Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems最新文献

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Radiation hardening of optical fibre links by photobleaching with light of shorter wavelength 用短波长的光漂白法对光纤链路进行辐射硬化
H. Henschel, O. Kohn, H. U. Schmidt
{"title":"Radiation hardening of optical fibre links by photobleaching with light of shorter wavelength","authors":"H. Henschel, O. Kohn, H. U. Schmidt","doi":"10.1109/RADECS.1995.509830","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509830","url":null,"abstract":"The influence of additionally injected short-wavelength photobleaching light on the radiation hardness of Ge-doped graded index fibres working at 1300 nm wavelength is investigated. Predictions are complicated by the fact that more efficient shortwave bleaching light experiences higher radiation-induced loss. Promising results are found for low fibre temperatures (/spl lsim/-50/spl deg/C) and bleaching light of about 835 nm wavelength.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128499153","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 29
Total dose response of a U.H.F. complementary-bipolar process (C-bip) using dielectric isolation (DI/SOI) 使用介质隔离(DI/SOI)的超高频互补双极过程(C-bip)的总剂量响应
M. Melotte
{"title":"Total dose response of a U.H.F. complementary-bipolar process (C-bip) using dielectric isolation (DI/SOI)","authors":"M. Melotte","doi":"10.1109/RADECS.1995.509790","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509790","url":null,"abstract":"Fast analog signal processing in ionizing radiation environments is today a growing activity for our ASIC design company. To answer this need, we have tested the total-dose response, up to 30 kGy(Si) (3 Mrad(Si)), of the NPN and PNP transistors used in the DI-Cbip UHF process from Harris Semiconductor. Results show a common-emitter current gain (/spl beta/) degradation of approximately 50% at usual current density. Degradation versus total dose exhibits saturation above 20 kGy(Si) at 36 mGy(Si)/s (3.6 rad(Si)/s).","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131495753","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Barrier width of an irradiated junction 辐照结的势垒宽度
Y. Moreau, F. Pelanchon, C. Sudre
{"title":"Barrier width of an irradiated junction","authors":"Y. Moreau, F. Pelanchon, C. Sudre","doi":"10.1109/RADECS.1995.509748","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509748","url":null,"abstract":"Barrier width of an irradiated junction is estimated taking the free carrier space charge due to irradiation into account. These numerical and analytical estimations may drastically modify the photocurrent depending on the dose rate.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131568899","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Comparative study of the radiation hardness of an analog CMOS pipeline, discrete MOS transistors and interface traps in MOS capacitors 模拟CMOS管道、分立MOS晶体管和MOS电容中接口阱辐射硬度的比较研究
S. Bottcher, C. Coldewey, N. Croitoru, A. Seidman, H. Vogt
{"title":"Comparative study of the radiation hardness of an analog CMOS pipeline, discrete MOS transistors and interface traps in MOS capacitors","authors":"S. Bottcher, C. Coldewey, N. Croitoru, A. Seidman, H. Vogt","doi":"10.1109/RADECS.1995.509750","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509750","url":null,"abstract":"The ZEUS experiment at HERA employs a custom made analog pipeline, manufactured with a 2 /spl mu/m CMOS process. The standard transistor layout was not sufficiently radiation hard. After introducing thin oxide extension and guard bands, the pipeline worked after irradiation, up to 500 krad, with only minor performance degradation. The performance of the pipeline and of discrete transistors was studied before and after irradiation. Additionally, interface traps were investigated on MOS capacitors. All devices were made with the same process. The degradation of transistor parameters was related to changes in the parameters of the pipeline. Most effects in the circuit could be explained by the observed threshold voltage shift in the transistors. Interface trap densities were measured on MOS capacitors in the lower part of the silicon bandgap, obtained under different bias conditions during irradiation. The observed interface trap density is low. The threshold voltage shift is dominated by fixed oxide charges.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131580352","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
A simple model for calculating proton induced SEU 一个计算质子诱导SEU的简单模型
J. Barak, J. Levinson, A. Akkerman, Y. Lifshitz, M. Victoria
{"title":"A simple model for calculating proton induced SEU","authors":"J. Barak, J. Levinson, A. Akkerman, Y. Lifshitz, M. Victoria","doi":"10.1109/RADECS.1995.509815","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509815","url":null,"abstract":"A new semi-empirical model for proton induced SEU is presented. For estimating the energy deposited by the protons in the sensitive volumes of the devices the model uses the measured spectra of surface barrier detectors (SBD) with the same thicknesses of the sensitive volume and at the same proton energies. Fitting the SBD spectra by exponential functions and the heavy ion induced cross sections by simple formulas results in simple expressions for the proton cross sections. The model predictions are in good agreement with the experimental results.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132379845","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 30
