置文件是希望创造制造需求，以增加这些有用设备的可用性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.