2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)最新文献

{"title":"CLEAN: From Limbo to LIMS","authors":"V. Di Bernardo, E. Martin","doi":"10.1109/UGIM.2012.6247076","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247076","url":null,"abstract":"In the late 1990s Dr. Alan McLelland of the Institute of Biochemistry, Royal Infirmary, Glasgow highlighted the multi-faceted nature of a LIMS (Laboratory Information Management System) by pointing out how it is perceived by an analyst, a laboratory manager, an information systems manager, and an accountant, \"all of them correct, but each of them limited by the users' own perceptions.\" [1] At Harvard's CNS the daily conflict between these different points of view gave birth to our own version of a LIMS: CLEAN (CNS Lab Equipment Access Network). The Center for Nanoscale systems operates shared facilities for cleanroom fabrication, imaging, and materials synthesis. Over the past seven years, CLEAN has gone through several transformations until it reached the current configuration, one of a web-based, centralized instrument access management system capable of enforcing scheduling policies, logging equipment usage reports, flagging no-show events, generating invoices, tracking user training, providing real-time dashboards and more. But even this definition does not completely cover what CLEAN does for CNS' people and users every day.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127785829","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"UGIM and the Institute of Environmental Sciences and Technology: Possible Synergies","authors":"J. Weaver","doi":"10.1109/UGIM.2012.6247064","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247064","url":null,"abstract":"There is a convergence developing in the mission of the UGIM and the Institute of Environmental Sciences and Technology (IEST). In addition, there has been interest within the UGIM community to meet in odd years, transforming UGIM into an every-year conference. An opportunity exists to build on both of these situations and develop potential synergies. Several options exist, but in the forefront is an informal partnering of the two organizations to provide an odd-year track at the IEST annual conference, ESTECH, while preserving the even-year UGIM meetings. This paper explores the synergies possible in combining the organizations and presents a path forward to develop these synergies.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127956202","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Micro and Nano R&D Fab Safety, Inert Gas Reduction: A Lean Six-Sigma Approach","authors":"R. Olson, R. Frank, J. Benyeda, J. LaBrie, P. McConnelee","doi":"10.1109/UGIM.2012.6247081","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247081","url":null,"abstract":"This paper will present the lean six sigma approach that was utilized to identify and analyze factors critical to creating a safe work environment, while reducing the use of these inert gases within the MNST laboratories and cleanroom. After an inventory of all inert gas sources in MNST was conducted, actions were identified utilizing guidelines outlined in the CGA P-1-2008 pamphlet.2 This initiative revealed 10 improvements to be centered on elimination, controlling and safety protocol of inert gas usage. Initial results showed that there were 7400 (740 sources of inert gases x 10 possible actions) total possible opportunities throughout MNST. Out of the 7400 total possible opportunities, 1031 or 14% of the opportunities needed actions; 6369 needed no actions and were considered safe by the inert gas reduction team and 456 were listed as “Don't Know”. The “Don't Know” items were items that needed further clarification by EHS, engineering or facilities. Further scrutiny uncovered additional points, items and issues. Follow on projects concentrated on optimization and incorporated a control plan of monthly audits, a management of change process and training awareness programs.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130894580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Micro and Nano Characterization Facility: Operations Methodology and Technical Management","authors":"V. Mishra, S. Raghavan, N. Bhat, R. Pratap","doi":"10.1109/UGIM.2012.6247094","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247094","url":null,"abstract":"Summary form only given. The Micro and Nano Characterization Facility (MNCF) located in Centre for Nano Science and Engineering (CeNSE) building on the Indian Institute of Science (IISc, Bangalore, INDIA) campus is a centralized facility for characterization of Micro and Nano Devices. The National Nanofabrication Centre (NNFC) which is 10,000 sq. ft. of clean room housing state of the art equipment for nanofabrication is located in the same building. The MNCF is 5000 sq. ft precision controlled environment facility housing 4 distinct laboratories for Electrical, Mechanical, Optical and Material Characterization. The MNCF is a national facility with plethora of high end equipment spanning over multiple disciplines of nano science and engineering rarely found under a single roof. The prime funding agencies to establish this facility are NPMAS-DRDO and MCIT. MNCF is a fully-staffed, user research facility at IISc that offers researchers convenient and reasonably priced access to a wide- range of state-of-the-art analytical instrumentation and services. The Mission of this facility is to support research and educational objectives of CeNSE, IISc and offer state of the art characterization facilities and services to nanoscience academia (thorugh INUP), related industries and National Laboratories. The CeNSE witnesses multidesciplinary research activities in nano-scale electronics, nano technologies, smart materials, micro and nanoelectromechanical systems (NEMS, MEMS), bio-electronic interfaces and integrated small-scale systems. Various characterization techniques available in MNCF are RF Characterization, AC/DC Characterization, AC/DC Characterization at different temperatures in electrical characterization lab. Mechanical characterization of MNCF is equipped with techniques like laser dopplar vibrometry, Stroboscopic Video Microscopy, White Light Interferometry, Non-destructive acoustic Investigations, Atomic Force Microscopy, Tensile and compressive strength measurements. Material Characterization Lab houses SEM, FIB, Nano particle analysis techniques and optical characterization lab facilitates STM, PL, RAMAN Spectroscopy, Solar Cell Characterization and quantum efficiency measurements. XPS and XRD facilities are scheduled for commissioning soon. This paper discusses various challenges involved in establishing the infrastructure of the facility, financial and technical operations, staffing, access control and maintenance of user discipline during its' 24/7 operations.