A Practical Comparison of Mask Making Pattern Generation Systems

Abstract

A Practical Comparison of Mask Making Pattern Generation Systems Kevin Hensley Utah Nanofab, College of Engineering, University of Utah Category: Equipment acquisition, capability development Three mask making systems utilizing different pattern generation technologies were evaluated. The systems include laser direct write (Heidelberg MicroPG), variable aperture UV mercury arc lamp exposure (Electromask CC250), and UV lamp DLP projection (IMP Xpress). A test pattern was exposed on each system and measurements and images were acquired and compared. Results show that the laser direct-write system is preferred for both curved shapes and high-resolution features. Additionally, maintenance and facility costs where evaluated for all systems.