Gamma-ray irradiation induced degradation in ultra-thin silica layers 伽玛射线辐照诱导超薄二氧化硅层降解
A. Aassime, G. Sarrabayrouse, G. Salace, C. Petit
{"title":"Gamma-ray irradiation induced degradation in ultra-thin silica layers","authors":"A. Aassime, G. Sarrabayrouse, G. Salace, C. Petit","doi":"10.1109/RADECS.1995.509755","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509755","url":null,"abstract":"In this paper, the influence of gamma irradiation (unbiased devices) on the electrical properties of Metal-Oxide-Semiconductor (MOS) devices with an ultra-thin silica layer N/sub 2/O-nitrided or not is investigated. Mainly electron trapping, defects generation and breakdown during electrical stress are studied.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114409530","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Analog performance of SOI MOSFETs up to 25 mrad (Si) 高达25 mrad (Si)的SOI mosfet模拟性能
F. Faccio, P. Aspell, E. Heijne, P. Jarron, G. Borel
{"title":"Analog performance of SOI MOSFETs up to 25 mrad (Si)","authors":"F. Faccio, P. Aspell, E. Heijne, P. Jarron, G. Borel","doi":"10.1109/RADECS.1995.509766","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509766","url":null,"abstract":"We have studied the analog performance of the HSOI3-HD technology (industrialized by Thomson TCS, St. Egreve, France) up to a total dose of 25 Mrad of ionising radiation. Static parameters and their evolution have been extracted, and particular attention has been devoted to the noise. We found that most of the damage occurs in the first 12 Mrad, so the technology can find applications where tens of Mrad total doses are foreseen. P-channel transistors should be chosen as key elements in low noise ICs, with a maximum degradation of 18% in transconductance and better 1/f noise performance. A Generation-Recombination component in the noise spectra can be controlled through the body bias. We have studied the energy level of the trapping centers responsible for it and found that it is not modified by the irradiation.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121666977","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Interpretation of heavy ion cross section measurements 重离子截面测量的解释
E. Petersen
{"title":"Interpretation of heavy ion cross section measurements","authors":"E. Petersen","doi":"10.1109/RADECS.1995.509804","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509804","url":null,"abstract":"This paper discusses the information about a device that is contained in the experimental heavy ion cross section curve. The width and shape of the curve are shown to be determined by intra-cell variations of charge collection, not by cell to cell variations. If we assume that there is a unique charge that must appear on the transistor terminal, then the cross section may be described in terms of variation of effective charge collection depth across the device. Contours of constant charge collection can be determined from the parameters that describe the cross section curve. The effects of diffusion can be distinguished from the other charge collection processes.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124585054","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 19
Numerical modelling of mechanisms involved in latchup triggering by a laser beam 激光锁闭触发机理的数值模拟
P. Fouillat, H. Lapuyade, A. Touboul, J. Dom, R. Gaillard
{"title":"Numerical modelling of mechanisms involved in latchup triggering by a laser beam","authors":"P. Fouillat, H. Lapuyade, A. Touboul, J. Dom, R. Gaillard","doi":"10.1109/RADECS.1995.509806","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509806","url":null,"abstract":"The use of a laser beam is a well-known technique to trigger latchup parasitic structures in ICs. Numerical analyses of this phenomenon are brought into play to study its sensitivity when a continuous wave laser as well as pulsed lasers are used. The impact location is also studied to demonstrate that different mechanisms are involved in the triggering phase of latchup. The structure is also more sensitive to the blue light when it is directed over the well-substrate junction while it is more sensitive to infrared light elsewhere. When using a CW laser, the curves giving the power supply current versus the photo-induced current provide direct information on the parameters of the parasitic structure.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127674603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
A study involving the design and the fabrication process on the SRAM behaviour during a dose-rate event 涉及在剂量率事件中SRAM行为的设计和制造过程的研究
R. Marec, P. Mary, R. Gaillard, J. Palau, G. Bruguier, J. Gasiot
{"title":"A study involving the design and the fabrication process on the SRAM behaviour during a dose-rate event","authors":"R. Marec, P. Mary, R. Gaillard, J. Palau, G. Bruguier, J. Gasiot","doi":"10.1109/RADECS.1995.509819","DOIUrl":"https://doi.org/10.1109/RADECS.1995.509819","url":null,"abstract":"The experimental results analysis of TS4T1601 SRAMs in standby mode and electrical simulations show that the SRAM design and some slight mask misalignments during the fabrication process are dominant factors concerning the dose-rate upset patterns and thresholds.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122695274","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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