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115767615","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Hands-On Training in the Design and Fabrication of N-Type Solar Cells","authors":"S. Shumate, M. Young, B. Newton, E. Porter, S-Q Yu, H. Naseem","doi":"10.1109/UGIM.2012.6247055","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247055","url":null,"abstract":"A new laboratory design has been developed that involves both theoretical modeling and practical implementation of n-type wafer based solar cells. PC1D and EDNA, two open source software packages, are utilized by the students to model and design a diffusion based process. The optimal design is chosen for lap implementation and characterization follows. Industrial quality QE gives student's experience with AR coating design and passivation concepts. Future lab development will include chemical processing for optical light trapping, grid contact design, and creation of front/back contacts via screen printing.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126541935","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Web-Based Content Management System for Equipment Information","authors":"R. Taylor","doi":"10.1109/UGIM.2012.6247085","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247085","url":null,"abstract":"Summary form only given. Our lab has developed a database driven content management system for lab members to obtain up to date information on the status and availability of tools from any web browser. The system displays whether a tool is up, down or in a caution state. It provides a calendar of upcoming reservations-either in-browser or as an ical file. Tools can be pinpointed on a map. Tool specific downloads can be stored in a versionable file repository with tiered access to control visibility to each of 3 groups: lab staff, lab members and the general public. Administration views and controls are available to lab staff when logged in. The system can be configured to use OpenCoral as the data backend. By installing the JasperServer reporting engine, a number of reports covering lab usage, equipment metrics and repair history can also be hosted and linked to the same set of information. This presentation will demonstrate how our web system is accessed by first going through the typical experience of a lab member, from authentication to looking up tool information, including the availability of reservation slots and any problems that have been reported on the tool. Then the user interface that is used by administrators for updating information and uploading files will be shown. The second portion of the demonstration will show the software components that make up the system and give an overview of how to install the application onto an existing web server. The software is based on a typical LAMP (Linux, Apache, MySQL and PHP) stack with LDAP authentication on the backend. Database storage can also use PostgreSQL. The JasperReports reporting engine is used for displaying reports. I will discuss the various caveats that need to be considered when setting up and connecting these systems, as well as plans for future improvements.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"377 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123088617","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Re-Evaluation of Proposed Microfabrication Process Cost Calculator","authors":"J. Provine, G. Yama","doi":"10.1109/UGIM.2012.6247109","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247109","url":null,"abstract":"We provide a cost calculation of running a pair of example nanofabrication processes in the Stanford Nanofabrication Facility and the University of California, Berkeley's Marvell Nanofabrication Laboratory. Cost analysis for a MEMS membrane process and a photonic waveguide process for each facility will be shown at the symposium. In this abstract the outline for the MEMS membrane process at SNF is provided as an example.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125954931","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Cross-Contamination Control at MIT's Microsystems Technology Labs","authors":"V. Diadiuk","doi":"10.1109/UGIM.2012.6247065","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247065","url":null,"abstract":"The mission of the Microsystems Technology Labs (MTL) is to provide facilities for education and research in micro and nano technology and innovative devices. MTL's research program is interdisciplinary, including students and faculty from most of the academic departments and research centers in MIT's Schools of Engineering and Science. In addition, MTL welcomes scientists and engineers from its sponsoring companies and, through its fabrication Facilities Access Program (FFA) includes engineers from companies who wish to make use of the MTL fabs for prototype development. Through its Outreach Program, MTL welcomes researchers from other universities and government labs.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"156 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122968196","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"History of the University Government Industry Microelectronics Symposium","authors":"L. Fuller, R. Pearson","doi":"10.1109/UGIM.2012.6247092","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247092","url":null,"abstract":"This paper and presentation will trace the history of the University Government Industry Microelectronics Symposium/Conference from its start in 1975 through 2012. The presentation will provide images from many of the conferences over the years. The stated purpose of the conference was to \"assemble research workers, engineering educators, members of the microelectronics industry and representatives of funding agencies and microelectronics laboratories for a discussion of applied and basic research and educational programs in microelectronics and the role of government and industry concerning the philosophy, direction, content and support of such programs\".","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"509 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115892424","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"A Practical Comparison of Mask Making Pattern Generation Systems","authors":"K. Hensley","doi":"10.1109/UGIM.2012.6247106","DOIUrl":"https://doi.org/10.1109/UGIM.2012.6247106","url":null,"abstract":"A Practical Comparison of Mask Making Pattern Generation Systems Kevin Hensley Utah Nanofab, College of Engineering, University of Utah Category: Equipment acquisition, capability development Three mask making systems utilizing different pattern generation technologies were evaluated. The systems include laser direct write (Heidelberg MicroPG), variable aperture UV mercury arc lamp exposure (Electromask CC250), and UV lamp DLP projection (IMP Xpress). A test pattern was exposed on each system and measurements and images were acquired and compared. Results show that the laser direct-write system is preferred for both curved shapes and high-resolution features. Additionally, maintenance and facility costs where evaluated for all systems.","PeriodicalId":347838,"journal":{"name":"2012 19th Biennial University/Government/Industry, Micro/Nano Symposium (UGIM)","volume":"395 2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114375785","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}